JP2005338917A - Film for security sensor, security sensor, and method for manufacturing film for security sensor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a film for a security sensor that is inconspicuous and hardly gives the feeling of discomfort in appearance, the security sensor, and a method for manufacturing the film for the security sensor. <P>SOLUTION: The film 6 for a security sensor is used, on whose flexible transparent film 21 a detection wiring 22 composed of thin metallic wires of 20 μm or less in thickness, 40-100 μm in width, and 50% or more in the total light ray transmittance is arranged. For the detection wire 22, the wire composed of thin wires which are made by plated metals (a plated layer 22b) using physically developed metallic silver (a physical development layer 22a) as a catalysis nucleus can be used, for example. The film 6 for the security sensor can be made into the security sensor by, for example, connecting the detection wire 22 and a detection circuit capable of detecting a change in resistance of the detection wire 22. The film 6 for the security sensor can be laminated on a windowpane 2 and the like. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a security sensor film, a security sensor, and a method for manufacturing a security sensor film.

To prevent intruders and intruders such as burial nests from entering buildings, security sensors that reinforce areas such as window glass that are easy to enter and detect abnormalities such as window glass breakage are attached. Has been done.
For example, as a means for preventing the scattering of broken pieces even when the glass is broken, a glass with a wire mesh embedded in the inside of the glass, or a scattering that allows a PET film to be adhesively attached to a window glass or the like There is a prevention film.
Moreover, as a crime prevention sensor which detects abnormality, such as destruction of a window glass, a tent sheet | seat, etc., it is described in the method of attaching a vibration sensor and detecting abnormality, such as glass, or the patent documents 1-3 reference In addition, a security sensor that detects abnormalities in glass, sheets, etc. by providing detection lines made of conductive wires, etc. connected to the detection circuit on glass, tent sheets, etc., and electrically detecting cutting of detection lines, etc. There is.
JP 10-040473 A JP 2000-132753 A JP 2002-032869 A

However, simply preventing the shattering of glass pieces is not useful in many cases because they are easily broken by methods such as cutting a wire mesh or film when a hole is made in the glass with a lighter or burner. is the current situation. Further, in the case of glass with a wire mesh, there is a concern that the wire mesh may become anxious due to its appearance.
When a vibration sensor is used, although it has excellent sensitivity, it may malfunction due to electromagnetic waves from a lighter or a mobile phone.

In the case of a security sensor with a detection line connected to the detection circuit, it is excellent in sensitivity and reliability because it can electrically detect abnormalities such as glass, etc., but the wiring is conspicuous and the appearance is impaired, and intruders can easily notice The location may be changed. In this regard, in Patent Document 2, a transparent conductive layer is used, or the wire is shaped to represent a decorative pattern. Further, in Patent Document 3, the crime prevention wiring is shared with the heat generation wiring so as to make it appear as a facility intended for heating or decoration (such as paragraph 0011 of the specification).
However, when forming a decorative pattern, there is a possibility that the wiring shape of the detection line is complicated and does not meet the user's hobby, and there is a problem in terms of cost and the like.
Further, when the entire wiring is formed transparently by the transparent conductive layer, the transparent conductor has poor conductivity as compared with the metal, so that the sensitivity of the security sensor is lowered, and there is a risk of malfunction or detection omission.

  This invention is made | formed in view of the said situation, and makes it a subject to provide the manufacturing method of the film for security sensors, a security sensor, and a film for security sensors which are not conspicuous and are hard to give an unpleasant appearance.

In order to solve the above-mentioned problems, the present invention provides a detection line made of a thin metal wire having a thickness of 20 μm or less, a line width of 300 μm or less, and a total light transmittance of 50% or more on a flexible transparent film. A film for a security sensor is provided. The thickness of the fine metal wire is preferably 5 μm or less.
As the detection line, a line composed of a fine line obtained by plating a metal using a physically developed metal silver as a catalyst core can be used. Moreover, the detection line can have a blackening layer for making the surface of the metal fine wire black.
In this invention, a resin layer can be laminated | stacked on the opposite side to the flexible transparent film of a detection line. As the resin layer, for example, a plastic film or an adhesive can be used.

The present invention also provides a security sensor characterized in that a detection circuit capable of detecting a change in the resistance value of the detection line is connected to the detection line of the security sensor film.
In this crime prevention sensor, a detection circuit that can detect the disconnection of the detection line and / or the change in resistance value can be used. The security sensor film can be laminated on the window glass.

Furthermore, the present invention supplies unexposed silver halide to a physical development nucleus layer provided on a flexible transparent film by physical development processing, and deposits metallic silver in an arbitrary fine line pattern on the physical development nucleus layer. Provided is a method for producing a film for a security sensor, characterized in that, after depositing, a metal is plated using the physically developed metallic silver as a catalyst core, thereby wiring a detection line made of a fine metal wire.
In this production method, a photosensitive material having a physical development nucleus layer and a silver halide emulsion layer in this order is exposed on a flexible transparent film, and an arbitrary fine line pattern is formed on the physical development nucleus layer by physical development. After the metal silver is deposited with the above, the layer provided on the physical development nucleus layer is removed, and then the metal is plated using the physically developed metal silver as a catalyst nucleus to form a detection line made of a fine metal wire. A wiring method can be used.

According to the present invention, when it is provided on a window glass or the like, the detection line is hardly noticeable, and it is difficult to give unpleasant appearance. There is no sense of incongruity in the field of view seen through the film for the security sensor, and there is no possibility of disturbing sunlight.
When the detection line is made of a thin line plated with metal using a physically developed metallic silver as a catalyst core, a detection line with a small line width and thickness and a high total light transmittance can be easily and reliably formed. A film for a crime prevention sensor having both translucency and detection sensitivity can be obtained.
When the detection line has a blackening layer for making the surface of the metal fine wire black, reflection or scattering of light on the surface of the metal fine wire can be suppressed to make the detection line less noticeable. Moreover, by covering the surface of the fine metal wire, oxidation and alteration of the fine metal wire can be suppressed, and long-term reliability can be improved.
When a resin layer such as a plastic film or adhesive is laminated on the opposite side of the detection line from the flexible transparent film, the external force is such that the detection line is protected so that no abnormalities such as breakage occur in the glass. In this case, the detection line is hardly damaged and the resistance value change is less likely to occur, and the malfunction of the security sensor can be suppressed.

In the security sensor of the present invention, the security sensor film is a transparent base film and a wiring on the base film, the thickness is 20 μm or less, the line width is 40 to 100 μm, and the total light transmittance is 50% or more. It has a detection line made of a thin metal wire.
In the present invention, the security sensor film may be attached to, for example, one side of glass (for example, see FIG. 1), or sandwiched between two (or more) sheets of glass (for example, FIG. 4, FIG. 4). 5)). As the glass, inorganic glass is widely adopted, but organic glass made of acrylic resin or the like may be used.

The base film is a film made of plastic having flexibility and translucency. Examples of the plastic include thermoplastic resins such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polystyrene (PS), polycarbonate (PC), polyarylate (PAR), and cyclic polyolefin (COP). And films made of thermosetting resins such as polyurethane and epoxy resins.
The thickness of the base film is preferably 12 μm to 200 μm from the viewpoints of strength, handleability, and workability in the process of forming a metal fine wire serving as a detection line.

  As the detection line, one or more kinds of metals such as copper, silver, nickel, and aluminum, and metal oxide semiconductors such as ITO (indium-added tin oxide) and zinc oxide are laminated in one or more layers. A thin metal wire is used. Since the metal oxide semiconductor has a lower electrical conductivity than the above metal, it is preferable that the metal fine wire contains metal in at least one layer.

  The shape of the thin metal wire is not particularly limited, but may be a shape that is turned around to form a circuit on the base film, a mesh shape, a lattice shape, a stripe shape, or the like. The electric resistance of the detection line is preferably 20 kΩ or less from the viewpoint of easy detection of a change in the resistance value of the detection line. In view of the dimensions of a person's hand, tool, or the like who is damaging the window glass or the like, if the distance between the detection lines in the wiring pattern is set to 45 mm or less, an abnormality can be detected practically without any defects in the film.

Here, in the present invention, the thickness of the detection line is 20 μm or less, the line width is 300 μm or less, and the total light transmittance is 50% or more. As a result, the detection line is not conspicuous and, for example, it is difficult to see when viewed from a position about 1 m away, and thus it is difficult to give an unpleasant appearance. In addition, the sensitivity of the detection line cutting and the resistance value change is increased, and it is easy to detect an abnormality. The thickness of the detection line is more preferably 10 μm or less, and further preferably 5 μm or less. The line width of the detection line is more preferably 200 μm or less, and still more preferably in the range of 40 to 100 μm.
In order for the total light transmittance to be 50% or more, the substrate film preferably has a higher transmittance, and the area ratio of the detection lines on the substrate film is preferably as low as possible.

The fine metal wire can be formed, for example, by an etching method, screen printing, an ink jet method, a developing method such as a silver complex diffusion transfer method (DTR), or a method of attaching a metal wire. Moreover, the electroless plating method and the electrolytic plating method can also be used together as needed.
Here, in the present invention, as described above, it is necessary to form a thin metal wire having a narrow line width and high conductivity. Such a fine metal wire is preferably formed by a method of plating a metal using a physically developed metal silver as a catalyst core, because it can be easily and reliably formed at low cost. Hereinafter, a method for forming a fine metal wire by the above method will be described in detail.

  The transparent substrate film is preferably provided with a physical development nucleus layer in advance. As the physical development nucleus, fine particles (having a particle size of about 1 to several tens of nanometers) made of heavy metal or a sulfide thereof are used. Examples thereof include colloids such as gold and silver, metal sulfides obtained by mixing water-soluble salts such as palladium and zinc and sulfides, and the like. The fine particle layer of these physical development nuclei can be provided on the transparent substrate film by a vacuum deposition method, a cathode sputtering method, a coating method or the like. From the viewpoint of production efficiency, a coating method is preferably used. The content of physical development nuclei in the physical development nuclei layer is suitably about 0.1 to 10 mg per square meter in solid content.

The physical development nucleus layer preferably contains a hydrophilic binder. The amount of the hydrophilic binder is preferably about 10 to 300% by mass with respect to the physical development nucleus. As the hydrophilic binder, gelatin, gum arabic, cellulose, albumin, casein, sodium alginate, various starches, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylamide, a copolymer of acrylamide and vinyl imidazole, and the like can be used. The physical development nucleus layer may also contain a hydrophilic binder crosslinking agent.
The physical development nucleus layer can be applied by an application method such as dip coating, slide coating, curtain coating, bar coating, air knife coating, roll coating, gravure coating, spray coating and the like. In the present invention, the physical development nucleus layer is preferably provided as a continuous and uniform layer by the above-described coating method.

  The supply of silver halide for depositing metallic silver on the physical development nucleus layer is performed by a method in which the physical development nucleus layer and the silver halide emulsion layer are integrally formed in this order on a transparent base film, or another paper or plastic. There is a method of supplying a soluble silver complex salt from a silver halide emulsion layer provided on a substrate such as a resin film. From the viewpoint of cost and production efficiency, the former physical development nucleus layer and the silver halide emulsion layer are preferably provided integrally.

The silver halide emulsion can be produced according to a general method for producing a silver halide emulsion of a silver halide photographic light-sensitive material. The silver halide emulsion is usually prepared by mixing and ripening an aqueous silver nitrate solution, an aqueous halogen solution of sodium chloride or sodium bromide in the presence of gelatin.
The silver halide composition of the silver halide emulsion layer preferably contains 80 mol% or more of silver chloride, and more preferably 90 mol% or more is silver chloride. The conductivity of the physically developed silver formed by increasing the silver chloride content is improved.

The silver halide emulsion layer is sensitive to various light sources. As one method for producing an electromagnetic wave shielding material, for example, formation of physically developed silver having a fine line pattern such as a mesh shape can be mentioned. In this case, the silver halide emulsion layer is exposed in the form of a fine line pattern. As an exposure method, a method in which a transparent original having a fine line pattern and the silver halide emulsion layer are in close contact with each other and exposed with ultraviolet light, or various laser beams are used. Scanning exposure method. The former contact exposure using ultraviolet light is possible even if the silver halide has relatively low photosensitivity, but in the case of scanning exposure using laser light, relatively high photosensitivity is required. Therefore, when the latter exposure method is used, the silver halide may be subjected to chemical sensitization or spectral sensitization with a sensitizing dye in order to increase the sensitivity of the silver halide. Chemical sensitization includes metal sensitization using a gold compound or silver compound, sulfur sensitization using a sulfur compound, or a combination thereof. Gold-sulfur sensitization using a gold compound and a sulfur compound in combination is preferable.
In the exposure method using the laser beam described above, a laser beam having an oscillation wavelength of 450 nm or less, for example, a blue semiconductor laser (also referred to as a violet laser diode) having an oscillation wavelength of 400 to 430 nm is used. It can be handled even under a yellow fluorescent lamp.
The transparent base film provided with the physical development nucleus layer may contain a dye or pigment for preventing halation or irradiation at any position.

  When producing an electromagnetic shielding material using a photosensitive material in which a silver halide emulsion layer is coated directly on the physical development nucleus layer or via an intermediate layer, an arbitrary fine line pattern such as a mesh pattern is used. After exposing a transparent original and the photosensitive material in close contact, or by scanning and exposing a digital image of an arbitrary fine line pattern onto the photosensitive material with various laser light output machines, in the presence of a soluble silver complex salt forming agent and a reducing agent. Silver complex diffusion transfer development (DTR development) occurs by processing in an alkaline solution, the silver halide in the unexposed area is dissolved to form a silver complex salt, which is reduced on the physical development nuclei, and metallic silver is precipitated to form a fine line. A physically developed silver thin film with a pattern can be obtained. The exposed portion is chemically developed in the silver halide emulsion layer to become blackened silver. After development, the silver halide emulsion layer and the intermediate layer, or the protective layer provided as necessary, are washed away with water, and a physically developed silver thin film having a fine line pattern is exposed on the surface.

  After DTR development, the silver halide emulsion layer or the like provided on the physical development nucleus layer may be removed by washing with water or transferring and peeling to a release paper or the like. There are two methods for removing the water washing: a method of removing hot water using a scrubbing roller or the like while jetting it with a nozzle or the like, and a method of removing hot water by jetting with a nozzle or the like.

  On the other hand, when the soluble silver complex salt is supplied from a silver halide emulsion layer provided on a substrate different from the transparent substrate on which the physical development nucleus layer is coated, the silver halide emulsion layer is exposed as described above. After that, a transparent substrate coated with a physical development nucleus layer and another photosensitive material coated with a silver halide emulsion layer are overlaid in an alkaline solution in the presence of a soluble silver complex salt solution and a reducing agent. After several tens of seconds to several minutes after taking out from the alkaline solution, the both are removed to obtain a physically developed silver thin film having a fine line pattern deposited on the physical development nuclei.

  Next, a soluble silver complex salt forming agent, a reducing agent, and an alkali solution necessary for silver complex diffusion transfer development will be described. The soluble silver complex salt forming agent is a compound that dissolves silver halide to form a soluble silver complex salt, and the reducing agent is a compound that reduces this soluble silver complex salt to precipitate metallic silver on physical development nuclei. These actions are performed in an alkaline solution.

  Examples of the soluble silver complex forming agent used in the present invention include sodium thiosulfate, thiosulfate such as ammonium thiosulfate, thiocyanate such as sodium thiocyanate and ammonium thiocyanate, alkanolamine, sodium sulfite, and potassium bisulfite. Sulfites such as T. H. Examples include the compounds described in 474-475 (1977) of James The Theory of the Photographic Process 4th edition.

  As the reducing agent used in the present invention, a developing agent known in the field of photographic development can be used. For example, polyhydroxybenzenes such as hydroquinone, catechol, pyrogallol, methylhydroquinone, chlorohydroquinone, 1-phenyl-4-dimethyl-3-pyrazolidone, 1-phenyl-3-pyrazolidone, 1-phenyl-4-methyl-4- Examples include 3-pyrazolidones such as hydroxymethyl-3-pyrazolidone, paramethylaminophenol, paraaminophenol, parahydroxyphenylglycine, paraphenylenediamine, and the like.

  The above-described soluble silver complex salt forming agent and reducing agent may be applied to the transparent substrate film together with the physical development nucleus layer, added to the silver halide emulsion layer, or in the alkaline solution. It may be contained, and may be further contained at a plurality of positions, but is preferably contained at least in the alkaline liquid.

  The content of the soluble silver complex salt forming agent in the alkaline solution is suitably used in the range of 0.1 to 5 mol per liter of the developer, and the reducing agent is 0.05 to 1 per liter of the developer. It is suitable to use in the molar range.

  The pH of the alkaline solution is preferably 10 or more, and more preferably 11-14. In the present invention, the alkali solution for performing silver complex diffusion transfer development may be an immersion method or a coating method. The immersion method is, for example, transporting while immersing a transparent substrate film provided with a physical development nucleus layer and a silver halide emulsion layer in an alkaline solution stored in a large amount in a tank. For example, about 40 to 120 ml of an alkali solution per square meter is coated on the silver halide emulsion layer.

  The physically developed silver formed as described above has a surface resistivity of 50 ohms / square or less, preferably 20 ohms / square or less, but a pattern with a fine line width of 40 μm or less, for example, a fine line width of 20 μm. When the total light transmittance is 50% or more, the surface resistance becomes several hundred ohms / square to 1000 ohms / square or more. However, this physical development silver itself has a good silver electroplating (plating), especially electrolytic plating, because it has a good silver image and is electrically conductive. Can be secured.

  The fine line pattern of physically developed silver can be plated by any of electroless plating, electrolytic plating, or a combination of both. However, in producing the electromagnetic shielding material of the present invention, From the standpoint that at least a series of treatments of fine line pattern exposure, development treatment and plating treatment can be applied to a roll-like long web provided with a physical development nucleus layer and a silver halide emulsion layer. A method in which electrolytic plating is combined is preferable.

In the present invention, the metal plating method can be performed by a known method. For example, the electrolytic plating method is a conventionally known method such as copper, nickel, silver, gold, solder, or a multilayer or composite system of copper / nickel. For these, reference can be made to documents such as “Surface Treatment Technology Overview; Technical Data Center, 1987/12/21 First Edition, pages 281 to 422”.
In particular, it is preferable to use copper and / or nickel for reasons such as easy plating, excellent conductivity, plating of a thick film, and low cost. As an example of electrolytic plating, the transparent base material on which the above-described physically developed silver is formed is bathed in a bath mainly composed of copper sulfate, sulfuric acid, etc., and a current density of 1 to 20 amps / cm at 10 to 40 ° C. Plating can be performed by energizing at dm ² .
As described above, the detection line is a thin line plated with metal using the physically developed metallic silver as a catalyst core, and even when the thickness or line width is extremely small, sufficient detection of a change in the resistance value of the detection line is possible. Conductivity can be ensured and excellent alarm performance can be obtained.

In the present invention, a blackened layer for reducing the reflectance may be formed on the surface of the fine metal wire. The blackened layer may be a layer having a color that hardly reflects light, and may be not only black, but also, for example, blackish brown or blackish green. By forming the blackened layer, the detection line is less noticeable. For example, when it is used for a window glass or the like, the opposite side is easily visible, which is preferable. When the detection line is made of a transparent metal oxide, the blackening layer is not necessary.
The blackening layer can be formed by an ink treatment by applying a black ink, a plating treatment with a metal having a black surface such as ruthenium, nickel, or tin, or a chemical conversion treatment (oxidation treatment or the like) of a fine metal wire. Of these, in the chemical conversion treatment, a thin film of metal oxide is formed on the surface of the metal film, so that it becomes black.

  Furthermore, in the film for security sensors of the present invention, a resin layer can be laminated on the side of the detection line opposite to the base film. Accordingly, the detection line can be protected by the resin layer, and an external force that does not cause an abnormality such as breakage in the glass is preferable because a change in the resistance value due to the damage of the detection line hardly occurs. The resin layer can be formed by laminating a plastic film (protective film), an adhesive, a resin coating, or the like.

When the resin layer is an adhesive, the security sensor film can be attached to the window glass etc. on the adhesive layer side, so the detection line is located between the base film and the window glass. ,preferable.
Moreover, a rust preventive agent, an ultraviolet absorber, a heat stabilizer, etc. can be added for the oxidation prevention of a metal fine wire. Thereby, the increase in resistance due to oxidation of the detection line is suppressed, and the detection sensitivity can be maintained for a longer period.

In the present invention, a detection circuit capable of detecting a change in resistance value of the detection line is connected to the detection line.
As the detection circuit, a circuit that can detect disconnection of the detection line and / or change in resistance value can be used. The detection circuit preferably has an alarm that generates a signal by sound, light, radio waves, or the like when a disconnection or resistance value change is detected. In addition, it is preferable to use a battery as a power source for the detection circuit because the battery can be directly attached to a window or the like together with the detection circuit.
As shown in FIGS. 3 and 6, the detection circuit 8 can be attached to, for example, a corner of a window. In particular, it is preferable to provide at the upper corner which is difficult to reach. At this time, the adhesive sheet (black tape 8b) is made into a triangular shape (for example, a 10 cm square square is cut in half and cut in half) with a slope of about 45 ° (about 30 to 60 °) on the hypotenuse. Covering the top is preferable because the detection circuit is less noticeable. The dimensions of the detection circuit and the battery are preferably thin enough to open and close the glass window.
The black tape may be attached to a corner other than the corner provided with the detection circuit (not shown). In this case, the extra black tape becomes a dummy, and it is possible to obscure the location of the detection circuit.

The security sensor of the present invention can be provided in a window of a building or a car, for example. The detection lines are not conspicuous, and are difficult to see when viewed from a position that is, for example, about 1 m or more away, so that it is difficult to give an unpleasant appearance. It can also be suppressed that an intruder notices and the intrusion location is changed. When approaching a very close position, the detection line may become visible, but in this case, since the suspicious person who tried to enter the building etc. approaches the very close position, it will notice the presence of the detection line, Surprised by the fact that a security sensor is installed, it is preferable to give up illegal activities such as intrusion and destruction without having the room to change the intrusion route, because damage is prevented in advance. If it is attached to the window of a vehicle such as an automobile, a high crime prevention effect can be obtained against illegal activities such as so-called vandalism.
The shape of the wiring pattern of the detection line does not need to be decorative, and it can be a pattern that is easily targeted, such as a grid-like geometric shape or a window lock. A pattern suitable for cost and the like can be adopted. This is advantageous in terms of reliability and price.

(Example 1)
As shown in FIG. 1, an adhesive layer 11a (polyester polyurethane adhesive, thickness 10 μm) on one side (surface opposite to the hard coat layer 11b) of the base film 11 (PET with a hard coat layer 11b, thickness 50 μm). The metal foil 12a having a thickness of 12 μm, a line width of 20 μm, and an interval of 250 μm was formed in a lattice shape (see the circle in FIG. 2). The surface of the fine metal wire 12a was subjected to chemical conversion treatment to form a blackened layer 12b made of copper oxide, whereby the lattice-like detection lines 12 were provided on the entire surface of the base film 11.
30 g of urethane-crosslinked acrylic pressure-sensitive adhesive in which 0.5% by mass of benzotriazole and 0.5% by mass of UV absorber are blended on the surface of the base film 11 on the side of the detection line 12 and the detection line 12 as a rust inhibitor. The resin layer (adhesive layer) 13 was formed by coating with a thickness of / m ² .
As shown in FIG. 2, a conductive tape 7 (38 μm thick copper foil coated with a conductive adhesive, with a conductive adhesive of 0.1Ω / □) on both sides of the security sensor film 6 is provided. As shown in FIG. 3, the detection circuit 8 was electrically connected to the detection line 12 of the security sensor film 6 via the conductive tape 7 and the lead wire 8a. The security sensor film 6 was attached to the glass 2 of the window 1 through the pressure-sensitive adhesive layer 13 so that air bubbles would not enter the pressure-sensitive adhesive layer 13. The conductive tape 7 can be hidden under the sash 3 of the window 1 as shown in FIG. The detection circuit 8 has a black tape for concealment disposed between the glass 2 and a battery (not shown). The detection circuit 8 is neatly arranged at the upper corner of the glass 2 together with a battery (not shown), and further has a black tape for concealment thereon. 8b was pasted to complete the security sensor 5.

(Example 2)
An unexposed film obtained by coating a substrate film (PET, thickness 100 μm) with physical development nuclei and a silver halide emulsion (not shown) and drying it is exposed, developed, linear, and dried. As shown in FIG. 4, a physical development layer 22 a made of silver was formed on the base film 21. The physical development layer 22a has a lattice shape (thickness: about 0.07 μm, line width: 20 μm, interval: 250 μm) similar to that shown in the circle of FIG. Copper is plated to a thickness of 5 μm on the physical development layer 22a to form a plating layer 22b, and a blackening layer 22c (thickness of 2 μm or less) is formed on the surface of the physical development layer 22a and the plating layer 22b by chemical conversion treatment. By doing so, the grid-like detection lines 22 were provided on the entire surface of the base film 21.
The base film 21 with the detection line 22 was sandwiched between the two glasses 2 and 2 through the EVA films 23 and 24 having a thickness of 400 μm, and vacuum thermocompression bonded. Here, the EVA film 23 on the detection line 22 side is a resin layer laminated on the detection line 22.
As in FIG. 2, conductive tape 7 (38 μm thick copper foil coated with conductive adhesive on both sides of security sensor film 6 is 0.1 Ω / □). Affixed at 7 mm, fitted into the sash 3 as shown in FIG. 3, and the detection circuit 8 was electrically connected to the detection line 22 of the security sensor film 6 via the lead wire 8a.
The detection circuit 8 has a black tape for concealment disposed between the glass 2 and a battery (not shown). The detection circuit 8 is neatly arranged at the upper corner of the glass 2 together with a battery (not shown), and further has a black tape for concealment thereon. 8b was pasted to complete the security sensor 5.

(Example 3)
As shown in FIG. 5, a copper foil (thickness 12 μm) adhered to one side of a base film 31 (PET, thickness 100 μm) via an adhesive layer 31a (polyester polyurethane adhesive, thickness 10 μm). By etching, metal fine wires 32a having a thickness of 12 μm, a line width of 60 μm, and an interval of 20 mm were formed. Here, as shown in FIG. 6, the wiring pattern of the fine metal wires 32a is folded back in a S-shape, and in particular, the shape of the fine metal wires 32a is preferentially wired near the lock 4 (lever) of the window 1. did.
A grid-like detection line 32 was provided on the base film 31 by forming a blackened layer 32b made of copper oxide on the surface of the fine metal wire 32a by chemical conversion treatment.
The substrate film 31 with the detection line 32 was sandwiched between the two glasses 2 and 2 through the EVA films 33 and 34 having a thickness of 400 μm and vacuum thermocompression bonded. Here, the EVA film 33 on the detection line 32 side is a resin layer laminated on the detection line 32. As shown in FIG. 5, the films 33 and 34 are laminated over the entire surface of the glass 2.
As in FIG. 2, the edge of the base film 31 and the detection wire 32 is placed on the outer side of the glass 2 in advance on one side of the security sensor film 6 (the side disposed near the lock 4 in FIG. 6). A conductive tape 7 (38 μm thick copper foil coated with a conductive adhesive, with a conductive material having a conductivity of 0.1Ω / □) is pasted with a width of 7 mm, and FIG. As shown, it was fitted into the sash 3, and the detection circuit 8 was electrically connected to the detection line 32 of the security sensor film 6 through the lead wire 8a. The detection circuit 8 has a black tape for concealment disposed between the glass 2 and a battery (not shown). The detection circuit 8 is neatly arranged at the upper corner of the glass 2 together with a battery (not shown), and further has a black tape for concealment thereon. 8b was pasted to complete the security sensor 5.

Example 4
As a thin metal wire, instead of the thin metal wire 32a obtained by etching a copper foil, copper is plated to a thickness of 4 μm on a physical development layer 22a made of silver (thickness: about 0.07 μm, line width: 30 μm, spacing: 20 mm). A security sensor was completed in the same manner as in Example 3 except that the thin metal wire formed with the layer 22b was used.

(Comparative Example 1)
A security sensor 5 was completed in the same manner as in Example 3 except that the line width of the fine metal wires was 500 μm and the interval was 20 mm.

(test)
About the security sensor of the said Examples 1-4 and the comparative example 1, total light transmittance, alarm property, the electrical resistance of a detection line, and the visibility of the detection line by visual observation were tested.
The total light transmittance was measured by a method based on JIS K 7361.
As for the alarm property, it was tested whether an abnormality of the window glass could be detected from the change in resistance value when the window glass was broken. In Table 1, when the abnormality of the window glass could be detected, a mark “◯” was given as a pass, and when the abnormality of the window glass was not detected, a mark “X” was given as a failure.
Visibility of the detection line by visual observation was observed from a position 1 m away from the window glass, and it was confirmed whether the detection line of the security sensor could be seen and give an unpleasant appearance. In Table 1, when the detection line was not visible and no discomfort was given, a mark “◯” was given as a pass, and when the detection line was visible and given a discomfort, an x was marked as a failure.

As shown in Table 1, according to the security sensors of Examples 1 to 4, the total light transmittance was high, the alarm property was ensured, the detection line was not noticeable, and it was difficult to give discomfort. It was.
In the case of the security sensor of Comparative Example 1, the total light transmittance was low, the translucency desired for the window glass was lowered, and the detection lines were easily noticeable.

  The present invention can be used as a security sensor by being attached to a window of a building or a vehicle.

It is sectional drawing which shows 1st Example of the security sensor of this invention. It is a front view which shows 1st Example of the crime prevention sensor of this invention. It is a front view which shows an example of the window provided with the security sensor of this invention. It is sectional drawing which shows 2nd Example of the crime prevention sensor of this invention. It is sectional drawing which shows 3rd Example of the crime prevention sensor of this invention. It is a front view which shows the other example of the window provided with the security sensor of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 2 ... Window glass, 8 ... Detection circuit, 11, 21, 31 ... Flexible transparent film (base film), 12, 22, 32 ... Detection line, 12b ... Blackening layer, 13 ... Resin layer (adhesive layer) ), 22a ... physical development layer, 22b ... plating layer, 22c ... blackening layer, 23, 33 ... resin layer (protective film).

Claims (12)

  A film for a security sensor, wherein a detection line made of a thin metal wire having a thickness of 20 μm or less, a line width of 300 μm or less, and a total light transmittance of 50% or more is wired on a flexible transparent film.   The film for a security sensor according to claim 1, wherein the thickness of the fine metal wire is 5 µm or less.   The security sensor film according to claim 1 or 2, wherein the detection line is a fine line obtained by plating a metal using a physically developed metallic silver as a catalyst core.   The security sensor film according to any one of claims 1 to 3, wherein the detection line has a blackening layer for making the surface of the metal fine wire black.   The security sensor film according to any one of claims 1 to 4, wherein a resin layer is laminated on an opposite side of the detection line to the flexible transparent film.   The security sensor film according to claim 5, wherein the resin layer is a plastic film.   The security resin film according to claim 5, wherein the resin layer is an adhesive.   A security sensor, wherein a detection circuit capable of detecting a change in the resistance value of the detection line is connected to the detection line of the film for a security sensor according to claim 1.   The security sensor according to claim 8, wherein the detection circuit is capable of detecting cutting of the detection line and / or a change in resistance value.   The security sensor according to claim 8 or 9, wherein the security sensor film is laminated on a window glass.   After supplying unexposed silver halide to the physical development nucleus layer provided on the flexible transparent film by physical development processing, and depositing metallic silver in an arbitrary fine line pattern on the physical development nucleus layer, A method for producing a film for a security sensor, wherein a detection line made of a fine metal wire is wired by plating a metal using the physically developed metallic silver as a catalyst core.   A photosensitive material having a physical development nucleus layer and a silver halide emulsion layer in this order is exposed on a flexible transparent film, and metallic silver is deposited in an arbitrary fine line pattern on the physical development nucleus layer by physical development processing. Then, after the layer provided on the physical development nucleus layer is removed, the metal wire is plated using the physically developed metal silver as a catalyst nucleus, thereby wiring the detection line made of the thin metal wire. The manufacturing method of the film for crime prevention sensors of Claim 11.

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