JP2005233979A - 反射屈折光学系 - Google Patents

反射屈折光学系 Download PDF

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Publication number
JP2005233979A
JP2005233979A JP2000031285A JP2000031285A JP2005233979A JP 2005233979 A JP2005233979 A JP 2005233979A JP 2000031285 A JP2000031285 A JP 2000031285A JP 2000031285 A JP2000031285 A JP 2000031285A JP 2005233979 A JP2005233979 A JP 2005233979A
Authority
JP
Japan
Prior art keywords
optical system
catadioptric
imaging optical
lens
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000031285A
Other languages
English (en)
Japanese (ja)
Inventor
Tomowaki Takahashi
友刀 高橋
Kiyoshi Mitarai
潔 御手洗
Satoru Kumagai
悟 熊谷
Hiroyuki Tsukamoto
宏之 塚本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2000031285A priority Critical patent/JP2005233979A/ja
Priority to AU2001232257A priority patent/AU2001232257A1/en
Priority to PCT/JP2001/000912 priority patent/WO2001059502A1/fr
Publication of JP2005233979A publication Critical patent/JP2005233979A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000031285A 2000-02-09 2000-02-09 反射屈折光学系 Pending JP2005233979A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000031285A JP2005233979A (ja) 2000-02-09 2000-02-09 反射屈折光学系
AU2001232257A AU2001232257A1 (en) 2000-02-09 2001-02-09 Reflection/refraction optical system
PCT/JP2001/000912 WO2001059502A1 (fr) 2000-02-09 2001-02-09 Systeme optique reflechissant/refringent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000031285A JP2005233979A (ja) 2000-02-09 2000-02-09 反射屈折光学系

Publications (1)

Publication Number Publication Date
JP2005233979A true JP2005233979A (ja) 2005-09-02

Family

ID=18556059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000031285A Pending JP2005233979A (ja) 2000-02-09 2000-02-09 反射屈折光学系

Country Status (3)

Country Link
JP (1) JP2005233979A (fr)
AU (1) AU2001232257A1 (fr)
WO (1) WO2001059502A1 (fr)

Cited By (12)

* Cited by examiner, † Cited by third party
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WO2007086220A1 (fr) * 2006-01-30 2007-08-02 Nikon Corporation Systeme de prise d’images catadioptrique, dispositif d’exposition et procede de fabrication de dispositif
JP2008287249A (ja) * 2007-04-18 2008-11-27 Carl Zeiss Smt Ag マイクロリソグラフィ用投影対物レンズ
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Families Citing this family (19)

* Cited by examiner, † Cited by third party
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US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
JP4706171B2 (ja) * 2003-10-24 2011-06-22 株式会社ニコン 反射屈折投影光学系、露光装置及び露光方法
EP2722703A3 (fr) 2003-05-06 2014-07-23 Nikon Corporation Système de projection optique, système et procédé d'exposition
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
TWI282487B (en) * 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
WO2006005547A1 (fr) * 2004-07-14 2006-01-19 Carl Zeiss Smt Ag Objectif de projection catadioptrique
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
CN100483174C (zh) 2004-05-17 2009-04-29 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜
JP5600128B2 (ja) * 2004-07-14 2014-10-01 カール・ツァイス・エスエムティー・ゲーエムベーハー カタディオプトリック投影対物系
KR101171131B1 (ko) 2004-07-14 2012-08-07 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
EP2179330A1 (fr) 2007-10-16 2010-04-28 Nikon Corporation Système optique d'éclairage, appareil d'exposition et procédé de fabrication de dispositif
KR101546987B1 (ko) 2007-10-16 2015-08-24 가부시키가이샤 니콘 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법
WO2009145048A1 (fr) 2008-05-28 2009-12-03 株式会社ニコン Dispositif et procédé d'inspection pour modulateur spatial de lumière, système optique d'éclairage, procédé de réglage de ce système optique d'éclairage, dispositif d'exposition et procédé de fabrication de dispositif
JP2011049571A (ja) * 2010-09-24 2011-03-10 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法
JP2012073632A (ja) * 2011-11-18 2012-04-12 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3635684B2 (ja) * 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
JP3352325B2 (ja) * 1996-05-21 2002-12-03 キヤノン株式会社 走査露光装置及びそれを用いたデバイスの製造方法

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495981B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10488759B2 (en) 2005-05-03 2019-11-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
WO2007086220A1 (fr) * 2006-01-30 2007-08-02 Nikon Corporation Systeme de prise d’images catadioptrique, dispositif d’exposition et procede de fabrication de dispositif
US7990609B2 (en) 2006-01-30 2011-08-02 Nikon Corporation Catadioptric imaging system with prolate spheroidal-shaped mirrors
JP2008287249A (ja) * 2007-04-18 2008-11-27 Carl Zeiss Smt Ag マイクロリソグラフィ用投影対物レンズ
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

Also Published As

Publication number Publication date
AU2001232257A1 (en) 2001-08-20
WO2001059502A1 (fr) 2001-08-16

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