JP2005503452A5 - - Google Patents

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Publication number
JP2005503452A5
JP2005503452A5 JP2002587483A JP2002587483A JP2005503452A5 JP 2005503452 A5 JP2005503452 A5 JP 2005503452A5 JP 2002587483 A JP2002587483 A JP 2002587483A JP 2002587483 A JP2002587483 A JP 2002587483A JP 2005503452 A5 JP2005503452 A5 JP 2005503452A5
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JP
Japan
Prior art keywords
block copolymer
saturated
block
unsaturated
hydrophobic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002587483A
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English (en)
Japanese (ja)
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JP2005503452A (ja
JP4744783B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/FR2002/001349 external-priority patent/WO2002090409A2/fr
Publication of JP2005503452A publication Critical patent/JP2005503452A/ja
Publication of JP2005503452A5 publication Critical patent/JP2005503452A5/ja
Application granted granted Critical
Publication of JP4744783B2 publication Critical patent/JP4744783B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002587483A 2001-05-04 2002-04-19 制御されたラジカル重合によって造られる界面活性ブロックコポリマー Expired - Lifetime JP4744783B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US28884401P 2001-05-04 2001-05-04
US60/288,844 2001-05-04
PCT/FR2002/001349 WO2002090409A2 (fr) 2001-05-04 2002-04-19 Copolymeres a blocs tensioactifs prepares par polymerisation radicalaire controlee

Publications (3)

Publication Number Publication Date
JP2005503452A JP2005503452A (ja) 2005-02-03
JP2005503452A5 true JP2005503452A5 (enExample) 2006-06-15
JP4744783B2 JP4744783B2 (ja) 2011-08-10

Family

ID=23108901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002587483A Expired - Lifetime JP4744783B2 (ja) 2001-05-04 2002-04-19 制御されたラジカル重合によって造られる界面活性ブロックコポリマー

Country Status (6)

Country Link
US (2) US20020198347A1 (enExample)
EP (1) EP1397403B1 (enExample)
JP (1) JP4744783B2 (enExample)
AT (1) ATE388970T1 (enExample)
DE (1) DE60225550T2 (enExample)
WO (1) WO2002090409A2 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6716948B1 (en) 1999-07-31 2004-04-06 Symyx Technologies, Inc. Controlled-architecture polymers and use thereof as separation media
US6855840B2 (en) * 2002-02-11 2005-02-15 University Of Southern Mississippi Chain transfer agents for raft polymerization in aqueous media
US6667376B2 (en) * 2002-03-22 2003-12-23 Symyx Technologies, Inc. Control agents for living-type free radical polymerization and methods of polymerizing
CN100379833C (zh) * 2002-07-26 2008-04-09 阿托菲纳公司 含有至少一种亲水嵌段的嵌段共聚物基的湿介质粘合剂组合物
FR2848557B1 (fr) 2002-12-13 2006-07-07 Atofina Copolymeres a gradient solubles ou du moins dispersibles dans l'eau comme dans les solvants organiques
JP4254292B2 (ja) * 2003-03-24 2009-04-15 星光Ｐｍｃ株式会社 水性顔料分散剤およびその製造方法
US6919409B2 (en) 2003-06-26 2005-07-19 Symyx Technologies, Inc. Removal of the thiocarbonylthio or thiophosphorylthio end group of polymers and further functionalization thereof
US6762257B1 (en) * 2003-05-05 2004-07-13 3M Innovative Properties Company Azlactone chain transfer agents for radical polymerization
JP2005002325A (ja) * 2003-05-19 2005-01-06 Canon Inc ポリマー、それを含有するポリマー含有組成物、インク組成物、該インク組成物を用いたインク付与方法および装置
KR101057570B1 (ko) 2003-06-26 2011-08-17 제이에스알 가부시끼가이샤 포토레지스트 중합체 조성물
JP2007522262A (ja) 2003-06-26 2007-08-09 シミックス・テクノロジーズ・インコーポレイテッド フォトレジストポリマー
US7250475B2 (en) 2003-06-26 2007-07-31 Symyx Technologies, Inc. Synthesis of photoresist polymers
WO2005021612A1 (en) * 2003-09-03 2005-03-10 Rhodia Inc New copolymer having a controlled structure, and use thereof
US7632905B2 (en) * 2004-04-09 2009-12-15 L'oreal S.A. Block copolymer, composition comprising it and cosmetic treatment process
JP5113988B2 (ja) * 2005-03-31 2013-01-09 株式会社日本触媒 セメント混和剤用ポリカルボン酸系ポリマー
FR2885367B1 (fr) * 2005-05-03 2007-07-27 Rhodia Chimie Sa Organosol stabilise par des polymeres sequences amphiphiles
EP1889858B1 (en) * 2006-08-17 2009-05-13 Rhodia Opérations Block copolymer, process for making the same, and use in emulsions
EP2101973B1 (en) 2007-08-27 2016-01-06 Borealis Technology OY Equipment and process for producing polymer pellets
FR2965564B1 (fr) * 2010-09-30 2012-10-26 Rhodia Operations Preparation de polymeres hydrophiles de haute masse par polymerisation radicalaire controlee
FR2975100B1 (fr) * 2011-05-13 2014-09-26 Oreal Polymere sequence comprenant de l'acrylate d'isobutyle et de l'acide acry-lique, composition cosmetique et procede de traitement
WO2013060741A1 (fr) * 2011-10-24 2013-05-02 Rhodia Operations Preparation de polymeres sequences amphiphiles par polymerisation radicalaire micellaire a caractere controle
FR2986235B1 (fr) * 2012-01-31 2015-02-06 Rhodia Operations Stabilisants reactifs poly(n-vinyl lactame) vivants pour polymerisation en phase dispersee
FR2986234B1 (fr) * 2012-01-31 2014-06-13 Rhodia Operations Stabilisants reactifs poly(n-vinyl lactame) vivants pour polymerisation en phase dispersee
JP6550908B2 (ja) * 2015-05-08 2019-07-31 国立大学法人福井大学 アルケニルエーテル系重合体の製造方法
RU2632004C1 (ru) * 2016-06-06 2017-10-02 Федеральное государственное бюджетное учреждение науки Институт металлоорганической химии им. Г.А. Разуваева Российской академии наук (ИМХ РАН) Способ получения коллоидного раствора узкодисперсного по молекулярной массе амфифильного блоксополимера бутилакрилата и акриловой кислоты с узким распределением мицелл по размеру
EP3755732B1 (en) * 2018-02-21 2025-09-03 3M Innovative Properties Company Ketone-containing controlled radical initiators for polymerization reactions
WO2025205553A1 (ja) * 2024-03-29 2025-10-02 富士フイルム株式会社 樹脂の製造方法、感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
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AUPM930394A0 (en) * 1994-11-09 1994-12-01 Commonwealth Scientific And Industrial Research Organisation Block copolymer synthesis
FR2738573B1 (fr) * 1995-09-08 1997-10-17 Rhone Poulenc Chimie Utilisation en tant qu'agents thermoepaississants de copolymeres multiblocs
DE19704714A1 (de) * 1996-01-25 1997-07-31 Basf Ag Amphiphile Blockcopolymere
FR2764892B1 (fr) * 1997-06-23 2000-03-03 Rhodia Chimie Sa Procede de synthese de polymeres a blocs
US6111025A (en) * 1997-06-24 2000-08-29 The Lubrizol Corporation Block copolymer surfactants prepared by stabilized free-radical polymerization
DE19806853A1 (de) * 1998-02-19 1999-09-02 Basf Ag Verfahren zur Herstellung von Polymeren aus N-Vinylverbindungen
FR2794463B1 (fr) * 1999-06-04 2005-02-25 Rhodia Chimie Sa Procede de synthese de polymeres par polymerisation radicalaire controlee a l'aide de xanthates halogenes
FR2794464B1 (fr) * 1999-06-04 2005-03-04 Rhodia Chimie Sa Procede de synthese de polymeres a blocs par polymerisation radicalaire controlee a l'aide de thioether-thiones
US6437040B2 (en) * 1999-09-01 2002-08-20 Rhodia Chimie Water-soluble block copolymers comprising a hydrophilic block and a hydrophobic block
CN1220707C (zh) * 1999-09-01 2005-09-28 罗狄亚化学公司 包括含有至少一种水溶性嵌段和一种疏水嵌段的嵌段共聚物的凝胶化水性组合物
EP1130556B1 (de) * 2000-03-02 2004-09-01 Lucatron AG Elektronisch detektierbare Resonanzetikette, insbesondere RFID-Labels
US6507837B1 (en) * 2000-06-08 2003-01-14 Hyperphrase Technologies, Llc Tiered and content based database searching
US6410005B1 (en) * 2000-06-15 2002-06-25 Pmd Holdings Corp. Branched/block copolymers for treatment of keratinous substrates
JP2004510720A (ja) * 2000-10-03 2004-04-08 ユニリーバー・ナームローゼ・ベンノートシヤープ 化粧品及びパーソナルケア組成物
EP1337563B1 (en) * 2000-10-06 2006-12-20 Carnegie-Mellon University Polymerization process for ionic monomers
US6559233B2 (en) * 2001-07-13 2003-05-06 Rhodia Chimie Composition comprising a copolymer at least two charged blocks and type of opposite charge

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