JP2006120878A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006120878A5 JP2006120878A5 JP2004307528A JP2004307528A JP2006120878A5 JP 2006120878 A5 JP2006120878 A5 JP 2006120878A5 JP 2004307528 A JP2004307528 A JP 2004307528A JP 2004307528 A JP2004307528 A JP 2004307528A JP 2006120878 A5 JP2006120878 A5 JP 2006120878A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- liquid
- immersion exposure
- exposure apparatus
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000007788 liquid Substances 0.000 claims 12
- 239000000758 substrate Substances 0.000 claims 12
- 238000007654 immersion Methods 0.000 claims 11
- 230000003287 optical effect Effects 0.000 claims 7
- 239000003638 chemical reducing agent Substances 0.000 claims 6
- 230000033116 oxidation-reduction process Effects 0.000 claims 3
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-N Nitrous acid Chemical compound ON=O IOVCWXUNBOPUCH-UHFFFAOYSA-N 0.000 claims 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 claims 1
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- -1 hydrogen compound Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 230000001590 oxidative effect Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004307528A JP2006120878A (ja) | 2004-10-22 | 2004-10-22 | 液浸露光装置及びそれを用いたデバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004307528A JP2006120878A (ja) | 2004-10-22 | 2004-10-22 | 液浸露光装置及びそれを用いたデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006120878A JP2006120878A (ja) | 2006-05-11 |
| JP2006120878A5 true JP2006120878A5 (https=) | 2007-12-06 |
Family
ID=36538470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004307528A Withdrawn JP2006120878A (ja) | 2004-10-22 | 2004-10-22 | 液浸露光装置及びそれを用いたデバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006120878A (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7291569B2 (en) * | 2005-06-29 | 2007-11-06 | Infineon Technologies Ag | Fluids for immersion lithography systems |
| KR20130083901A (ko) * | 2010-07-20 | 2013-07-23 | 가부시키가이샤 니콘 | 노광 방법, 노광 장치 및 세정 방법 |
-
2004
- 2004-10-22 JP JP2004307528A patent/JP2006120878A/ja not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2005183693A5 (https=) | ||
| Simm et al. | Sonically assisted electroanalytical detection of ultratrace arsenic | |
| EP1727188A4 (en) | EXPOSURE DEVICE, FEEDING METHOD AND RECOVERY METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD | |
| JP2005197384A5 (https=) | ||
| TW200737301A (en) | Substrate processing method, substrate processing system, program, and recording medium | |
| WO2005017625A3 (en) | Method and apparatus for monitoring and controlling imaging in immersion lithography systems | |
| EP2319892A4 (en) | LIGHT-SENSITIVE LAMINATING COMPOSITION, LIGHT-RESPONSIVE FILM, HAIR STRUCTURE, SEMICONDUCTOR WITH HAZARD, SEMICONDUCTOR ELEMENT AND ELECTRONIC COMPONENT | |
| NL1032276A1 (nl) | Verlaging van een vloeistofpeil bij dompellithografie. | |
| Houle et al. | Kinetic model for positive tone resist dissolution and roughening | |
| Kang et al. | Characterization of the photoacid diffusion length and reaction kinetics in EUV photoresists with IR spectroscopy | |
| TW200612202A (en) | Photopolymerizable silcone materials forming semipermeable membranes for sensor applications | |
| JP2006013158A5 (https=) | ||
| JP2006120878A5 (https=) | ||
| JP4097973B2 (ja) | アルカリ現像液の濃度測定方法 | |
| US20010042692A1 (en) | Microsensor to measure or regulate the amount of chlorine and bromine in water | |
| KR20150064298A (ko) | Toc 분석장치 및 이를 이용한 toc 분석 시스템 | |
| SE0400403D0 (sv) | Method and device for the characterization of interactions between different species | |
| Kim et al. | Detection of ethanol gas concentration by fuel cell sensors fabricated using a solid polymer electrolyte | |
| JP6390119B2 (ja) | センサユニット、並びに分析装置、及び分析方法 | |
| CN107589049B (zh) | 一种用于测定清洗剂在膜污染层中扩散系数的方法及装置 | |
| JP5585173B2 (ja) | 全有機体炭素測定装置 | |
| CN103063670B (zh) | 人体呼气酒精浓度测试剂及其制备方法和应用 | |
| Fisher et al. | Tetrazolium Blue-Based Colorimetric Sensor for Hydrogen Gas | |
| JP6551784B2 (ja) | レジスト剥離液中の炭酸濃度管理方法および炭酸濃度管理装置 | |
| Brites Helú et al. | Ordered Array Electrodes Fabricated by a Mask‐Assisted Electron‐Beam Method as Platforms for Studying Kinetic and Mass‐Transport Phenomena on Electrocatalysts |