JP2005260015A5 - - Google Patents

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Publication number
JP2005260015A5
JP2005260015A5 JP2004070051A JP2004070051A JP2005260015A5 JP 2005260015 A5 JP2005260015 A5 JP 2005260015A5 JP 2004070051 A JP2004070051 A JP 2004070051A JP 2004070051 A JP2004070051 A JP 2004070051A JP 2005260015 A5 JP2005260015 A5 JP 2005260015A5
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JP
Japan
Prior art keywords
substrate
held
disposed
plasma
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004070051A
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English (en)
Japanese (ja)
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JP4459666B2 (ja
JP2005260015A (ja
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Application filed filed Critical
Priority to JP2004070051A priority Critical patent/JP4459666B2/ja
Priority claimed from JP2004070051A external-priority patent/JP4459666B2/ja
Publication of JP2005260015A publication Critical patent/JP2005260015A/ja
Publication of JP2005260015A5 publication Critical patent/JP2005260015A5/ja
Application granted granted Critical
Publication of JP4459666B2 publication Critical patent/JP4459666B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004070051A 2004-03-12 2004-03-12 除去装置 Expired - Fee Related JP4459666B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004070051A JP4459666B2 (ja) 2004-03-12 2004-03-12 除去装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004070051A JP4459666B2 (ja) 2004-03-12 2004-03-12 除去装置

Publications (3)

Publication Number Publication Date
JP2005260015A JP2005260015A (ja) 2005-09-22
JP2005260015A5 true JP2005260015A5 (https=) 2007-04-26
JP4459666B2 JP4459666B2 (ja) 2010-04-28

Family

ID=35085444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004070051A Expired - Fee Related JP4459666B2 (ja) 2004-03-12 2004-03-12 除去装置

Country Status (1)

Country Link
JP (1) JP4459666B2 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101218114B1 (ko) * 2005-08-04 2013-01-18 주성엔지니어링(주) 플라즈마 식각 장치
JP2009302401A (ja) * 2008-06-16 2009-12-24 Tokyo Seimitsu Co Ltd チャックテーブル洗浄方法、チャックテーブル洗浄装置及び半導体ウェーハ平面加工装置
JP4696165B2 (ja) * 2009-02-03 2011-06-08 東京エレクトロン株式会社 基板処理装置及び基板処理方法
KR102678588B1 (ko) 2018-11-14 2024-06-27 램 리써치 코포레이션 차세대 리소그래피에서 유용한 하드 마스크들을 제조하기 위한 방법들
US12211691B2 (en) 2018-12-20 2025-01-28 Lam Research Corporation Dry development of resists
TWI910974B (zh) 2019-06-26 2026-01-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
CN114200776A (zh) 2020-01-15 2022-03-18 朗姆研究公司 用于光刻胶粘附和剂量减少的底层
WO2022010809A1 (en) 2020-07-07 2022-01-13 Lam Research Corporation Integrated dry processes for patterning radiation photoresist patterning
WO2022103764A1 (en) * 2020-11-13 2022-05-19 Lam Research Corporation Process tool for dry removal of photoresist
US12577466B2 (en) 2020-12-08 2026-03-17 Lam Research Corporation Photoresist development with organic vapor
KR102725782B1 (ko) 2022-07-01 2024-11-05 램 리써치 코포레이션 에칭 정지 억제 (etch stop deterrence) 를 위한 금속 옥사이드 기반 포토레지스트의 순환적 현상
WO2024196643A1 (en) 2023-03-17 2024-09-26 Lam Research Corporation Integration of dry development and etch processes for euv patterning in a single process chamber
KR20250034920A (ko) 2023-07-27 2025-03-11 램 리써치 코포레이션 금속-함유 포토레지스트에 대한 올-인-원 건식 현상

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