JP2006120878A - 液浸露光装置及びそれを用いたデバイス製造方法 - Google Patents

液浸露光装置及びそれを用いたデバイス製造方法 Download PDF

Info

Publication number
JP2006120878A
JP2006120878A JP2004307528A JP2004307528A JP2006120878A JP 2006120878 A JP2006120878 A JP 2006120878A JP 2004307528 A JP2004307528 A JP 2004307528A JP 2004307528 A JP2004307528 A JP 2004307528A JP 2006120878 A JP2006120878 A JP 2006120878A
Authority
JP
Japan
Prior art keywords
liquid
substrate
exposure apparatus
immersion exposure
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2004307528A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006120878A5 (https=
Inventor
Keiko Chiba
啓子 千葉
Sunao Mori
直 森
Keisui Banno
渓帥 坂野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004307528A priority Critical patent/JP2006120878A/ja
Publication of JP2006120878A publication Critical patent/JP2006120878A/ja
Publication of JP2006120878A5 publication Critical patent/JP2006120878A5/ja
Withdrawn legal-status Critical Current

Links

Images

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004307528A 2004-10-22 2004-10-22 液浸露光装置及びそれを用いたデバイス製造方法 Withdrawn JP2006120878A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004307528A JP2006120878A (ja) 2004-10-22 2004-10-22 液浸露光装置及びそれを用いたデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004307528A JP2006120878A (ja) 2004-10-22 2004-10-22 液浸露光装置及びそれを用いたデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006120878A true JP2006120878A (ja) 2006-05-11
JP2006120878A5 JP2006120878A5 (https=) 2007-12-06

Family

ID=36538470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004307528A Withdrawn JP2006120878A (ja) 2004-10-22 2004-10-22 液浸露光装置及びそれを用いたデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2006120878A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007013180A (ja) * 2005-06-29 2007-01-18 Qimonda Ag 液浸リソグラフィシステム用液体
WO2012011512A1 (ja) * 2010-07-20 2012-01-26 株式会社ニコン 露光方法、露光装置および洗浄方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007013180A (ja) * 2005-06-29 2007-01-18 Qimonda Ag 液浸リソグラフィシステム用液体
WO2012011512A1 (ja) * 2010-07-20 2012-01-26 株式会社ニコン 露光方法、露光装置および洗浄方法

Similar Documents

Publication Publication Date Title
US8570484B2 (en) Immersion exposure apparatus, device manufacturing method, cleaning method, and cleaning member to remove foreign substance using liquid
US7528930B2 (en) Exposure apparatus and device manufacturing method
KR101245070B1 (ko) 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
CN105204296B (zh) 曝光装置的控制方法、曝光装置及元件制造方法
US8721803B2 (en) Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
JP2006190997A (ja) 露光装置、露光方法及びデバイス製造方法
JP2003115451A (ja) 露光装置及びそれを用いたデバイスの製造方法
JP2006165502A (ja) 露光装置、及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
US20060192930A1 (en) Exposure apparatus
EP3669232A1 (en) Method for operating an optical apparatus, and optical apparatus
KR100870791B1 (ko) 노광장치, 노광방법 및 노광시스템
JP2006120878A (ja) 液浸露光装置及びそれを用いたデバイス製造方法
US8363205B2 (en) Exposure apparatus
CN102652349A (zh) 液浸构件、液浸构件的制造方法、曝光装置、及元件制造方法
JP2008182167A (ja) 露光装置、露光方法及び露光システム
JP3977377B2 (ja) 露光装置およびデバイス製造方法
JP2010010380A (ja) 光学系、露光装置、及びデバイスの製造方法
JP4125215B2 (ja) 光学装置および半導体露光装置
JP2006073906A (ja) 露光装置、露光システム及びデバイス製造方法
JPWO2012011512A1 (ja) 露光方法、露光装置および洗浄方法
EP1926127A1 (en) Exposure apparatus, exposure method, and device manufacturing method
JPH11274050A (ja) 露光装置およびデバイス製造方法
CN101002303B (zh) 曝光装置及元件制造方法
JP2012009668A (ja) チタン含有部材の製造方法、チタン含有部材、露光装置及びデバイス製造方法
JP2005142488A (ja) 露光装置及び露光方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071018

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071018

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20100201

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20100216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20100217