JP2004069754A5 - Photopolymerizable black composition, method for forming black pattern, and black matrix - Google Patents
Photopolymerizable black composition, method for forming black pattern, and black matrix Download PDFInfo
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- JP2004069754A5 JP2004069754A5 JP2002224866A JP2002224866A JP2004069754A5 JP 2004069754 A5 JP2004069754 A5 JP 2004069754A5 JP 2002224866 A JP2002224866 A JP 2002224866A JP 2002224866 A JP2002224866 A JP 2002224866A JP 2004069754 A5 JP2004069754 A5 JP 2004069754A5
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【特許請求の範囲】
【請求項１】 下記一般式（１）で示される光重合性化合物と、光重合開始剤と、黒色顔料とを含むことを特徴とする光重合性黒色組成物。
【化１】
Ｙは、ジカルボン酸無水物の酸無水物基を除いた残基であり、
Ｚは、テトラカルボン酸二無水物の酸無水物基を除いた残基であり、
Ｘは、
【化２】
Ｒ1、Ｒ2は、Ｈ、ＣＨ3又は
【化３】
Ｒ3は、Ｈ又はＣＨ3である。
【請求項２】 請求項１に記載の光重合性黒色組成物において、
付加重合可能なエチレン性不飽和二重結合を有する化合物を含むことを特徴とする光重合性黒色組成物。
【請求項３】 請求項１に記載の光重合性黒色組成物において、
前記一般式（１）で示される光重合性化合物を２０〜６０重量部、光重合開始剤を０．５〜３０重量部、黒色顔料を１０〜７０重量部の範囲で含むことを特徴とする光重合性黒色組成物。
【請求項４】 請求項２に記載の光重合性黒色組成物において、
前記一般式（１）で示される光重合性化合物を２０〜５０重量部、前記エチレン性不飽和二重結合を有する化合物を１０〜４０重量部、光重合開始剤を０．５〜３０重量部、黒色顔料を１０〜７０重量部の範囲で含むことを特徴とする光重合性黒色組成物。
【請求項５】 請求項１〜４のいずれか一項に記載の光重合性黒色組成物において、
前記黒色顔料はカーボンブラック又はチタンブラックを含むことを特徴とする光重合性黒色組成物。
【請求項６】 請求項１〜５のいずれか一項に記載の光重合性黒色組成物からなる光重合性黒色組成物層を基板上に形成し、所定波長の光を選択的に照射し、現像して黒色パターンを形成することを特徴とする黒色パターンの形成方法。
【請求項７】
請求項１〜５の何れか一項に記載の光重合性黒色組成物を基板上に塗布、露光、現像することより形成されたことを特徴とするブラックマトリックス。
[Claims]
1. A photopolymerizable black composition comprising a photopolymerizable compound represented by the following general formula (1), a photopolymerization initiator, and a black pigment.
Embedded image
Y is a residue obtained by removing an acid anhydride group of a dicarboxylic anhydride,
Z is a residue obtained by removing an acid anhydride group of tetracarboxylic dianhydride,
X is
Embedded image
R 1 and R 2 are H, CH 3 or
R 3 is H or CH 3 .
2. The photopolymerizable black composition according to claim 1, wherein
A photopolymerizable black composition comprising a compound having an addition-polymerizable ethylenically unsaturated double bond.
3. The photopolymerizable black composition according to claim 1, wherein
20 to 60 parts by weight of the photopolymerizable compound represented by the general formula (1), 0.5 to 30 parts by weight of a photopolymerization initiator, and 10 to 70 parts by weight of a black pigment. Photopolymerizable black composition.
4. The photopolymerizable black composition according to claim 2, wherein
20 to 50 parts by weight of the photopolymerizable compound represented by the general formula (1), 10 to 40 parts by weight of the compound having an ethylenically unsaturated double bond, and 0.5 to 30 parts by weight of a photopolymerization initiator. A photopolymerizable black composition comprising a black pigment in a range of 10 to 70 parts by weight.
5. The photopolymerizable black composition according to any one of claims 1 to 4, wherein
The photopolymerizable black composition, wherein the black pigment contains carbon black or titanium black.
6. A photopolymerizable black composition layer comprising the photopolymerizable black composition according to claim 1 is formed on a substrate, and selectively irradiated with light having a predetermined wavelength. And forming a black pattern by developing.
7.
A black matrix formed by applying, exposing, and developing the photopolymerizable black composition according to claim 1 on a substrate.
【０００１】
【発明の属する技術分野】
本発明は、新規の光重合性黒色組成物、黒色パターンの形成方法及びブラックマトリックスに関し、更に詳しくは液晶ディスプレイ等のカラーフィルターの製造に好適な、光硬化性に優れた光重合性黒色組成物、黒色パターンの形成方法及びブラックマトリックスに関する。
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a novel photopolymerizable black composition, a method for forming a black pattern, and a black matrix . , A black pattern forming method and a black matrix .
請求項６に記載の発明の黒色パターンの形成方法は、請求項１〜５のいずれ一項に記載の光重合性黒色組成物からなる光重合性黒色組成物層を基板上に形成し、所定波長の光を選択的に照射し、現像して黒色パターンを形成することを特徴とする。
請求項７に記載のブラックマトリックスは、請求項１〜５の何れか一項に記載の光重合性黒色組成物を基板上に塗布、露光、現像することより形成されたことを特徴とする。
According to a sixth aspect of the present invention, there is provided a method for forming a black pattern, comprising: forming a photopolymerizable black composition layer comprising the photopolymerizable black composition according to any one of the first to fifth aspects on a substrate; It is characterized by selectively irradiating light of a wavelength and developing to form a black pattern.
A black matrix according to a seventh aspect is characterized by being formed by applying, exposing, and developing the photopolymerizable black composition according to any one of the first to fifth aspects on a substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002224866A JP2004069754A (en) | 2002-08-01 | 2002-08-01 | Photopolymerizable black composition and black pattern forming method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002224866A JP2004069754A (en) | 2002-08-01 | 2002-08-01 | Photopolymerizable black composition and black pattern forming method |
Publications (2)
| Publication Number | Publication Date |
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| JP2004069754A JP2004069754A (en) | 2004-03-04 |
| JP2004069754A5 true JP2004069754A5 (en) | 2006-02-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2002224866A Pending JP2004069754A (en) | 2002-08-01 | 2002-08-01 | Photopolymerizable black composition and black pattern forming method |
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| JP3912405B2 (en) * | 2003-11-11 | 2007-05-09 | 三菱化学株式会社 | Curable composition, cured product, color filter, and liquid crystal display device |
| JP4496845B2 (en) * | 2004-05-20 | 2010-07-07 | 日立化成工業株式会社 | Photosensitive resin composition, photosensitive element using the same, resist pattern forming method, and printed wiring board manufacturing method |
| JP4005092B2 (en) | 2004-08-20 | 2007-11-07 | 東京応化工業株式会社 | Cleaning solvent |
| JP5109246B2 (en) * | 2004-12-09 | 2012-12-26 | 三菱化学株式会社 | Curable composition, cured product, color filter, and liquid crystal display device |
| JP4657808B2 (en) * | 2005-05-24 | 2011-03-23 | 東京応化工業株式会社 | Photosensitive composition and color filter formed from the photosensitive composition |
| JP2007072035A (en) * | 2005-09-06 | 2007-03-22 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
| JP2007279668A (en) * | 2006-03-14 | 2007-10-25 | Asahi Kasei Electronics Co Ltd | Black matrix and method for producing the same |
| JP4786388B2 (en) * | 2006-03-29 | 2011-10-05 | 新日鐵化学株式会社 | Color filter having a cured film of photosensitive resin composition |
| JP4315195B2 (en) * | 2006-12-21 | 2009-08-19 | ソニー株式会社 | Curable resin material-particulate composite material and method for producing the same, optical material, and light emitting device |
| JP5133658B2 (en) * | 2007-03-28 | 2013-01-30 | 新日鉄住金化学株式会社 | Photosensitive resin composition for black matrix, cured product and color filter using the same |
| JP5535063B2 (en) | 2007-05-11 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | Oxime ester photoinitiator |
| WO2008138732A1 (en) | 2007-05-11 | 2008-11-20 | Basf Se | Oxime ester photoinitiators |
| WO2010108835A1 (en) | 2009-03-23 | 2010-09-30 | Basf Se | Photoresist composition |
| US9051397B2 (en) | 2010-10-05 | 2015-06-09 | Basf Se | Oxime ester |
| CN103153952B (en) | 2010-10-05 | 2016-07-13 | 巴斯夫欧洲公司 | The oxime ester derivative of benzo carbazole compound and in photopolymerisable compositions as the purposes of photoinitiator |
| JP5462773B2 (en) * | 2010-11-29 | 2014-04-02 | 新日鉄住金化学株式会社 | Alkali-soluble resin and photosensitive resin composition |
| EP2668156B1 (en) | 2011-01-28 | 2018-10-31 | Basf Se | Polymerizable composition comprising an oxime sulfonate as thermal curing agent |
| JP6037708B2 (en) * | 2011-09-22 | 2016-12-07 | 東京応化工業株式会社 | Photosensitive resin composition, pattern forming method, color filter, and display device |
| CN103998427A (en) | 2011-12-07 | 2014-08-20 | 巴斯夫欧洲公司 | Oxime ester photoinitiators |
| EP3354641B1 (en) | 2012-05-09 | 2019-07-17 | Basf Se | Oxime ester photoinitiators |
| JPWO2014080908A1 (en) * | 2012-11-26 | 2017-01-05 | 東レ株式会社 | Negative photosensitive resin composition |
| CN105358527B (en) | 2013-07-08 | 2018-09-25 | 巴斯夫欧洲公司 | Oxime ester photoinitiator |
| US9957258B2 (en) | 2013-09-10 | 2018-05-01 | Basf Se | Oxime ester photoinitiators |
| CN106604912A (en) | 2014-08-29 | 2017-04-26 | 巴斯夫欧洲公司 | Oxime sulfonate derivatives |
| US20220121113A1 (en) | 2019-01-23 | 2022-04-21 | Basf Se | Oxime ester photoinitiators having a special aroyl chromophore |
| CN115210219A (en) | 2020-03-04 | 2022-10-18 | 巴斯夫欧洲公司 | Oxime ester photoinitiators |
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| JP2998880B2 (en) * | 1993-09-28 | 2000-01-17 | 凸版印刷株式会社 | Photosensitive coloring composition, color filter and method for producing color filter |
| JP3509269B2 (en) * | 1995-04-07 | 2004-03-22 | 新日鐵化学株式会社 | Composition for forming light-shielding thin film and light-shielding film formed using the same |
| JP3998797B2 (en) * | 1998-02-10 | 2007-10-31 | 東京応化工業株式会社 | Photopolymerizable resin composition and method for producing color filter using the photopolymerizable resin composition |
| JP3268771B2 (en) * | 2000-06-12 | 2002-03-25 | ナガセケムテックス株式会社 | Photopolymerizable unsaturated compound, method for producing the same, and alkali-soluble radiation-sensitive resin composition using the same |
| JP2002088136A (en) * | 2000-09-12 | 2002-03-27 | Nagase Kasei Kogyo Kk | Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin |
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2002
- 2002-08-01 JP JP2002224866A patent/JP2004069754A/en active Pending
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