JP2005509710A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005509710A5 JP2005509710A5 JP2003545711A JP2003545711A JP2005509710A5 JP 2005509710 A5 JP2005509710 A5 JP 2005509710A5 JP 2003545711 A JP2003545711 A JP 2003545711A JP 2003545711 A JP2003545711 A JP 2003545711A JP 2005509710 A5 JP2005509710 A5 JP 2005509710A5
- Authority
- JP
- Japan
- Prior art keywords
- siloxane polymer
- family
- anthracenecarboxy
- concave
- polymer family
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 32
- 229920000642 polymer Polymers 0.000 claims 32
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 7
- 229910000077 silane Inorganic materials 0.000 claims 7
- -1 3-trimethoxysilylpropoxy Chemical group 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 239000011877 solvent mixture Substances 0.000 claims 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 claims 2
- IKBFHCBHLOZDKH-UHFFFAOYSA-N 2-chloroethyl(triethoxy)silane Chemical compound CCO[Si](CCCl)(OCC)OCC IKBFHCBHLOZDKH-UHFFFAOYSA-N 0.000 claims 1
- CASYTJWXPQRCFF-UHFFFAOYSA-N 2-chloroethyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCl CASYTJWXPQRCFF-UHFFFAOYSA-N 0.000 claims 1
- BEYOBVMPDRKTNR-BUHFOSPRSA-N 4-Hydroxyazobenzene Chemical compound C1=CC(O)=CC=C1\N=N\C1=CC=CC=C1 BEYOBVMPDRKTNR-BUHFOSPRSA-N 0.000 claims 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 claims 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims 1
- CCGWVKHKHWKOIQ-UHFFFAOYSA-N [2-hydroxy-4-(3-triethoxysilylpropoxy)phenyl]-phenylmethanone Chemical compound OC1=CC(OCCC[Si](OCC)(OCC)OCC)=CC=C1C(=O)C1=CC=CC=C1 CCGWVKHKHWKOIQ-UHFFFAOYSA-N 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- JEZFASCUIZYYEV-UHFFFAOYSA-N chloro(triethoxy)silane Chemical compound CCO[Si](Cl)(OCC)OCC JEZFASCUIZYYEV-UHFFFAOYSA-N 0.000 claims 1
- CBVJWBYNOWIOFJ-UHFFFAOYSA-N chloro(trimethoxy)silane Chemical compound CO[Si](Cl)(OC)OC CBVJWBYNOWIOFJ-UHFFFAOYSA-N 0.000 claims 1
- ZDOBWJOCPDIBRZ-UHFFFAOYSA-N chloromethyl(triethoxy)silane Chemical compound CCO[Si](CCl)(OCC)OCC ZDOBWJOCPDIBRZ-UHFFFAOYSA-N 0.000 claims 1
- FPOSCXQHGOVVPD-UHFFFAOYSA-N chloromethyl(trimethoxy)silane Chemical compound CO[Si](CCl)(OC)OC FPOSCXQHGOVVPD-UHFFFAOYSA-N 0.000 claims 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 239000005055 methyl trichlorosilane Substances 0.000 claims 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 239000003002 pH adjusting agent Substances 0.000 claims 1
- FABOKLHQXVRECE-UHFFFAOYSA-N phenyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=CC=C1 FABOKLHQXVRECE-UHFFFAOYSA-N 0.000 claims 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 claims 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims 1
- 239000005052 trichlorosilane Substances 0.000 claims 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 claims 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/US2001/043831 WO2003044077A1 (en) | 2001-11-16 | 2001-11-16 | Spin-on-glass anti-reflective coatings for photolithography |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009158887A Division JP2009280822A (ja) | 2009-07-03 | 2009-07-03 | フォトリソグラフィ用のスピンオングラス反射防止性コーティング |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005509710A JP2005509710A (ja) | 2005-04-14 |
| JP2005509710A5 true JP2005509710A5 (enExample) | 2005-12-22 |
Family
ID=21743007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003545711A Pending JP2005509710A (ja) | 2001-11-16 | 2001-11-16 | フォトリソグラフィ用のスピンオングラス反射防止性コーティング |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20090275694A1 (enExample) |
| EP (1) | EP1478681A4 (enExample) |
| JP (1) | JP2005509710A (enExample) |
| KR (1) | KR100818678B1 (enExample) |
| WO (1) | WO2003044077A1 (enExample) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003502449A (ja) | 1999-06-10 | 2003-01-21 | ハネウエル・インターナシヨナル・インコーポレーテツド | フォトリソグラフィ用スピンオンガラス反射防止コーティング |
| DE10227807A1 (de) * | 2002-06-21 | 2004-01-22 | Honeywell Specialty Chemicals Seelze Gmbh | Silylalkylester von Anthracen- und Phenanthrencarbonsäuren |
| CN100355813C (zh) | 2003-05-23 | 2007-12-19 | 陶氏康宁公司 | 具有高的湿蚀刻速率的硅氧烷树脂型抗反射涂料组合物 |
| US7914897B2 (en) | 2003-06-23 | 2011-03-29 | University Of Zurich | Superhydrophobic coating |
| US8053159B2 (en) * | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
| JP4541080B2 (ja) * | 2004-09-16 | 2010-09-08 | 東京応化工業株式会社 | 反射防止膜形成用組成物およびこれを用いた配線形成方法 |
| KR101275649B1 (ko) | 2004-12-17 | 2013-06-14 | 다우 코닝 코포레이션 | 반사방지 피막의 형성방법 |
| WO2006065310A2 (en) | 2004-12-17 | 2006-06-22 | Dow Corning Corporation | Siloxane resin coating |
| KR100882794B1 (ko) | 2005-03-01 | 2009-02-09 | 제이에스알 가부시끼가이샤 | 레지스트 하층막용 조성물 및 그의 제조 방법 |
| WO2007094848A2 (en) | 2006-02-13 | 2007-08-23 | Dow Corning Corporation | Antireflective coating material |
| JP2007272168A (ja) * | 2006-03-10 | 2007-10-18 | Tokyo Ohka Kogyo Co Ltd | レジスト下層膜用組成物及びこれを用いたレジスト下層膜 |
| WO2007144453A1 (en) * | 2006-06-13 | 2007-12-21 | Braggone Oy | Carbosilane polymer compositions for anti-reflective coatings |
| KR20100126295A (ko) | 2008-01-08 | 2010-12-01 | 다우 코닝 도레이 캄파니 리미티드 | 실세스퀴옥산 수지 |
| KR20100114075A (ko) | 2008-01-15 | 2010-10-22 | 다우 코닝 코포레이션 | 실세스퀴옥산 수지 |
| KR101546222B1 (ko) | 2008-02-25 | 2015-08-20 | 허니웰 인터내셔널 인코포레이티드 | 공정가능한 무기 및 유기 중합체 배합물, 이의 제조방법 및 이의 용도 |
| EP2250213B1 (en) | 2008-03-04 | 2013-08-21 | Dow Corning Corporation | Silsesquioxane resins |
| WO2009111121A2 (en) | 2008-03-05 | 2009-09-11 | Dow Corning Corporation | Silsesquioxane resins |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| JP5645113B2 (ja) * | 2010-09-10 | 2014-12-24 | 株式会社豊田中央研究所 | 表面に微細な凹凸構造を有するフィルムおよびその製造方法 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| CN103832968B (zh) * | 2014-03-17 | 2016-04-13 | 上海华虹宏力半导体制造有限公司 | Mems器件的制造方法 |
| CN104497034B (zh) * | 2014-12-09 | 2018-04-13 | 山东大学 | 一种α‑取代丙烯酰氧基甲基三烷氧基硅烷的制备方法 |
| JP6470079B2 (ja) * | 2015-03-16 | 2019-02-13 | 株式会社東芝 | パターン形成方法 |
| WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0629382B2 (ja) * | 1987-04-07 | 1994-04-20 | 信越化学工業株式会社 | 紫外線硬化性ハードコーティング剤 |
| US6040053A (en) * | 1996-07-19 | 2000-03-21 | Minnesota Mining And Manufacturing Company | Coating composition having anti-reflective and anti-fogging properties |
| CN100341166C (zh) * | 1998-09-01 | 2007-10-03 | 大赛璐化学工业株式会社 | 有机场致发光器件的材料及其制造方法 |
| US6177143B1 (en) * | 1999-01-06 | 2001-01-23 | Allied Signal Inc | Electron beam treatment of siloxane resins |
| JP2003502449A (ja) * | 1999-06-10 | 2003-01-21 | ハネウエル・インターナシヨナル・インコーポレーテツド | フォトリソグラフィ用スピンオンガラス反射防止コーティング |
| US6268457B1 (en) * | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
-
2001
- 2001-11-16 JP JP2003545711A patent/JP2005509710A/ja active Pending
- 2001-11-16 US US10/495,687 patent/US20090275694A1/en not_active Abandoned
- 2001-11-16 EP EP01995897A patent/EP1478681A4/en not_active Ceased
- 2001-11-16 KR KR1020047007541A patent/KR100818678B1/ko not_active Expired - Fee Related
- 2001-11-16 WO PCT/US2001/043831 patent/WO2003044077A1/en not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100705849B1 (ko) | 포토리소그래피용 ｓｏｇ 반사방지 코팅 | |
| KR100804873B1 (ko) | 포토리소그래피용 ｓｏｇ 반사방지 코팅 | |
| US6824879B2 (en) | Spin-on-glass anti-reflective coatings for photolithography | |
| KR100804870B1 (ko) | 포토리소그래피에 사용되는 스핀-온 유리 반사방지 코팅용흡수성 화합물 | |
| JP2005509914A5 (enExample) | ||
| CN1606713B (zh) | 用于照相平版印刷术的旋涂抗反射涂料 | |
| JP2003502449A5 (enExample) | ||
| JP2005512309A6 (ja) | フォトリソグラフィー用スピンオン反射防止膜 | |
| JP2005509710A (ja) | フォトリソグラフィ用のスピンオングラス反射防止性コーティング | |
| JP2011221549A (ja) | フォトリソグラフィー用スピンオン反射防止膜 | |
| KR100917241B1 (ko) | 포토리소그래피용 스핀-온 무반사 코팅 | |
| JP2009280822A (ja) | フォトリソグラフィ用のスピンオングラス反射防止性コーティング | |
| JP2009175747A (ja) | フォトリソグラフィー用スピンオン反射防止膜 | |
| HK1057903A (en) | Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |