JP2006147621A5 - - Google Patents

Download PDF

Info

Publication number
JP2006147621A5
JP2006147621A5 JP2004331585A JP2004331585A JP2006147621A5 JP 2006147621 A5 JP2006147621 A5 JP 2006147621A5 JP 2004331585 A JP2004331585 A JP 2004331585A JP 2004331585 A JP2004331585 A JP 2004331585A JP 2006147621 A5 JP2006147621 A5 JP 2006147621A5
Authority
JP
Japan
Prior art keywords
photosensitive paste
photosensitive
nickel
iron
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004331585A
Other languages
Japanese (ja)
Other versions
JP2006147621A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2004331585A priority Critical patent/JP2006147621A/en
Priority claimed from JP2004331585A external-priority patent/JP2006147621A/en
Publication of JP2006147621A publication Critical patent/JP2006147621A/en
Publication of JP2006147621A5 publication Critical patent/JP2006147621A5/ja
Pending legal-status Critical Current

Links

Claims (8)

無機粉末と感光性有機成分からなるペーストであって、無機粉末が、少なくともニッケル−鉄系合金粉末およびガラス粉末を含み、該ニッケル−鉄系合金粉末が以下の範囲内の組成であることを特徴とする感光性ペースト。
ニッケル ：５５〜９０質量％
鉄 ：１０〜４５質量％ A paste comprising inorganic powder and a photosensitive organic component, an inorganic powder, at least a nickel - see including the iron-based alloy powder and the glass powder, the nickel - that iron-based alloy powder having a composition within the following ranges Characteristic photosensitive paste.
Nickel: 55-90% by mass
Iron: 10-45% by mass ニッケル−鉄系合金粉末が以下の範囲内の組成であることを特徴とする請求項１に記載の感光性ペースト。
ニッケル ：５５〜９０質量％
鉄 ：１０〜４５質量％
モリブデン：０．５〜１５質量％ The photosensitive paste according to claim 1 , wherein the nickel-iron-based alloy powder has a composition within the following range.
Nickel: 55-90% by mass
Iron: 10-45% by mass
Molybdenum: 0.5 to 15% by mass ニッケル−鉄系合金粉末とガラス粉末との質量比が２０：８０〜８０：２０の範囲内であることを特徴とする請求項１または２に記載の感光性ペースト。 The photosensitive paste according to claim 1 or 2 , wherein the mass ratio of the nickel-iron-based alloy powder and the glass powder is in the range of 20:80 to 80:20. 感光性有機成分が３６５ｎｍの波長で分子吸光係数が１，０００（１／ｍｏｌ・ｃｍ）以上である光重合開始剤および／または増感剤を含むことを特徴とする請求項１〜３のいずれかに記載の感光性ペースト。 Any photosensitive organic component according to claim 1 to 3, characterized in that it comprises a photopolymerization initiator and / or sensitizer is molecular extinction coefficient at a wavelength of 365nm is 1,000 (1 / mol · cm) or higher The photosensitive paste of crab. 感光性有機成分が４００ｎｍを越えた波長領域に吸収極大をもつ化合物とビス（アルキルアミノ）ベンゾフェノンもしくはチオキサントン誘導体を含むことを特徴とする請求項４に記載の感光性ペースト。 5. The photosensitive paste according to claim 4 , wherein the photosensitive organic component contains a compound having an absorption maximum in a wavelength region exceeding 400 nm and a bis (alkylamino) benzophenone or thioxanthone derivative. 感光性有機成分がＮ−ブチルアクリドンおよび４，４−ビス（ジエチルアミノ）ベンゾフェノンまたはＮ−ブチルアクリドンおよび２，４−ジエチルチオキサントンを含むことを特徴とする請求項５に記載の感光性ペースト。 6. The photosensitive paste according to claim 5 , wherein the photosensitive organic component comprises N-butylacridone and 4,4-bis (diethylamino) benzophenone or N-butylacridone and 2,4-diethylthioxanthone. 電磁波シールド層形成用に用いる請求項１〜６のいずれかに記載の感光性ペースト。 The photosensitive paste in any one of Claims 1-6 used for electromagnetic wave shield layer formation. 感光性ペーストを基板上に塗布して乾燥する工程を含むディスプレイパネル用部材の製造方法であって、感光性ペーストに請求項７に記載の感光性ペーストを用いることを特徴とするディスプレイパネル用部材の製造方法。 A display panel member comprising a step of applying a photosensitive paste onto a substrate and drying the display panel member, wherein the photosensitive paste according to claim 7 is used as the photosensitive paste. Manufacturing method.
JP2004331585A 2004-11-16 2004-11-16 Photosensitive paste and method of manufacturing member for display panel using the same Pending JP2006147621A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004331585A JP2006147621A (en) 2004-11-16 2004-11-16 Photosensitive paste and method of manufacturing member for display panel using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004331585A JP2006147621A (en) 2004-11-16 2004-11-16 Photosensitive paste and method of manufacturing member for display panel using the same

Publications (2)

Publication Number Publication Date
JP2006147621A JP2006147621A (en) 2006-06-08
JP2006147621A5 true JP2006147621A5 (en) 2007-12-27

Family

ID=36626990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004331585A Pending JP2006147621A (en) 2004-11-16 2004-11-16 Photosensitive paste and method of manufacturing member for display panel using the same

Country Status (1)

Country Link
JP (1) JP2006147621A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101190921B1 (en) * 2004-07-22 2012-10-12 도레이 카부시키가이샤 Photosensitive paste and method for producing member for display panel
KR100791205B1 (en) * 2006-11-09 2008-01-02 에스케이씨하스디스플레이필름(주) Optical filter for display panel and preparation thereof
KR100791211B1 (en) * 2006-11-13 2008-01-03 에스케이씨하스디스플레이필름(주) Optical filter for display panel and preparation thereof
US7763326B2 (en) * 2006-12-20 2010-07-27 United Technologies Corporation Photocurable maskant composition and method of use
JP5266958B2 (en) * 2008-08-22 2013-08-21 凸版印刷株式会社 Color filter for liquid crystal display
CN101947651B (en) * 2010-09-26 2012-05-30 南京工业大学 Metal powder electromagnetic wave absorbent and preparation method thereof
JP6352658B2 (en) * 2014-03-26 2018-07-04 太陽インキ製造株式会社 Photosensitive resin composition, electrode structure, and method for producing the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0882922A (en) * 1994-07-11 1996-03-26 Toray Ind Inc Original plate of waterless planographic printing plate
JPH09304923A (en) * 1996-05-10 1997-11-28 Toray Ind Inc Photosensitive paste
JP2002202599A (en) * 2000-12-28 2002-07-19 Taiyo Ink Mfg Ltd Composite patterning layer and method for producing the same
JP2003124682A (en) * 2001-10-19 2003-04-25 Nippon Ceramic Co Ltd Electromagnetic wave absorbing (suppressing) sheet
JP2004103701A (en) * 2002-09-06 2004-04-02 Shin Etsu Polymer Co Ltd Translucent electromagnetic wave shield member and its producing process
JP4189234B2 (en) * 2003-02-19 2008-12-03 京セラ株式会社 Radio wave absorbing lid member and high-frequency device using the same

Similar Documents

Publication Publication Date Title
WO2006030234A3 (en) Use of methanofullerene derivatives as resist materials and method for forming a resist layer
JP2006147621A5 (en)
JP2006268035A5 (en)
JP2004069754A5 (en) Photopolymerizable black composition, method for forming black pattern, and black matrix
TW200710449A (en) Process for proudcing color filter, color filter and liquid crystal display device
KR20120019619A (en) A colored photosensitive resin composition, color filter and liquid crystal display device having the same
EP1493757A4 (en) Photopolymerizable composition
JP2009037232A5 (en)
JP2016130848A (en) Self-luminous photosensitive resin composition and display device including color conversion layer produced from the same
JP2018018079A (en) Photosensitive resin composition and color filter containing the same
JP5996591B2 (en) Photosensitive resin composition for non-display part light shielding pattern formation
KR102204534B1 (en) Self emission type photosensitive resin composition, and display device comprising color conversion layer prepared thereof
TW200641073A (en) Polymer for forming anti-reflective coating layer
JP2022109931A (en) Black photosensitive resin composition and display device using the same
JP7210952B2 (en) Composition, cured film and display device
KR20200034309A (en) Compound and photosensitive resin composition comprising the same, photoresist, color filter and display device
TW200634110A (en) Polymer for forming anti-reflective coating layer
TW200631989A (en) Polymer for forming anti-reflective coating layer
TW201111911A (en) Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern
JP2011504636A5 (en)
KR100946085B1 (en) A colored photosensitive resin composition, color filter and liquid crystal display device having the same
JP2001200171A (en) Composition having picture quality improving function
JP2006259717A5 (en)
JP2019120954A (en) Self-luminous photosensitive resin composition, color conversion layer produced using the same and display device
TW201446505A (en) Thermoplastic resin film base for optical firing, conductive circuit board using same, and method for manufacturing said conductive circuit board