JP2005316167A5 - - Google Patents

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Publication number
JP2005316167A5
JP2005316167A5 JP2004134441A JP2004134441A JP2005316167A5 JP 2005316167 A5 JP2005316167 A5 JP 2005316167A5 JP 2004134441 A JP2004134441 A JP 2004134441A JP 2004134441 A JP2004134441 A JP 2004134441A JP 2005316167 A5 JP2005316167 A5 JP 2005316167A5
Authority
JP
Japan
Prior art keywords
exposure
pattern
exposed
unit
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004134441A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005316167A (ja
JP4253707B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2004134441A external-priority patent/JP4253707B2/ja
Priority to JP2004134441A priority Critical patent/JP4253707B2/ja
Priority to KR1020067022507A priority patent/KR101094468B1/ko
Priority to TW094113745A priority patent/TWI380134B/zh
Priority to CNB2005800131153A priority patent/CN100483258C/zh
Priority to PCT/JP2005/008115 priority patent/WO2005106591A1/ja
Publication of JP2005316167A publication Critical patent/JP2005316167A/ja
Publication of JP2005316167A5 publication Critical patent/JP2005316167A5/ja
Publication of JP4253707B2 publication Critical patent/JP4253707B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004134441A 2004-04-28 2004-04-28 露光パターン形成方法 Expired - Fee Related JP4253707B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004134441A JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法
PCT/JP2005/008115 WO2005106591A1 (ja) 2004-04-28 2005-04-28 露光パターン形成方法
TW094113745A TWI380134B (en) 2004-04-28 2005-04-28 Exposure pattern forming method
CNB2005800131153A CN100483258C (zh) 2004-04-28 2005-04-28 曝光图案形成方法
KR1020067022507A KR101094468B1 (ko) 2004-04-28 2005-04-28 노광 패턴 형성 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004134441A JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法

Publications (3)

Publication Number Publication Date
JP2005316167A JP2005316167A (ja) 2005-11-10
JP2005316167A5 true JP2005316167A5 (OSRAM) 2007-05-24
JP4253707B2 JP4253707B2 (ja) 2009-04-15

Family

ID=35241830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004134441A Expired - Fee Related JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法

Country Status (5)

Country Link
JP (1) JP4253707B2 (OSRAM)
KR (1) KR101094468B1 (OSRAM)
CN (1) CN100483258C (OSRAM)
TW (1) TWI380134B (OSRAM)
WO (1) WO2005106591A1 (OSRAM)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5344730B2 (ja) * 2006-05-22 2013-11-20 株式会社ブイ・テクノロジー 露光装置
JP5319175B2 (ja) * 2008-06-17 2013-10-16 日立造船株式会社 パターン描画方法及び装置
CN102725680B (zh) * 2010-01-21 2015-02-11 夏普株式会社 基板、针对基板的曝光方法、光取向处理方法
JP5538049B2 (ja) * 2010-04-22 2014-07-02 日東電工株式会社 フォトマスクと基材との位置合わせ方法および配線回路基板の製造方法
JP5704315B2 (ja) * 2011-01-07 2015-04-22 株式会社ブイ・テクノロジー 露光装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010623A (ja) * 1983-06-29 1985-01-19 Fujitsu Ltd ホトリピ−タ
JPS62124999A (ja) * 1985-11-27 1987-06-06 株式会社ニコン 自動作図装置
JP3046697B2 (ja) * 1993-11-08 2000-05-29 シャープ株式会社 露光装置
JPH09171106A (ja) * 1995-10-19 1997-06-30 Fuji Photo Film Co Ltd カラーフィルターの作製方法
JP3169068B2 (ja) * 1997-12-04 2001-05-21 日本電気株式会社 電子線露光方法及び半導体ウエハ
JPWO2002025711A1 (ja) * 2000-09-21 2004-01-29 株式会社ニコン 結像特性の計測方法及び露光方法
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

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