JP2006164893A5 - - Google Patents

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Publication number
JP2006164893A5
JP2006164893A5 JP2004358331A JP2004358331A JP2006164893A5 JP 2006164893 A5 JP2006164893 A5 JP 2006164893A5 JP 2004358331 A JP2004358331 A JP 2004358331A JP 2004358331 A JP2004358331 A JP 2004358331A JP 2006164893 A5 JP2006164893 A5 JP 2006164893A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2004358331A
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JP4681291B2 (ja
JP2006164893A (ja
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Priority to JP2004358331A priority Critical patent/JP4681291B2/ja
Priority claimed from JP2004358331A external-priority patent/JP4681291B2/ja
Priority to DE102005057069A priority patent/DE102005057069A1/de
Priority to US11/293,148 priority patent/US7375328B2/en
Publication of JP2006164893A publication Critical patent/JP2006164893A/ja
Publication of JP2006164893A5 publication Critical patent/JP2006164893A5/ja
Application granted granted Critical
Publication of JP4681291B2 publication Critical patent/JP4681291B2/ja
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JP2004358331A 2004-12-10 2004-12-10 荷電粒子線装置およびそのコンタミネーション除去方法 Active JP4681291B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004358331A JP4681291B2 (ja) 2004-12-10 2004-12-10 荷電粒子線装置およびそのコンタミネーション除去方法
DE102005057069A DE102005057069A1 (de) 2004-12-10 2005-11-30 Vorrichtung mit einem geladenen Partikelstrahl sowie Verfahren zur Kontaminationsbeseitigung in einer solchen Vorrichtung
US11/293,148 US7375328B2 (en) 2004-12-10 2005-12-05 Charged particle beam apparatus and contamination removal method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004358331A JP4681291B2 (ja) 2004-12-10 2004-12-10 荷電粒子線装置およびそのコンタミネーション除去方法

Publications (3)

Publication Number Publication Date
JP2006164893A JP2006164893A (ja) 2006-06-22
JP2006164893A5 true JP2006164893A5 (ja) 2008-01-17
JP4681291B2 JP4681291B2 (ja) 2011-05-11

Family

ID=36500361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004358331A Active JP4681291B2 (ja) 2004-12-10 2004-12-10 荷電粒子線装置およびそのコンタミネーション除去方法

Country Status (3)

Country Link
US (1) US7375328B2 (ja)
JP (1) JP4681291B2 (ja)
DE (1) DE102005057069A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4546902B2 (ja) 2005-08-24 2010-09-22 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP2007212288A (ja) * 2006-02-09 2007-08-23 Toshiba Corp パターン検査方法、パターン検査装置およびプログラム
US7550744B1 (en) * 2007-03-23 2009-06-23 Kla-Tencor Corporation Chamberless substrate handling
US8013300B2 (en) * 2008-06-20 2011-09-06 Carl Zeiss Nts, Llc Sample decontamination
DE102008062080A1 (de) * 2008-12-12 2010-06-17 Karlsruher Institut für Technologie Vorrichtung zum Transport atmosphärenempfindlicher Proben und Verwendung derselben
DE102009033319B4 (de) * 2009-07-15 2019-02-21 Carl Zeiss Microscopy Gmbh Partikelstrahl-Mikroskopiesystem und Verfahren zum Betreiben desselben
JP5783318B1 (ja) * 2014-11-28 2015-09-24 Ｊｆｅスチール株式会社 微量炭素定量分析装置および微量炭素定量分析方法
KR101619226B1 (ko) * 2015-11-17 2016-05-10 (주)잉켐테크 열전사 인쇄 장치
CN111033678B (zh) * 2017-06-21 2023-10-27 株式会社日立高新技术 带电粒子束装置以及清洁方法
CN111061129B (zh) * 2018-10-17 2022-11-01 台湾积体电路制造股份有限公司 光刻系统及清洁光刻系统的方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3452422B2 (ja) * 1995-05-26 2003-09-29 東京エレクトロン株式会社 真空処理装置
JP2001015057A (ja) * 1999-06-30 2001-01-19 Jeol Ltd 荷電粒子線装置および荷電粒子線装置用試料供給方法
JP2001325912A (ja) * 2000-05-16 2001-11-22 Hitachi Ltd 電子ビーム検査装置
JP2002025497A (ja) * 2000-07-07 2002-01-25 Canon Inc 真空分析装置、質量分析装置および電子顕微鏡装置
JP2002195965A (ja) * 2000-12-27 2002-07-10 Matsushita Electric Ind Co Ltd オージェ電子分光分析装置およびそれを用いた分析方法

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