JP2005529730A5 - - Google Patents
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- Publication number
- JP2005529730A5 JP2005529730A5 JP2004512886A JP2004512886A JP2005529730A5 JP 2005529730 A5 JP2005529730 A5 JP 2005529730A5 JP 2004512886 A JP2004512886 A JP 2004512886A JP 2004512886 A JP2004512886 A JP 2004512886A JP 2005529730 A5 JP2005529730 A5 JP 2005529730A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- pressure
- container
- mixture
- purge gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 25
- 238000000034 method Methods 0.000 claims 19
- 238000010926 purge Methods 0.000 claims 8
- 239000000203 mixture Substances 0.000 claims 7
- 239000003344 environmental pollutant Substances 0.000 claims 6
- 231100000719 pollutant Toxicity 0.000 claims 6
- 238000005202 decontamination Methods 0.000 claims 5
- 230000003588 decontaminative effect Effects 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- 230000003213 activating effect Effects 0.000 claims 1
- 239000003570 air Substances 0.000 claims 1
- 229910021529 ammonia Inorganic materials 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 230000007423 decrease Effects 0.000 claims 1
- 229910000078 germane Inorganic materials 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/173,335 US6638341B1 (en) | 2002-06-14 | 2002-06-14 | Method for rapid activation or preconditioning of porous gas purification substrates |
| PCT/US2003/018432 WO2003105995A1 (en) | 2002-06-14 | 2003-06-11 | Method for rapid activation or preconditioning of porous gas purification substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005529730A JP2005529730A (ja) | 2005-10-06 |
| JP2005529730A5 true JP2005529730A5 (https=) | 2006-10-19 |
Family
ID=29250091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004512886A Pending JP2005529730A (ja) | 2002-06-14 | 2003-06-11 | 多孔性ガス精製基材の迅速活性化または前調整の方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6638341B1 (https=) |
| EP (1) | EP1549414A4 (https=) |
| JP (1) | JP2005529730A (https=) |
| CN (1) | CN100340321C (https=) |
| AU (1) | AU2003245449A1 (https=) |
| WO (1) | WO2003105995A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050229947A1 (en) * | 2002-06-14 | 2005-10-20 | Mykrolis Corporation | Methods of inserting or removing a species from a substrate |
| US6638341B1 (en) * | 2002-06-14 | 2003-10-28 | Aeronex, Inc. | Method for rapid activation or preconditioning of porous gas purification substrates |
| US6913654B2 (en) * | 2003-06-02 | 2005-07-05 | Mykrolis Corporation | Method for the removal of airborne molecular contaminants using water gas mixtures |
| US20060285091A1 (en) * | 2003-07-21 | 2006-12-21 | Parekh Bipin S | Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application |
| US7384149B2 (en) * | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
| KR20120099802A (ko) * | 2004-02-05 | 2012-09-11 | 엔테그리스, 아이엔씨. | 웨이퍼 반송 용기의 세정 |
| KR20080034492A (ko) * | 2005-08-03 | 2008-04-21 | 엔테그리스, 아이엔씨. | 이송 용기 |
| EP3775076A4 (en) | 2018-03-28 | 2021-12-22 | FUJIFILM Electronic Materials U.S.A, Inc. | CHEMICAL-MECHANICAL BARRIER POLISHING MUD FOR RUTHENIUM |
| FR3087670B1 (fr) | 2018-10-26 | 2020-10-23 | Air Liquide | Procede de conditionnement d'un recipient comprenant un materiau granulaire |
| CN111912939A (zh) * | 2020-07-30 | 2020-11-10 | 上海化工研究院有限公司 | 一种用于高效评价烯烃净化剂性能的评价装置及评价方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US596823A (en) * | 1898-01-04 | Webster davis | ||
| JPS61157328A (ja) * | 1984-12-28 | 1986-07-17 | Hitachi Zosen Corp | 乾式ドロマイト法による排ガスの浄化方法 |
| JPS6291408A (ja) * | 1985-10-16 | 1987-04-25 | Mitsubishi Heavy Ind Ltd | 酸素含有窒素ガスの脱酸素方法 |
| US5013335A (en) * | 1987-06-30 | 1991-05-07 | Uop | Process for sequestering ammonia and the odor associated therewith |
| US5160512A (en) * | 1992-01-13 | 1992-11-03 | Cleveland State University | Gas separation process |
| JPH0787889B2 (ja) * | 1992-02-08 | 1995-09-27 | 大同ほくさん株式会社 | 混合ガスの分離方法およびそれに用いる装置 |
| US5968232A (en) * | 1993-03-08 | 1999-10-19 | Whitlock; David R. | Method for ammonia production |
| US5470377A (en) * | 1993-03-08 | 1995-11-28 | Whitlock; David R. | Separation of solutes in gaseous solvents |
| US5540757A (en) * | 1995-05-15 | 1996-07-30 | Jordan Holding Company | Method for preconditioning adsorbent |
| JP4355834B2 (ja) * | 1999-08-20 | 2009-11-04 | 独立行政法人 日本原子力研究開発機構 | ガス成分の分離除去または回収する方法および装置 |
| US6221132B1 (en) | 1999-10-14 | 2001-04-24 | Air Products And Chemicals, Inc. | Vacuum preparation of hydrogen halide drier |
| US6638341B1 (en) * | 2002-06-14 | 2003-10-28 | Aeronex, Inc. | Method for rapid activation or preconditioning of porous gas purification substrates |
-
2002
- 2002-06-14 US US10/173,335 patent/US6638341B1/en not_active Expired - Lifetime
-
2003
- 2003-06-11 AU AU2003245449A patent/AU2003245449A1/en not_active Abandoned
- 2003-06-11 EP EP03739089A patent/EP1549414A4/en not_active Withdrawn
- 2003-06-11 WO PCT/US2003/018432 patent/WO2003105995A1/en not_active Ceased
- 2003-06-11 CN CNB03813800XA patent/CN100340321C/zh not_active Expired - Lifetime
- 2003-06-11 JP JP2004512886A patent/JP2005529730A/ja active Pending
- 2003-10-23 US US10/692,019 patent/US6869463B2/en not_active Expired - Lifetime
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