JP2006064669A5 - - Google Patents

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Publication number
JP2006064669A5
JP2006064669A5 JP2004250877A JP2004250877A JP2006064669A5 JP 2006064669 A5 JP2006064669 A5 JP 2006064669A5 JP 2004250877 A JP2004250877 A JP 2004250877A JP 2004250877 A JP2004250877 A JP 2004250877A JP 2006064669 A5 JP2006064669 A5 JP 2006064669A5
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JP
Japan
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JP2004250877A
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JP2006064669A (ja
JP4425747B2 (ja
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Priority to JP2004250877A priority Critical patent/JP4425747B2/ja
Priority claimed from JP2004250877A external-priority patent/JP4425747B2/ja
Priority to US11/204,177 priority patent/US7233400B2/en
Priority to CNB2005100959762A priority patent/CN100360895C/zh
Publication of JP2006064669A publication Critical patent/JP2006064669A/ja
Publication of JP2006064669A5 publication Critical patent/JP2006064669A5/ja
Application granted granted Critical
Publication of JP4425747B2 publication Critical patent/JP4425747B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004250877A 2004-08-30 2004-08-30 仮想接面測定用の干渉計装置 Expired - Fee Related JP4425747B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004250877A JP4425747B2 (ja) 2004-08-30 2004-08-30 仮想接面測定用の干渉計装置
US11/204,177 US7233400B2 (en) 2004-08-30 2005-08-16 Interferometer for measuring virtual contact surfaces
CNB2005100959762A CN100360895C (zh) 2004-08-30 2005-08-29 假想接面测定用的干涉仪装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004250877A JP4425747B2 (ja) 2004-08-30 2004-08-30 仮想接面測定用の干渉計装置

Publications (3)

Publication Number Publication Date
JP2006064669A JP2006064669A (ja) 2006-03-09
JP2006064669A5 true JP2006064669A5 (ja) 2007-06-21
JP4425747B2 JP4425747B2 (ja) 2010-03-03

Family

ID=35942591

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004250877A Expired - Fee Related JP4425747B2 (ja) 2004-08-30 2004-08-30 仮想接面測定用の干渉計装置

Country Status (3)

Country Link
US (1) US7233400B2 (ja)
JP (1) JP4425747B2 (ja)
CN (1) CN100360895C (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7564559B2 (en) * 2006-06-02 2009-07-21 The Regents Of The University Of California MEMS-based, phase-shifting interferometer
JP2009162539A (ja) * 2007-12-28 2009-07-23 Fujinon Corp 光波干渉測定装置
JP2009244227A (ja) * 2008-03-31 2009-10-22 Fujinon Corp 光波干渉測定装置
JP5605999B2 (ja) * 2009-03-06 2014-10-15 キヤノン株式会社 光干渉断層撮像方法および装置
JP2011085569A (ja) * 2009-09-15 2011-04-28 Toshiba Corp パターン検査装置およびパターン検査方法
JP5590524B2 (ja) * 2010-03-17 2014-09-17 学校法人北里研究所 オプティカル・コヒーレンス・トモグラフィー装置とその光源
TWI452270B (zh) * 2011-10-21 2014-09-11 Univ Nat Central 量測裝置及其量測方法
ITBO20130403A1 (it) * 2013-07-26 2015-01-27 Marposs Spa Metodo e apparecchiatura per il controllo ottico mediante interferometria dello spessore di un oggetto in lavorazione
JP5658331B2 (ja) * 2013-07-31 2015-01-21 Hoya株式会社 マスクブランク用基板セットの製造方法、マスクブランクセットの製造方法、フォトマスクセットの製造方法、及び半導体デバイスの製造方法
JP6482251B2 (ja) * 2014-11-21 2019-03-13 株式会社ミツトヨ 形状測定装置
US10094653B2 (en) 2015-01-22 2018-10-09 Boe Technology Group Co., Ltd. Detection device and detection method
CN104536172A (zh) * 2015-01-22 2015-04-22 合肥京东方光电科技有限公司 一种检测装置和检测方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3082356B2 (ja) 1991-10-25 2000-08-28 日本電気株式会社 半導体装置の製造方法
JPH08240413A (ja) 1995-01-06 1996-09-17 Toshiba Corp 膜厚測定装置及びポリシング装置
JP3796363B2 (ja) * 1998-10-30 2006-07-12 キヤノン株式会社 位置検出装置及びそれを用いた露光装置
AU2001260975A1 (en) * 2000-01-25 2001-08-20 Zygo Corporation Optical systems for measuring form and geometric dimensions of precision engineered parts
JP2001298036A (ja) 2000-02-08 2001-10-26 Toshiba Corp バンプ高さ測定方法、バンプ位置測定方法およびバンプ高さ測定装置、バンプ位置測定装置ならびに半導体装置の製造方法、半導体装置の実装方法
JP2002048519A (ja) 2000-08-03 2002-02-15 Toshiba Corp 段差測定方法とその装置、および半導体装置の製造方法
US7019841B2 (en) * 2002-12-19 2006-03-28 August Technology Corp. System and method for inspecting a component using interferometry
US6985232B2 (en) * 2003-03-13 2006-01-10 Tokyo Electron Limited Scatterometry by phase sensitive reflectometer

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