JP2006037189A - 蒸着用ボート - Google Patents
蒸着用ボート Download PDFInfo
- Publication number
- JP2006037189A JP2006037189A JP2004221192A JP2004221192A JP2006037189A JP 2006037189 A JP2006037189 A JP 2006037189A JP 2004221192 A JP2004221192 A JP 2004221192A JP 2004221192 A JP2004221192 A JP 2004221192A JP 2006037189 A JP2006037189 A JP 2006037189A
- Authority
- JP
- Japan
- Prior art keywords
- boat
- vapor deposition
- lid
- fixing member
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 101
- 239000000463 material Substances 0.000 claims abstract description 75
- 238000001704 evaporation Methods 0.000 claims description 22
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 20
- 229910052721 tungsten Inorganic materials 0.000 claims description 20
- 239000010937 tungsten Substances 0.000 claims description 20
- 230000008020 evaporation Effects 0.000 claims description 19
- 229910052715 tantalum Inorganic materials 0.000 claims description 8
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 6
- 239000000126 substance Substances 0.000 abstract description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 11
- 229910052791 calcium Inorganic materials 0.000 description 11
- 239000011575 calcium Substances 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- 238000002844 melting Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 229910052720 vanadium Inorganic materials 0.000 description 4
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000010000 carbonizing Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000009864 tensile test Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
【解決手段】蒸着物質が載置されるボート2と、蒸着物質5の蒸気が通過する開口4を有し、前記ボート2の縁部に対して一部が重畳される蓋体1と、前記ボート2と前記蓋体1との重畳部に配設され、前記ボート2及び前記蓋体1よりも塑性変形し易く、破壊靱性が高い材料により形成された固定部材3と、を備えた蒸着用ボートを構成する。
【選択図】図1
Description
蒸着用ボートの従来例として図6に示すクヌードセン型ボートが引用されている。
蒸発源材料を加熱して蒸発させる抵抗加熱式の蒸発源加熱ヒータとして、図7に示す両端に接続端子22aおよび22bを有し、中央部分に蒸発口23を設けた上部ボート22と、同じく両側に接続端子21aおよび21bを有し蒸発源材料を収容する下部ボート21とからなり、該上部ボート22と下部ボート21とは各接続端子を揃えて重ね合わされて一体構造となることを特徴とした蒸発源加熱ヒータ212が示されている。
図8は特開平11-246963号公報の第1の実施形態の蒸着用ボートの概略断面図である。該発明に係る実施形態の蒸着用ボートは、上板31、遮蔽板32、底板33よりなる少なくとも3枚以上の部材より構成され、上板31、遮蔽板32にはそれぞれ開口部34、35が設けられている。その開口部34、35は、各部材を組み立てた際に一致しないように配置され、飛沫粒子が直接飛んで行かないようになっている。さらに、組み立てる際に遮蔽板32及び底板33が摺動可能であり、組み立てた際に各部材を一つに固定するために(各部材がバラバラにならないために)、上板1の2つの長辺に折り返し突起部36が設けられおり、その突起部36は底板33側に向けて折り曲げられている。
厚さ0.2mmのタングステン製の板を用いて絞り加工により縦70mm、横20mm深さ7mmの窪み部を形成した縦100mm、横30mmのボートと、同形状の蓋を作製した。曲げ部の曲率は7mm以上とした。さらに蓋にドリル加工により1.0mm径の開口を中央付近に10mm間隔で3つ形成して蓋体を作製した。一方、厚さ0.2mmのタンタル板を用いて、内側の曲率約1mm、幅2mm、長さ70mmのU字型の固定部材を作製した。ボートと蓋体との重畳部に関して、固定部材で固定する側の重畳部の幅は5mm程度、電極端子と接続する側の重畳部の幅は15mm程度とした。
2・・・ボート
3、3’・・・固定部材
4・・・開口
5・・・蒸着物質
6・・・遮蔽部材
Claims (10)
- 蒸着物質が載置されるボートと、
蒸着物質の蒸気が通過する開口を有し、前記ボートの縁部に対して一部が重畳される蓋体と、
前記ボートと前記蓋体との重畳部に配設され、前記ボート及び前記蓋体よりも塑性変形し易く、破壊靱性が高い材料により形成された固定部材と、を備えたことを特徴とする蒸着用ボート。 - 前記ボートと前記蓋体との間に蒸着物質を収容する中空部が形成されていることを特徴とする請求項1に記載の蒸着用ボート。
- 前記ボート及び前記蓋体は導電性材料により形成されていることを特徴とする請求項1または請求項2に記載の蒸着用ボート。
- 前記ボート及び前記蓋体はタングステンにより形成されていることを特徴とする請求項1乃至請求項3のいずれかに記載の蒸着用ボート。
- 前記固定部材はタンタルにより形成されていることを特徴とする請求項1乃至請求項4のいずれかに記載の蒸着用ボート。
- 前記固定部材は、前記ボート及び前記蓋体を押圧して両者を挟持する挟持部を有していることを特徴とする請求項1乃至請求項5のいずれかに記載の蒸着用ボート。
- 前記挟持部は前記ボートを押圧する部位よりも前記蓋体を押圧する部位の方がボートの中央側に位置していることを特徴とする請求項1乃至請求項6のいずれかに記載の蒸着用ボート。
- 前記蓋体もしくは前記ボートは少なくとも中空部の形成領域において平板状を成していることを特徴とする請求項2乃至請求項7のいずれかに記載の蒸着用ボート。
- 前記中空部の外周に沿って配置され、前記ボート及び前記蓋体の内面に接触される遮蔽部材を備えたことを特徴とする請求項2乃至請求項8のいずれかに記載の蒸着用ボート。
- 前記遮蔽部材はタングステンにより形成されていることを特徴とする請求項9に記載の蒸着用ボート。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004221192A JP4502738B2 (ja) | 2004-07-29 | 2004-07-29 | 蒸着用ボート |
US11/193,286 US20060027170A1 (en) | 2004-07-29 | 2005-07-29 | Deposition boat and manufacturing method of organic EL display therewith |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004221192A JP4502738B2 (ja) | 2004-07-29 | 2004-07-29 | 蒸着用ボート |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006037189A true JP2006037189A (ja) | 2006-02-09 |
JP4502738B2 JP4502738B2 (ja) | 2010-07-14 |
Family
ID=35756180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004221192A Expired - Lifetime JP4502738B2 (ja) | 2004-07-29 | 2004-07-29 | 蒸着用ボート |
Country Status (2)
Country | Link |
---|---|
US (1) | US20060027170A1 (ja) |
JP (1) | JP4502738B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008032666A1 (en) * | 2006-09-14 | 2008-03-20 | Ulvac, Inc. | Vacuum evaporation processing equipment |
WO2008032668A1 (en) * | 2006-09-11 | 2008-03-20 | Ulvac, Inc. | Vacuum evaporation processing equipment |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104178734B (zh) * | 2014-07-21 | 2016-06-15 | 京东方科技集团股份有限公司 | 蒸发镀膜装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56116874A (en) * | 1980-02-19 | 1981-09-12 | Citizen Watch Co Ltd | Boat for evaporation |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5274580A (en) * | 1975-12-19 | 1977-06-22 | Hitachi Ltd | Boat for vacuum evaporation |
-
2004
- 2004-07-29 JP JP2004221192A patent/JP4502738B2/ja not_active Expired - Lifetime
-
2005
- 2005-07-29 US US11/193,286 patent/US20060027170A1/en not_active Abandoned
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56116874A (en) * | 1980-02-19 | 1981-09-12 | Citizen Watch Co Ltd | Boat for evaporation |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008032668A1 (en) * | 2006-09-11 | 2008-03-20 | Ulvac, Inc. | Vacuum evaporation processing equipment |
US8375891B2 (en) | 2006-09-11 | 2013-02-19 | Ulvac, Inc. | Vacuum vapor processing apparatus |
WO2008032666A1 (en) * | 2006-09-14 | 2008-03-20 | Ulvac, Inc. | Vacuum evaporation processing equipment |
Also Published As
Publication number | Publication date |
---|---|
JP4502738B2 (ja) | 2010-07-14 |
US20060027170A1 (en) | 2006-02-09 |
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