JP2006159125A - Work cleaning device - Google Patents

Work cleaning device Download PDF

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JP2006159125A
JP2006159125A JP2004356598A JP2004356598A JP2006159125A JP 2006159125 A JP2006159125 A JP 2006159125A JP 2004356598 A JP2004356598 A JP 2004356598A JP 2004356598 A JP2004356598 A JP 2004356598A JP 2006159125 A JP2006159125 A JP 2006159125A
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tray
glass substrate
workpiece
conveyor
nozzle
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Japanese (ja)
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Hiroshi Fukazawa
博 深澤
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Murata Machinery Ltd
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Murata Machinery Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To clean the top surface of a work transferred by using a tray or stored in a tray. <P>SOLUTION: A work cleaning device 10 is incorporated in a transferring system for the tray 6 on which a glass substrate 8 is placed. A supporting body 32 is lifted from an opening 17 in the bottom face of the tray 6 to support the supporting face 19 of the tray bottom surface together with the substrate 8. A nozzle 22 is moved above the substrate 8, and the substrate is cleaned by blowing clean air. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

この発明はトレイによる枚葉搬送に関し、特にトレイ内のガラス基板等のワークの洗浄に関する。   The present invention relates to sheet conveyance by a tray, and more particularly to cleaning of a workpiece such as a glass substrate in the tray.

液晶基板等の搬送は従来、数枚程度ずつカセットに収容してカセット単位で行われてきたが、液晶基板が2m角程度まで大形化したことに伴い、カセット搬送には無理が生じている。そこで液晶基板をトレイに1枚ずつ載置し、トレイ単位で搬送することが考えられる。この場合に、トレイへのガラス基板の出し入れの便宜などのために、トレイの上面を開放しておくのが好ましい。しかしそのようにすると、搬送の過程でガラス基板の表面にパーティクルなどが付着することが考えられる。   Conventionally, transport of liquid crystal substrates and the like has been performed in units of cassettes, each being accommodated in several cassettes. However, as the liquid crystal substrates have been enlarged to about 2 square meters, it has become impossible to transport cassettes. . Therefore, it is conceivable that the liquid crystal substrates are placed one by one on the tray and transported in units of trays. In this case, it is preferable to open the upper surface of the tray for the convenience of loading and unloading the glass substrate into and from the tray. However, in such a case, it is conceivable that particles or the like adhere to the surface of the glass substrate during the conveyance process.

この発明の基本的課題は、トレイでの搬送中やストック中に、トレイ内のワークの上面を洗浄できるようにすることにある。
請求項2の発明での追加の課題は、ワークをより多数の位置で支持することにより、クリーンエアなどを強く吹き付けることを可能にすることにある。
請求項3の発明での追加の課題は、トレイ内のワークの表面に沿った流れを作り、より効率的に除塵できるようにすることにある。
A basic object of the present invention is to be able to clean the upper surface of a workpiece in a tray during conveyance on a tray or during stocking.
An additional problem in the invention of claim 2 is to enable strong blowing of clean air or the like by supporting the workpiece at a larger number of positions.
An additional problem in the invention of claim 3 is to create a flow along the surface of the work in the tray so that dust can be removed more efficiently.

この発明のワーク洗浄装置は、上方が開口したトレイにワークを載置して搬送する搬送システムに組み込むためのワーク洗浄装置であって、前記トレイの上方からワークを除塵するための手段を設けたことを特徴とする。   The workpiece cleaning apparatus according to the present invention is a workpiece cleaning apparatus for incorporation in a transport system for mounting and transporting a workpiece on a tray having an upper opening, and is provided with means for removing dust from the tray. It is characterized by that.

好ましくは、前記除塵手段はワークの上面に気流を吹き付けるように構成され、かつトレイはその底面にワークをトレイからリフトするための開口を有し、さらにワークを前記気流に抗して支持するための力を前記開口を介してワークの底面に及ぼすための支持手段、を設ける。   Preferably, the dust removing means is configured to blow an airflow on the upper surface of the workpiece, and the tray has an opening on the bottom surface for lifting the workpiece from the tray, and further supports the workpiece against the airflow. Supporting means for exerting the above force on the bottom surface of the work through the opening.

また好ましくは、除塵時にトレイの上面を覆うための手段を設ける。   Preferably, means for covering the upper surface of the tray during dust removal is provided.

この発明のワーク洗浄装置では、トレイでの搬送中やストック中に、ワークの上面を洗浄できる。この発明では、搬送システム内でワークを洗浄できるので効率的で、また上面が開口したトレイを用いて、例えば長時間トレイを搬送システムで扱っても、ワークの汚染を防止できる。   In the workpiece cleaning apparatus of the present invention, the upper surface of the workpiece can be cleaned during conveyance on a tray or during stocking. In the present invention, since the workpiece can be cleaned in the transfer system, it is efficient, and contamination of the workpiece can be prevented even when the tray having an open upper surface is used, for example, when the tray is handled in the transfer system for a long time.

請求項2の発明では、ワークを多数の位置で支持できるので、トレイの底面に開口が有っても、ワークに強い気流を吹き付けることができ、確実に洗浄できる。   In the invention of claim 2, since the work can be supported at a large number of positions, even if there is an opening on the bottom surface of the tray, a strong air current can be sprayed on the work, and the work can be reliably washed.

請求項3の発明では、トレイの上面を覆うカバーにより、ワークの表面に沿った流れを形成して、効率的に除塵できる。   In the invention of claim 3, the cover covering the upper surface of the tray can form a flow along the surface of the work and can efficiently remove dust.

以下に本発明を実施するための最適実施例を示す。   In the following, an optimum embodiment for carrying out the present invention will be shown.

図1〜図6に、実施例とその変形とを示す。図において、2は搬送システムで、例えばクリーンルーム内に設けられ、4は搬送用のコンベヤで、上方が開口したトレイ6にガラス基板8を載置して搬送するためのものである。10は処理装置などの出入り口となるステーションで、駆動ローラ13を多数配列したリフターからなる。12は基板搬送コンベヤで、駆動ローラ13を備えている。ステーション10や基板搬送コンベヤ12では、ガラス基板8の底面に駆動ローラ13を接触させて搬送する。14はリフター付コンベヤ、15は分岐コンベヤで、リフター付コンベヤ14を上昇させて、トレイ6の図1の左右方向の両フランジを支持して搬送し、分岐コンベヤ15側との間で搬送する。ガラス基板8は例えば液晶用のガラス基板で、2m角程度のサイズで数mm程度の厚さであり、重量は10Kgのオーダーで、処理装置はガラス基板8を用いて液晶ディスプレイを作成するための処理装置である。   1 to 6 show an embodiment and its modifications. In the figure, reference numeral 2 denotes a transfer system, which is provided in a clean room, for example, and 4 is a transfer conveyor for transferring a glass substrate 8 placed on a tray 6 opened upward. Reference numeral 10 denotes a station serving as an entrance / exit of a processing apparatus or the like, and includes a lifter in which a large number of drive rollers 13 are arranged. Reference numeral 12 denotes a substrate transfer conveyor which includes a drive roller 13. In the station 10 and the substrate transport conveyor 12, the drive roller 13 is brought into contact with the bottom surface of the glass substrate 8 and transported. 14 is a conveyor with a lifter, and 15 is a branching conveyor. The conveyor 14 with a lifter is lifted and supported by supporting both flanges of the tray 6 in the left-right direction in FIG. 1, and is transported between the branching conveyor 15 side. The glass substrate 8 is, for example, a glass substrate for liquid crystal, has a size of about 2 m square and a thickness of about several millimeters, a weight of the order of 10 kg, and the processing apparatus uses the glass substrate 8 to create a liquid crystal display. It is a processing device.

20はワーク洗浄装置で、搬送システム2に組み込んでその適宜の位置に設ける。例えば実施例では、トレイ6の搬送用のコンベヤ4上にワーク洗浄装置20を設けるが、例えばステーション10上に設けても良い。この場合は例えば、ガラス基板8を載置したトレイが、ステーション10上で待機している間に、ガラス基板8を洗浄するようにしても良い。あるいはトレイ6と基板搬送コンベヤ12との間で、ガラス基板8を駆動ローラ13で搬送しながら洗浄しても良い。さらにステーション10でガラス基板8を搬出すると、空のトレイが残るので、ガラス基板8のみでなく、空のトレイを洗浄しても良い。   Reference numeral 20 denotes a workpiece cleaning device which is incorporated in the transfer system 2 and provided at an appropriate position. For example, in the embodiment, the workpiece cleaning device 20 is provided on the conveyor 4 for transporting the tray 6, but may be provided on the station 10, for example. In this case, for example, the glass substrate 8 may be cleaned while the tray on which the glass substrate 8 is placed is waiting on the station 10. Alternatively, the glass substrate 8 may be cleaned while being transported by the driving roller 13 between the tray 6 and the substrate transporting conveyor 12. Further, when the glass substrate 8 is unloaded at the station 10, an empty tray remains, so that not only the glass substrate 8 but also an empty tray may be washed.

分岐コンベヤ15に洗浄装置20を設ける場合、例えば分岐コンベヤ15をガラス基板8を載置したトレイ6のバッファとして用い、分岐コンベヤ15でトレイ6が待機している間に洗浄すると良い。さらに、図1の分岐コンベヤ15の終端側に図示しないトレイのストッカなどを設けて、空のトレイやガラス基板を載置したトレイなどをストックし、ストッカへの出し入れ時に、特にストッカへの保管前に、トレイ6上のガラス基板8を洗浄しても良い。   When the cleaning device 20 is provided on the branch conveyor 15, for example, the branch conveyor 15 may be used as a buffer for the tray 6 on which the glass substrate 8 is placed, and cleaning may be performed while the tray 6 is waiting on the branch conveyor 15. Furthermore, a tray stocker (not shown) is provided on the terminal side of the branch conveyor 15 in FIG. 1 to stock empty trays and trays on which glass substrates are placed. In addition, the glass substrate 8 on the tray 6 may be washed.

以上のように、搬送システム2でのトレイ6の搬送中に、あるいは搬送システム2内でトレイ6をストックしている間に、トレイ6上のガラス基板8をワーク洗浄装置20で洗浄する。このことを搬送システム2内でトレイのガラス基板8を洗浄するという。実施例では、搬送の途中でガラス基板8を洗浄できるので効率的で、また搬送システム2でガラス基板8を載置したトレイ6を長時間扱っても、ガラス基板8が汚染されることがない。   As described above, the glass substrate 8 on the tray 6 is cleaned by the workpiece cleaning device 20 during the transfer of the tray 6 in the transfer system 2 or while the tray 6 is stocked in the transfer system 2. This is called cleaning the glass substrate 8 of the tray in the transport system 2. In the embodiment, since the glass substrate 8 can be cleaned in the middle of conveyance, the glass substrate 8 is efficient, and even if the tray 6 on which the glass substrate 8 is placed is handled in the conveyance system 2 for a long time, the glass substrate 8 is not contaminated. .

図2に、コンベヤ4上のワーク洗浄装置20を、その上部カバーを取り外して示す。またワーク洗浄装置20の断面を図3,図4に示す。コンベヤ4は例えばローラコンベヤからなり、搬送方向に沿ったトレイ6の両側のフランジを支持して搬送する。16はコンベヤフレームで、コンベヤ4を支持する。トレイ6の底面には多数の開口17があり、これは前記の駆動ローラ13がガラス基板8の底面に接触できるようにするためのものである。またガラス基板8をトレイ6から出し入れするために、スカラアームやスライドフォークなどを用いる際にも、開口17からこれらのものをガラス基板8の底面に作用させることができる。トレイ6には例えばその左右方向(コンベヤ4での搬送方向の前後)に、突き出し18を設けて、トレイ6を積み重ねて保管できるようにする。トレイ6の底面の開口17,17間には支持面19を設けて、ガラス基板8の底面を支持する。ここでは支持面19で支持したが、この部分に図示しないピンなどを設けて、ピンなどで支持するようにしても良い。   FIG. 2 shows the workpiece cleaning device 20 on the conveyor 4 with its upper cover removed. Moreover, the cross section of the workpiece | work washing apparatus 20 is shown in FIG. The conveyor 4 is composed of a roller conveyor, for example, and supports and conveys the flanges on both sides of the tray 6 along the conveying direction. A conveyor frame 16 supports the conveyor 4. A large number of openings 17 are provided on the bottom surface of the tray 6 so that the driving roller 13 can come into contact with the bottom surface of the glass substrate 8. Further, when using a SCARA arm, a slide fork or the like in order to put the glass substrate 8 in and out of the tray 6, these can be applied to the bottom surface of the glass substrate 8 from the opening 17. For example, the tray 6 is provided with protrusions 18 in the left-right direction (before and after the conveying direction on the conveyor 4) so that the trays 6 can be stacked and stored. A support surface 19 is provided between the openings 17 and 17 on the bottom surface of the tray 6 to support the bottom surface of the glass substrate 8. Although the support surface 19 is used here, a pin (not shown) or the like may be provided in this portion and supported by the pin or the like.

22はワーク洗浄装置20のノズルで、クリーンエアなどの気流をガラス基板8の上面に吹き付けることにより除塵する。気流はガラス基板8の表面に垂直に吹き付けても、斜めに吹き付けても良く、またイオン化器で正負にイオン化したクリーンエアなどを吹き付けても良い。24はクリーンエアの給気管で、26は上部カバーで、トレイ6の上面を覆い、上部カバー26に設けたスリット28に沿って、ノズル22が移動する。駆動部30は、ノズル22を支持して移動させると共に、給気管24からクリーンエアを供給する。   A nozzle 22 of the workpiece cleaning device 20 removes dust by blowing an air flow such as clean air onto the upper surface of the glass substrate 8. The airflow may be blown perpendicularly to the surface of the glass substrate 8, or may be blown obliquely, or clean air ionized positively or negatively by an ionizer may be blown. Reference numeral 24 denotes a clean air supply pipe, and 26 denotes an upper cover which covers the upper surface of the tray 6, and the nozzle 22 moves along a slit 28 provided in the upper cover 26. The drive unit 30 supports and moves the nozzle 22 and supplies clean air from the air supply pipe 24.

クリーンエアなどを吹き付けると、ガラス基板8に大きな圧力が加わる。ガラス基板8は例えば2m角で厚さは数mm程度で、その重量は10kgのオーダーである。ガラス基板8の底面を支持面19のみで支持した状態で、ノズル22からクリーンエアを吹き付けると、開口17の部分でガラス基板8が撓んで破損する恐れがある。そこで支持体32により開口17の部分でもガラス基板8の底面を支持し、より強いクリーンエアを吹き付けることができるようにする。支持体32はここではピン状の部材であるが、その形状は任意で、また開口17の下部にノズルを設けて上向きの気流を吹き付けて、クリーンエアからの圧力を支持しても良い。支持体32はプレート34に取り付けられ、リフター35により昇降して、除塵時に上昇し、ガラス基板8の底面に接触する。実施例では、除塵時に支持体32と支持面19の双方でガラス基板8の底部を支持するが、支持体32のみで支持しても良い。   When clean air or the like is sprayed, a large pressure is applied to the glass substrate 8. The glass substrate 8 is, for example, 2 square meters, has a thickness of about several mm, and its weight is on the order of 10 kg. If clean air is blown from the nozzle 22 while the bottom surface of the glass substrate 8 is supported only by the support surface 19, the glass substrate 8 may be bent and damaged at the opening 17. Therefore, the support 32 supports the bottom surface of the glass substrate 8 even at the opening 17 so that stronger clean air can be blown. Although the support body 32 is a pin-shaped member here, the shape thereof is arbitrary, and a nozzle may be provided below the opening 17 to blow upward airflow to support the pressure from the clean air. The support 32 is attached to the plate 34, and is lifted and lowered by the lifter 35. The support 32 is raised during dust removal, and comes into contact with the bottom surface of the glass substrate 8. In the embodiment, the bottom portion of the glass substrate 8 is supported by both the support 32 and the support surface 19 during dust removal, but may be supported only by the support 32.

ガラス基板8の上面は上部カバー26で覆われ、ノズル22からクリーンエアをガラス基板8の上面に吹き付ける。上部カバー26の四方の端部には、トレイ6との間に隙間36,38があり、吹き付けられたエアは隙間36,38から周囲へと逃げていく。このため、ノズル22からガラス基板8の上面に吹き付けられたクリーンエアは、ガラス基板8の表面に沿って層状に流れ、隙間36,38から外に逃げて、効率的に除塵できる。これに対して、例えばガラス基板8の上部から鉛直にクリーンエアを吹き付けても、ガラス基板8の上部の空気が移動せずに、ノズルから吹き付けられたクリーンエアがガラス基板8の上面に到達するのを妨害し、除塵が難しくなる。   The upper surface of the glass substrate 8 is covered with the upper cover 26, and clean air is blown from the nozzle 22 onto the upper surface of the glass substrate 8. There are gaps 36 and 38 between the tray 6 and the four ends of the upper cover 26, and the blown air escapes from the gaps 36 and 38 to the surroundings. Therefore, clean air blown from the nozzle 22 onto the upper surface of the glass substrate 8 flows in a layered manner along the surface of the glass substrate 8 and escapes from the gaps 36 and 38 to efficiently remove dust. On the other hand, for example, even when clean air is blown vertically from the upper part of the glass substrate 8, the air above the glass substrate 8 does not move, and the clean air blown from the nozzle reaches the upper surface of the glass substrate 8. It becomes difficult to remove dust.

以上のように、実施例では以下の作用が得られる。
(1) 搬送システム2での搬送中やストック中に、トレイ6上のガラス基板8の上面を洗浄できる。
(2) トレイ6の底面には、駆動ローラ13などでの搬送のために開口17がある。開口17の部分で、ガラス基板8の底面を支持体32により支持するので、強い気流を吹き付けても、ガラス基板8が撓んで破損したりすることがない。なおピンなどの物理的な支持体32に代えて、開口17を介して上向きの気流をガラス基板8の底面に吹き付け、クリーンエアによる圧力を打ち消しても良い。トレイ6の上部は、洗浄時に上部カバー26で覆われているので、ガラス基板8の上面に沿って隙間36,38へと逃げる層流が生じやすく、効率的に除塵できる。
(3) スリット28に沿ってノズル22を移動させることにより、洗浄個所に集中的に強いクリーンエアを吹き付けることができる。
As described above, the following actions are obtained in the embodiment.
(1) The upper surface of the glass substrate 8 on the tray 6 can be cleaned during conveyance in the conveyance system 2 or during stocking.
(2) On the bottom surface of the tray 6, there is an opening 17 for conveyance by the drive roller 13 or the like. Since the bottom surface of the glass substrate 8 is supported by the support body 32 at the opening 17 portion, the glass substrate 8 is not bent and damaged even when a strong air current is blown. Instead of the physical support 32 such as a pin, an upward air flow may be blown to the bottom surface of the glass substrate 8 through the opening 17 to cancel the pressure by the clean air. Since the upper portion of the tray 6 is covered with the upper cover 26 at the time of cleaning, a laminar flow that escapes to the gaps 36 and 38 along the upper surface of the glass substrate 8 is likely to occur, and dust can be efficiently removed.
(3) By moving the nozzle 22 along the slit 28, strong clean air can be intensively sprayed on the cleaning portion.

図5に、第1の変形例を示す。56は新たな上部カバーで、その底部にノズル52を多数、例えば格子状に配置してある。ノズル52の位置は固定で、スリット28は設けず、給気管24からのクリーンエアはノズル52を介してガラス基板8の上面に吹き付けられ、隙間36,38から外に逃げる。他の点では図1〜図4の実施例と同様である。   FIG. 5 shows a first modification. A new top cover 56 has a large number of nozzles 52 arranged at the bottom, for example, in a lattice pattern. The position of the nozzle 52 is fixed, the slit 28 is not provided, and clean air from the air supply pipe 24 is blown to the upper surface of the glass substrate 8 through the nozzle 52 and escapes from the gaps 36 and 38 to the outside. The other points are the same as those of the embodiment of FIGS.

図6に、第2の変形例を示す。この変形例では、ノズル62からエアナイフ状のクリーンエアをガラス基板8の上部に吹き付け、ノズル62とガラス基板8との間隔は例えば数mm程度の僅かなものとし、吹き付けるクリーンエアの向きはガラス基板8の表面にほぼ並行なものにして、エアナイフとして作用させる。64はイオン化器で、イオン化器64からノズル62を、ガラス基板8の上面と並行に移動させて除塵を行う。エアナイフを用いて基板に対して小さな角度でクリーンエアを吹き付けると、ガラス基板8を左右に移動させようとする力が働く。この力が問題になる場合、前記の突き出し18によりガラス基板8の左右動を防止すると良い。他の点では図1〜図4の実施例と同様である。
FIG. 6 shows a second modification. In this modification, air knife-shaped clean air is blown from the nozzle 62 onto the upper portion of the glass substrate 8, and the distance between the nozzle 62 and the glass substrate 8 is a few millimeters, for example, and the direction of the clean air to be blown is the glass substrate. 8 is almost parallel to the surface of 8 and acts as an air knife. An ionizer 64 moves the nozzle 62 from the ionizer 64 in parallel with the upper surface of the glass substrate 8 to perform dust removal. When clean air is blown at a small angle with respect to the substrate using an air knife, a force that moves the glass substrate 8 to the left and right acts. When this force becomes a problem, it is preferable to prevent the glass substrate 8 from moving left and right by the protrusion 18. The other points are the same as those of the embodiment of FIGS.

実施例のワーク洗浄装置を組み込んだ搬送システムの要部平面図Plan view of the main part of the transfer system incorporating the workpiece cleaning device of the embodiment 実施例のワーク洗浄装置を、上部カバーを外し、かつノズルへの給気管を切断して見た平面図The top view which looked at the workpiece washing device of an example by removing the upper cover and cutting the air supply pipe to the nozzle 実施例のワーク洗浄装置の鉛直方向断面図Vertical sectional view of the workpiece cleaning apparatus of the embodiment 図3の部分拡大断面図Partial enlarged sectional view of FIG. 変形例のワーク洗浄装置の鉛直方向部分拡大断面図Vertical section enlarged sectional view of a workpiece cleaning device of a modified example 第2の変形例のワーク洗浄装置の鉛直方向部分拡大断面図The vertical direction partial expanded sectional view of the workpiece | work washing apparatus of a 2nd modification

符号の説明Explanation of symbols

2 搬送システム
4 コンベヤ
6 トレイ
8 ガラス基板
10 ステーション
12 基板搬送コンベヤ
13 駆動ローラ
14 リフター付コンベヤ
15 分岐コンベヤ
16 コンベヤフレーム
17 開口
18 突き出し
19 支持面
20 ワーク洗浄装置
22,52 ノズル
24 給気管
26,56 上部カバー
28 スリット
30 駆動部
32 支持体
34 プレート
35 リフター
36,38 隙間
62 ノズル
64 イオン化器
2 Conveying System 4 Conveyor 6 Tray 8 Glass Substrate 10 Station 12 Substrate Conveying Conveyor 13 Driving Roller 14 Conveyor with Lifter 15 Branch Conveyor 16 Conveyor Frame 17 Opening 18 Protrusion 19 Support Surface 20 Work Cleaning Device 22, 52 Nozzle 24 Air Supply Pipes 26, 56 Upper cover 28 Slit 30 Drive unit 32 Support 34 Plate 35 Lifter 36, 38 Gap 62 Nozzle 64 Ionizer

Claims (3)

上方が開口したトレイにワークを載置して搬送する搬送システムに組み込むためのワーク洗浄装置であって、前記トレイの上方からワークを除塵するための手段を設けたことを特徴とする、ワーク洗浄装置。 A workpiece cleaning apparatus for incorporating a workpiece into a transport system for placing and transporting a workpiece on a tray having an upper opening, wherein the workpiece cleaning device is provided with means for removing dust from the workpiece from above the tray. apparatus. 前記除塵手段はワークの上面に気流を吹き付けるように構成され、かつトレイはその底面にワークをトレイからリフトするための開口を有し、さらにワークを前記気流に抗して支持するための力を前記開口を介してワークの底面に及ぼすための支持手段、を設けたことを特徴とする、請求項1のワーク洗浄装置。 The dust removing means is configured to blow an airflow on the upper surface of the workpiece, and the tray has an opening on the bottom surface for lifting the workpiece from the tray, and further has a force for supporting the workpiece against the airflow. 2. The workpiece cleaning apparatus according to claim 1, further comprising support means for exerting an influence on the bottom surface of the workpiece through the opening. 除塵時にトレイの上面を覆うための手段を設けたことを特徴とする、請求項1または2のワーク洗浄装置。 3. A workpiece cleaning apparatus according to claim 1, further comprising means for covering the upper surface of the tray during dust removal.
JP2004356598A 2004-12-09 2004-12-09 Work cleaning device Pending JP2006159125A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004356598A JP2006159125A (en) 2004-12-09 2004-12-09 Work cleaning device

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Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
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Family

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Application Number Title Priority Date Filing Date
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Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009043137A1 (en) * 2007-10-02 2009-04-09 Cleancount Incorporated A self cleaning pill counting device, and cleaning method
CN114671217A (en) * 2020-12-24 2022-06-28 志圣工业股份有限公司 Self-cleaning conveying device and heating equipment comprising same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009043137A1 (en) * 2007-10-02 2009-04-09 Cleancount Incorporated A self cleaning pill counting device, and cleaning method
CN114671217A (en) * 2020-12-24 2022-06-28 志圣工业股份有限公司 Self-cleaning conveying device and heating equipment comprising same

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