JP2005281710A5 - - Google Patents

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Publication number
JP2005281710A5
JP2005281710A5 JP2004065318A JP2004065318A JP2005281710A5 JP 2005281710 A5 JP2005281710 A5 JP 2005281710A5 JP 2004065318 A JP2004065318 A JP 2004065318A JP 2004065318 A JP2004065318 A JP 2004065318A JP 2005281710 A5 JP2005281710 A5 JP 2005281710A5
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JP
Japan
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JP2004065318A
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English (en)
Japanese (ja)
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JP4344631B2 (ja
JP2005281710A (ja
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Application filed filed Critical
Priority to JP2004065318A priority Critical patent/JP4344631B2/ja
Priority claimed from JP2004065318A external-priority patent/JP4344631B2/ja
Priority to US11/183,720 priority patent/US7369758B2/en
Publication of JP2005281710A publication Critical patent/JP2005281710A/ja
Publication of JP2005281710A5 publication Critical patent/JP2005281710A5/ja
Application granted granted Critical
Publication of JP4344631B2 publication Critical patent/JP4344631B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004065318A 2004-03-02 2004-03-09 有機物薄膜堆積用分子線源 Expired - Fee Related JP4344631B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004065318A JP4344631B2 (ja) 2004-03-02 2004-03-09 有機物薄膜堆積用分子線源
US11/183,720 US7369758B2 (en) 2004-03-02 2005-07-18 Molecular beam source for use in accumulation of organic thin-films

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004057049 2004-03-02
JP2004065318A JP4344631B2 (ja) 2004-03-02 2004-03-09 有機物薄膜堆積用分子線源

Publications (3)

Publication Number Publication Date
JP2005281710A JP2005281710A (ja) 2005-10-13
JP2005281710A5 true JP2005281710A5 (enExample) 2006-02-09
JP4344631B2 JP4344631B2 (ja) 2009-10-14

Family

ID=35180433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004065318A Expired - Fee Related JP4344631B2 (ja) 2004-03-02 2004-03-09 有機物薄膜堆積用分子線源

Country Status (2)

Country Link
US (1) US7369758B2 (enExample)
JP (1) JP4344631B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100688969B1 (ko) * 2005-10-24 2007-03-08 삼성전자주식회사 표시장치용 기판의 제조장치 및 제조방법
GB0619160D0 (en) * 2006-09-28 2006-11-08 Oxford Instr Plasma Technology Valve assembly
FR2956411B1 (fr) * 2010-02-16 2012-04-06 Astron Fiamm Safety Systeme de chauffage d'une source de depot en phase vapeur

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH654596A5 (de) * 1983-09-05 1986-02-28 Balzers Hochvakuum Verdampferzelle.
US5336324A (en) * 1991-12-04 1994-08-09 Emcore Corporation Apparatus for depositing a coating on a substrate
US5253266A (en) * 1992-07-20 1993-10-12 Intevac, Inc. MBE effusion source with asymmetrical heaters
US5820681A (en) 1995-05-03 1998-10-13 Chorus Corporation Unibody crucible and effusion cell employing such a crucible
JP2003002778A (ja) 2001-06-26 2003-01-08 International Manufacturing & Engineering Services Co Ltd 薄膜堆積用分子線セル
JP3684343B2 (ja) 2001-09-25 2005-08-17 株式会社日本ビーテック 薄膜堆積用分子線源セル
DE10211573A1 (de) * 2002-03-15 2003-10-16 Unaxis Balzers Ag Vakuumverdampfungseinrichtung

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