JP3997244B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP3997244B2
JP3997244B2 JP2005291808A JP2005291808A JP3997244B2 JP 3997244 B2 JP3997244 B2 JP 3997244B2 JP 2005291808 A JP2005291808 A JP 2005291808A JP 2005291808 A JP2005291808 A JP 2005291808A JP 3997244 B2 JP3997244 B2 JP 3997244B2
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Prior art keywords
liquid
substrate
optical system
projection optical
flat plate
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Expired - Fee Related
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JP2005291808A
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Japanese (ja)
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JP2006074061A (ja
JP2006074061A5 (https=
Inventor
一志 中野
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Canon Inc
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Canon Inc
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005291808A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP3997244B2 (ja)

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JP2005291808A JP3997244B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

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JP2005291808A JP3997244B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

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JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Publications (3)

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JP2006074061A JP2006074061A (ja) 2006-03-16
JP2006074061A5 JP2006074061A5 (https=) 2007-08-23
JP3997244B2 true JP3997244B2 (ja) 2007-10-24

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ID=36154262

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JP2005291808A Expired - Fee Related JP3997244B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

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JP (1) JP3997244B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4961299B2 (ja) 2007-08-08 2012-06-27 キヤノン株式会社 露光装置およびデバイス製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG121819A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4529433B2 (ja) * 2002-12-10 2010-08-25 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
SG139733A1 (en) * 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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JP2006074061A (ja) 2006-03-16

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