JP2006175317A5 - - Google Patents

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Publication number
JP2006175317A5
JP2006175317A5 JP2004369186A JP2004369186A JP2006175317A5 JP 2006175317 A5 JP2006175317 A5 JP 2006175317A5 JP 2004369186 A JP2004369186 A JP 2004369186A JP 2004369186 A JP2004369186 A JP 2004369186A JP 2006175317 A5 JP2006175317 A5 JP 2006175317A5
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JP
Japan
Prior art keywords
exhaust gas
heating furnace
manufacturing process
gas
semiconductor manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004369186A
Other languages
English (en)
Japanese (ja)
Other versions
JP4594065B2 (ja
JP2006175317A (ja
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Priority to JP2004369186A priority Critical patent/JP4594065B2/ja
Priority claimed from JP2004369186A external-priority patent/JP4594065B2/ja
Publication of JP2006175317A publication Critical patent/JP2006175317A/ja
Publication of JP2006175317A5 publication Critical patent/JP2006175317A5/ja
Application granted granted Critical
Publication of JP4594065B2 publication Critical patent/JP4594065B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004369186A 2004-12-21 2004-12-21 半導体製造プロセスからの排気ガスに含まれるフッ素化合物の処理装置及び処理方法 Expired - Fee Related JP4594065B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004369186A JP4594065B2 (ja) 2004-12-21 2004-12-21 半導体製造プロセスからの排気ガスに含まれるフッ素化合物の処理装置及び処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004369186A JP4594065B2 (ja) 2004-12-21 2004-12-21 半導体製造プロセスからの排気ガスに含まれるフッ素化合物の処理装置及び処理方法

Publications (3)

Publication Number Publication Date
JP2006175317A JP2006175317A (ja) 2006-07-06
JP2006175317A5 true JP2006175317A5 (enrdf_load_stackoverflow) 2008-02-07
JP4594065B2 JP4594065B2 (ja) 2010-12-08

Family

ID=36729922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004369186A Expired - Fee Related JP4594065B2 (ja) 2004-12-21 2004-12-21 半導体製造プロセスからの排気ガスに含まれるフッ素化合物の処理装置及び処理方法

Country Status (1)

Country Link
JP (1) JP4594065B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102786941B (zh) * 2012-08-06 2014-10-08 山西鑫立能源科技有限公司 一种热循环连续自动化煤热解炉
CN102786947B (zh) * 2012-08-06 2014-08-06 山西鑫立能源科技有限公司 一种煤热解炉内燃烧加热装置
CN102786940B (zh) * 2012-08-06 2014-12-24 山西鑫立能源科技有限公司 一种煤热解炉的煤热解炭化装置
KR101820821B1 (ko) * 2017-06-27 2018-01-22 (주)제이솔루션 설치가 용이한 반도체 및 lcd 제조공정의 배기가스 가열용 3중 배관 가열장치
CN111306558B (zh) 2017-07-07 2022-03-04 鉴锋国际股份有限公司 用于控制气体污染物分解氧化的装置及系统

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4828722B2 (ja) * 2001-05-21 2011-11-30 ルネサスエレクトロニクス株式会社 除害装置
JP3737082B2 (ja) * 2001-12-04 2006-01-18 株式会社荏原製作所 排ガスの処理方法および装置
JP2004053219A (ja) * 2002-07-24 2004-02-19 Nippon Sanso Corp 燃焼除害装置

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