JP2006045663A - Method for depositing vapor-deposited film on substrate and transport tray - Google Patents

Method for depositing vapor-deposited film on substrate and transport tray Download PDF

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JP2006045663A
JP2006045663A JP2005084627A JP2005084627A JP2006045663A JP 2006045663 A JP2006045663 A JP 2006045663A JP 2005084627 A JP2005084627 A JP 2005084627A JP 2005084627 A JP2005084627 A JP 2005084627A JP 2006045663 A JP2006045663 A JP 2006045663A
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frame
substrate
transport tray
forming
glass substrate
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Eiichi Iijima
栄一 飯島
Yukio Masuda
行男 増田
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Ulvac Inc
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Ulvac Inc
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for depositing a vapor-deposited film on a substrate by which a plurality of panels are prepared from one glass substrate under conserved energy with simple constitution without inducing the cracking of the glass substrate, or the like, caused by a thermal load, and to provide a transport tray for performing the method. <P>SOLUTION: The transport tray is composed of a square frame body and thin body-shaped members constructed in such a manner that, between the confronted frame sides in the frame body, both ends of the above members are connected via each frame side and elastic members to thereby apply tension thereto. The plurality of thin body-shaped members are functioned as holding members for forming the state where the substrate is placed on the transport tray, and are also functioned as mask members for demarcating two or more vapor-deposited film forming regions in the substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、プラズマディスプレイパネルを製造する際の、ガラス基板にMgO被膜を形成する工程などに適用される、基板への蒸着被膜の形成方法および当該方法を実施するための搬送トレイに関する。   The present invention relates to a method for forming a vapor-deposited film on a substrate, which is applied to a step of forming an MgO film on a glass substrate when manufacturing a plasma display panel, and a transport tray for carrying out the method.

従来、この種の基板への蒸着被膜の形成方法および搬送トレイとして知られているものには、例えば、特許文献1に記載のものがある。特許文献1には、四角形状の枠体と、枠体の対向する内周部と内周部の間に、その両端を枠体の各内周部と弾性部材を介して連結することでテンションを付加して架設した薄体状部材とから構成される搬送トレイを用いた、ガラス基板へのMgO被膜などの蒸着被膜の形成方法が記載されている(例えば図2を参照のこと)。   Conventionally known methods for forming a vapor-deposited film on this type of substrate and a transfer tray include those described in Patent Document 1, for example. In Patent Document 1, a rectangular frame body, and an inner peripheral portion and an inner peripheral portion facing each other of the frame body, both ends thereof are connected to each inner peripheral portion of the frame body via an elastic member, thereby providing tension. A method of forming a vapor deposition film such as an MgO film on a glass substrate using a transport tray composed of a thin-shaped member constructed with the addition of is described (for example, see FIG. 2).

特許文献1に記載の方法は、基板への蒸着被膜の形成方法として一応の評価をすることができるものである。しかしながら、この方法は、その発明の詳細な説明の段落0012に記載の通り、ガラス基板を四角形状の枠体の内周部に設けた窓枠状の基板受けに載置することで保持するようにしている。従って、例えば、大型のガラス基板を加熱して蒸着被膜を形成する際、枠体自体を加熱しなければならないので、エネルギー消費量が膨大であるといった問題や、枠体の熱歪が起こるといった問題を有していた。また、ガラス基板を搬送トレイにセットすることで初期に発生する機械応力を緩和することができないといった問題を有していた。さらに、ガラス基板に許容範囲を超える熱応力が発生するとこれを緩和することができないことに加え、ガラス基板の高熱による撓みを基板受けが十分に吸収することができないことで熱のびによって無視することのできない機械応力が発生するといった問題を有していた。その結果、熱負荷によるガラス基板の割れなどを誘発するおそれがあるといった問題を有していた。
特開2000−199046号公報
The method described in Patent Document 1 can be temporarily evaluated as a method for forming a vapor deposition film on a substrate. However, in this method, as described in paragraph 0012 of the detailed description of the invention, the glass substrate is held by being placed on the window frame-shaped substrate receiver provided on the inner periphery of the rectangular frame. I have to. Therefore, for example, when a vapor deposition film is formed by heating a large glass substrate, the frame itself must be heated, so that the energy consumption is enormous and the frame is subject to thermal distortion. Had. In addition, there is a problem that mechanical stress generated in the initial stage cannot be relaxed by setting the glass substrate on the transfer tray. Furthermore, if thermal stress exceeding the allowable range occurs on the glass substrate, it cannot be alleviated, and the substrate holder cannot sufficiently absorb the bending due to the high heat of the glass substrate, so it should be ignored by heat spread. There is a problem that mechanical stress that cannot be generated occurs. As a result, there has been a problem that the glass substrate may be cracked by a thermal load.
JP 2000-199046 A

そこで本発明は、簡易な構成で、熱負荷によるガラス基板の割れなどを誘発することなく、1枚のガラス基板から複数枚のパネルを省エネルギーのもとに調製することを可能にする、基板への蒸着被膜の形成方法および当該方法を実施するための搬送トレイを提供することを目的とする。   Therefore, the present invention provides a substrate having a simple configuration and capable of preparing a plurality of panels from a single glass substrate with energy saving without inducing a crack of the glass substrate due to a thermal load. An object of the present invention is to provide a method for forming a vapor-deposited film and a transport tray for carrying out the method.

本発明者は、上記の点に鑑みて種々の検討を行った結果、ガラス基板に蒸着被膜を形成するために用いる搬送トレイを、四角形状の枠体と、枠体の対向する枠辺と枠辺の間に、その両端を枠体の各枠辺と弾性部材を介して連結することでテンションを付加して架設した薄体状部材とから構成し、複数本の薄体状部材を、ガラス基板が搬送トレイに載置されている状態を形成するための保持部材として機能させるとともに、ガラス基板における2つ以上の蒸着被膜形成領域を画定するためのマスク部材として機能させることで、上記の目的を達成することができることを知見した。   As a result of various studies in view of the above points, the present inventor has determined that a transport tray used for forming a vapor-deposited film on a glass substrate has a rectangular frame body, a frame side and a frame opposite to each other. Between the sides, each end of the frame is connected to each frame side via an elastic member, and a thin member is provided with tension applied thereto, and a plurality of thin members are made of glass. The above object is achieved by functioning as a holding member for forming a state in which the substrate is placed on the transfer tray and as a mask member for demarcating two or more vapor deposition film forming regions in the glass substrate. It was found that can be achieved.

上記の知見に基づいてなされた本発明の基板への蒸着被膜の形成方法は、請求項1記載の通り、基板を水平に維持して真空蒸着装置の蒸着室に搬送し、基板に蒸着被膜を形成するために用いられる搬送トレイを、四角形状の枠体と、枠体の対向する枠辺と枠辺の間に、その両端を枠体の各枠辺と弾性部材を介して連結することでテンションを付加して架設した薄体状部材とから構成し、前記薄体状部材を、一方の対向する枠辺と枠辺の間に他方の枠辺に平行に3本以上、他方の対向する枠辺と枠辺の間に一方の枠辺に平行に2本以上、架設して、個々の薄体状部材を、基板が搬送トレイに載置されている状態を形成するための保持部材として機能させるとともに、基板における2つ以上の蒸着被膜形成領域を画定するためのマスク部材として機能させ、基板の下方から蒸着被膜を形成することを特徴とする。
また、本発明の搬送トレイは、請求項2記載の通り、基板を水平に維持して真空蒸着装置の蒸着室に搬送し、基板に蒸着被膜を形成するために用いられる搬送トレイであって、四角形状の枠体と、枠体の対向する枠辺と枠辺の間に、その両端を枠体の各枠辺と弾性部材を介して連結することでテンションを付加して架設した薄体状部材とから構成され、前記薄体状部材を、一方の対向する枠辺と枠辺の間に他方の枠辺に平行に3本以上、他方の対向する枠辺と枠辺の間に一方の枠辺に平行に2本以上、架設して、個々の薄体状部材を、基板が搬送トレイに載置されている状態を形成するための保持部材として機能させるとともに、基板における2つ以上の蒸着被膜形成領域を画定するためのマスク部材として機能させるようにしたことを特徴とする。
The method of forming a vapor deposition film on the substrate of the present invention based on the above knowledge is as described in claim 1, wherein the substrate is horizontally maintained and conveyed to a vapor deposition chamber of a vacuum vapor deposition apparatus, and the vapor deposition film is applied to the substrate. By connecting the both ends of each of the conveyance trays used for forming a rectangular frame between the frame sides of the frame body and the frame sides through elastic members. The thin member is constructed with a tension applied, and three or more thin members are arranged in parallel between the opposite frame sides and the other frame side. Two or more frames are installed between the frame sides in parallel with one of the frame sides, and each thin member is used as a holding member for forming a state in which the substrate is placed on the transport tray. As a mask member for functioning and defining two or more vapor deposition film formation regions in a substrate It is ability, and forming a vapor deposited film from below the substrate.
The transport tray of the present invention is a transport tray used for forming a deposited film on the substrate by keeping the substrate horizontal and transporting it to the deposition chamber of the vacuum deposition apparatus, as described in claim 2. A rectangular frame, and a thin frame that is constructed with tension applied by connecting both ends of the frame to the opposite sides of the frame via elastic members. The thin member is composed of three or more parallel to the other frame side between one opposing frame side and one of the other thin frame members between the other opposing frame side and the frame side. Two or more pieces are installed in parallel to the frame side, and each thin member functions as a holding member for forming a state where the substrate is placed on the transport tray, and two or more members on the substrate are provided. It is made to function as a mask member for demarcating a deposited film formation region To.

本発明によれば、簡易な構成で、熱負荷によるガラス基板の割れなどを誘発することなく、1枚のガラス基板から複数枚のパネルを省エネルギーのもとに調製することを可能にする、基板への蒸着被膜の形成方法および当該方法を実施するための搬送トレイが提供される。   According to the present invention, it is possible to prepare a plurality of panels from a single glass substrate with energy saving without inducing a crack of the glass substrate due to a thermal load with a simple configuration. A method for forming a vapor-deposited film on the substrate and a transport tray for carrying out the method are provided.

以下、本発明の基板への蒸着被膜の形成方法を、プラズマディスプレイパネルを製造する際の、ガラス基板にMgO被膜を形成する場合を例にとって図面を参照しながら説明する。   Hereinafter, a method for forming a vapor deposition film on a substrate of the present invention will be described with reference to the drawings, taking as an example the case of forming an MgO film on a glass substrate when manufacturing a plasma display panel.

図1は、本発明の基板への蒸着被膜の形成方法を実施するための搬送トレイの一実施形態の概略平面図である。図1に示した搬送トレイAは、ステンレスやチタンなどからなる四角形状の枠体1と、枠体1の対向する枠辺と枠辺の間に、その両端を枠体1の各枠辺と弾性部材としてのスプリング3を介して連結することでテンションを付加して架設した薄体状部材2とから構成される。薄体状部材2は、図1における横方向に対向する枠辺と枠辺の間に縦方向の枠辺に平行に3本、縦方向の対向する枠辺と枠辺の間に横方向の枠辺に平行に4本、架設されている。   FIG. 1 is a schematic plan view of an embodiment of a transport tray for carrying out the method for forming a vapor deposition film on a substrate of the present invention. The transport tray A shown in FIG. 1 includes a rectangular frame 1 made of stainless steel, titanium, or the like, and between the opposite frame sides of the frame 1, and both ends of each frame side of the frame 1. It is composed of a thin-shaped member 2 that is constructed with a tension applied by connecting via a spring 3 as an elastic member. The thin member 2 has three horizontal sides opposite to each other in the horizontal direction in FIG. 1 in parallel to the vertical frame sides and a horizontal direction between the vertical side frames and the frame sides. Four are installed in parallel to the frame side.

図2は、図1に示した搬送トレイAにガラス基板Xを載置した状態を示す概略平面図である。本発明においては、個々の薄体状部材2を、ガラス基板Xが搬送トレイAに載置されている状態を形成するための保持部材として機能させるとともに、ガラス基板Xにおける6つの蒸着被膜形成領域(斜線で示すYの部分)を画定するためのマスク部材として機能させる。これにより、大型のガラス基板を加熱して各蒸着被膜形成領域にMgO被膜を形成する際でも、枠体を加熱する必要がないので、省エネルギー化を図ることができる。加えて、枠体の熱歪を抑制することができる。また、両端にテンションを付加した薄体状部材が、ガラス基板を搬送トレイにセットすることで初期に発生する機械応力を緩和する。また、薄体状であることで熱容量が小さいことから、ガラス基板との温度差が小さくなるので、ガラス基板に発生する熱応力を軽減するとともに、ガラス基板に発生する熱応力を緩和する。さらに、ガラス基板の高熱による撓みを均等に吸収することで熱のびによる機械応力も緩和する。従って、特許文献1に記載の方法のように、ガラス基板を枠体の内周部に設けた窓枠状の基板受けに載置するといった態様の他、薄体状部材をガラス基板の保持部材として機能させる場合であっても、その両端を枠体の各枠辺と弾性部材を介さず固定するといった態様や、一方の端部のみ枠体の枠辺と弾性部材を介して連結することでテンションを付加し、他方の端部は枠体の枠辺と弾性部材を介さず固定するといった態様において起こりうる熱負荷によるガラス基板の割れなどを抑制することができる。   FIG. 2 is a schematic plan view showing a state where the glass substrate X is placed on the transport tray A shown in FIG. In the present invention, each thin member 2 functions as a holding member for forming a state in which the glass substrate X is placed on the transport tray A, and six vapor-deposited film forming regions in the glass substrate X are used. It is made to function as a mask member for demarcating (the Y portion shown by oblique lines). Thereby, even when a large glass substrate is heated to form an MgO film in each vapor deposition film forming region, it is not necessary to heat the frame body, so that energy saving can be achieved. In addition, the thermal distortion of the frame can be suppressed. Moreover, the thin-shaped member which added tension to both ends relieves the mechanical stress which generate | occur | produces initially by setting a glass substrate to a conveyance tray. Further, since the heat capacity is small due to the thin body shape, the temperature difference with the glass substrate is reduced, so that the thermal stress generated in the glass substrate is reduced and the thermal stress generated in the glass substrate is reduced. Furthermore, the mechanical stress due to heat spread is alleviated by evenly absorbing the bending of the glass substrate due to high heat. Therefore, as in the method described in Patent Document 1, in addition to a mode in which the glass substrate is placed on a window frame-shaped substrate receiver provided on the inner peripheral portion of the frame, the thin member is a holding member for the glass substrate. Even if it is made to function as, the both ends are fixed to each frame side of the frame without an elastic member, or only one end is connected to the frame side of the frame via an elastic member. It is possible to suppress the breakage of the glass substrate due to a thermal load that may occur in an aspect in which tension is applied and the other end is fixed without interposing the frame side of the frame without an elastic member.

薄体状部材の熱膨張率をガラス基板の熱膨張率の±20%とすることで、ガラス基板を加熱してMgO被膜を形成する際、ガラス基板に発生する熱応力や機械応力をより効果的に緩和することができる。従って、熱負荷によるガラス基板の割れなどをより効果的に抑制することができる。例えば、ガラス基板としてホウケイ酸ガラスを用いる場合、薄体状部材はホウケイ酸ガラスと熱膨張率が近似するニッケル鉄合金からなるものが望ましい。   By making the thermal expansion coefficient of the thin body member ± 20% of the thermal expansion coefficient of the glass substrate, the thermal stress and mechanical stress generated in the glass substrate are more effective when the glass substrate is heated to form the MgO film. Can be relaxed. Therefore, the crack of the glass substrate by a heat load, etc. can be suppressed more effectively. For example, when borosilicate glass is used as the glass substrate, the thin member is preferably made of a nickel-iron alloy whose thermal expansion coefficient approximates that of borosilicate glass.

薄体状部材の厚みは0.1mm〜0.8mmとすることが望ましい。厚みが0.1mmを下回るとガラス基板の保持部材としての機能が十分でなくなるおそれがある一方、厚みが0.8mmを上回ると薄体状部材と薄体状部材の交差部分周囲に隙間が生じ、マスク部分へのMgO成分の回り込み現象(所謂「膜ダレ現象」)が起こることで、ガラス基板における蒸着被膜形成領域への正確なMgO被膜の形成ができなくなるおそれがある。   The thickness of the thin member is preferably 0.1 mm to 0.8 mm. If the thickness is less than 0.1 mm, the function as a glass substrate holding member may not be sufficient. On the other hand, if the thickness exceeds 0.8 mm, a gap is generated around the intersection of the thin member and the thin member. If the MgO component wraps around the mask portion (so-called “film sagging phenomenon”), there is a possibility that an accurate MgO film cannot be formed on the deposited film forming region of the glass substrate.

本発明の基板への蒸着被膜の形成方法を実施するために用いる真空蒸着装置は、図面による説明は省略するが、自体公知のものであってよく、特許文献1に記載されている装置の他、搬送トレイAによって水平に維持された状態で蒸着室に搬送されてきたガラス基板Xに、その下方から、蒸発源から蒸発させたMgO成分を蒸着させてMgO被膜を形成することができる構造を有する装置であれば、どのような装置であってもよい。   The vacuum vapor deposition apparatus used for carrying out the method for forming a vapor deposition film on the substrate of the present invention is not described with reference to the drawings, but may be a publicly known apparatus, other than the apparatus described in Patent Document 1. A structure capable of forming an MgO film by vapor-depositing the MgO component evaporated from the evaporation source on the glass substrate X which has been transported to the deposition chamber while being maintained horizontally by the transport tray A from below. Any device may be used as long as it has a device.

なお、図1に示した搬送トレイAは、ガラス基板Xにおける6つの蒸着被膜形成領域YにMgO被膜を形成することで、1枚のガラス基板Xから6枚のパネルを調製するためのものであるが、薄体状部材2をスプリング3とともに枠体1から着脱自在とし、これらを枠体1の枠辺の任意の位置に任意の本数だけ架設することができるようにすれば、ガラス基板Xに2つ以上の任意の個数かつ任意の大きさの蒸着被膜形成領域Yを画定してMgO被膜を形成することができるので、1枚のガラス基板Xから2枚以上の任意の枚数かつ任意の大きさのパネルを調製することができる。   The transport tray A shown in FIG. 1 is for preparing six panels from one glass substrate X by forming MgO coatings on the six vapor deposition coating formation regions Y on the glass substrate X. However, if the thin member 2 is detachable from the frame body 1 together with the spring 3, and an arbitrary number of them can be installed at arbitrary positions on the frame side of the frame body 1, the glass substrate X An MgO film can be formed by demarcating two or more arbitrary numbers and arbitrary sizes of vapor-deposited film forming regions Y, so that two or more arbitrary numbers and arbitrary numbers can be formed from one glass substrate X. Panels of size can be prepared.

本発明は、簡易な構成で、熱負荷によるガラス基板の割れなどを誘発することなく、1枚のガラス基板から複数枚のパネルを省エネルギーのもとに調製することを可能にする、基板への蒸着被膜の形成方法および当該方法を実施するための搬送トレイを提供することができる点において産業上の利用可能性を有する。   The present invention has a simple configuration and allows a plurality of panels to be prepared from a single glass substrate with energy saving without inducing a crack of the glass substrate due to a thermal load. The present invention has industrial applicability in that it can provide a method for forming a vapor deposition film and a transport tray for carrying out the method.

本発明の基板への蒸着被膜の形成方法を実施するための搬送トレイの一実施形態の概略平面図である。It is a schematic plan view of one Embodiment of the conveyance tray for enforcing the formation method of the vapor deposition film to the board | substrate of this invention. 図1に示した搬送トレイAにガラス基板Xを載置した状態を示す概略平面図である。It is a schematic plan view which shows the state which mounted the glass substrate X in the conveyance tray A shown in FIG.

符号の説明Explanation of symbols

A 搬送トレイ
1 枠体
2 薄体状部材
3 スプリング
X ガラス基板
Y 蒸着被膜形成領域
A Transport tray 1 Frame 2 Thin body member 3 Spring X Glass substrate Y Deposition film formation area

Claims (2)

基板を水平に維持して真空蒸着装置の蒸着室に搬送し、基板に蒸着被膜を形成するために用いられる搬送トレイを、四角形状の枠体と、枠体の対向する枠辺と枠辺の間に、その両端を枠体の各枠辺と弾性部材を介して連結することでテンションを付加して架設した薄体状部材とから構成し、前記薄体状部材を、一方の対向する枠辺と枠辺の間に他方の枠辺に平行に3本以上、他方の対向する枠辺と枠辺の間に一方の枠辺に平行に2本以上、架設して、個々の薄体状部材を、基板が搬送トレイに載置されている状態を形成するための保持部材として機能させるとともに、基板における2つ以上の蒸着被膜形成領域を画定するためのマスク部材として機能させ、基板の下方から蒸着被膜を形成することを特徴とする基板への蒸着被膜の形成方法。   Maintaining the substrate horizontally and transporting it to the vapor deposition chamber of the vacuum vapor deposition apparatus, the transport tray used to form the vapor deposition film on the substrate is divided into a rectangular frame, the opposing frame sides of the frame and the frame sides In between, the two ends are connected to each frame side of the frame body via an elastic member to form a thin body member that is installed with tension applied thereto, and the thin body member is connected to one opposing frame. 3 or more parallel to the other frame side between the side and the frame side, and 2 or more parallel to the one frame side between the other opposing frame side and the frame side to form individual thin bodies The member functions as a holding member for forming a state in which the substrate is placed on the transport tray, and also functions as a mask member for defining two or more vapor deposition film forming regions on the substrate. A method for forming a deposited film on a substrate, comprising forming a deposited film from the substrate. 基板を水平に維持して真空蒸着装置の蒸着室に搬送し、基板に蒸着被膜を形成するために用いられる搬送トレイであって、四角形状の枠体と、枠体の対向する枠辺と枠辺の間に、その両端を枠体の各枠辺と弾性部材を介して連結することでテンションを付加して架設した薄体状部材とから構成され、前記薄体状部材を、一方の対向する枠辺と枠辺の間に他方の枠辺に平行に3本以上、他方の対向する枠辺と枠辺の間に一方の枠辺に平行に2本以上、架設して、個々の薄体状部材を、基板が搬送トレイに載置されている状態を形成するための保持部材として機能させるとともに、基板における2つ以上の蒸着被膜形成領域を画定するためのマスク部材として機能させるようにしたことを特徴とする搬送トレイ。   A transport tray used for maintaining a substrate horizontally and transporting it to a deposition chamber of a vacuum deposition apparatus and forming a deposition film on the substrate, comprising a rectangular frame, opposing frame sides and a frame It is composed of a thin member that is constructed with a tension applied by connecting both ends of the frame to each frame side of the frame via an elastic member. Three or more parallel to the other frame side between the frame sides and two or more parallel to one frame side between the other opposing frame sides and the frame sides. The body member functions as a holding member for forming a state in which the substrate is placed on the transport tray, and also functions as a mask member for defining two or more vapor deposition film forming regions on the substrate. A transport tray characterized by that.
JP2005084627A 2004-07-06 2005-03-23 Method for depositing vapor-deposited film on substrate and transport tray Pending JP2006045663A (en)

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WO2013140599A1 (en) * 2012-03-23 2013-09-26 株式会社島津製作所 Film forming mask and film forming apparatus
KR101343041B1 (en) * 2012-02-22 2013-12-18 (주)에스엔텍 Tray transfer device
KR101366840B1 (en) 2012-03-30 2014-02-26 (주)에스엔텍 Tray for high temperature process
KR20140058902A (en) * 2012-11-07 2014-05-15 주성엔지니어링(주) Substrate tray and substrate processing apparatus comprising the same
KR101904802B1 (en) * 2012-03-07 2018-10-05 주성엔지니어링(주) Substrate tray and substrate processing apparatus comprising the same

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JP2000199046A (en) * 1999-01-07 2000-07-18 Ulvac Japan Ltd Masking device in vacuum vapor deposition device
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101343041B1 (en) * 2012-02-22 2013-12-18 (주)에스엔텍 Tray transfer device
KR101904802B1 (en) * 2012-03-07 2018-10-05 주성엔지니어링(주) Substrate tray and substrate processing apparatus comprising the same
WO2013140599A1 (en) * 2012-03-23 2013-09-26 株式会社島津製作所 Film forming mask and film forming apparatus
KR101366840B1 (en) 2012-03-30 2014-02-26 (주)에스엔텍 Tray for high temperature process
KR20140058902A (en) * 2012-11-07 2014-05-15 주성엔지니어링(주) Substrate tray and substrate processing apparatus comprising the same
CN104937707A (en) * 2012-11-07 2015-09-23 周星工程股份有限公司 Substrate tray and substrate processing apparatus including same
KR101698536B1 (en) 2012-11-07 2017-01-20 주성엔지니어링(주) Substrate tray and substrate processing apparatus comprising the same

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