JP2005260270A - Resin-sealed semiconductor device and its manufacturing method - Google Patents

Resin-sealed semiconductor device and its manufacturing method Download PDF

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JP2005260270A
JP2005260270A JP2005130978A JP2005130978A JP2005260270A JP 2005260270 A JP2005260270 A JP 2005260270A JP 2005130978 A JP2005130978 A JP 2005130978A JP 2005130978 A JP2005130978 A JP 2005130978A JP 2005260270 A JP2005260270 A JP 2005260270A
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terminal
resin
semiconductor device
semiconductor element
external
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JP4176092B2 (en
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Yutaka Yagi
裕 八木
Yoichi Hitomi
陽一 人見
Makoto Nakamura
誠 中村
Masahito Sasaki
将人 佐々木
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

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  • Lead Frames For Integrated Circuits (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a resin-sealed semiconductor device which is reduced in size by increasing an occupation rate of chips in a semiconductor device package size and has realized a higher pin counts which has been conventionally difficult to achieve in a small package such as TSOP, in order to respond to a call for higher integration and higher performance of the resin-sealed semiconductor device. <P>SOLUTION: The resin-sealed semiconductor device 200 and 200A has such a structure that a plurality of terminal units 230, each having an internal terminal on the front face side and an external terminal on the rear face side in an integrated state, are arranged substantially in a plane in such a manner as to be electrically independent from each other, and the internal terminals of the terminal units 230 and terminals of a semiconductor element are electrically connected by wires 240, and then the whole body is sealed with resin with part of the external terminal of each terminal unit 230 being exposed to the outside. A lead 225 is integrally connected to each terminal unit 230 along the plane in which the plurality of terminals units 230 are arranged. The leads 225 are electrically independent from each other, and the semiconductor element 210 is mounted on the plurality of leads 225, being electrically insulated from these leads 225. <P>COPYRIGHT: (C)2005,JPO&amp;NCIPI

Description

本発明は、半導体素子を搭載する樹脂封止型の半導体装置(プラスチックパッケージ)に関し、特に、パッケージサイズの小型化に対応し、その実装性を向上させることができる半導体装置とその製造方法に関する。   The present invention relates to a resin-encapsulated semiconductor device (plastic package) on which a semiconductor element is mounted, and more particularly to a semiconductor device that can cope with a reduction in package size and improve its mountability and a method for manufacturing the same.

近年、半導体装置は、高集積化、小型化技術の進歩と電子機器の高性能化と軽薄短小化の傾向(時流)から、LSIのASICに代表されるように、ますます高集積化、高機能化になってきている。
これに伴い、リードフレームを用いた封止型の半導体装置においても、その開発のトレンドが、SOJ(Small Outline J−Leaded Package)やQFP(Quad Flat Package)のような表面実装型のパッケージを経て、TSOP(Thin Small Outline Package)の開発による薄型化を主軸としたパッケージの小型化へ、さらにはパッケージ内部の3次元化によるチップ収納効率向上を目的としたLOC(Lead On Chip)の構造へと進展してきた。
しかし、樹脂封止型半導体装置パッケージには、高集積化、高機能化とともに、更に一層の多ピン化、薄型化、小型化が求めらており、上記従来のパッケージにおいてもチップ外周部分のリードの引き回しがあるため、パッケージの小型化に限界が見えてきた。
また、TSOP等の小型パッケージにおいては、リードの引き回し、ピンピッチから多ピン化に対しても限界が見えてきた。
In recent years, semiconductor devices are becoming increasingly integrated and highly integrated, as represented by LSI ASICs, due to the trend of high integration and miniaturization technology and the trend of high performance and light and thin electronic devices (current). It is becoming functional.
As a result, even in a sealed semiconductor device using a lead frame, the development trend has progressed through surface-mounted packages such as SOJ (Small Outline J-Leaded Package) and QFP (Quad Flat Package). , TSOP (Thin Small Outline Package) development to reduce the size of the package with the main axis being thin, and further to the LOC (Lead On Chip) structure for the purpose of improving chip storage efficiency by making the inside of the package three-dimensional Has progressed.
However, resin-encapsulated semiconductor device packages are required to have higher integration, higher functionality, and even higher pin counts, thickness reductions, and downsizing. As a result, there has been a limit in reducing the size of the package.
In addition, in a small package such as TSOP, there is a limit to the number of pins due to lead routing and pin pitch.

上記のように、更なる樹脂封止型半導体装置の高集積化、高機能化が求められており、樹脂封止型半導体装置パッケージの一層の多ピン化、薄型化、小型化が求められている。
本発明は、このような状況のもと、半導体装置パッケージサイズにおけるチップの占有率を上げ、半導体装置の小型化に対応させ、回路基板への実装面積を低減できる、即ち、回路基板への実装密度を向上させることができる樹脂封止型半導体装置を提供しようとするものである。
また、同時に従来のTSOP等の小型パッケージに困難であった更なる多ピン化を実現しようとするものである。
As described above, there is a demand for higher integration and higher functionality of resin-encapsulated semiconductor devices, and there is a need for further increase in the number of pins, thickness, and size of resin-encapsulated semiconductor device packages. Yes.
Under such circumstances, the present invention can increase the chip occupancy ratio in the semiconductor device package size, cope with the miniaturization of the semiconductor device, and reduce the mounting area on the circuit board, that is, mounting on the circuit board. An object of the present invention is to provide a resin-encapsulated semiconductor device capable of improving the density.
At the same time, it is intended to realize a further increase in the number of pins, which has been difficult for a conventional small package such as TSOP.

このような目的を達成するために、本発明の樹脂封止型半導体装置は、表面側に内部端子と裏面側に外部端子を表裏一体的に有する端子部を略一平面内に複数個、それぞれ互いに電気的に独立して配置し、端子部の内部端子と半導体素子の端子とをワイヤにて電気的に接続し、各端子部の外部端子の一部を外部に露出させるように全体を樹脂封止した樹脂封止型半導体装置において、複数個の前記端子部が配置された平面に沿うように各端子部にリードを一体的に連結し、かつ、各リードをそれぞれ互いに電気的に独立して配置し、前記半導体素子が複数の前記リード上に電気的に絶縁して搭載されたような構成とした。
外部に露出した外部端子面に半田からなる外部電極を備えるような構成とした。
前記半導体素子の端子は半導体素子の端子面の一対の辺の略中心部線上にそって配置されており、前記端子部は前記中心部線を挟むように対向する前記一対の各辺に沿い、それぞれ設けられているような構成とした。
In order to achieve such an object, the resin-encapsulated semiconductor device of the present invention includes a plurality of terminal portions in a substantially flat plane each having an internal terminal on the front surface side and an external terminal on the back surface side. Resin is arranged so as to be electrically independent from each other, electrically connecting the internal terminals of the terminal section and the terminals of the semiconductor element with wires, and exposing a part of the external terminals of each terminal section to the outside. In a sealed resin-encapsulated semiconductor device, leads are integrally connected to the terminal portions along a plane on which the plurality of terminal portions are arranged, and the leads are electrically independent from each other. The semiconductor element is mounted on the plurality of leads in an electrically insulated manner.
An external electrode made of solder is provided on the external terminal surface exposed to the outside.
The terminals of the semiconductor element are arranged along substantially the center line of a pair of sides of the terminal surface of the semiconductor element, and the terminal part is along the pair of sides facing each other so as to sandwich the center line. It was set as the structure provided respectively.

本発明の樹脂封止型半導体装置の製造方法は、表面側に内部端子と裏面側に外部端子を表裏一体的に有する複数の端子部を略一平面内に互いに電気的に独立して配置し、端子部の内部端子と半導体素子の端子とをワイヤにて電気的に接続し、各端子部の外部端子の一部を外部に露出させるように全体を樹脂封止した樹脂封止型半導体装置の製造方法において、(A)導電性基板をエッチングして、表面側に内部端子を裏面側に外部端子を表裏一体的に有する複数の端子部と、前記各端子部が相互に独立して接続リードを介して一体的に連結された外枠部材と、各端子部に一体連結された半導体素子搭載用のリードと、を備えた回路部材を作成する回路部材作成工程と、(B)半導体素子搭載用のリードに半導体素子を電気的に絶縁して固着することにより搭載する半導体素子搭載工程と、(C)半導体素子の端子と回路部材の内部端子とをワイヤで電気的に接続するワイヤボンディング工程と、(D)各外部端子の一部を外部に露出させるように全体を樹脂封止する樹脂封止工程と、(E)回路部材の各接続リードを切断し、外枠部材を除去する外枠部材分離除去工程と、を備えるような構成とした。   In the method for manufacturing a resin-encapsulated semiconductor device of the present invention, a plurality of terminal portions having an internal terminal on the front surface side and an external terminal on the back surface side are integrated in a substantially plane and electrically independent from each other. The resin-encapsulated semiconductor device in which the internal terminals of the terminal portions and the terminals of the semiconductor element are electrically connected with wires, and the entire external terminals of each terminal portion are resin-sealed so as to be exposed to the outside. In the manufacturing method of (A), the conductive substrate is etched, and a plurality of terminal portions having internal terminals on the front surface side and external terminals on the back surface side are integrally connected to each other, and the respective terminal portions are connected independently of each other. A circuit member creating step for creating a circuit member comprising: an outer frame member integrally connected via leads; and a semiconductor element mounting lead integrally connected to each terminal portion; and (B) a semiconductor element. The semiconductor element is electrically insulated and fixed to the mounting lead. A semiconductor element mounting step to be mounted, (C) a wire bonding step of electrically connecting the terminal of the semiconductor element and the internal terminal of the circuit member with a wire, and (D) exposing a part of each external terminal to the outside. And a resin sealing step for resin sealing the whole and (E) an outer frame member separation and removal step for cutting each connection lead of the circuit member and removing the outer frame member.

このような本発明は、更なる樹脂封止型半導体装置の高集積化、高機能化が求められる状況のもと、半導体装置パッケージサイズにおけるチップの占有率を上げ、半導体装置の小型化に対応させ、回路基板への実装面積を低減できる、即ち、回路基板への実装密度を向上させることができる導体装置の提供を可能としたものである。本発明は、同時に従来のTSOP等の小型パッケージに困難であった更なる多ピン化を実現した樹脂封止型半導体装置の提供を可能としたものである。   In the present invention, under the situation where further integration and high functionality of a resin-encapsulated semiconductor device are required, the chip occupancy ratio in the semiconductor device package size is increased and the semiconductor device can be reduced in size. Thus, it is possible to provide a conductor device that can reduce the mounting area on the circuit board, that is, improve the mounting density on the circuit board. The present invention makes it possible to provide a resin-encapsulated semiconductor device that realizes a further increase in the number of pins, which was difficult for a conventional small package such as TSOP.

以下、本発明について図面を参照しながら説明する。
はじめに、本発明の樹脂封止型半導体装置の第1の例を挙げる。
図1(a)は本発明の樹脂封止型半導体装置の第1の例の概略断面図であり、図1(b)はその内部の構成を透視した斜視図であり、図1(c)はその第2の例の概略断面図である。
図1中、100、100Aは樹脂封止型半導体装置、110は半導体素子、111は端子(パッド)、115はダイアタッチ材、120はダイパッド、130は端子部、132は内部端子部、134は外部端子部、134Aは露出部、140はワイヤ、150は封止用樹脂、160は銀めっき、170は半田からなる外部電極である。
図1に示す第1の例の樹脂封止型半導体装置100は、後述するエッチングにて外形加工された回路部材を用い作製したもので、半導体素子110を、端子(パッド)111側の面でない側にて、ダイパッド120にダイアタッチ材115を介して接着して搭載し、半導体素子110の端子(パッド)111と端子部130の内部端子部132とをワイヤ140にて電気的に接続し、且つ、端子部130の外部端子134の一部を外部に露出させ、全体を封止用樹脂150で樹脂封止したものである。
端子部130は、半導体素子110の端子(パッド)111と電気的に結線するための内部端子部132と、外部回路への接続のための外部端子部134とをその表裏に相対するように一体的に設け、略一平面内に二次元的に複数個、それぞれ互いに電気的に独立して配置されている。
図1に示す第1の例の樹脂封止型半導体装置100においては、半導体素子110の端子(パッド)111は半導体素子110の端子面の一対の辺にそって配置されており、端子部130も前記一対の辺に沿い、半導体素子110の外側にそれぞれ設けられている。
そして、図1(a)に示す半導体装置100は、ダイパッド120を端子部130の厚さより薄肉にして、一面を内部端子132の面132Aに沿うように形成したもので、その外部端子134側は、外部端子134の面134Aより内部端子側に凹んだ構造をしている。
The present invention will be described below with reference to the drawings.
First, a first example of the resin-encapsulated semiconductor device of the present invention will be given.
FIG. 1A is a schematic cross-sectional view of a first example of a resin-encapsulated semiconductor device of the present invention, and FIG. 1B is a perspective view illustrating the internal configuration thereof. FIG. These are the schematic sectional drawings of the 2nd example.
In FIG. 1, 100 and 100A are resin-encapsulated semiconductor devices, 110 is a semiconductor element, 111 is a terminal (pad), 115 is a die attach material, 120 is a die pad, 130 is a terminal portion, 132 is an internal terminal portion, and 134 is External terminal portion 134A is an exposed portion, 140 is a wire, 150 is a sealing resin, 160 is silver plating, and 170 is an external electrode made of solder.
A resin-encapsulated semiconductor device 100 of the first example shown in FIG. 1 is manufactured using a circuit member that has been processed by etching, which will be described later, and the semiconductor element 110 is not a surface on the terminal (pad) 111 side. On the side, the die pad 120 is bonded and mounted via the die attach material 115, and the terminal (pad) 111 of the semiconductor element 110 and the internal terminal portion 132 of the terminal portion 130 are electrically connected by the wire 140, In addition, a part of the external terminal 134 of the terminal portion 130 is exposed to the outside, and the whole is sealed with a sealing resin 150.
The terminal portion 130 is integrated so that an internal terminal portion 132 for electrically connecting to a terminal (pad) 111 of the semiconductor element 110 and an external terminal portion 134 for connection to an external circuit are opposed to each other. And two-dimensionally in a substantially plane and are electrically independent of each other.
In the resin-encapsulated semiconductor device 100 of the first example shown in FIG. 1, the terminals (pads) 111 of the semiconductor element 110 are arranged along a pair of sides of the terminal surface of the semiconductor element 110, and the terminal portion 130. Are also provided on the outside of the semiconductor element 110 along the pair of sides.
The semiconductor device 100 shown in FIG. 1A is such that the die pad 120 is made thinner than the thickness of the terminal portion 130 and one surface is formed along the surface 132A of the internal terminal 132. The outer terminal 134 is recessed from the surface 134A toward the inner terminal.

図1(c)に示す第2の例の半導体装置100Aは、図1(a)に示す第1の例の半導体装置100の外部に露出した外部端子部の面134Aに半田からなる外部電極170を設けたものであり、回路基板へ搭載される際には、半田を溶解、固化して、外部端子部134が外部回路と電気的に接続される。   The semiconductor device 100A of the second example shown in FIG. 1C has an external electrode 170 made of solder on the surface 134A of the external terminal portion exposed to the outside of the semiconductor device 100 of the first example shown in FIG. When mounting on a circuit board, the solder is melted and solidified, and the external terminal portion 134 is electrically connected to the external circuit.

図2(a)、図2(b)に示す半導体装置は、図1(a)に示す第1の例の半導体装置100の変形例であり、図2(c)、図2(d)に示す半導体装置は、図1(c)に示す第2の例の半導体装置100Aの変形例である。
図2(a)に示す半導体装置100aは、図1(a)に示す半導体装置100において、ダイパッド120を端子部130の厚さに形成したものである。
そして、図2(b)に示す半導体装置100bは、図1(a)に示す半導体装置100において、ダイパッド120を端子部130の厚さより薄肉にして、一面を外部端子134の面134Aに沿うように形成したもので、その内部端子132側は、内部端子132の面より外部端子側に凹んだ構造をしている。
図2(c)に示す半導体装置100cは、図1(c)に示す半導体装置100Aにおいて、ダイパッド120を端子部130の厚さに形成し、且つ、外部端子134の面134Aに半田からなる外部電極170を設けたものである。
図2(d)に示す半導体装置100dは、図1(c)に示す半導体装置100Aにおいて、ダイパッド120を端子部130の厚さより薄肉にして、一面を外部端子134の面134Aに沿うように形成したもので、内部端子132側は、内部端子132の面より外部端子側に凹んだ構造をしている。
The semiconductor device shown in FIGS. 2A and 2B is a modification of the semiconductor device 100 of the first example shown in FIG. 1A, and is shown in FIGS. 2C and 2D. The semiconductor device shown is a modification of the semiconductor device 100A of the second example shown in FIG.
A semiconductor device 100a shown in FIG. 2A is obtained by forming a die pad 120 with a thickness of a terminal portion 130 in the semiconductor device 100 shown in FIG.
The semiconductor device 100b shown in FIG. 2B has the die pad 120 thinner than the terminal portion 130 in the semiconductor device 100 shown in FIG. 1A so that one surface is along the surface 134A of the external terminal 134. The internal terminal 132 side is recessed from the surface of the internal terminal 132 toward the external terminal side.
The semiconductor device 100c shown in FIG. 2C is the same as the semiconductor device 100A shown in FIG. 1C, except that the die pad 120 is formed to the thickness of the terminal portion 130 and the surface 134A of the external terminal 134 is made of solder. An electrode 170 is provided.
A semiconductor device 100d shown in FIG. 2D is formed so that the die pad 120 is thinner than the terminal portion 130 in the semiconductor device 100A shown in FIG. Therefore, the internal terminal 132 side has a structure that is recessed from the surface of the internal terminal 132 to the external terminal side.

次いで、本発明の樹脂封止型半導体装置の第3の例を挙げる。
図3(a)は本発明の樹脂封止型半導体装置の第3の例の概略断面図であり、図3(b)はその内部の構成を透視した斜視図であり、図3(c)は第4の例の概略断面図である。
図3中、200、200Aは樹脂封止型半導体装置、210は半導体素子、211は端子(パッド)、215はダイアタッチ材、225はリード、230は端子部、232は内部端子部、234は外部端子部、234Aは露出部、240はワイヤ、250は封止用樹脂、260は銀めっき、270は半田からなる外部電極である。
図3(a)に示す半導体装置200は、端子部230に一体的に連結したリード225を設け、半導体素子210をダイアタッチ材215を介してリード225に搭載している点で、図1(a)に示す半導体装置100と異なるが、その他の点は同じである。
Next, a third example of the resin-encapsulated semiconductor device of the present invention will be given.
FIG. 3A is a schematic cross-sectional view of a third example of the resin-encapsulated semiconductor device of the present invention, and FIG. 3B is a perspective view illustrating the internal configuration thereof, and FIG. These are the schematic sectional drawings of the 4th example.
3, 200 and 200A are resin-encapsulated semiconductor devices, 210 is a semiconductor element, 211 is a terminal (pad), 215 is a die attach material, 225 is a lead, 230 is a terminal portion, 232 is an internal terminal portion, 234 is External terminal portions, 234A are exposed portions, 240 is a wire, 250 is a sealing resin, 260 is silver plating, and 270 is an external electrode made of solder.
The semiconductor device 200 shown in FIG. 3A is provided with a lead 225 integrally connected to the terminal portion 230, and the semiconductor element 210 is mounted on the lead 225 via the die attach material 215. Although different from the semiconductor device 100 shown in a), the other points are the same.

図3(c)に示す第4の例の半導体装置200Aは、図3(a)に示す第3の例の半導体装置200の外部に露出した外部端子部の面234Aに半田からなる外部電極270を設けたものであり、回路基板へ搭載される際には、半田を溶解、固化して、外部端子部234が外部回路と電気的に接続される。   The semiconductor device 200A of the fourth example shown in FIG. 3C has an external electrode 270 made of solder on the surface 234A of the external terminal portion exposed to the outside of the semiconductor device 200 of the third example shown in FIG. When mounting on the circuit board, the solder is melted and solidified, and the external terminal portion 234 is electrically connected to the external circuit.

尚、本発明の樹脂封止型半導体装置は、図1、図2、図3に示すように、パッケージ面積が半導体素子の面積と大きく変わらない、面積的に小型化されたパッケージであるが、厚み方向についても、略1.0mm厚以下にすることができ、薄型も同時に達成できるものである。
また、図1、図2、図3に示す例においては、外部端子部を、半導体素子の端子部(パッド部)に沿い2列に配列したが、半導体素子の端子の位置をその四辺に沿い二次元的に配置し、且つ、端子部を該半導体素子の外側に半導体素子の四辺に沿い、二次元的に配列することにより、半導体素子の、一層の多ピン化に十分対応できる。
The resin-encapsulated semiconductor device of the present invention is an area-reduced package in which the package area is not significantly different from the area of the semiconductor element as shown in FIG. 1, FIG. 2, and FIG. Also in the thickness direction, the thickness can be made approximately 1.0 mm or less, and a thin shape can be achieved at the same time.
In the example shown in FIGS. 1, 2, and 3, the external terminal portions are arranged in two rows along the terminal portion (pad portion) of the semiconductor element, but the positions of the terminals of the semiconductor element are along the four sides. The two-dimensional arrangement and the two-dimensional arrangement of the terminal portions on the outer side of the semiconductor element along the four sides of the semiconductor element can sufficiently cope with the further increase in the number of pins of the semiconductor element.

次に、本発明の回路部材を図に基づいて説明する。
本発明の回路部材は、上記本発明の半導体装置の作製に用いられるものであるが、エッチングにより外形加工されるもので、図4(a)、図4(b)に示すように、半導体素子の端子と電気的に結線するための内部端子部と、外部回路への接続のための外部端子部とをその表裏に相対するように一体的に設けた端子部を略一平面内に複数個、それぞれ互いに独立して配置し、各端子部の外側に、各端子部ないしダイパッドを接続リードを介して一体連結し、全体を保持する外枠部を設けている。
図4(a)の回路部材300は、図1(a)に示す第1の例、図1(c)に示す第2の例の半導体装置の作製に用いられるもので、図4(a)(イ)はその平面図を示す。また、図4(b)の回路部材305は、図3(a)に示す第3の例、図3(c)に示す第4の例の半導体装置の作製に用いられるもので、図4(b)(イ)はその平面図を示す。
そして、図4(a)(ロ)、図4(b)(ロ)はそれぞれ、図4(a)(イ)、図4(b)(イ)の、C1−C2、C3−C4における概略断面であるが、実際には、エッチングの特性からそれぞれ、図4(a)(ハ)、図4(b)(ハ)のような形状となる。
尚、図2に示す半導体装置に用いられている回路部材も、その平面形状は図4(a)(イ)に示す形状と、基本的には同じであるが、図4(a)(イ)のC1−C2に相当する位置におけるダイパッド部の断面形状は異なる。
図4中、300、305は回路部材、320はダイパッド、325はリード、330は端子部、332は内部端子部、334は外部端子部、350は外枠部、352は接続リードである。
尚、図4中の点線領域は、回路部材の半導体装置作製に用いられる領域を示している。
回路部材300(305)の材質としては42合金(Ni42%のFe合金)、銅合金等が用いられ、通常のリードフレームと同様、エッチングにより外形加工できる。
Next, the circuit member of this invention is demonstrated based on figures.
The circuit member of the present invention is used for manufacturing the above-described semiconductor device of the present invention, and is subjected to external processing by etching. As shown in FIGS. 4 (a) and 4 (b), the semiconductor element A plurality of terminal portions that are integrally provided so as to face the front and back of the internal terminal portion for electrical connection with the terminal and the external terminal portion for connection to an external circuit are arranged in a substantially plane. These are arranged independently from each other, and each terminal portion or die pad is integrally connected to the outside of each terminal portion via a connection lead to provide an outer frame portion for holding the whole.
The circuit member 300 of FIG. 4A is used for manufacturing the semiconductor device of the first example shown in FIG. 1A and the second example shown in FIG. (A) shows a plan view thereof. 4B is used for manufacturing the semiconductor device of the third example shown in FIG. 3A and the fourth example shown in FIG. 3C. b) (A) shows a plan view thereof.
4 (a) (b) and FIG. 4 (b) (b) are schematic views of C1-C2 and C3-C4 in FIG. 4 (a) (b) and FIG. 4 (b) (b), respectively. Although it is a cross-section, in practice, the shapes are as shown in FIGS. 4A and 4C and FIGS. 4B and 4C, respectively, due to etching characteristics.
Note that the planar shape of the circuit member used in the semiconductor device shown in FIG. 2 is basically the same as the shape shown in FIGS. 4A and 4A, but FIG. ) Of the die pad portion at a position corresponding to C1-C2 is different.
4, 300 and 305 are circuit members, 320 is a die pad, 325 is a lead, 330 is a terminal portion, 332 is an internal terminal portion, 334 is an external terminal portion, 350 is an outer frame portion, and 352 is a connection lead.
Note that a dotted line region in FIG. 4 indicates a region used for manufacturing a semiconductor device of a circuit member.
As the material of the circuit member 300 (305), 42 alloy (Ni 42% Fe alloy), copper alloy, or the like is used, and the outer shape can be processed by etching in the same manner as a normal lead frame.

次いで、図4に示す本発明の回路部材の製造方法の例、および図2に示す半導体装置に用いられる回路部材の製造方法の例を図に基づいて説明する。
先ず、図1(a)、図1(c)に示す第1の例、第2の例の半導体装置に用いられる回路部材、及び図3(a)に示す第3の例、図3(c)に示す第4の例の半導体装置に用いられる回路部材の製造を方法を図5を基に説明する。
尚、図5は、説明を分かり易くするため、端子部周辺のみを示している。
先ず、42合金(Ni42%のFe合金)等からなる、回路部材の素材である厚さ0.2mm程度の板材410を準備し、板材410の両面を脱脂等を行い良く洗浄処理した(図5(a))後、板材410の両面に感光性のレジスト420を塗布し、乾燥する。(図5(b))
次いで、板材410の両面から所定のパターン版を用いてレジストの所定の部分のみに露光を行った後、現像処理し、レジストパターンを形成する。(図5(c))
図4(a)に示す回路部材300の作製の場合は、図5(c)(イ)のように、レジストパターン421、422が形成され、図4(b)に示す回路部材305の作製の場合は、図5(c)(ロ)のように、レジストパターン423、424が形成される。
尚、レジストとしては、特に限定はされないが、重クロム酸カリウムを感光材としたガゼイン系のレジストや、東京応化株式会社製のネガ型液状レジスト(PMERレジスト)等が使用できる。
次いで、レジストパターンを耐腐蝕性膜として腐蝕液にてエッチングを行い、回路部材を作製する。(図5(d)、図5(e))
図4(a)に示す回路部材300の作製の場合は、図5(d)(イ)のように、エッチングが進行し、図5(e)(イ)のようになりエッチングが完了する。
また、図4(b)に示す回路部材305の作製の場合は、図5(d)(ロ)のように、エッチングが進行し、図5(e)(ロ)のようになりエッチングは完了する。
尚、図4(a)、図4(b)に示す回路部材の製造の場合、板材410の表裏のエッチング量を加減することにより、薄肉部430の厚さを調整することができる。
エッチングは、通常、腐蝕液として塩化第二鉄水溶液を用い、板材の両面からスプレイエッチングにて行う。
この後、レジストを剥膜して、本発明の回路部材を得る。(図5(f))
図5に示す方法は、図4に示す回路部材の製造方法の1例で、これに限定はされない。
Next, an example of a method for manufacturing a circuit member of the present invention shown in FIG. 4 and an example of a method for manufacturing a circuit member used in the semiconductor device shown in FIG. 2 will be described based on the drawings.
First, circuit members used in the semiconductor device of the first example and the second example shown in FIGS. 1A and 1C, and the third example shown in FIG. 3A, FIG. A method of manufacturing a circuit member used in the semiconductor device of the fourth example shown in FIG.
FIG. 5 shows only the periphery of the terminal portion for easy understanding.
First, a plate material 410 having a thickness of about 0.2 mm, which is a material of a circuit member, made of 42 alloy (Ni 42% Fe alloy) or the like is prepared, and both surfaces of the plate material 410 are degreased and washed well (FIG. 5). (A) After that, a photosensitive resist 420 is applied to both sides of the plate 410 and dried. (Fig. 5 (b))
Next, after exposing only a predetermined portion of the resist from both surfaces of the plate material 410 using a predetermined pattern plate, development processing is performed to form a resist pattern. (Fig. 5 (c))
In the case of manufacturing the circuit member 300 shown in FIG. 4A, resist patterns 421 and 422 are formed as shown in FIGS. 5C and 5A, and the circuit member 305 shown in FIG. In this case, resist patterns 423 and 424 are formed as shown in FIGS.
The resist is not particularly limited, but a casein resist using potassium dichromate as a photosensitive material, a negative liquid resist (PMER resist) manufactured by Tokyo Ohka Co., Ltd., or the like can be used.
Next, the resist pattern is used as an anticorrosion film, and etching is performed with a corrosive solution to produce a circuit member. (FIG. 5 (d), FIG. 5 (e))
In the case of manufacturing the circuit member 300 shown in FIG. 4A, the etching proceeds as shown in FIGS. 5D and 5A, and the etching is completed as shown in FIGS. 5E and 5A.
In the case of manufacturing the circuit member 305 shown in FIG. 4B, the etching proceeds as shown in FIGS. 5D and 5B, and the etching is completed as shown in FIGS. 5E and 5B. To do.
In the case of manufacturing the circuit member shown in FIGS. 4A and 4B, the thickness of the thin portion 430 can be adjusted by adjusting the etching amount on the front and back of the plate material 410.
Etching is usually performed by spray etching from both sides of the plate material using a ferric chloride aqueous solution as a corrosive solution.
Thereafter, the resist is peeled off to obtain the circuit member of the present invention. (Fig. 5 (f))
The method shown in FIG. 5 is an example of the method for manufacturing the circuit member shown in FIG. 4 and is not limited thereto.

次に、図1(a)に示す第1の例の半導体装置100の変形例として挙げられている、図2(a)、図2(c)に示す半導体装置に用いられる回路部材、および図2(b)、図2(d)に示す半導体装置に用いられる回路部材の製造方法を、図6を基に説明する。
図6も、説明を分かり易くするため、端子部周辺のみを示している。
図5に示す製造方法と同様、42合金(Ni42%のFe合金)等からなる、回路部材の素材である厚さ0.2mm程度の板材410を準備し、板材410の両面を脱脂等を行い良く洗浄処理した(図6(a))後、板材410の両面に感光性のレジスト420を塗布し、乾燥する。(図6(b))
次いで、板材410の両面から所定のパターン版を用いてレジストの所定の部分のみに露光を行った後、現像処理し、レジストパターンを形成する。(図6(c))
図2(a)、図2(c)に示す半導体装置に用いられる回路部材の作製の場合は、図6(c)(イ)のように、レジストパターン421A、422Aが形成され、図2(b)、図2(d)に示す半導体装置に用いられる回路部材の作製の場合は、図6(c)(ロ)のように、レジストパターン423A、424Aが形成される。
次いで、レジストパターンを耐腐蝕性膜として腐蝕液にてエッチングを行い、回路部材を作製する。(図6(d)、図6(e))
図2(a)、図2(c)に示す半導体装置に用いられる回路部材の作製の場合は、図6(d)(イ)のように、エッチングが進行し、図6(e)(イ)のようになりエッチングが完了する。
また、図2(b)、図2(d)に示す半導体装置に用いられる回路部材の作製の場合は、図6(d)(ロ)のように、エッチングが進行し、図6(e)(ロ)のようになりエッチングは完了する。
この後、レジストを剥膜して、本発明の回路部材を得る。(図6(f))
Next, circuit members used in the semiconductor device shown in FIGS. 2A and 2C, which are cited as modifications of the semiconductor device 100 of the first example shown in FIG. A method for manufacturing a circuit member used in the semiconductor device shown in 2 (b) and FIG. 2 (d) will be described with reference to FIG.
FIG. 6 also shows only the periphery of the terminal portion for easy understanding.
Similar to the manufacturing method shown in FIG. 5, a plate member 410 made of 42 alloy (Ni 42% Fe alloy) and the like having a thickness of about 0.2 mm, which is a material of a circuit member, is prepared, and both surfaces of the plate member 410 are degreased. After thoroughly washing (FIG. 6A), a photosensitive resist 420 is applied on both sides of the plate material 410 and dried. (Fig. 6 (b))
Next, after exposing only a predetermined portion of the resist from both surfaces of the plate material 410 using a predetermined pattern plate, development processing is performed to form a resist pattern. (Fig. 6 (c))
In the case of manufacturing a circuit member used in the semiconductor device shown in FIGS. 2A and 2C, resist patterns 421A and 422A are formed as shown in FIGS. b) In the case of manufacturing a circuit member used in the semiconductor device shown in FIG. 2D, resist patterns 423A and 424A are formed as shown in FIGS.
Next, the resist pattern is used as an anticorrosion film, and etching is performed with a corrosive solution to produce a circuit member. (Fig. 6 (d), Fig. 6 (e))
In the case of manufacturing a circuit member used in the semiconductor device shown in FIGS. 2A and 2C, the etching proceeds as shown in FIGS. 6D and 6A, and FIG. And the etching is completed.
In the case of manufacturing a circuit member used in the semiconductor device shown in FIGS. 2B and 2D, etching proceeds as shown in FIGS. 6D and 6B, and FIG. Etching is completed as shown in (b).
Thereafter, the resist is peeled off to obtain the circuit member of the present invention. (Fig. 6 (f))

上記の回路部材の製造方法は、1ケの半導体装置を作製するために必要な回路部材1ケの製造方法であるが、通常は生産性の面から、回路部材をエッチング加工する際、図4に示す回路部材を複数個面付けした状態で作製し、上記の工程を行う。この場合は、図4に示す外枠部350の一部に連結する枠部(図示していない)をリードフレームの外側に設けて面付け状態とする。   The circuit member manufacturing method described above is a method for manufacturing one circuit member necessary for manufacturing one semiconductor device. Normally, from the viewpoint of productivity, when etching a circuit member, FIG. A plurality of circuit members shown in (1) are fabricated in a state of being imposed, and the above-described process is performed. In this case, a frame portion (not shown) connected to a part of the outer frame portion 350 shown in FIG.

次いで、本発明の半導体装置の製造方法を図7に基づいて簡単に説明する。
図4(a)に示す回路部材300を用いた場合について説明する。
先ず、図5のようにして外形加工して作製された、図4(a)に示す回路部材300を用意する。(図7(a))
次いで、洗浄処理等を施した後、内部端子部332表面部に銀めっき処理を行い、銀めっき部510を設ける。(図7(b))
尚、銀めっきに代え、金めっきやパラジウムめっきでも良い。
次いで、半導体素子520をダイアタッチ材525によりダイパッド320に、その端子面側でない面にて搭載し、半導体素子520の端子522と、内部端子部332の銀めっき部510とをワイヤ540にて電気的に接続する。(図7(c))
この後、端子部330の外部端子部334の一部を外部に露出させ、全体を封止用樹脂で樹脂封止する。(図7(d))
更に、必要に応じて、端子部330の露出した外部端子部334の一面334Aに半田からなる外部電極560を形成する。(図7(e))
次いで、回路部材300の各接続リード352をプレスにより切断し、外枠部350を除去する。(図7(f1)、図7(f2))
尚、半田からなる外部電極560の作製は、スクリーン印刷による半田ペースト塗布や、リフロー等でも、回路基板と半導体装置との接続に必要な量の半田が得られれば良い。
以上、本発明の半導体装置の製造方法を説明したが、回路部材は、図4(a)に示すものに限定はされない。
Next, a method for manufacturing a semiconductor device of the present invention will be briefly described with reference to FIG.
The case where the circuit member 300 shown to Fig.4 (a) is used is demonstrated.
First, a circuit member 300 shown in FIG. 4 (a) prepared by external processing as shown in FIG. 5 is prepared. (Fig. 7 (a))
Next, after performing a cleaning process or the like, a silver plating process is performed on the surface portion of the internal terminal portion 332 to provide a silver plating portion 510. (Fig. 7 (b))
In place of silver plating, gold plating or palladium plating may be used.
Next, the semiconductor element 520 is mounted on the die pad 320 by a die attach material 525 on a surface that is not on the terminal surface side, and the terminal 522 of the semiconductor element 520 and the silver plating portion 510 of the internal terminal portion 332 are electrically connected by the wire 540. Connect. (Fig. 7 (c))
Thereafter, a part of the external terminal portion 334 of the terminal portion 330 is exposed to the outside, and the whole is resin-sealed with a sealing resin. (Fig. 7 (d))
Further, if necessary, an external electrode 560 made of solder is formed on one surface 334A of the exposed external terminal portion 334 of the terminal portion 330. (Fig. 7 (e))
Next, each connection lead 352 of the circuit member 300 is cut by pressing, and the outer frame portion 350 is removed. (Fig. 7 (f1), Fig. 7 (f2))
The external electrode 560 made of solder may be manufactured by applying solder paste by screen printing, reflowing, or the like as long as the amount of solder necessary for connection between the circuit board and the semiconductor device can be obtained.
The semiconductor device manufacturing method of the present invention has been described above, but the circuit member is not limited to that shown in FIG.

更に、本発明の回路部材の実施例を挙げて、図4に基づいて説明する。
図4(a)に示す回路部材300で、42合金(Ni42%のFe合金)からなり、端子部の厚さを0.2mmとする回路部材を、図5に示すエッチング方法にて作製して得た後、図7に示す半導体装置の作製方法により、図1に示す半導体装置を作製したが、品質的には特に問題はなかった。
同様に、図4(b)に示す回路部材305で、銅合金からなり、端子部の厚さを0.2mm、リード部の厚さ0.05mmとした回路部材を、図5に示すエッチング方法にて作製して得た後、図7に示す半導体装置の作製方法により、図3に示す半導体装置を作製したが、特に問題はなかった。
Furthermore, the Example of the circuit member of this invention is given and demonstrated based on FIG.
In the circuit member 300 shown in FIG. 4A, a circuit member made of 42 alloy (Ni 42% Fe alloy) and having a terminal portion thickness of 0.2 mm is manufactured by the etching method shown in FIG. After being obtained, the semiconductor device shown in FIG. 1 was manufactured by the method for manufacturing the semiconductor device shown in FIG. 7, but there was no particular problem in terms of quality.
Similarly, the circuit member 305 shown in FIG. 4B is made of a copper alloy, and the circuit member having a terminal portion thickness of 0.2 mm and a lead portion thickness of 0.05 mm is formed by the etching method shown in FIG. Then, the semiconductor device shown in FIG. 3 was manufactured by the method for manufacturing the semiconductor device shown in FIG. 7, but there was no particular problem.

半導体素子を搭載する樹脂封止型の半導体装置(プラスチックパッケージ)の製造に有用である。   This is useful for manufacturing a resin-encapsulated semiconductor device (plastic package) on which a semiconductor element is mounted.

本発明の樹脂封止型半導体装置の第1の例、第2の例を示した図The figure which showed the 1st example of the resin-encapsulated semiconductor device of this invention, and the 2nd example 本発明の樹脂封止型半導体装置の第1の例、第2の例の変形例を示した図The figure which showed the modification of the 1st example of the resin-encapsulated semiconductor device of this invention, and a 2nd example 本発明の樹脂封止型半導体装置の第3の例、第4の例を示した図The figure which showed the 3rd example of the resin-encapsulated semiconductor device of this invention, and the 4th example 本発明の回路部材を示した図The figure which showed the circuit member of this invention 本発明の回路部材の製造工程図Manufacturing process diagram of circuit member of the present invention 本発明の回路部材の製造工程図Manufacturing process diagram of circuit member of the present invention 本発明の樹脂封止型半導体装置の製造工程図Manufacturing process diagram of resin-encapsulated semiconductor device of the present invention

符号の説明Explanation of symbols

100、100A 樹脂封止型半導体装置
110 半導体素子
111 端子(パッド)
115 ダイアタッチ材
120 ダイパッド
130 端子部
132 内部端子部
134 外部端子部
134A 露出面
140 ワイヤ
150 封止用樹脂
160 銀めっき
170 半田からなる外部電極
200、200A 樹脂封止型半導体装置
210 半導体素子
211 端子(パッド)
215 ダイアタッチ材
225 リード
230 端子部
232 内部端子部
234 外部端子部
234A 露出面
240 ワイヤ
250 封止用樹脂
260 銀めっき
270 半田からなる外部電極
300、305 回路部材
320 ダイパッド
325 リード
330 端子部
332 内部端子部
334 外部端子部
350 外枠部
352 接続リード
410 板材
420 レジスト
421、422、423、424 レジストパターン
421A、422A、423A、424A レジストパターン
430 薄肉部
500、500A 半導体装置
510 銀めっき
520 半導体素子
522 端子(パッド)
525 ダイアタッチ
540 ワイヤ
550 封止用樹脂
560 半田からなる外部電極
100, 100A Resin-encapsulated semiconductor device 110 Semiconductor element 111 Terminal (pad)
115 Die attach material 120 Die pad 130 Terminal part 132 Internal terminal part 134 External terminal part 134A Exposed surface 140 Wire 150 Sealing resin 160 Silver plating 170 External electrode 200, 200A Resin-encapsulated semiconductor device 210 Semiconductor element 211 Terminal (pad)
215 Die attach material 225 Lead 230 Terminal portion 232 Internal terminal portion 234 External terminal portion 234A Exposed surface 240 Wire 250 Sealing resin 260 Silver plating 270 Solder external electrode 300, 305 Circuit member 320 Die pad 325 Lead 330 Terminal portion 332 Inside Terminal portion 334 External terminal portion 350 Outer frame portion 352 Connection lead 410 Plate material 420 Resist 421, 422, 423, 424 Resist pattern 421A, 422A, 423A, 424A Resist pattern 430 Thin portion 500, 500A Semiconductor device 510 Silver plating 520 Semiconductor element 522 Terminal (pad)
525 Die attach 540 Wire 550 Resin 560 for sealing External electrode made of solder

Claims (4)

表面側に内部端子と裏面側に外部端子を表裏一体的に有する端子部を略一平面内に複数個、それぞれ互いに電気的に独立して配置し、端子部の内部端子と半導体素子の端子とをワイヤにて電気的に接続し、各端子部の外部端子の一部を外部に露出させるように全体を樹脂封止した樹脂封止型半導体装置において、
複数個の前記端子部が配置された平面に沿うように各端子部にリードを一体的に連結し、かつ、各リードをそれぞれ互いに電気的に独立して配置し、前記半導体素子が複数の前記リード上に電気的に絶縁して搭載されたことを特徴とする樹脂封止型半導体装置。
A plurality of terminal portions each having an internal terminal on the front surface side and an external terminal on the back surface side are integrated in a substantially flat surface, and each of the terminal portions is electrically independent from each other. In a resin-encapsulated semiconductor device in which the whole is resin-sealed so as to expose a part of the external terminals of each terminal portion to the outside,
A lead is integrally connected to each terminal portion so as to be along a plane on which the plurality of terminal portions are arranged, and each lead is electrically arranged independently of each other, and the semiconductor element includes a plurality of the semiconductor elements. A resin-encapsulated semiconductor device, wherein the resin-encapsulated semiconductor device is mounted on a lead while being electrically insulated.
外部に露出した外部端子面に半田からなる外部電極を備えることを特徴とする請求項1に記載の樹脂封止型半導体装置。   The resin-encapsulated semiconductor device according to claim 1, further comprising an external electrode made of solder on an external terminal surface exposed to the outside. 前記半導体素子の端子は半導体素子の端子面の一対の辺の略中心部線上にそって配置されており、前記端子部は前記中心部線を挟むように対向する前記一対の各辺に沿い、それぞれ設けられていることを特徴とする請求項1または請求項2に記載の樹脂封止型半導体装置。   The terminals of the semiconductor element are arranged along substantially the center line of the pair of sides of the terminal surface of the semiconductor element, and the terminal part is along the pair of sides facing each other so as to sandwich the center line. The resin-encapsulated semiconductor device according to claim 1, wherein the resin-encapsulated semiconductor device is provided respectively. 表面側に内部端子と裏面側に外部端子を表裏一体的に有する複数の端子部を略一平面内に互いに電気的に独立して配置し、端子部の内部端子と半導体素子の端子とをワイヤにて電気的に接続し、各端子部の外部端子の一部を外部に露出させるように全体を樹脂封止した樹脂封止型半導体装置の製造方法において、
(A)導電性基板をエッチングして、表面側に内部端子を裏面側に外部端子を表裏一体的に有する複数の端子部と、前記各端子部が相互に独立して接続リードを介して一体的に連結された外枠部材と、各端子部に一体連結された半導体素子搭載用のリードと、を備えた回路部材を作成する回路部材作成工程と、
(B)半導体素子搭載用のリードに半導体素子を電気的に絶縁して固着することにより搭載する半導体素子搭載工程と、
(C)半導体素子の端子と回路部材の内部端子とをワイヤで電気的に接続するワイヤボンディング工程と、
(D)各外部端子の一部を外部に露出させるように全体を樹脂封止する樹脂封止工程と、
(E)回路部材の各接続リードを切断し、外枠部材を除去する外枠部材分離除去工程と、を備えることを特徴とする樹脂封止型半導体装置の製造方法。
A plurality of terminal portions having an internal terminal on the front surface side and an external terminal on the back surface are integrally arranged in a substantially flat surface, and the internal terminal of the terminal portion and the terminal of the semiconductor element are wired. In the manufacturing method of the resin-encapsulated semiconductor device in which the whole is resin-sealed so as to expose a part of the external terminals of each terminal portion to the outside,
(A) The conductive substrate is etched, and a plurality of terminal portions having internal terminals on the front surface side and external terminals on the back surface are integrated with each other, and the respective terminal portions are integrated with each other through connection leads. A circuit member creating step for creating a circuit member comprising: an outer frame member connected to each other; and a lead for mounting a semiconductor element integrally connected to each terminal portion;
(B) a semiconductor element mounting process for mounting by electrically insulating and fixing the semiconductor element to the lead for mounting the semiconductor element;
(C) a wire bonding step of electrically connecting a terminal of the semiconductor element and an internal terminal of the circuit member with a wire;
(D) a resin sealing step for resin-sealing the whole so that a part of each external terminal is exposed to the outside;
(E) A method of manufacturing a resin-encapsulated semiconductor device, comprising: an outer frame member separation and removal step of cutting each connection lead of the circuit member and removing the outer frame member.
JP2005130978A 1997-04-02 2005-04-28 Resin-sealed semiconductor device and manufacturing method thereof Expired - Lifetime JP4176092B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009113507A1 (en) * 2008-03-10 2009-09-17 吉川工業株式会社 Semiconductor device, and communication apparatus and electronic apparatus provided with semiconductor device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009113507A1 (en) * 2008-03-10 2009-09-17 吉川工業株式会社 Semiconductor device, and communication apparatus and electronic apparatus provided with semiconductor device
JP2009218804A (en) * 2008-03-10 2009-09-24 Yoshikawa Kogyo Co Ltd Semiconductor device, and communication apparatus and electronic apparatus provided with the same
JP4551461B2 (en) * 2008-03-10 2010-09-29 吉川工業株式会社 Semiconductor device and communication device and electronic device provided with the same
CN101971486A (en) * 2008-03-10 2011-02-09 吉川工业株式会社 Semiconductor device, and communication apparatus and electronic apparatus provided with semiconductor device
US8384202B2 (en) 2008-03-10 2013-02-26 Yoshikawa Kogyo Co., Ltd. Semiconductor device, and communication apparatus and electronic apparatus having the same

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