JP2005249847A - Positive photosensitive resin composition and semiconductor device or display component using the same - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition having high sensitivity and a low water absorption, and a semiconductor device or a display component. <P>SOLUTION: The positive photosensitive resin composition contains an alkali-soluble resin (A), a diazoquinone compound (B) and a phenol-dicyclopentadiene copolymer (C), wherein the phenol-dicyclopentadiene copolymer (C) is a hydrophobic phenolic resin using dicyclopentadiene and phenol as starting material and the benzene ring of the phenol may have a halogen atom, an alkyl group, an alkoxy group, an alkyl ester group, a cycloalkyl group or a cycloalkoxy group as a substituent. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a positive photosensitive resin composition and a semiconductor device or display element using the same.

Conventionally, polybenzoxazole resins and polyimide resins having excellent heat resistance and excellent electrical characteristics, mechanical characteristics, and the like have been used for surface protection films and interlayer insulating films of semiconductor elements. On the other hand, in order to simplify the process, a positive photosensitive resin in which the polybenzoxazole resin or polyimide resin is combined with a diazoquinone compound as a photosensitive material is also used (for example, see Patent Document 1). The development mechanism of this positive photosensitive resin composition is hardly soluble in an alkaline aqueous solution in the unexposed area due to the effect of inhibiting the dissolution of a diazoquinone compound in a resin such as polybenzoxazole resin or polyimide resin. On the other hand, in the exposed area, the diazoquinone compound undergoes a chemical change and becomes soluble in an alkaline aqueous solution. By utilizing the difference in solubility between the exposed portion and the unexposed portion to dissolve and remove the exposed portion, a coating film pattern of only the unexposed portion can be created. When these photosensitive resin compositions are used, the sensitivity of the photosensitive resin composition is particularly important. If the sensitivity is low, the exposure time becomes long and the throughput decreases. Therefore, in an attempt to improve the sensitivity of the photosensitive resin composition, for example, when the molecular weight of the base resin is reduced, the film thickness of the unexposed area is increased during development, so that the required film thickness cannot be obtained, There arises a problem that the pattern shape collapses. Conversely, if the diazoquinone compound, which is a photosensitive material, is increased in order to increase the dissolution inhibition of the unexposed area, a development residue called scum may occur at the bottom of the pattern after development. In order to solve these problems, a method of adding a phenol resin with good patternability is described, but there is a problem of increasing the water absorption rate (see, for example, Patent Document 2). As described above, development of a positive photosensitive resin composition having high sensitivity and low water absorption is strongly desired.
Japanese Examined Patent Publication No. 1-46862 JP-A-10-186658

  The present invention provides a positive photosensitive resin composition and a semiconductor device or a display element having high sensitivity and low water absorption.

Such an object is achieved by the present invention described in the following [1] to [9].
[1] A positive photosensitive resin composition comprising an alkali-soluble resin (A), a diazoquinone compound (B), and a copolymer (C) of phenol and dicyclopentadiene.
[2] The alkali-soluble resin (A) includes one or more selected from the group consisting of a polybenzoxazole structure, a polybenzoxazole precursor structure, a polyimide structure, a polyimide precursor structure, and a polyamic acid ester structure. The positive photosensitive resin composition according to item [1].
[3] The positive photosensitive resin composition according to [1] or [2], wherein the alkali-soluble resin (A) has a structure represented by the following general formula (1).

[4] The copolymer (C) of phenol and dicyclopentadiene comprises a compound represented by the following general formula (2) and / or general formula (3) [1] [2] or [3] The positive photosensitive resin composition according to Item.

[5] Any one of items [1] to [4], comprising 1 to 100 parts by weight of a copolymer (C) of phenol and dicyclopentadiene with respect to 100 parts by weight of the alkali-soluble resin (A). The positive photosensitive resin composition according to Item.
[6] A semiconductor device manufactured using the positive photosensitive resin composition according to any one of items [1] to [5].
[7] A display element produced by using the positive photosensitive resin composition according to any one of items [1] to [5].
[8] The positive photosensitive resin composition according to any one of [1] to [5] is applied onto a semiconductor element so that the film thickness after heat dehydration and ring closure is 0.1 to 50 μm. And a method of manufacturing a semiconductor device, which is obtained by pre-baking, exposing, developing, and heating.
[9] The positive photosensitive resin composition according to any one of [1] to [5] is applied onto a semiconductor element so that the film thickness after heat dehydration and ring closure is 0.1 to 50 μm. And a pre-baking, exposure, development, and heating.

  According to the present invention, a positive photosensitive resin composition having high sensitivity and low water absorption, and a semiconductor device or a display element using the positive photosensitive resin composition can be obtained.

  The alkali-soluble resin used in the present invention includes a polybenzoxazole structure, a polybenzoxazole precursor structure, a polyimide structure, a polyimide precursor structure, or a polyamic acid ester structure, and includes one or more of these. The alkali-soluble resin is a resin having a hydroxyl group, a carboxyl group, or a sulfonic acid group in the main chain or side chain, and a cresol type novolak resin, polyhydroxystyrene, and a polyamide resin having a structure represented by the general formula (1) The polyamide resin containing the structure represented by the general formula (1) is preferable from the viewpoint of heat resistance after the final heating. Moreover, a part of these resins may be closed to form a polybenzoxazole structure or a polyimide structure.

X of the polyamide resin having the structure represented by the general formula (1) represents a divalent to tetravalent organic group, R ₁ is a hydroxyl group or O—R ₃ , and m is an integer of 0 to 2. . Each R ₁ may be the same or different. Y in the general formula (1) represents a divalent to hexavalent organic group, R ₂ is a hydroxyl group, a carboxyl group, O—R ₃ or COO—R ₃ , and n is an integer of 0 to 4. Each R ₂ may be the same or different. Here, R ₃ is an organic group having 1 to 15 carbon atoms. However, when R ₁ has no hydroxyl group, at least one R ₂ must be a carboxyl group. When R ₂ has no carboxyl group, at least one R ₁ must be a hydroxyl group.

  The polyamide resin having the structure represented by the general formula (1) is, for example, a compound selected from diamine having an X structure or bis (aminophenol), 2,4-diaminophenol, and the like, and a tetracarboxylic acid having a Y structure. It is obtained by reacting with a compound selected from anhydride, trimellitic anhydride, dicarboxylic acid or dicarboxylic acid dichloride, dicarboxylic acid derivative, hydroxydicarboxylic acid, hydroxydicarboxylic acid derivative and the like. In the case of dicarboxylic acid, an active ester type dicarboxylic acid derivative obtained by reacting 1-hydroxy-1,2,3-benzotriazole or the like in advance may be used in order to increase the reaction yield or the like.

In the polyamide resin containing the structure represented by the general formula _{(1), O-R 3} , COO-R 3 as a substituent of O-R _3, Y as a substituent of X is a hydroxyl group, an alkaline aqueous solution of the carboxyl group Is a group protected by R ₃ which is an organic group having 1 to 15 carbon atoms, and if necessary, a hydroxyl group or a carboxyl group may be protected. Examples of R ₃ include formyl group, methyl group, ethyl group, propyl group, isopropyl group, tertiary butyl group, tertiary butoxycarbonyl group, phenyl group, benzyl group, tetrahydrofuranyl group, tetrahydropyranyl group and the like. It is done.

  When this polyamide resin is heated at about 300 to 400 ° C., it is dehydrated and closed, and a heat-resistant resin is obtained in the form of polyimide resin, polybenzoxazole resin, or copolymerization of both.

等であるが、これらに限定されるものではない。 As X in the general formula (1), for example,

However, it is not limited to these.

より選ばれるものであり、又２種類以上用いても良い。 Among these, particularly preferred are:

Two or more types may be used.

Moreover, as Y of general formula (1), for example,

等であるが、これらに限定されるものではない。

However, it is not limited to these.

Among these, particularly preferred are:

Two or more types may be used.

  In the present invention, it is desirable to seal the end from the viewpoint of storage stability. For sealing, a derivative having an aliphatic group or a cyclic compound group having at least one alkenyl group or alkynyl group can be introduced as an acid derivative or an amine derivative at the end of the polyamide represented by the general formula (1). Specifically, for example, a compound selected from diamine or bis (aminophenol) having a structure of X, 2,4-diaminophenol, and the like, and a tetracarboxylic acid anhydride, trimellitic acid anhydride, dicarboxylic acid having a structure of Y After synthesizing a polyamide resin having a structure represented by the general formula (1) obtained by reacting with a compound selected from acid or dicarboxylic acid dichloride, dicarboxylic acid derivative, hydroxydicarboxylic acid, hydroxydicarboxylic acid derivative, etc. It is preferable to cap the terminal amino group contained in the polyamide resin as an amide using an acid anhydride or acid derivative containing an aliphatic group or cyclic compound group having at least one alkenyl group or alkynyl group. Examples of the group derived from an acid anhydride or acid derivative containing an aliphatic group or cyclic compound group having at least one alkenyl group or alkynyl group after reacting with an amino group include:

等が挙げられるが、これらに限定されるものではない。

However, it is not limited to these.

Among these, particularly preferred are:

Two or more types may be used. The method is not limited to this method, and the terminal acid contained in the polyamide resin is capped as an amide using an amine derivative containing an aliphatic group or cyclic compound group having at least one alkenyl group or alkynyl group. You can also
The positive photosensitive resin composition of the present invention may be composed only of the structural unit represented by the general formula (1), or may be a copolymer or blend with other structural units.

  The diazoquinone compound (B) used in the present invention is a compound having a 1,2-benzoquinonediazide or 1,2-naphthoquinonediazide structure, and is a substance known from US Pat. Nos. 2,722,975, 2,797,213 and 3,669,658. It is. For example, the following are mentioned.

  Among these, an ester of a phenol compound and 1,2-naphthoquinone-2-diazide-5-sulfonic acid or 1,2-naphthoquinone-2-diazide-4-sulfonic acid is particularly preferable. Examples of these include, but are not limited to, the following. Two or more of these may be used.

  The addition amount of the diazoquinone compound (B) used by this invention is 1-50 weight part with respect to 100 weight part of alkali-soluble resin. If the amount is less than 1 part by weight, a good pattern cannot be obtained, and if it exceeds 50 parts by weight, the sensitivity is greatly reduced.

  The copolymer (C) of phenol and dicyclopentadiene used in the present invention is a hydrophobic phenol resin made from dicyclopentadiene and phenol, and contains an alicyclic skeleton derived from dicyclopentadiene in the molecule. Therefore, compared with the conventional novolak phenol resin, it exhibits excellent heat resistance, electrical properties, low water absorption, and high adhesion. Further, halogen atoms, alkyl groups, alkoxy groups, alkyl ester groups, cycloalkyl groups, and cycloalkoxy groups may be substituted on the benzene ring of these phenol compounds.

  Specific examples of the copolymer of phenol and dicyclopentadiene represented by the general formulas (2) and (3) include, for example, DPP-6085, DPP-6095L, DPP-6095H, DPP-6115L, DPP-6115H, Examples include, but are not limited to, DPP-6125, DPA-145-L, DPA-155-M, and DPA-155-3M (trade name, manufactured by Shin Nippon Petrochemical Co., Ltd.).

The addition amount of the copolymer of phenol and dicyclopentadiene used in the present invention is 1 to 100 parts by weight, preferably 5 to 50 parts by weight with respect to 100 parts by weight of the alkali-soluble resin. When the addition amount of the copolymer of phenol and dicyclopentadiene exceeds the upper limit value, the heat resistance and mechanical properties are remarkably lowered during development, and when it is less than the lower limit, the sensitivity during development is lowered.
Further, it can be used by mixing with other phenolic compounds as long as the sensitivity and film characteristics are not lowered.
If necessary, additives such as a leveling agent and a silane coupling agent can be added to the positive photosensitive resin composition in the present invention.

  In the present invention, these components are dissolved in a solvent and used in the form of a varnish. Solvents include N-methyl-2-pyrrolidone, γ-butyrolactone, N, N-dimethylacetamide, dimethyl sulfoxide, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, propylene glycol Monomethyl ether acetate, methyl lactate, ethyl lactate, butyl lactate, methyl-1,3-butylene glycol acetate, 1,3-butylene glycol-3-monomethyl ether, methyl pyruvate, ethyl pyruvate, methyl-3-methoxypropio And the like, and may be used alone or in combination.

  In the method of using the positive photosensitive resin composition of the present invention, first, the composition is applied to a suitable support such as a silicon wafer, a ceramic substrate, an aluminum substrate and the like. In the case of a semiconductor device, the coating amount is applied so that the final film thickness after curing is 0.1 to 50 μm. If the film thickness is below the lower limit value, it will be difficult to fully function as a protective surface film of the semiconductor element. If the film thickness exceeds the upper limit value, it will be difficult to obtain a fine processing pattern. Takes a long time to reduce throughput. Examples of the coating method include spin coating using a spinner, spray coating using a spray coater, dipping, printing, roll coating, and the like. Next, after prebaking at 60 to 130 ° C. to dry the coating film, actinic radiation is applied to the desired pattern shape. As the actinic radiation, X-rays, electron beams, ultraviolet rays, visible rays and the like can be used, but those having a wavelength of 200 to 500 nm are preferable.

  Next, a relief pattern is obtained by dissolving and removing the irradiated portion with a developer. Developers include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, and aqueous ammonia, primary amines such as ethylamine and n-propylamine, diethylamine, and di-n. Secondary amines such as propylamine, tertiary amines such as triethylamine and methyldiethylamine, alcohol amines such as dimethylethanolamine and triethanolamine, quaternary ammonium such as tetramethylammonium hydroxide and tetraethylammonium hydroxide An aqueous solution of an alkali such as a salt and an aqueous solution to which an appropriate amount of a water-soluble organic solvent such as methanol or ethanol or a surfactant is added can be preferably used. As a developing method, methods such as spraying, paddle, dipping, and ultrasonic waves are possible.

  Next, the relief pattern formed by development is rinsed. Distilled water is used as the rinse liquid. Next, heat treatment is performed to form an oxazole ring and / or an imide ring, thereby obtaining a final pattern rich in heat resistance.

  The positive photosensitive resin composition according to the present invention is used not only for semiconductor applications, but also as interlayer insulation for multilayer circuits, cover coats for flexible copper-clad plates, solder resist films and liquid crystal alignment films, interlayer insulation films for elements in display elements, etc. Is also useful. As other semiconductor device manufacturing methods, known methods can be used.

* Synthesis of polyamide resin 360.4 g of dicarboxylic acid derivative obtained by reacting 0.9 mol of terephthalic acid, 0.1 mol of isophthalic acid and 2 mol of 1-hydroxy-1,2,3-benzotriazole (0. 9 mol) and 366.3 g (1 mol) of hexafluoro-2,2-bis (3-amino-4-hydroxyphenyl) propane 4 equipped with a thermometer, stirrer, raw material inlet, and dry nitrogen gas inlet tube It put into the separable flask of one neck, 3000 g of N-methyl-2-pyrrolidone was added and it was made to melt | dissolve. Thereafter, the mixture was reacted at 75 ° C. for 12 hours using an oil bath.

  Next, 32.8 g (0.2 mol) of 5-norbornene-2,3-dicarboxylic anhydride dissolved in 500 g of N-methyl-2-pyrrolidone was added, and the mixture was further stirred for 12 hours to complete the reaction. After filtering the reaction mixture, the reaction mixture was poured into a solution of water / methanol = 3/1 (volume ratio) to obtain a precipitate. It was collected by filtration, washed thoroughly with water, dried under vacuum, represented by the general formula (1), X is the following formula X-1, Y is a mixture of the following formulas Y-1 and Y-2, a = The objective polyamide resin (PA-1) with 100 and b = 0 was obtained.

* Preparation of positive photosensitive resin composition 100 g of synthesized polyamide resin (PA-1), 20 g of diazonaphthoquinone compound (S-1) having the following structure, copolymer DPP-6095 of phenol and dicyclopentadiene (trade name) , Nippon Petrochemical Co., Ltd.) was dissolved in γ-butyrolactone and then filtered through a 0.2 μm fluororesin filter to obtain a photosensitive resin composition.

* Characteristic Evaluation After applying this positive photosensitive resin composition on a silicon wafer using a spin coater, it was dried on a hot plate at 120 ° C. for 3 minutes to obtain a coating film having a thickness of about 8 μm. Through this coating film, a mask made by Toppan Printing Co., Ltd. (test chart No. 1: a remaining pattern and a blank pattern with a width of 0.88 to 50 μm are drawn) is used with an i-line stepper NSR4425i made by Nikon Corporation. The exposure was performed by increasing the exposure amount from 100 mJ / cm ² to 20 mJ / cm ² . Next, the exposed portion was dissolved and removed by immersing in a 2.38% tetramethylammonium hydroxide aqueous solution for 60 seconds, and then rinsed with pure water for 30 seconds. As a result, it was confirmed that a pattern was formed at an exposure amount of 260 mJ / cm ² , and the resolution was 3 μm.
The amount of film bevel in the unexposed area during development was 1.0 μm.
Furthermore, curing was performed in a nitrogen atmosphere at 150 ° C./30 minutes and 320 ° C./60 minutes in a clean oven. Next, the obtained cured film was immersed in 3% hydrogen fluoride water, and the film was peeled off from the silicon wafer. The obtained film was sufficiently washed with pure water and then dried in an oven over 60 ° C./5 hours. The obtained film was dried at 50 ° C. for 24 hours, and the water absorption was measured by a method of immersing the dried film in pure water kept at 23 ° C. (based on JIS-K7209). It was as low as 4%.

Example 2
A positive photosensitive resin composition was obtained in the same manner as in Example 1 except that 50 g of the copolymer of phenol and dicyclopentadiene in Example 1 was used, and the same evaluation as in Example 1 was performed.

Example 3
A positive photosensitive resin composition was obtained in the same manner as in Example 1 except that 75 g of the copolymer of phenol and dicyclopentadiene in Example 1 was used, and the same evaluation as in Example 1 was performed.

Example 4
A positive photosensitive resin composition was obtained in the same manner as in Example 1 except that 30 g of DPP-6085 was used instead of the copolymer DPP-6095 of phenol and dicyclopentadiene in Example 1. Evaluation similar to Example 1 was performed.

Example 5
A positive photosensitive resin composition was obtained in the same manner as in Example 1 except that 25 g of S-2 was used instead of the diazonaphthoquinone compound (S-1) in Example 1, and the same as in Example 1. Evaluation was performed.

Example 6
In the synthesis of the polyamide resin in Example 1, in place of 0.9 mol of terephthalic acid and 0.1 mol of isophthalic acid, 1 mol of diphenyl ether-4,4′-dicarboxylic acid was used and represented by the general formula (1), A polyamide resin (PA-2) in which X is the following formula X-1 and Y is the following formula Y-3 and a = 100 and b = 0 was synthesized. Otherwise, a positive photosensitive resin composition was obtained in the same manner as in Example 1, and the same evaluation as in Example 1 was performed.

Example 7
A thermometer containing 17.1 g (0.055 mol) of 4,4′-oxydiphthalic anhydride, 13.0 g (0.110 mol) of 2-methyl-2-propanol and 10.9 g (0.138 mol) of pyridine Into a four-necked separable flask equipped with a stirrer, a raw material inlet, and a dry nitrogen gas inlet tube, 150 g of N-methyl-2-pyrrolidone was added and dissolved. 14.9 g (0.110 mol) of 1-hydroxy-1,2,3-benzotriazole was added dropwise to this reaction solution together with 30 g of N-methyl-2-pyrrolidone, and then 22.7 g (0.110 mol) of dicyclohexylcarbodiimide. Was added dropwise together with 50 g of N-methyl-2-pyrrolidone and allowed to react overnight at room temperature.
Thereafter, 27.1 g of a dicarboxylic acid derivative (active ester) obtained by reacting 1 mol of diphenyl ether-4,4′-dicarboxylic acid and 2 mol of 1-hydroxy-1,2,3-benzotriazole with this reaction solution. (0.055 mol) and 44.8 g (0.122 mol) of hexafluoro-2,2-bis (3-amino-4-hydroxyphenyl) propane with 70 g of N-methyl-2-pyrrolidone are added at room temperature. Stir for 2 hours. Thereafter, the reaction was performed in the same manner as in Example 1 except that the reaction was performed at 75 ° C. for 12 hours using an oil bath, and the reaction was represented by the general formula (1). And a mixture of Y-4, a polyamide resin (PA-3) having a = 100 and b = 0 was synthesized. Otherwise, a positive photosensitive resin composition was obtained in the same manner as in Example 1, and the same evaluation as in Example 1 was performed.

Example 8
After dissolving 22.0 g (0.06 mol) of hexafluoro-2,2-bis (3-amino-4-hydroxyphenyl) propane in 100 g of N-methyl-2-pyrrolidone, N-methyl-2-pyrrolidone 25.3 g (0.12 mol) of trimellitic chloride dissolved in 80 g was added while cooling to 5 ° C. or lower. Further, 11.4 g (0.144 mol) of pyridine was added and stirred at 20 ° C. or lower for 3 hours. Next, after adding 12.0 g (0.06 mol) of 4,4′-diaminodiphenyl ether, the mixture was reacted at room temperature for 5 hours. Next, the internal temperature was raised to 85 ° C. and stirred for 3 hours. After completion of the reaction, the filtered filtrate was added to water / methanol = 5/1 (volume ratio) to obtain a precipitate. It is collected by filtration, washed thoroughly with water, and dried under vacuum. The mixture is represented by the formula (1), X is the following formula X-1 and X-2, and Y is the following formula Y-5. The objective polyamide resin (PA-4) which consists of a = 100 and b = 0 was obtained. Otherwise, a positive photosensitive resin composition was obtained in the same manner as in Example 1, and the same evaluation as in Example 1 was performed.

<< Comparative Example 1 >>
In the production of the positive photosensitive resin composition of Example 1, a photosensitive resin composition was prepared without adding 10 g of a copolymer of phenol and dicyclopentadiene, and the same evaluation as in Example 1 was performed.

<< Comparative Example 2 >>
In the production of the positive photosensitive resin composition of Example 1, 20 g of phenol novolac resin Tamanol 758 (trade name, manufactured by Arakawa Chemical Co., Ltd.) was used instead of the copolymer of phenol and dicyclopentadiene. The same evaluation as in Example 1 was performed.

  The evaluation results of Examples 1 to 6 and Comparative Examples 1 and 2 are shown in Table 1.

  INDUSTRIAL APPLICABILITY The present invention provides a positive photosensitive resin composition having high sensitivity and low water absorption, and can be suitably used for a surface protective film, an interlayer insulating film, etc. of a semiconductor element or a display element.

Claims (9)

A positive photosensitive resin composition comprising an alkali-soluble resin (A), a diazoquinone compound (B), and a copolymer (C) of phenol and dicyclopentadiene. The alkali-soluble resin (A) contains one or more selected from the group consisting of a polybenzoxazole structure, a polybenzoxazole precursor structure, a polyimide structure, a polyimide precursor structure, and a polyamic acid ester structure. The positive photosensitive resin composition as described. The positive photosensitive resin composition according to claim 1 or 2, wherein the alkali-soluble resin (A) has a structure represented by the following general formula (1).

The positive photosensitive composition according to claim 1, 2 or 3, wherein the copolymer (C) of phenol and dicyclopentadiene comprises a compound represented by the following general formula (2) and / or general formula (3). Resin composition.

The positive type according to any one of claims 1 to 4, comprising 1 to 100 parts by weight of a copolymer (C) of phenol and dicyclopentadiene with respect to 100 parts by weight of the alkali-soluble resin (A). Photosensitive resin composition. The semiconductor device manufactured using the positive photosensitive resin composition of any one of Claims 1-5. The display element manufactured using the positive photosensitive resin composition of any one of Claims 1-5. The positive photosensitive resin composition according to any one of claims 1 to 5 is applied on a semiconductor element so that the film thickness after heat dehydration and ring closure is 0.1 to 50 μm, and prebaking, exposure, A method for producing a semiconductor device, which is obtained by developing and heating. The positive photosensitive resin composition according to any one of claims 1 to 5 is applied on a semiconductor element so that the film thickness after heat dehydration and ring closure is 0.1 to 50 μm, and prebaking, exposure, A method for producing a display element, which is obtained by developing and heating.