JP2006214856A - 測定装置及び方法 - Google Patents

測定装置及び方法 Download PDF

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Publication number
JP2006214856A
JP2006214856A JP2005027498A JP2005027498A JP2006214856A JP 2006214856 A JP2006214856 A JP 2006214856A JP 2005027498 A JP2005027498 A JP 2005027498A JP 2005027498 A JP2005027498 A JP 2005027498A JP 2006214856 A JP2006214856 A JP 2006214856A
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JP
Japan
Prior art keywords
subject
measuring
polarization characteristic
characteristic matrix
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005027498A
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English (en)
Japanese (ja)
Other versions
JP2006214856A5 (enExample
Inventor
Naoto Hayashi
直人 林
Fukuyuki Kuramoto
福之 蔵本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005027498A priority Critical patent/JP2006214856A/ja
Priority to EP06101218A priority patent/EP1688720A2/en
Priority to US11/345,220 priority patent/US7532019B2/en
Publication of JP2006214856A publication Critical patent/JP2006214856A/ja
Priority to US11/875,377 priority patent/US7548077B2/en
Publication of JP2006214856A5 publication Critical patent/JP2006214856A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005027498A 2005-02-03 2005-02-03 測定装置及び方法 Withdrawn JP2006214856A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005027498A JP2006214856A (ja) 2005-02-03 2005-02-03 測定装置及び方法
EP06101218A EP1688720A2 (en) 2005-02-03 2006-02-02 Apparatus for measuring a polarization characteristic of a test object and corresponding measuring method
US11/345,220 US7532019B2 (en) 2005-02-03 2006-02-02 Measuring apparatus and measuring method
US11/875,377 US7548077B2 (en) 2005-02-03 2007-10-19 Measuring apparatus and a measuring method for measuring a polarization characteristic of an optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005027498A JP2006214856A (ja) 2005-02-03 2005-02-03 測定装置及び方法

Publications (2)

Publication Number Publication Date
JP2006214856A true JP2006214856A (ja) 2006-08-17
JP2006214856A5 JP2006214856A5 (enExample) 2008-03-21

Family

ID=36250973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005027498A Withdrawn JP2006214856A (ja) 2005-02-03 2005-02-03 測定装置及び方法

Country Status (3)

Country Link
US (2) US7532019B2 (enExample)
EP (1) EP1688720A2 (enExample)
JP (1) JP2006214856A (enExample)

Cited By (5)

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JP2009194238A (ja) * 2008-02-15 2009-08-27 Canon Inc 露光装置及びデバイス製造方法
WO2012160936A1 (en) 2011-05-23 2012-11-29 Canon Kabushiki Kaisha Wavefront measuring apparatus, wavefront measuring method, and object measuring apparatus
JP2013131745A (ja) * 2011-12-21 2013-07-04 Asml Netherlands Bv 変形センサを有するリソグラフィ装置
JP2016202597A (ja) * 2015-04-23 2016-12-08 株式会社トーメーコーポレーション 偏光情報を利用した光干渉断層計
WO2019198287A1 (ja) * 2018-04-09 2019-10-17 ソニー株式会社 情報処理装置と情報処理方法とプログラムおよびキャリブレーション装置

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US7139081B2 (en) 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7869057B2 (en) 2002-09-09 2011-01-11 Zygo Corporation Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
US7324214B2 (en) 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
TW200604695A (en) * 2004-05-18 2006-02-01 Zygo Corp Methods and systems for determining optical properties using low-coherence interference signals
US7884947B2 (en) 2005-01-20 2011-02-08 Zygo Corporation Interferometry for determining characteristics of an object surface, with spatially coherent illumination
EP1853874B1 (en) * 2005-01-20 2009-09-02 Zygo Corporation Interferometer for determining characteristics of an object surface
US8009297B2 (en) * 2005-12-07 2011-08-30 Kabushiki Kaisha Topcon Optical image measuring apparatus
TWI312064B (en) * 2006-07-10 2009-07-11 Ind Tech Res Inst Interferometer and a microscope utilizing the same
US7924435B2 (en) 2006-12-22 2011-04-12 Zygo Corporation Apparatus and method for measuring characteristics of surface features
US7889355B2 (en) 2007-01-31 2011-02-15 Zygo Corporation Interferometry for lateral metrology
US7619746B2 (en) * 2007-07-19 2009-11-17 Zygo Corporation Generating model signals for interferometry
US8072611B2 (en) 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
JP2009109414A (ja) * 2007-10-31 2009-05-21 Canon Inc 測定装置、露光装置およびデバイス製造方法
KR101274517B1 (ko) 2007-11-13 2013-06-13 지고 코포레이션 편광 스캐닝을 이용한 간섭계
WO2009079334A2 (en) 2007-12-14 2009-06-25 Zygo Corporation Analyzing surface structure using scanning interferometry
JP2009194041A (ja) * 2008-02-12 2009-08-27 Canon Inc 評価方法、調整方法、露光装置、およびコンピュータプログラム
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
US8979266B2 (en) * 2009-01-23 2015-03-17 Indiana University Research And Technology Corporation Devices and methods for polarization-sensitive optical coherence tomography and adaptive optics
US8830462B2 (en) * 2011-02-28 2014-09-09 National University Corporation Kagawa University Optical characteristic measurement device and optical characteristic measurement method
CN102393569B (zh) * 2011-11-25 2013-04-10 中国科学院上海光学精密机械研究所 偏振光学扫描器
CN102589416B (zh) * 2012-03-15 2014-05-07 浙江大学 用于非球面测量的波长扫描干涉仪及方法
CN112880987B (zh) * 2019-11-29 2022-05-03 上海微电子装备（集团）股份有限公司 光学元件的偏振性能检测方法及检测系统
CN119044844B (zh) * 2024-08-02 2025-09-09 北京航空航天大学 检测光加压电反射镜与位置探测器模块实现光路指向闭环方法

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
US5898501A (en) * 1996-07-25 1999-04-27 Nikon Corporation Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens
KR100564436B1 (ko) * 1997-07-22 2006-03-29 가부시키가이샤 니콘 노광 방법, 노광 장치 및 광 세정 방법
JP3796368B2 (ja) 1999-03-24 2006-07-12 キヤノン株式会社 投影露光装置
JP3796369B2 (ja) 1999-03-24 2006-07-12 キヤノン株式会社 干渉計を搭載した投影露光装置
JP2001351842A (ja) * 2000-06-05 2001-12-21 Canon Inc 位置検出方法、位置検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
JP3728187B2 (ja) 2000-07-10 2005-12-21 キヤノン株式会社 結像光学系性能測定方法及び装置
JP2002071515A (ja) * 2000-08-31 2002-03-08 Canon Inc 測定装置及び測定方法
DE60001353T2 (de) * 2000-11-17 2003-06-26 Agilent Technologies, Inc. (N.D.Ges.D.Staates Delaware) Polarisationsdispersionsmessverfahren für optische Geräte und Vorrichtung dazu
US20040042094A1 (en) * 2000-12-28 2004-03-04 Tomoyuki Matsuyama Projection optical system and production method therefor, exposure system and production method therefor, and production method for microdevice
US6882428B2 (en) * 2001-08-28 2005-04-19 Agilent Technologies, Inc. Optical analyzer and method for reducing relative intensity noise in interferometric optical measurements using a continuously tunable laser
WO2003029751A1 (en) * 2001-09-27 2003-04-10 Nikon Corporation Method and device for measuring point diffraction interference
US6943891B2 (en) * 2002-03-15 2005-09-13 Agilent Technologies, Inc. Determining optical characteristics of optical devices under test
US7009691B2 (en) * 2002-05-29 2006-03-07 Agilent Technologies, Inc. System and method for removing the relative phase uncertainty in device characterizations performed with a polarimeter
JP2004061515A (ja) 2002-07-29 2004-02-26 Cark Zeiss Smt Ag 光学系による偏光状態への影響を決定する方法及び装置と、分析装置
JP4455024B2 (ja) * 2002-12-13 2010-04-21 キヤノン株式会社 複屈折測定装置
US7212291B2 (en) * 2003-12-18 2007-05-01 Zygo Corporation Interferometric microscopy using reflective optics for complex surface shapes
US6958817B1 (en) * 2004-08-13 2005-10-25 Nanyang Technological University Method of interferometry with modulated optical path-length difference and interferometer

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009194238A (ja) * 2008-02-15 2009-08-27 Canon Inc 露光装置及びデバイス製造方法
US7889319B2 (en) 2008-02-15 2011-02-15 Canon Kabushiki Kaisha Exposure apparatus and device fabrication method
WO2012160936A1 (en) 2011-05-23 2012-11-29 Canon Kabushiki Kaisha Wavefront measuring apparatus, wavefront measuring method, and object measuring apparatus
JP2013131745A (ja) * 2011-12-21 2013-07-04 Asml Netherlands Bv 変形センサを有するリソグラフィ装置
US9360774B2 (en) 2011-12-21 2016-06-07 Asml Netherlands B.V. Lithographic apparatus with a deformation sensor
JP2016202597A (ja) * 2015-04-23 2016-12-08 株式会社トーメーコーポレーション 偏光情報を利用した光干渉断層計
WO2019198287A1 (ja) * 2018-04-09 2019-10-17 ソニー株式会社 情報処理装置と情報処理方法とプログラムおよびキャリブレーション装置
US11637967B2 (en) 2018-04-09 2023-04-25 Sony Corporation Information processing apparatus, information processing method, and calibration apparatus

Also Published As

Publication number Publication date
US7548077B2 (en) 2009-06-16
US20060170932A1 (en) 2006-08-03
US20080043226A1 (en) 2008-02-21
US7532019B2 (en) 2009-05-12
EP1688720A2 (en) 2006-08-09

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