JP2005340850A - 光子バンドギャップ材料と蛍光材料を含んでいる半導体発光素子 - Google Patents
光子バンドギャップ材料と蛍光材料を含んでいる半導体発光素子 Download PDFInfo
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 16
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 17
- 230000000737 periodic effect Effects 0.000 claims description 13
- 239000011521 glass Substances 0.000 claims description 7
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 239000004793 Polystyrene Substances 0.000 claims description 4
- 229920002223 polystyrene Polymers 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 45
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 21
- 229910002601 GaN Inorganic materials 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 13
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- 238000007789 sealing Methods 0.000 description 4
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- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000002893 slag Substances 0.000 description 3
- 239000012780 transparent material Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
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- 229910052733 gallium Inorganic materials 0.000 description 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
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- 229910052751 metal Inorganic materials 0.000 description 2
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- 239000010409 thin film Substances 0.000 description 2
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- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 229910004122 SrSi Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
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- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0083—Periodic patterns for optical field-shaping in or on the semiconductor body or semiconductor body package, e.g. photonic bandgap structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/501—Wavelength conversion elements characterised by the materials, e.g. binder
- H01L33/502—Wavelength conversion materials
- H01L33/504—Elements with two or more wavelength conversion materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/508—Wavelength conversion elements having a non-uniform spatial arrangement or non-uniform concentration, e.g. patterned wavelength conversion layer, wavelength conversion layer with a concentration gradient of the wavelength conversion material
Abstract
【解決手段】 発光構造は、第1ピーク波長を有する第1光を放射可能な半導体発光素子と、半導体発光素子を覆って配置された、第2ピーク波長を有する第2光を放射可能な蛍光材料と、発光素子と蛍光材料の間に配置された光子バンドギャップ材料を含んでいる。光子バンドギャップ材料は、第1光及び第2光の入射角にかかわらず、第1光を透過させ第2光を反射することができる。
【選択図】 図3
Description
42 n型領域
44 発光領域
45 p型領域
46 接点
47 相互接続部
48 マウント
49 蛍光材料層
50 光子バンドギャップ材料
Claims (29)
- 第1ピーク波長を有する第1光を放射可能な活性領域を含んでいる半導体発光素子と、
前記第1光の少なくとも一部の経路に配置された蛍光材料であって、第2ピーク波長を有する第2光を放射可能な蛍光材料と、
前記発光素子と前記蛍光材料の間に配置された光子バンドギャップ材料であって、少なくとも二次元での屈折率の周期的な変動を備え、前記第1光を透過させ前記第2光を反射することのできる光子バンドギャップ材料と、を備えていることを特徴とする構造体。 - 前記半導体発光素子は、少なくとも1つのIII群窒化物層を備えていることを特徴とする、請求項1に記載の構造体。
- 前記第1光は、ピーク波長が490nm未満の光を備えていることを特徴とする、請求項1に記載の構造体。
- 前記蛍光材料はリン光体であることを特徴とする、請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、前記半導体発光素子の表面に接触していることを特徴とする、請求項1に記載の構造体。
- 前記蛍光材料は、前記光子バンドギャップ材料の表面に接触していることを特徴とする、請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、前記半導体発光素子から離して配置されていることを特徴とする、請求項1に記載の構造体。
- 前記蛍光材料は、前記光子バンドギャップ材料から離して配置されていることを特徴とする、請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、三次元での屈折率の周期的な変動を備えていることを特徴とする、請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、複数の球を備えていることを特徴とする、請求項1に記載の構造体。
- 前記球はポリスチレンであることを特徴とする、請求項10に記載の構造体。
- 前記光子バンドギャップ材料は、複数の材料層を備えており、前記各材料層は周期的な孔の配列を含んでいることを特徴とする、請求項1に記載の構造体。
- 前記孔には空気が充満していることを特徴とする、請求項12に記載の構造体。
- 前記材料層は、結晶質、ガラス、又は誘電体の内の1つであることを特徴とする、請求項12に記載の構造体。
- 前記各材料層の前記周期的な孔の配列は、上方及び下方の前記材料層の周期的な孔の配列からずれていることを特徴とする、請求項12に記載の構造体。
- 前記第1光は青色であり、前記第2光は赤色又は緑色であることを特徴とする、請求項12に記載の構造体。
- 前記第1光はUVであり、前記第2光は青色、緑色、及び赤色の内の一色であることを特徴とする、請求項1に記載の構造体。
- 前記第1光は青色であり、前記第2光は黄色であることを特徴とする、請求項1に記載の構造体。
- 前記蛍光材料は前記第1光の一部を吸収し、
前記蛍光材料は、前記第1光の少なくとも90%が前記蛍光材料に吸収されるように構成されていることを特徴とする、請求項1に記載の構造体。 - 前記蛍光材料は前記第1光の一部を吸収し、
前記蛍光材料は、前記第1光の少なくとも50%が前記蛍光材料に吸収されるように構成されていることを特徴とする、請求項1に記載の構造体。 - 前記蛍光材料は第1蛍光材料であり、前記構造体は、第3ピーク波長を有する第3光を放射可能な第2蛍光材料を更に備えていることを特徴とする、請求項1に記載の構造体。
- 前記第1光は青色であり、前記第2光は黄色又は緑色であり、前記第3光は赤色であることを特徴とする、請求項21に記載の構造体。
- 前記第1光はUVであり、前記第2光は青色であり、前記第3光は黄色であることを特徴とする、請求項21に記載の構造体。
- 第4ピーク波長を有する第4光を放射可能な第3蛍光材料を更に備えており、前記第1光はUV、前記第2光は青色、前記第3光は緑色、前記第4光は赤色であることを特徴とする、請求項21に記載の構造体。
- 前記蛍光材料は、前記第1光の一部が、前記蛍光材料に入射することなく前記構造体を脱出するように構成されていることを特徴とする、請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、前記第1及び第2光の、前記光子バンドギャップ材料への入射角にかかわらず、前記第1光を透過させ、前記第2光を反射することができることを特徴とする請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、前記光子バンドギャップ材料に入射する前記第1光の少なくとも90%を透過させるように構成されていることを特徴とする、請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、前記光子バンドギャップ材料に入射する前記二次光の少なくとも50%を反射するように構成されていることを特徴とする、請求項1に記載の構造体。
- 前記光子バンドギャップ材料は、前記光子バンドギャップ材料に入射する前記二次光の少なくとも90%を反射するように構成されていることを特徴とする、請求項1に記載の構造体。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US10/855,292 | 2004-05-26 | ||
US10/855,292 US6956247B1 (en) | 2004-05-26 | 2004-05-26 | Semiconductor light emitting device including photonic band gap material and luminescent material |
Publications (2)
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JP2005340850A true JP2005340850A (ja) | 2005-12-08 |
JP5149484B2 JP5149484B2 (ja) | 2013-02-20 |
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JP2005182565A Active JP5149484B2 (ja) | 2004-05-26 | 2005-05-26 | 光子バンドギャップ材料と蛍光材料を含んでいる半導体発光素子 |
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US (1) | US6956247B1 (ja) |
EP (1) | EP1601027B1 (ja) |
JP (1) | JP5149484B2 (ja) |
TW (1) | TWI383515B (ja) |
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US6956247B1 (en) | 2005-10-18 |
EP1601027A2 (en) | 2005-11-30 |
TW200618337A (en) | 2006-06-01 |
JP5149484B2 (ja) | 2013-02-20 |
EP1601027B1 (en) | 2012-11-21 |
EP1601027A3 (en) | 2011-06-22 |
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