JP2005520007A - カチオン系光重合のための促進物質 - Google Patents

カチオン系光重合のための促進物質 Download PDF

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Publication number
JP2005520007A
JP2005520007A JP2003574705A JP2003574705A JP2005520007A JP 2005520007 A JP2005520007 A JP 2005520007A JP 2003574705 A JP2003574705 A JP 2003574705A JP 2003574705 A JP2003574705 A JP 2003574705A JP 2005520007 A JP2005520007 A JP 2005520007A
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Japan
Prior art keywords
photopolymerization
composition capable
cation
substituted
cation according
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Pending
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JP2003574705A
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English (en)
Japanese (ja)
Inventor
クリヴェッロ，ジェイムズ，ブィ
Original Assignee
レンセラール ポリテクニック インスティチュート
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Publication of JP2005520007A publication Critical patent/JP2005520007A/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
JP2003574705A 2002-03-08 2003-03-10 カチオン系光重合のための促進物質 Pending JP2005520007A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US36268002P 2002-03-08 2002-03-08
PCT/US2003/007227 WO2003076491A1 (fr) 2002-03-08 2003-03-10 Accelerateurs de photopolymerisation cationique

Publications (1)

Publication Number Publication Date
JP2005520007A true JP2005520007A (ja) 2005-07-07

Family

ID=27805211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003574705A Pending JP2005520007A (ja) 2002-03-08 2003-03-10 カチオン系光重合のための促進物質

Country Status (6)

Country Link
US (1) US6863701B2 (fr)
EP (1) EP1483310A1 (fr)
JP (1) JP2005520007A (fr)
AU (1) AU2003218051A1 (fr)
CA (1) CA2477135A1 (fr)
WO (1) WO2003076491A1 (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009101913A1 (fr) * 2008-02-12 2009-08-20 Fujifilm Corporation Composition durcissable pour nano-impression et procédé de formation de motif
DE102011001432A1 (de) 2010-03-22 2011-11-24 Denso International America, Inc. Steuerventil für Sekundärluft
JP2012140502A (ja) * 2010-12-28 2012-07-26 Nitto Denko Corp 光硬化性樹脂組成物および光学材料
WO2013027833A1 (fr) * 2011-08-25 2013-02-28 東洋インキＳｃホールディングス株式会社 Composition photopolymérisable, agent de revêtement photopolymérisable, stratifié et plaque polarisante
JP2016018093A (ja) * 2014-07-09 2016-02-01 東レ株式会社 反射防止膜用樹脂組成物、それを用いた反射防止膜の製造方法およびパターンの製造方法、ならびに固体撮像素子
JP2016507606A (ja) * 2012-12-17 2016-03-10 エボニック デグサ ゲーエムベーハーＥｖｏｎｉｋ Ｄｅｇｕｓｓａ ＧｍｂＨ 反応性エポキシ系における置換されたベンジルアルコールの使用
JP2020125435A (ja) * 2019-02-06 2020-08-20 株式会社Adeka 組成物、その硬化物、および硬化物の製造方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8017795B2 (en) * 2005-04-21 2011-09-13 Ndsu Research Foundation Radiation curable polymer films having improved laser ablation properties and radiation curable sensitizers therefor
US7807230B2 (en) * 2005-06-16 2010-10-05 Rensselaer Polytechnic Institute Curcumin and curcuminoid compounds, and use thereof as photosensitizers of onium salts
US8617795B2 (en) * 2006-02-16 2013-12-31 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition and pattern forming method using the same
US8114567B2 (en) 2006-04-21 2012-02-14 Ndsu Research Foundation Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same
US7744803B2 (en) * 2006-08-02 2010-06-29 Shawcor Ltd. Photo-crosslinkable polyolefin compositions
JP5881948B2 (ja) * 2007-11-27 2016-03-09 スリーディー システムズ インコーポレーテッド 高透明性を有する三次元物品を製造するための光硬化型樹脂組成物
US20090162797A1 (en) * 2007-12-19 2009-06-25 Canon Kabushiki Kaisha Method of manufacturing liquid ejection head
DE102008000903A1 (de) 2008-04-01 2009-10-08 Evonik Goldschmidt Gmbh Neue Organosiloxangruppen tragende Polyetheralkohole durch Alkoxylierung epoxidfunktioneller (Poly)Organosiloxane an Doppelmetallcyanid (DMC)-Katalysatoren, sowie Verfahren zu deren Herstellung
JP5992930B2 (ja) 2011-02-23 2016-09-14 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ スルホニウムサルフェートならびにその製造および使用
US9631048B2 (en) 2012-04-19 2017-04-25 Basf Se Sulfonium compounds, their preparation and use
US9556094B2 (en) 2012-12-26 2017-01-31 Cheil Industries, Inc. Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
WO2015019616A1 (fr) 2013-08-07 2015-02-12 Toyo Gosei Co., Ltd. Réactif pour améliorer la génération d'espèces chimiques
EP3271428B1 (fr) 2015-03-20 2020-11-11 Blue Cube IP LLC Compositions durcissables
DE102015114094A1 (de) * 2015-08-25 2017-03-02 Alanod Gmbh & Co. Kg Reflektierendes Verbundmaterial mit lackiertem Aluminium-Träger und mit einer Silber-Reflexionsschicht und Verfahren zu dessen Herstellung

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3591661A (en) * 1969-07-23 1971-07-06 Du Pont Polymeric photosensitizers
US4058400A (en) * 1974-05-02 1977-11-15 General Electric Company Cationically polymerizable compositions containing group VIa onium salts
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
GB8332073D0 (en) * 1983-12-01 1984-01-11 Ciba Geigy Ag Polymerisable compositions
US4694029A (en) * 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
US4921589A (en) * 1988-12-20 1990-05-01 Allied-Signal Inc. Polysiloxane bound photosensitizer for producing singlet oxygen
CA2008848A1 (fr) 1989-03-30 1990-09-30 Karen D. Riding Promoteurs et accelerateur de polymerisation a l'epoxysiloxane pour les systemes de polymerisation cationiques a l'uv
DE69630959T2 (de) * 1995-08-22 2004-06-03 Nippon Soda Co. Ltd. Neue sulfoniumsalzverbindungen, polymerisierungsinitiator, härtbare zusammensetzung und stärkungsverfahren
DE69731542T2 (de) * 1996-09-19 2005-05-19 Nippon Soda Co. Ltd. Photokatalytische zusammensetzung
US6025406A (en) * 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5998495A (en) * 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6287745B1 (en) 1998-02-18 2001-09-11 Dsm N.V. Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound
WO2000064572A2 (fr) * 1999-04-26 2000-11-02 Rensselaer Polytechnic Institute Microbilles polymères à fonctionnalité époxy

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009101913A1 (fr) * 2008-02-12 2009-08-20 Fujifilm Corporation Composition durcissable pour nano-impression et procédé de formation de motif
JP2009218550A (ja) * 2008-02-12 2009-09-24 Fujifilm Corp ナノインプリント用硬化性組成物およびパターン形成方法
US8025833B2 (en) 2008-02-12 2011-09-27 Fujifilm Corporation Curable composition for nanoimprint, and patterning method
DE102011001432A1 (de) 2010-03-22 2011-11-24 Denso International America, Inc. Steuerventil für Sekundärluft
JP2012140502A (ja) * 2010-12-28 2012-07-26 Nitto Denko Corp 光硬化性樹脂組成物および光学材料
US8722769B2 (en) 2010-12-28 2014-05-13 Nitto Denko Corporation Light-curing resin composition and optical material
CN103764708A (zh) * 2011-08-25 2014-04-30 东洋油墨Sc控股株式会社 光聚合性组合物、光聚合性涂覆剂、层叠体及偏光板
WO2013027833A1 (fr) * 2011-08-25 2013-02-28 東洋インキＳｃホールディングス株式会社 Composition photopolymérisable, agent de revêtement photopolymérisable, stratifié et plaque polarisante
KR20140089337A (ko) 2011-08-25 2014-07-14 토요잉크Sc홀딩스주식회사 광중합성 조성물, 광중합성 코팅제, 적층체 및 편광판
JP2016507606A (ja) * 2012-12-17 2016-03-10 エボニック デグサ ゲーエムベーハーＥｖｏｎｉｋ Ｄｅｇｕｓｓａ ＧｍｂＨ 反応性エポキシ系における置換されたベンジルアルコールの使用
US10472460B2 (en) 2012-12-17 2019-11-12 Evonik Degussa Gmbh Use of substituted benzyl alcohols in reactive epoxy systems
JP2016018093A (ja) * 2014-07-09 2016-02-01 東レ株式会社 反射防止膜用樹脂組成物、それを用いた反射防止膜の製造方法およびパターンの製造方法、ならびに固体撮像素子
JP2020125435A (ja) * 2019-02-06 2020-08-20 株式会社Adeka 組成物、その硬化物、および硬化物の製造方法
JP7558643B2 (ja) 2019-02-06 2024-10-01 株式会社Adeka 組成物、部材、および部材の製造方法

Also Published As

Publication number Publication date
AU2003218051A1 (en) 2003-09-22
US20030176519A1 (en) 2003-09-18
EP1483310A1 (fr) 2004-12-08
US6863701B2 (en) 2005-03-08
WO2003076491A1 (fr) 2003-09-18
CA2477135A1 (fr) 2003-09-18

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