JP2006112788A - 表面形状計測装置、表面計測方法、及び露光装置 - Google Patents

表面形状計測装置、表面計測方法、及び露光装置 Download PDF

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Publication number
JP2006112788A
JP2006112788A JP2004297158A JP2004297158A JP2006112788A JP 2006112788 A JP2006112788 A JP 2006112788A JP 2004297158 A JP2004297158 A JP 2004297158A JP 2004297158 A JP2004297158 A JP 2004297158A JP 2006112788 A JP2006112788 A JP 2006112788A
Authority
JP
Japan
Prior art keywords
optical detection
wafer
surface shape
substrate
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004297158A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006112788A5 (enExample
Inventor
Hideki Ine
秀樹 稲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004297158A priority Critical patent/JP2006112788A/ja
Priority to US11/249,295 priority patent/US7497111B2/en
Publication of JP2006112788A publication Critical patent/JP2006112788A/ja
Publication of JP2006112788A5 publication Critical patent/JP2006112788A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q20/00—Monitoring the movement or position of the probe
    • G01Q20/02—Monitoring the movement or position of the probe by optical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/06—Probe tip arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7061—Scanning probe microscopy, e.g. AFM, scanning tunneling microscopy
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Multimedia (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2004297158A 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置 Pending JP2006112788A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004297158A JP2006112788A (ja) 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置
US11/249,295 US7497111B2 (en) 2004-10-12 2005-10-12 Surface shape measuring apparatus, surface measuring method, and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004297158A JP2006112788A (ja) 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置

Publications (2)

Publication Number Publication Date
JP2006112788A true JP2006112788A (ja) 2006-04-27
JP2006112788A5 JP2006112788A5 (enExample) 2007-11-29

Family

ID=36144327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004297158A Pending JP2006112788A (ja) 2004-10-12 2004-10-12 表面形状計測装置、表面計測方法、及び露光装置

Country Status (2)

Country Link
US (1) US7497111B2 (enExample)
JP (1) JP2006112788A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7355709B1 (en) * 2004-02-23 2008-04-08 Kla-Tencor Technologies Corp. Methods and systems for optical and non-optical measurements of a substrate
NL1036307A1 (nl) * 2007-12-21 2009-06-23 Asml Netherlands Bv Lithographic apparatus, method for levelling an object, and lithographic projection method.
US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots
EP2680012A1 (en) * 2012-06-28 2014-01-01 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO High throughput scanning probe microscopy device
KR101681231B1 (ko) * 2015-05-13 2016-12-02 서강대학교산학협력단 기능성 탐침을 갖는 미소 캔틸레버 제조방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05217861A (ja) * 1992-01-31 1993-08-27 Canon Inc 位置ずれ検出方法及び露光装置
JPH06260391A (ja) * 1993-03-03 1994-09-16 Nikon Corp 露光方法
JP2000088735A (ja) * 1998-09-10 2000-03-31 Seiko Instruments Inc 走査型プローブ顕微鏡
JP2001091441A (ja) * 1999-07-16 2001-04-06 Japan Science & Technology Corp ナノメートルオーダの機械振動子、その製造方法及びそれを用いた測定装置
JP2003114182A (ja) * 2001-06-19 2003-04-18 Japan Science & Technology Corp カンチレバーアレイ、その製造方法及びそれを用いた走査型プローブ顕微鏡、案内・回転機構の摺動装置、センサ、ホモダインレーザ干渉計、試料の光励振機能を有するレーザドップラー干渉計ならびにカンチレバーの励振方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4861162A (en) * 1985-05-16 1989-08-29 Canon Kabushiki Kaisha Alignment of an object
GB8910566D0 (en) * 1989-05-08 1989-06-21 Amersham Int Plc Imaging apparatus and method
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
US5633455A (en) * 1993-10-05 1997-05-27 Board Of Trustees Of The Leland Stanford, Jr. University Method of detecting particles of semiconductor wafers
US6066265A (en) * 1996-06-19 2000-05-23 Kionix, Inc. Micromachined silicon probe for scanning probe microscopy
US5908981A (en) * 1996-09-05 1999-06-01 Board Of Trustees Of The Leland Stanford, Jr. University Interdigital deflection sensor for microcantilevers
JPH10312592A (ja) * 1997-05-13 1998-11-24 Canon Inc 情報処理装置および情報処理方法
US6545492B1 (en) * 1999-09-20 2003-04-08 Europaisches Laboratorium Fur Molekularbiologie (Embl) Multiple local probe measuring device and method
US6516528B1 (en) * 2000-10-24 2003-02-11 Advanced Micro Devices, Inc. System and method to determine line edge roughness and/or linewidth
JP4444734B2 (ja) * 2004-06-07 2010-03-31 キヤノン株式会社 微細パターン形成装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05217861A (ja) * 1992-01-31 1993-08-27 Canon Inc 位置ずれ検出方法及び露光装置
JPH06260391A (ja) * 1993-03-03 1994-09-16 Nikon Corp 露光方法
JP2000088735A (ja) * 1998-09-10 2000-03-31 Seiko Instruments Inc 走査型プローブ顕微鏡
JP2001091441A (ja) * 1999-07-16 2001-04-06 Japan Science & Technology Corp ナノメートルオーダの機械振動子、その製造方法及びそれを用いた測定装置
JP2003114182A (ja) * 2001-06-19 2003-04-18 Japan Science & Technology Corp カンチレバーアレイ、その製造方法及びそれを用いた走査型プローブ顕微鏡、案内・回転機構の摺動装置、センサ、ホモダインレーザ干渉計、試料の光励振機能を有するレーザドップラー干渉計ならびにカンチレバーの励振方法

Also Published As

Publication number Publication date
US7497111B2 (en) 2009-03-03
US20060076488A1 (en) 2006-04-13

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