JP2005336535A - 成膜装置及び成膜方法 - Google Patents

成膜装置及び成膜方法 Download PDF

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Publication number
JP2005336535A
JP2005336535A JP2004155765A JP2004155765A JP2005336535A JP 2005336535 A JP2005336535 A JP 2005336535A JP 2004155765 A JP2004155765 A JP 2004155765A JP 2004155765 A JP2004155765 A JP 2004155765A JP 2005336535 A JP2005336535 A JP 2005336535A
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JP
Japan
Prior art keywords
target
substrate
axis
film
film forming
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Pending
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JP2004155765A
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English (en)
Japanese (ja)
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JP2005336535A5 (enExample
Inventor
Kenji Ando
謙二 安藤
Hidehiro Kanazawa
秀宏 金沢
Takako Imai
香子 今井
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004155765A priority Critical patent/JP2005336535A/ja
Publication of JP2005336535A publication Critical patent/JP2005336535A/ja
Publication of JP2005336535A5 publication Critical patent/JP2005336535A5/ja
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
JP2004155765A 2004-05-26 2004-05-26 成膜装置及び成膜方法 Pending JP2005336535A (ja)

Priority Applications (1)

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JP2004155765A JP2005336535A (ja) 2004-05-26 2004-05-26 成膜装置及び成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004155765A JP2005336535A (ja) 2004-05-26 2004-05-26 成膜装置及び成膜方法

Publications (2)

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JP2005336535A true JP2005336535A (ja) 2005-12-08
JP2005336535A5 JP2005336535A5 (enExample) 2007-07-19

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JP2004155765A Pending JP2005336535A (ja) 2004-05-26 2004-05-26 成膜装置及び成膜方法

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007291506A (ja) * 2006-03-31 2007-11-08 Canon Inc 成膜方法
JP2011162858A (ja) * 2010-02-12 2011-08-25 Ulvac Japan Ltd 位置決め装置
JP2013001920A (ja) * 2011-06-14 2013-01-07 Hitachi High-Technologies Corp スパッタリング装置、スパッタリング装置を用いた成膜装置、およびそれらの成膜方法
WO2016152395A1 (ja) * 2015-03-20 2016-09-29 芝浦メカトロニクス株式会社 成膜装置及び成膜ワーク製造方法
US9481595B2 (en) 2010-06-03 2016-11-01 Canon Kabushiki Kaisha Method of producing optical element forming mold and optical element forming mold
KR20200105696A (ko) 2018-02-06 2020-09-08 캐논 아네르바 가부시키가이샤 기판 처리 장치 및 기판 처리 방법
CN114150278A (zh) * 2021-12-07 2022-03-08 业成科技（成都）有限公司 圆心对称型3d基板镀膜方法
CN115354284A (zh) * 2022-07-15 2022-11-18 湖南红太阳光电科技有限公司 一种旋转阴极及靶基距在线调节方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH064921A (ja) * 1992-06-24 1994-01-14 Victor Co Of Japan Ltd 光磁気記録媒体の製作方法及び製作装置
JPH10121235A (ja) * 1996-10-21 1998-05-12 Ulvac Japan Ltd 複合スパッタリングカソード、そのカソードを用いたスパッタリング装置
JPH10121237A (ja) * 1996-10-11 1998-05-12 Sony Corp スパッタ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH064921A (ja) * 1992-06-24 1994-01-14 Victor Co Of Japan Ltd 光磁気記録媒体の製作方法及び製作装置
JPH10121237A (ja) * 1996-10-11 1998-05-12 Sony Corp スパッタ装置
JPH10121235A (ja) * 1996-10-21 1998-05-12 Ulvac Japan Ltd 複合スパッタリングカソード、そのカソードを用いたスパッタリング装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007291506A (ja) * 2006-03-31 2007-11-08 Canon Inc 成膜方法
US7959971B2 (en) 2006-03-31 2011-06-14 Canon Kabushiki Kaisha Film formation method with deposition source position control
JP2011162858A (ja) * 2010-02-12 2011-08-25 Ulvac Japan Ltd 位置決め装置
US9481595B2 (en) 2010-06-03 2016-11-01 Canon Kabushiki Kaisha Method of producing optical element forming mold and optical element forming mold
JP2013001920A (ja) * 2011-06-14 2013-01-07 Hitachi High-Technologies Corp スパッタリング装置、スパッタリング装置を用いた成膜装置、およびそれらの成膜方法
WO2016152395A1 (ja) * 2015-03-20 2016-09-29 芝浦メカトロニクス株式会社 成膜装置及び成膜ワーク製造方法
KR20200105696A (ko) 2018-02-06 2020-09-08 캐논 아네르바 가부시키가이샤 기판 처리 장치 및 기판 처리 방법
US11270873B2 (en) 2018-02-06 2022-03-08 Canon Anelva Corporation Substrate processing apparatus and substrate processing method
DE112019000682B4 (de) 2018-02-06 2023-06-29 Canon Anelva Corporation Substratbearbeitungsvorrichtung und Substratbearbeitungsverfahren
US11694882B2 (en) 2018-02-06 2023-07-04 Canon Anelva Corporation Substrate processing apparatus and substrate processing method
CN114150278A (zh) * 2021-12-07 2022-03-08 业成科技（成都）有限公司 圆心对称型3d基板镀膜方法
CN115354284A (zh) * 2022-07-15 2022-11-18 湖南红太阳光电科技有限公司 一种旋转阴极及靶基距在线调节方法

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