JP2006210460A5 - - Google Patents
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- JP2006210460A5 JP2006210460A5 JP2005017700A JP2005017700A JP2006210460A5 JP 2006210460 A5 JP2006210460 A5 JP 2006210460A5 JP 2005017700 A JP2005017700 A JP 2005017700A JP 2005017700 A JP2005017700 A JP 2005017700A JP 2006210460 A5 JP2006210460 A5 JP 2006210460A5
- Authority
- JP
- Japan
- Prior art keywords
- optical
- photoelectric conversion
- electron beam
- exposure apparatus
- conversion unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (7)
信号を伝送する伝送線路とを備えた電子光学系を用いて、露光ビームを試料の上に収束させ所定のパターンを露光する電子線露光装置において、
前記伝送線路は、光伝送路と、前記光伝送路の始点側で前記駆動信号を電気信号から光信号に変換する第1の光電変換部と、前記光伝送路の終点側で前記第1の光電変換部で変換された光信号を電気信号に変換する第2の光電変換部とを有し、前記第2の光電変換部で変換された電気信号を前記ブランキング電極に入力することを特徴とする電子線露光装置。 Using an electron optical system that includes a plurality of blanking electrodes that individually control irradiation of a plurality of electron beams and a transmission line that transmits a drive signal for driving the blanking electrodes, an exposure beam is applied to the sample . In an electron beam exposure apparatus that converges and exposes a predetermined pattern,
The transmission line includes an optical transmission line, a first photoelectric conversion unit that converts the drive signal from an electric signal to an optical signal on the start point side of the optical transmission line, and the first photoelectric conversion unit on the end point side of the optical transmission line. characterized by a second photoelectric conversion unit for converting the converted optical signal by the photoelectric conversion section into an electrical signal, and inputs the electric signal converted by the second photoelectric conversion unit to said blanking electrodes An electron beam exposure apparatus.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005017700A JP4652829B2 (en) | 2005-01-26 | 2005-01-26 | Electron beam exposure apparatus and device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005017700A JP4652829B2 (en) | 2005-01-26 | 2005-01-26 | Electron beam exposure apparatus and device manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006210460A JP2006210460A (en) | 2006-08-10 |
JP2006210460A5 true JP2006210460A5 (en) | 2008-03-06 |
JP4652829B2 JP4652829B2 (en) | 2011-03-16 |
Family
ID=36966989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005017700A Expired - Fee Related JP4652829B2 (en) | 2005-01-26 | 2005-01-26 | Electron beam exposure apparatus and device manufacturing method |
Country Status (1)
Country | Link |
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JP (1) | JP4652829B2 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100524026C (en) * | 2002-10-25 | 2009-08-05 | 迈普尔平版印刷Ip有限公司 | Lithography system |
JP5844269B2 (en) * | 2009-10-26 | 2016-01-13 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | Charged particle multiple beamlet lithography system with adjustment device |
JP2012023316A (en) * | 2010-07-16 | 2012-02-02 | Canon Inc | Charged particle beam drawing apparatus and method of manufacturing article |
JP2013546180A (en) * | 2010-10-26 | 2013-12-26 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | Modulator and charged particle multi-beam lithography system using the same |
US8558196B2 (en) * | 2010-11-13 | 2013-10-15 | Mapper Lithography Ip B.V. | Charged particle lithography system with aperture array cooling |
JP5253532B2 (en) * | 2011-03-01 | 2013-07-31 | キヤノン株式会社 | Deflector array, deflector array manufacturing method, drawing apparatus, and article manufacturing method |
JP6038882B2 (en) * | 2011-04-20 | 2016-12-07 | マッパー・リソグラフィー・アイピー・ビー.ブイ. | Optical fiber constructs and methods of forming such constructs |
JP2013008878A (en) * | 2011-06-24 | 2013-01-10 | Canon Inc | Drawing device, manufacturing method of article, and processing unit |
JP5963139B2 (en) * | 2011-10-03 | 2016-08-03 | 株式会社Param | Electron beam drawing method and drawing apparatus |
JP6847886B2 (en) * | 2018-03-20 | 2021-03-24 | 株式会社東芝 | Charged particle beam deflection device |
JP7186739B2 (en) * | 2020-03-11 | 2022-12-09 | 株式会社東芝 | Charged particle beam deflection device |
CN116413856B (en) * | 2023-06-12 | 2024-01-09 | 之江实验室 | End face coupler and preparation method thereof |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57204131A (en) * | 1981-06-10 | 1982-12-14 | Toshiba Mach Co Ltd | Electron-ray drawing device |
JPH0582069A (en) * | 1991-09-25 | 1993-04-02 | Hitachi Ltd | Electron beam drawing device |
JP3191998B2 (en) * | 1992-09-01 | 2001-07-23 | 富士ゼロックス株式会社 | Wavelength multiplexing transceiver for optical communication |
JP2001126972A (en) * | 1999-10-25 | 2001-05-11 | Hitachi Ltd | Electron beam drawing system and drawing method |
US20020145113A1 (en) * | 2001-04-09 | 2002-10-10 | Applied Materials, Inc. | Optical signal transmission for electron beam imaging apparatus |
CN100524026C (en) * | 2002-10-25 | 2009-08-05 | 迈普尔平版印刷Ip有限公司 | Lithography system |
DE602004010824T2 (en) * | 2003-07-30 | 2008-12-24 | Mapper Lithography Ip B.V. | MODULATOR CIRCUIT |
-
2005
- 2005-01-26 JP JP2005017700A patent/JP4652829B2/en not_active Expired - Fee Related
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