JP2006074061A5 - - Google Patents

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Publication number
JP2006074061A5
JP2006074061A5 JP2005291808A JP2005291808A JP2006074061A5 JP 2006074061 A5 JP2006074061 A5 JP 2006074061A5 JP 2005291808 A JP2005291808 A JP 2005291808A JP 2005291808 A JP2005291808 A JP 2005291808A JP 2006074061 A5 JP2006074061 A5 JP 2006074061A5
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JP
Japan
Prior art keywords
liquid
substrate
flat plate
optical system
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005291808A
Other languages
English (en)
Japanese (ja)
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JP2006074061A (ja
JP3997244B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2005291808A priority Critical patent/JP3997244B2/ja
Priority claimed from JP2005291808A external-priority patent/JP3997244B2/ja
Publication of JP2006074061A publication Critical patent/JP2006074061A/ja
Publication of JP2006074061A5 publication Critical patent/JP2006074061A5/ja
Application granted granted Critical
Publication of JP3997244B2 publication Critical patent/JP3997244B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005291808A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP3997244B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005291808A JP3997244B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005291808A JP3997244B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006074061A JP2006074061A (ja) 2006-03-16
JP2006074061A5 true JP2006074061A5 (https=) 2007-08-23
JP3997244B2 JP3997244B2 (ja) 2007-10-24

Family

ID=36154262

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005291808A Expired - Fee Related JP3997244B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3997244B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4961299B2 (ja) 2007-08-08 2012-06-27 キヤノン株式会社 露光装置およびデバイス製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4529433B2 (ja) * 2002-12-10 2010-08-25 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
SG139733A1 (en) * 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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