JP2006066877A5 - - Google Patents

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Publication number
JP2006066877A5
JP2006066877A5 JP2005126614A JP2005126614A JP2006066877A5 JP 2006066877 A5 JP2006066877 A5 JP 2006066877A5 JP 2005126614 A JP2005126614 A JP 2005126614A JP 2005126614 A JP2005126614 A JP 2005126614A JP 2006066877 A5 JP2006066877 A5 JP 2006066877A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005126614A
Other languages
Japanese (ja)
Other versions
JP4601482B2 (ja
JP2006066877A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005126614A priority Critical patent/JP4601482B2/ja
Priority claimed from JP2005126614A external-priority patent/JP4601482B2/ja
Priority to TW094125234A priority patent/TWI368184B/zh
Priority to US11/191,021 priority patent/US7266802B2/en
Priority to KR1020050068956A priority patent/KR101135601B1/ko
Publication of JP2006066877A publication Critical patent/JP2006066877A/ja
Publication of JP2006066877A5 publication Critical patent/JP2006066877A5/ja
Application granted granted Critical
Publication of JP4601482B2 publication Critical patent/JP4601482B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2005126614A 2004-07-29 2005-04-25 描画装置および描画方法 Expired - Lifetime JP4601482B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005126614A JP4601482B2 (ja) 2004-07-29 2005-04-25 描画装置および描画方法
TW094125234A TWI368184B (en) 2004-07-29 2005-07-26 Drawing apparatus and drawing method
US11/191,021 US7266802B2 (en) 2004-07-29 2005-07-28 Drawing apparatus and drawing method
KR1020050068956A KR101135601B1 (ko) 2004-07-29 2005-07-28 묘화 장치 및 묘화 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004221778 2004-07-29
JP2005126614A JP4601482B2 (ja) 2004-07-29 2005-04-25 描画装置および描画方法

Publications (3)

Publication Number Publication Date
JP2006066877A JP2006066877A (ja) 2006-03-09
JP2006066877A5 true JP2006066877A5 (enExample) 2008-04-03
JP4601482B2 JP4601482B2 (ja) 2010-12-22

Family

ID=35731611

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005126614A Expired - Lifetime JP4601482B2 (ja) 2004-07-29 2005-04-25 描画装置および描画方法

Country Status (4)

Country Link
US (1) US7266802B2 (enExample)
JP (1) JP4601482B2 (enExample)
KR (1) KR101135601B1 (enExample)
TW (1) TWI368184B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5001638B2 (ja) * 2006-12-22 2012-08-15 株式会社オーク製作所 露光データ作成装置
JP5020745B2 (ja) * 2007-08-29 2012-09-05 株式会社ニューフレアテクノロジー 描画データの作成方法及び荷電粒子ビーム描画装置
JP5215018B2 (ja) * 2008-03-28 2013-06-19 大日本スクリーン製造株式会社 画像記録装置
KR101095549B1 (ko) 2010-04-29 2011-12-19 삼성전자주식회사 마스크리스 노광 장치와 이를 이용한 스티칭 노광 방법
CN103699708A (zh) * 2013-05-14 2014-04-02 上海大众汽车有限公司 全参数化拉延模具设计方法
GB2517702A (en) * 2013-08-28 2015-03-04 Ibm Collaborative electronic nose management in personal devices
US12452416B2 (en) 2016-01-22 2025-10-21 Spike Vision (Beijing) Technology Co., Ltd. Generating image based on pulse sequences obtained from encoded information
CN109803096B (zh) * 2019-01-11 2020-08-25 北京大学 一种基于脉冲信号的显示方法和系统
US11228758B2 (en) * 2016-01-22 2022-01-18 Peking University Imaging method and device

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2075026A1 (en) * 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
US6074790A (en) * 1994-11-17 2000-06-13 Texas Instruments Incorporated Black and white defect correction for a digital micromirror printer
JPH10112579A (ja) 1996-10-07 1998-04-28 M S Tec:Kk レジスト露光方法及びその露光装置
SE516914C2 (sv) * 1999-09-09 2002-03-19 Micronic Laser Systems Ab Metoder och rastrerare för högpresterande mönstergenerering
JP2001255664A (ja) * 2000-03-14 2001-09-21 Fuji Photo Film Co Ltd 画像露光方法
DE10031915A1 (de) * 2000-06-30 2002-01-10 Heidelberger Druckmasch Ag Kompakte Mehrstrahllaserlichtquelle und Interleafrasterscanlinien-Verfahren zur Belichtung von Druckplatten
US6998219B2 (en) * 2001-06-27 2006-02-14 University Of South Florida Maskless photolithography for etching and deposition
JP4320694B2 (ja) * 2001-08-08 2009-08-26 株式会社オーク製作所 多重露光描画装置および多重露光式描画方法
JP4273291B2 (ja) * 2001-08-17 2009-06-03 株式会社オーク製作所 多重露光描画装置および多重露光描画方法
US20030186164A1 (en) * 2002-03-27 2003-10-02 Hitachi, Ltd. Information recording medium, a method for recording information and a method for manufacturing a medium
JP4274784B2 (ja) * 2002-05-28 2009-06-10 新光電気工業株式会社 配線形成システムおよびその方法
JP2004012899A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置
CN101487982A (zh) * 2002-08-24 2009-07-22 无掩模平版印刷公司 连续地直接写的光刻技术
JP4150250B2 (ja) * 2002-12-02 2008-09-17 富士フイルム株式会社 描画ヘッド、描画装置及び描画方法
US7061591B2 (en) * 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays

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