JP2005519346A5 - - Google Patents
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- Publication number
- JP2005519346A5 JP2005519346A5 JP2003575187A JP2003575187A JP2005519346A5 JP 2005519346 A5 JP2005519346 A5 JP 2005519346A5 JP 2003575187 A JP2003575187 A JP 2003575187A JP 2003575187 A JP2003575187 A JP 2003575187A JP 2005519346 A5 JP2005519346 A5 JP 2005519346A5
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen
- adjacent
- bonds
- fluorine
- longer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000001257 hydrogen Substances 0.000 claims 19
- 229910052739 hydrogen Inorganic materials 0.000 claims 19
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 13
- 239000011737 fluorine Substances 0.000 claims 13
- 229910052731 fluorine Inorganic materials 0.000 claims 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 7
- 150000002431 hydrogen Chemical class 0.000 claims 7
- 239000001301 oxygen Substances 0.000 claims 7
- 229910052760 oxygen Inorganic materials 0.000 claims 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 6
- 125000004122 cyclic group Chemical group 0.000 claims 6
- 239000000203 mixture Substances 0.000 claims 5
- 230000005855 radiation Effects 0.000 claims 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 3
- 229910052799 carbon Inorganic materials 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 229910052757 nitrogen Inorganic materials 0.000 claims 3
- 230000005670 electromagnetic radiation Effects 0.000 claims 2
- 238000000605 extraction Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 238000012634 optical imaging Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US36199902P | 2002-03-06 | 2002-03-06 | |
| PCT/US2003/007091 WO2003077034A2 (en) | 2002-03-06 | 2003-03-06 | Fluorine-containing compounds with high transparency in the vacuum ultraviolet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005519346A JP2005519346A (ja) | 2005-06-30 |
| JP2005519346A5 true JP2005519346A5 (https=) | 2006-03-09 |
Family
ID=27805109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003575187A Pending JP2005519346A (ja) | 2002-03-06 | 2003-03-06 | 真空紫外で高い透明性を有するフッ素含有化合物 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US20040009425A1 (https=) |
| EP (1) | EP1480929A2 (https=) |
| JP (1) | JP2005519346A (https=) |
| KR (1) | KR20040096654A (https=) |
| CN (1) | CN1747917A (https=) |
| AU (1) | AU2003218015A1 (https=) |
| TW (1) | TW200304044A (https=) |
| WO (1) | WO2003077034A2 (https=) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005101498A (ja) * | 2003-03-04 | 2005-04-14 | Tokyo Ohka Kogyo Co Ltd | 液浸露光プロセス用浸漬液および該浸漬液を用いたレジストパターン形成方法 |
| US20050164522A1 (en) * | 2003-03-24 | 2005-07-28 | Kunz Roderick R. | Optical fluids, and systems and methods of making and using the same |
| US7763395B2 (en) * | 2003-06-30 | 2010-07-27 | Intel Corporation | Radiation stability of polymer pellicles |
| US8149381B2 (en) | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
| US7316869B2 (en) | 2003-08-26 | 2008-01-08 | Intel Corporation | Mounting a pellicle to a frame |
| TWI439823B (zh) | 2003-08-26 | 2014-06-01 | 尼康股份有限公司 | Optical components and exposure devices |
| EP2261740B1 (en) * | 2003-08-29 | 2014-07-09 | ASML Netherlands BV | Lithographic apparatus |
| US6954256B2 (en) * | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
| ITMI20031914A1 (it) | 2003-10-03 | 2005-04-04 | Solvay Solexis Spa | Perfluoropolieteri. |
| JP2005136374A (ja) * | 2003-10-06 | 2005-05-26 | Matsushita Electric Ind Co Ltd | 半導体製造装置及びそれを用いたパターン形成方法 |
| US7352433B2 (en) | 2003-10-28 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP1528432B1 (en) * | 2003-10-28 | 2010-03-10 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7460206B2 (en) | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| TWI259319B (en) * | 2004-01-23 | 2006-08-01 | Air Prod & Chem | Immersion lithography fluids |
| US20050161644A1 (en) * | 2004-01-23 | 2005-07-28 | Peng Zhang | Immersion lithography fluids |
| US7402377B2 (en) * | 2004-02-20 | 2008-07-22 | E. I. Du Pont De Nemours And Company | Use of perfluoro-n-alkanes in vacuum ultraviolet applications |
| US7473512B2 (en) * | 2004-03-09 | 2009-01-06 | Az Electronic Materials Usa Corp. | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| US20050202351A1 (en) * | 2004-03-09 | 2005-09-15 | Houlihan Francis M. | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| US20050202252A1 (en) * | 2004-03-12 | 2005-09-15 | Alexander Tregub | Use of alternative polymer materials for "soft" polymer pellicles |
| JP4355944B2 (ja) * | 2004-04-16 | 2009-11-04 | 信越化学工業株式会社 | パターン形成方法及びこれに用いるレジスト上層膜材料 |
| KR101421915B1 (ko) * | 2004-06-09 | 2014-07-22 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
| JP2006039129A (ja) * | 2004-07-26 | 2006-02-09 | Sony Corp | 液浸露光用積層構造、液浸露光方法、電子装置の製造方法及び電子装置 |
| JP2006073967A (ja) * | 2004-09-06 | 2006-03-16 | Tokyo Ohka Kogyo Co Ltd | 液浸露光プロセス用浸漬液および該浸漬液を用いたレジストパターン形成方法 |
| EP1720072B1 (en) * | 2005-05-01 | 2019-06-05 | Rohm and Haas Electronic Materials, L.L.C. | Compositons and processes for immersion lithography |
| US7317507B2 (en) * | 2005-05-03 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7495743B2 (en) | 2005-09-30 | 2009-02-24 | International Business Machines Corporation | Immersion optical lithography system having protective optical coating |
| US7745102B2 (en) * | 2006-05-26 | 2010-06-29 | Massachusetts Institute Of Technology | Immersion fluids for lithography |
| JP5731887B2 (ja) * | 2011-04-21 | 2015-06-10 | 株式会社日本フォトサイエンス | 液体処理装置 |
| JP5929588B2 (ja) * | 2012-07-26 | 2016-06-08 | 日本ゼオン株式会社 | フッ素化炭化水素化合物の精製方法 |
| US9017934B2 (en) | 2013-03-08 | 2015-04-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist defect reduction system and method |
| US9256128B2 (en) | 2013-03-12 | 2016-02-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for manufacturing semiconductor device |
| US9502231B2 (en) | 2013-03-12 | 2016-11-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist layer and method |
| US9354521B2 (en) | 2013-03-12 | 2016-05-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9110376B2 (en) | 2013-03-12 | 2015-08-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9175173B2 (en) | 2013-03-12 | 2015-11-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Unlocking layer and method |
| US9245751B2 (en) | 2013-03-12 | 2016-01-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-reflective layer and method |
| US9543147B2 (en) | 2013-03-12 | 2017-01-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method of manufacture |
| US8932799B2 (en) | 2013-03-12 | 2015-01-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9117881B2 (en) | 2013-03-15 | 2015-08-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conductive line system and process |
| US9341945B2 (en) | 2013-08-22 | 2016-05-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method of formation and use |
| US10036953B2 (en) | 2013-11-08 | 2018-07-31 | Taiwan Semiconductor Manufacturing Company | Photoresist system and method |
| US10095113B2 (en) | 2013-12-06 | 2018-10-09 | Taiwan Semiconductor Manufacturing Company | Photoresist and method |
| US9761449B2 (en) | 2013-12-30 | 2017-09-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Gap filling materials and methods |
| US9599896B2 (en) | 2014-03-14 | 2017-03-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
| US9581908B2 (en) | 2014-05-16 | 2017-02-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19619233A1 (de) * | 1996-05-13 | 1997-11-20 | Hoechst Ag | Fluorhaltige Lösungsmittel für Lithiumbatterien mit erhöhter Sicherheit |
| US6824930B1 (en) * | 1999-11-17 | 2004-11-30 | E. I. Du Pont De Nemours And Company | Ultraviolet and vacuum ultraviolet transparent polymer compositions and their uses |
| ITMI20010921A1 (it) * | 2001-05-07 | 2002-11-07 | Ausimont Spa | Polimeri (per)fluorurati amorfi |
| AU2002342745A1 (en) * | 2001-05-14 | 2002-11-25 | E.I. Du Pont De Nemours And Company | Fluoropolymer compositions comprising a fluor-containing liquid |
-
2003
- 2003-03-06 US US10/382,695 patent/US20040009425A1/en not_active Abandoned
- 2003-03-06 CN CNA038052962A patent/CN1747917A/zh active Pending
- 2003-03-06 AU AU2003218015A patent/AU2003218015A1/en not_active Abandoned
- 2003-03-06 TW TW092104812A patent/TW200304044A/zh unknown
- 2003-03-06 KR KR10-2004-7013793A patent/KR20040096654A/ko not_active Withdrawn
- 2003-03-06 US US10/501,968 patent/US20050145821A1/en not_active Abandoned
- 2003-03-06 JP JP2003575187A patent/JP2005519346A/ja active Pending
- 2003-03-06 WO PCT/US2003/007091 patent/WO2003077034A2/en not_active Ceased
- 2003-03-06 EP EP03713995A patent/EP1480929A2/en not_active Withdrawn
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