JP2006074061A5

JP2006074061A5 -

Info

Publication number: JP2006074061A5
Application number: JP2005291808A
Authority: JP
Filing date: 2005-10-04
Publication date: 2007-08-23
Anticipated expiration: 2023-06-27

Claims

Includes a projection optical system for projecting a pattern of an original onto a substrate, with the gap filled with liquid between a final surface and the substrate of the projection optical system, an exposure apparatus for exposing a substrate,
A substrate stage movable with respect to the projection optical system and holding the substrate;
A plane plate movable relative to the projection optical system and having a surface substantially the same height as the exposed surface of the substrate held by the substrate stage ;
Liquid injection means for injecting the liquid from a liquid injection port provided in the flat plate,
The exposure apparatus characterized in that the liquid injection means injects the liquid from the liquid injection port of the flat plate opposed to the final surface .

An exposure apparatus that has a projection optical system that projects an original pattern onto a substrate, and that exposes the substrate in a state where a liquid is filled in a gap between the final surface of the projection optical system and the substrate,
  A substrate stage movable with respect to the projection optical system and holding the substrate;
  A flat plate movable with respect to the projection optical system and having an upper surface substantially the same height as the upper surface of the substrate held by the substrate stage;
  A liquid suction means for sucking the liquid from a liquid suction port provided in the flat plate,
  The exposure apparatus according to claim 1, wherein the liquid suction means sucks the liquid from the liquid suction port of the flat plate opposed to the final surface.

A supply unit configured to supply the liquid to the gap from a supply port disposed so as to surround the final surface;
The liquid is sucked from the liquid suction port by using the liquid suction means while the liquid is supplied from the supply port to the flat plate by the supply means, and the liquid is filled in the gap. The exposure apparatus according to claim 2.

A supply unit configured to supply the liquid to the gap from a supply port disposed so as to surround the final surface;
By supplying the liquid from the liquid suction port using the liquid suction unit without supplying the liquid from the supply port to the flat plate by the supply unit, the final surface and the plane plate The exposure apparatus according to claim 2, wherein the liquid is collected from the gap.

5. The exposure apparatus according to claim 4, wherein the recovery of the liquid from the gap between the final surface and the flat plate is performed in parallel with the movement of the substrate stage.

An exposure apparatus that has a projection optical system that projects an original pattern onto a substrate, and that exposes the substrate in a state where a liquid is filled in a gap between the final surface of the projection optical system and the substrate,
  A substrate stage movable with respect to the projection optical system and holding the substrate;
  A flat plate movable with respect to the projection optical system and having an upper surface substantially the same height as the upper surface of the substrate held by the substrate stage;
  Liquid injection means for injecting the liquid from a liquid injection port provided in the flat plate;
  A liquid suction means for sucking the liquid from a liquid suction port provided in the flat plate,
  The liquid injection means injects the liquid from the liquid injection port of the flat plate opposed to the final surface, and the liquid suction means from the liquid suction port of the flat plate opposed to the final surface. An exposure apparatus for sucking the liquid.

An exposure apparatus that has a projection optical system that projects an original pattern onto a substrate, and that exposes the substrate in a state where a liquid is filled in a gap between the final surface of the projection optical system and the substrate,
  A substrate stage movable with respect to the projection optical system and holding the substrate;
  A flat plate movable with respect to the projection optical system and having an upper surface substantially the same height as the upper surface of the substrate held by the substrate stage;
  Liquid injection and suction means for selectively performing injection of the liquid and suction of the liquid from an opening provided in the flat plate,
  The exposure apparatus according to claim 1, wherein the liquid injection / suction means selectively injects the liquid and sucks the liquid from the opening of the flat plate facing the final surface.

8. The exposure apparatus according to claim 7, wherein the liquid injection / suction unit includes a valve for switching between injection of the liquid and suction of the liquid.

The exposure apparatus according to claim 1, wherein the flat plate is disposed on the substrate stage.

The exposure apparatus according to claim 1, wherein the flat plate moves independently of the substrate stage.

The exposure apparatus according to claim 1, wherein the substrate is supplied to or recovered from the substrate stage while the flat plate is opposed to the final surface.

11. The alignment measurement of the substrate held on the substrate stage is performed while the flat plate is opposed to the final surface. 11. Exposure device.

11. The exposure apparatus according to claim 1, wherein an operation for maintaining or managing the exposure apparatus is performed while the flat plate is opposed to the final surface. .

The exposure apparatus according to claim 1, wherein the flat plate includes any one of stainless steel and fluororesin.

An exposure apparatus that has a projection optical system that projects an original pattern onto a substrate, and that exposes the substrate in a state where a liquid is filled in a gap between the final surface of the projection optical system and the substrate,
  A substrate stage movable with respect to the projection optical system and holding the substrate;
  A plurality of planar plates movable relative to the projection optical system and having an upper surface substantially the same height as the upper surface of the substrate held by the substrate stage;
  A liquid suction means for sucking the liquid from a plurality of liquid suction ports provided in the plurality of flat plates;
  The exposure apparatus according to claim 1, wherein the liquid suction means sucks the liquid from the liquid suction port of a flat plate opposed to the final surface among the plurality of flat plates.

A master stage that is movable with respect to the projection optical system and holds the master;
The exposure according to any one of claims 1 to 15, wherein the substrate is exposed through the pattern of the original while the original and the substrate are scanned and moved with respect to the projection optical system. apparatus.

A step of exposing a substrate using the exposure apparatus according to any one of claims 1 to 16,
And developing the substrate exposed in the step.