JPS57204131A - Electron-ray drawing device - Google Patents

Electron-ray drawing device

Info

Publication number
JPS57204131A
JPS57204131A JP8901781A JP8901781A JPS57204131A JP S57204131 A JPS57204131 A JP S57204131A JP 8901781 A JP8901781 A JP 8901781A JP 8901781 A JP8901781 A JP 8901781A JP S57204131 A JPS57204131 A JP S57204131A
Authority
JP
Japan
Prior art keywords
optical
transmitters
circuit
electron
information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8901781A
Other languages
Japanese (ja)
Inventor
Shoji Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP8901781A priority Critical patent/JPS57204131A/en
Publication of JPS57204131A publication Critical patent/JPS57204131A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To improve noise resistant property at high speed by using a digital optical transmitter for the internal data transmission of the electron-ray drawing device. CONSTITUTION:The digital optical transmitters 40 are used as transmission lines 40 between a drawing controlling section 10 consisting of a drawing circuit (RCU) 11 converting figure information into serial digital signals and a deflection control circuit 12 and a driver circuit section 20 composed of a blanking circuit 21 and a deflection amplifier 22. The information is transmitted by infrared rays or a visible ray, and the transmitters are each formed by optical transmitters, optical fibers and optical receivers.
JP8901781A 1981-06-10 1981-06-10 Electron-ray drawing device Pending JPS57204131A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8901781A JPS57204131A (en) 1981-06-10 1981-06-10 Electron-ray drawing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8901781A JPS57204131A (en) 1981-06-10 1981-06-10 Electron-ray drawing device

Publications (1)

Publication Number Publication Date
JPS57204131A true JPS57204131A (en) 1982-12-14

Family

ID=13959134

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8901781A Pending JPS57204131A (en) 1981-06-10 1981-06-10 Electron-ray drawing device

Country Status (1)

Country Link
JP (1) JPS57204131A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04130713A (en) * 1990-09-21 1992-05-01 Hitachi Ltd Charged particle aligner
JP2006504134A (en) * 2002-10-25 2006-02-02 マッパー・リソグラフィー・アイピー・ビー．ブイ． Lithography system
JP2006210460A (en) * 2005-01-26 2006-08-10 Canon Inc Electron beam exposure device
JP2010073923A (en) * 2008-09-19 2010-04-02 Nuflare Technology Inc Charged particle beam lithography apparatus and charged particle beam lithography method
JP2012004415A (en) * 2010-06-18 2012-01-05 Nuflare Technology Inc Charged particle beam lithography apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710237A (en) * 1980-06-23 1982-01-19 Toshiba Corp Electron beam exposing apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710237A (en) * 1980-06-23 1982-01-19 Toshiba Corp Electron beam exposing apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04130713A (en) * 1990-09-21 1992-05-01 Hitachi Ltd Charged particle aligner
US5281827A (en) * 1990-09-21 1994-01-25 Hitachi, Ltd. Charged particle beam exposure apparatus
US5424550A (en) * 1990-09-21 1995-06-13 Hitachi, Ltd. Charged particle beam exposure apparatus
JP2559529B2 (en) * 1990-09-21 1996-12-04 株式会社日立製作所 Charged particle exposure system
JP2006504134A (en) * 2002-10-25 2006-02-02 マッパー・リソグラフィー・アイピー・ビー．ブイ． Lithography system
JP2012238902A (en) * 2002-10-25 2012-12-06 Mapper Lithography Ip Bv Lithography system
JP2006210460A (en) * 2005-01-26 2006-08-10 Canon Inc Electron beam exposure device
JP4652829B2 (en) * 2005-01-26 2011-03-16 キヤノン株式会社 Electron beam exposure apparatus and device manufacturing method
JP2010073923A (en) * 2008-09-19 2010-04-02 Nuflare Technology Inc Charged particle beam lithography apparatus and charged particle beam lithography method
JP2012004415A (en) * 2010-06-18 2012-01-05 Nuflare Technology Inc Charged particle beam lithography apparatus

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