JP2006214856A5 - - Google Patents

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Publication number
JP2006214856A5
JP2006214856A5 JP2005027498A JP2005027498A JP2006214856A5 JP 2006214856 A5 JP2006214856 A5 JP 2006214856A5 JP 2005027498 A JP2005027498 A JP 2005027498A JP 2005027498 A JP2005027498 A JP 2005027498A JP 2006214856 A5 JP2006214856 A5 JP 2006214856A5
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JP
Japan
Prior art keywords
light
detecting
test
reference light
measuring device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005027498A
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English (en)
Japanese (ja)
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JP2006214856A (ja
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Publication date
Application filed filed Critical
Priority to JP2005027498A priority Critical patent/JP2006214856A/ja
Priority claimed from JP2005027498A external-priority patent/JP2006214856A/ja
Priority to US11/345,220 priority patent/US7532019B2/en
Priority to EP06101218A priority patent/EP1688720A2/en
Publication of JP2006214856A publication Critical patent/JP2006214856A/ja
Priority to US11/875,377 priority patent/US7548077B2/en
Publication of JP2006214856A5 publication Critical patent/JP2006214856A5/ja
Withdrawn legal-status Critical Current

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JP2005027498A 2005-02-03 2005-02-03 測定装置及び方法 Withdrawn JP2006214856A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005027498A JP2006214856A (ja) 2005-02-03 2005-02-03 測定装置及び方法
US11/345,220 US7532019B2 (en) 2005-02-03 2006-02-02 Measuring apparatus and measuring method
EP06101218A EP1688720A2 (en) 2005-02-03 2006-02-02 Apparatus for measuring a polarization characteristic of a test object and corresponding measuring method
US11/875,377 US7548077B2 (en) 2005-02-03 2007-10-19 Measuring apparatus and a measuring method for measuring a polarization characteristic of an optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005027498A JP2006214856A (ja) 2005-02-03 2005-02-03 測定装置及び方法

Publications (2)

Publication Number Publication Date
JP2006214856A JP2006214856A (ja) 2006-08-17
JP2006214856A5 true JP2006214856A5 (enExample) 2008-03-21

Family

ID=36250973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005027498A Withdrawn JP2006214856A (ja) 2005-02-03 2005-02-03 測定装置及び方法

Country Status (3)

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US (2) US7532019B2 (enExample)
EP (1) EP1688720A2 (enExample)
JP (1) JP2006214856A (enExample)

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US7869057B2 (en) 2002-09-09 2011-01-11 Zygo Corporation Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
US7139081B2 (en) 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7324214B2 (en) 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
TW200604695A (en) * 2004-05-18 2006-02-01 Zygo Corp Methods and systems for determining optical properties using low-coherence interference signals
US7884947B2 (en) 2005-01-20 2011-02-08 Zygo Corporation Interferometry for determining characteristics of an object surface, with spatially coherent illumination
WO2006078718A1 (en) * 2005-01-20 2006-07-27 Zygo Corporation Interferometer for determining characteristics of an object surface
JP4891261B2 (ja) * 2005-12-07 2012-03-07 株式会社トプコン 光画像計測装置
TWI312064B (en) * 2006-07-10 2009-07-11 Ind Tech Res Inst Interferometer and a microscope utilizing the same
JP5502491B2 (ja) 2006-12-22 2014-05-28 ザイゴ コーポレーション 表面特徴の特性測定のための装置および方法
US7889355B2 (en) 2007-01-31 2011-02-15 Zygo Corporation Interferometry for lateral metrology
US7619746B2 (en) 2007-07-19 2009-11-17 Zygo Corporation Generating model signals for interferometry
US8072611B2 (en) 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
JP2009109414A (ja) * 2007-10-31 2009-05-21 Canon Inc 測定装置、露光装置およびデバイス製造方法
WO2009064670A2 (en) 2007-11-13 2009-05-22 Zygo Corporation Interferometer utilizing polarization scanning
EP2232195B1 (en) 2007-12-14 2015-03-18 Zygo Corporation Analyzing surface structure using scanning interferometry
JP2009194041A (ja) * 2008-02-12 2009-08-27 Canon Inc 評価方法、調整方法、露光装置、およびコンピュータプログラム
JP5033015B2 (ja) * 2008-02-15 2012-09-26 キヤノン株式会社 露光装置、露光方法及びデバイス製造方法
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
WO2010085618A1 (en) * 2009-01-23 2010-07-29 Indiana University Research And Technology Corporation Devices and methods for polarization-sensitive optical coherence tomography with adaptive optics
KR101590241B1 (ko) * 2011-02-28 2016-01-29 고쿠리츠다이가쿠호우징 카가와다이가쿠 광학특성 측정장치 및 광학특성 측정방법
JP2013007740A (ja) 2011-05-23 2013-01-10 Canon Inc 波面測定装置及び波面測定方法、物体測定装置
CN102393569B (zh) * 2011-11-25 2013-04-10 中国科学院上海光学精密机械研究所 偏振光学扫描器
NL2009824A (en) 2011-12-21 2013-06-24 Asml Netherlands Bv Lithographic apparatus with a deformation sensor.
CN102589416B (zh) * 2012-03-15 2014-05-07 浙江大学 用于非球面测量的波长扫描干涉仪及方法
JP6606800B2 (ja) * 2015-04-23 2019-11-20 株式会社トーメーコーポレーション 偏光情報を利用した光干渉断層計
US11637967B2 (en) 2018-04-09 2023-04-25 Sony Corporation Information processing apparatus, information processing method, and calibration apparatus
CN112880987B (zh) * 2019-11-29 2022-05-03 上海微电子装备（集团）股份有限公司 光学元件的偏振性能检测方法及检测系统
CN119044844B (zh) * 2024-08-02 2025-09-09 北京航空航天大学 检测光加压电反射镜与位置探测器模块实现光路指向闭环方法

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US5898501A (en) * 1996-07-25 1999-04-27 Nikon Corporation Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens
KR100564436B1 (ko) * 1997-07-22 2006-03-29 가부시키가이샤 니콘 노광 방법, 노광 장치 및 광 세정 방법
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JP3728187B2 (ja) * 2000-07-10 2005-12-21 キヤノン株式会社 結像光学系性能測定方法及び装置
JP2002071515A (ja) * 2000-08-31 2002-03-08 Canon Inc 測定装置及び測定方法
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US20040042094A1 (en) * 2000-12-28 2004-03-04 Tomoyuki Matsuyama Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
US6882428B2 (en) * 2001-08-28 2005-04-19 Agilent Technologies, Inc. Optical analyzer and method for reducing relative intensity noise in interferometric optical measurements using a continuously tunable laser
JP4265404B2 (ja) * 2001-09-27 2009-05-20 株式会社ニコン 点回折型干渉計測方法及び点回折型干渉計測装置
US6943891B2 (en) * 2002-03-15 2005-09-13 Agilent Technologies, Inc. Determining optical characteristics of optical devices under test
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JP2004061515A (ja) * 2002-07-29 2004-02-26 Cark Zeiss Smt Ag 光学系による偏光状態への影響を決定する方法及び装置と、分析装置
JP4455024B2 (ja) * 2002-12-13 2010-04-21 キヤノン株式会社 複屈折測定装置
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US6958817B1 (en) * 2004-08-13 2005-10-25 Nanyang Technological University Method of interferometry with modulated optical path-length difference and interferometer

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