JP2005501400A - ガス放電レーザ用の改良されたファン - Google Patents

ガス放電レーザ用の改良されたファン Download PDF

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Publication number
JP2005501400A
JP2005501400A JP2002590466A JP2002590466A JP2005501400A JP 2005501400 A JP2005501400 A JP 2005501400A JP 2002590466 A JP2002590466 A JP 2002590466A JP 2002590466 A JP2002590466 A JP 2002590466A JP 2005501400 A JP2005501400 A JP 2005501400A
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JP
Japan
Prior art keywords
blade
discharge
fan
radius
tangential flow
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Pending
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JP2002590466A
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English (en)
Japanese (ja)
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JP2005501400A5 (enExample
Inventor
パートロ ウィリアム エヌ
カーティス エル レッティグ
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Cymer Inc
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Cymer Inc
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Priority claimed from US09/854,097 external-priority patent/US6757316B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of JP2005501400A publication Critical patent/JP2005501400A/ja
Publication of JP2005501400A5 publication Critical patent/JP2005501400A5/ja
Pending legal-status Critical Current

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70025Production of exposure light, i.e. light sources by lasers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04DNON-POSITIVE-DISPLACEMENT PUMPS
    • F04D29/00Details, component parts, or accessories
    • F04D29/26Rotors specially for elastic fluids
    • F04D29/28Rotors specially for elastic fluids for centrifugal or helico-centrifugal pumps for radial-flow or helico-centrifugal pumps
    • F04D29/281Rotors specially for elastic fluids for centrifugal or helico-centrifugal pumps for radial-flow or helico-centrifugal pumps for fans or blowers
    • F04D29/282Rotors specially for elastic fluids for centrifugal or helico-centrifugal pumps for radial-flow or helico-centrifugal pumps for fans or blowers the leading edge of each vane being substantially parallel to the rotation axis
    • F04D29/283Rotors specially for elastic fluids for centrifugal or helico-centrifugal pumps for radial-flow or helico-centrifugal pumps for fans or blowers the leading edge of each vane being substantially parallel to the rotation axis rotors of the squirrel-cage type
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04DNON-POSITIVE-DISPLACEMENT PUMPS
    • F04D29/00Details, component parts, or accessories
    • F04D29/66Combating cavitation, whirls, noise, vibration or the like; Balancing
    • F04D29/661Combating cavitation, whirls, noise, vibration or the like; Balancing especially adapted for elastic fluid pumps
    • F04D29/666Combating cavitation, whirls, noise, vibration or the like; Balancing especially adapted for elastic fluid pumps by means of rotor construction or layout, e.g. unequal distribution of blades or vanes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70041Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • GPHYSICS
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    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933Purge, e.g. exchanging fluid or gas to remove pollutants
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    • H01S3/1024Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping for pulse generation
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    • H01S3/2256KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
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    • H01S3/2258F2, i.e. molecular fluoride is comprised for lasing around 157 nm

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Structures Of Non-Positive Displacement Pumps (AREA)
  • Lasers (AREA)
JP2002590466A 2001-05-11 2002-04-18 ガス放電レーザ用の改良されたファン Pending JP2005501400A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/854,097 US6757316B2 (en) 1999-12-27 2001-05-11 Four KHz gas discharge laser
US10/029,319 US6765946B2 (en) 2000-01-25 2001-10-17 Fan for gas discharge laser
PCT/US2002/012417 WO2002093703A1 (en) 2001-05-11 2002-04-18 Improved fan for gas discharge laser

Publications (2)

Publication Number Publication Date
JP2005501400A true JP2005501400A (ja) 2005-01-13
JP2005501400A5 JP2005501400A5 (enExample) 2006-01-05

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JP2008535260A (ja) * 2005-03-31 2008-08-28 サイマー インコーポレイテッド ガス放電レーザ出力光のビームパラメータ制御
US7746365B2 (en) 2004-04-22 2010-06-29 Nec Viewtechnology, Ltd. Image display device for rotating an image displayed on a display screen
JP2020023972A (ja) * 2017-09-27 2020-02-13 ダイキン工業株式会社 空気調和機
US11384765B2 (en) 2017-09-27 2022-07-12 Daikin Industries, Ltd. Air conditioner
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US7746365B2 (en) 2004-04-22 2010-06-29 Nec Viewtechnology, Ltd. Image display device for rotating an image displayed on a display screen
JP2008535260A (ja) * 2005-03-31 2008-08-28 サイマー インコーポレイテッド ガス放電レーザ出力光のビームパラメータ制御
JP2007221053A (ja) * 2006-02-20 2007-08-30 Komatsu Ltd レーザ装置
JP2020023972A (ja) * 2017-09-27 2020-02-13 ダイキン工業株式会社 空気調和機
US11384765B2 (en) 2017-09-27 2022-07-12 Daikin Industries, Ltd. Air conditioner
JP2022136087A (ja) * 2019-10-30 2022-09-15 ダイキン工業株式会社 空気調和機

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US20020094005A1 (en) 2002-07-18
WO2002093703A1 (en) 2002-11-21
EP1386378A4 (en) 2005-12-07
US6765946B2 (en) 2004-07-20
EP1386378A1 (en) 2004-02-04

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