JP2006249577A - プラズマ処理用ガス供給管 - Google Patents
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Abstract
【解決手段】プラズマ処理室内に保持された容器の内部に挿入され、該容器内にプラズマ処理用ガスを供給するためのガス供給管において、軸方向にガス流路が延びており且つ壁面にガス放出孔が全体にわたって分散している内管と、該内管を覆うように且つ該内管の外面との間に適当な空間が形成されるように設けられた金属製外管とからなり、前記金属製外管の壁面には、電磁波遮断性を有する大きさのガス吹き出し孔が全体にわたって分布していることを特徴とする。
【選択図】図2
Description
軸方向にガス流路が延びており且つ壁面にガス放出孔が全体にわたって分散している内管と、該内管を覆うように且つ該内管の外面との間に適当な空間が形成されるように設けられた金属製外管とからなり、
前記金属製外管の壁面には、電磁波遮断性を有する大きさのガス吹き出し孔が全体にわたって分布していることを特徴とするプラズマ処理用ガス供給管が提供される。
1.前記内管が一定の範囲の目開きを有する多孔質部材から形成され、該多孔質部材のポアが前記ガス放出孔を形成していること、
2.前記外管壁の少なくとも表面部が多孔質体で形成されていること、
3.前記外管壁が焼結体で形成されていること、
4.前記外管壁の表面がアルマイト処理によって形成されていること、
5.前記金属製外管が、金属ネットにより形成されていること、
が好適である。
図1は、本発明のガス供給管を用いて実施されるプラズマ処理による容器内面の蒸着膜の形成プロセスを示す概念図であり、マイクロ波CVDを例にとって示した図である。
図2は、本発明のガス供給管の好適例を示す部分断面側面図である。
[共通条件]
プラズマ処理対象である基材には、口部呼び径がφ28mmのPETボトルを用いた。処理用ガスには、有機ケイ素化合物ガス及び酸素ガスを用い、ガス流量は、それぞれ2sccm及び20sccmとした。プラズマ処理の際のボトル内部及び外部の真空度は、それぞれ20Pa及び7000Paに調整し、マイクロ波を供給した際にボトル内部のみにプラズマが励起されるようにした。マイクロ波は市販のマイクロ波電源(2.45GHz)を用いて発振させ、500Wの出力でプラズマ処理室内に供給した。なお、プラズマ処理時間はプラズマ点火から10秒間とした。
[評価]
上記一連の処理を24時間連続的に運転し、ガス供給管への蒸着膜成分の付着及びカス脱落状況とボトル内膜厚分布を確認した。
表1に示すような供給管仕様とキリ穴径の条件組み合わせで実験を行った。ここでSUS焼結体は、内管には、ボトル内膜厚分布均一に配慮した公称ろ過精度10μmと20μmの円筒管の組み合わせとし、外管には、公称ろ過精度10μmの円筒管を使用した。実施例2では、アルミニウム製の外管の表面にアルマイト処理を行っている。実施例3では、外管をステンレス製金網(16メッシュ−開目1.09mm)にて製作したものである。
表1から、本発明の請求範囲を満足する実験条件(実施例1〜2)では、連続使用7日後において、ガス供給管の目詰まりや蒸着時に付着したカスの脱落発生がなく非常に良好であった。実施例3では、金網部でのトラップ量には限界があるため極僅かなカス脱落は見られたが、それ以外は良好であった。
比較例1のように外管にキリ穴を設けない場合、外管表面への蒸着成分の堆積が目詰まりとなり膜厚分布不良が発生した。また、比較例2のようにキリ穴径が10mm以上となるような大径の場合、内管と外管との間で異常放電が発生し、安定したプラズマ発光ができなかった。
11:内管
13:金属製外管
Claims (6)
- プラズマ処理室内に保持された容器の内部に挿入され、該容器内にプラズマ処理用ガスを供給するためのガス供給管において、
軸方向にガス流路が延びており且つ壁面にガス放出孔が全体にわたって分散している内管と、該内管を覆うように且つ該内管の外面との間に適当な空間が形成されるように設けられた金属製外管とからなり、
前記金属製外管の壁面には、電磁波遮断性を有する大きさのガス吹き出し孔が全体にわたって分布していることを特徴とするプラズマ処理用ガス供給管。 - 前記内管が一定の範囲の目開きを有する多孔質部材から形成され、該多孔質部材のポアが前記ガス放出孔を形成している請求項1に記載のプラズマ処理用ガス供給管。
- 前記外管壁の少なくとも表面部が多孔質体で形成されている請求項1に記載のプラズマ処理用ガス供給管。
- 前記外管壁が焼結体で形成されている請求項1に記載のプラズマ処理用ガス供給管。
- 前記外管壁の表面がアルマイト処理によって形成されている請求項1に記載のプラズマ処理用ガス供給管。
- 前記金属製外管が、金属ネットにより形成されている請求項1または2に記載のプラズマ処理用ガス供給管。
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US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
US8512796B2 (en) | 2009-05-13 | 2013-08-20 | Si02 Medical Products, Inc. | Vessel inspection apparatus and methods |
US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
US9545360B2 (en) | 2009-05-13 | 2017-01-17 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
US9554968B2 (en) | 2013-03-11 | 2017-01-31 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging |
US9664626B2 (en) | 2012-11-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Coating inspection method |
US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
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US7985188B2 (en) | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
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