WO2001059502A1 - Systeme optique reflechissant/refringent - Google Patents

Systeme optique reflechissant/refringent Download PDF

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Publication number
WO2001059502A1
WO2001059502A1 PCT/JP2001/000912 JP0100912W WO0159502A1 WO 2001059502 A1 WO2001059502 A1 WO 2001059502A1 JP 0100912 W JP0100912 W JP 0100912W WO 0159502 A1 WO0159502 A1 WO 0159502A1
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WO
WIPO (PCT)
Prior art keywords
optical system
caf2
catadioptric
imaging optical
lens
Prior art date
Application number
PCT/JP2001/000912
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English (en)
Japanese (ja)
Inventor
Tomowaki Takahashi
Kiyoshi Mitarai
Satoru Kumagai
Hiroyuki Tsukamoto
Original Assignee
Nikon Corporation
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Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to AU2001232257A priority Critical patent/AU2001232257A1/en
Publication of WO2001059502A1 publication Critical patent/WO2001059502A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Definitions

  • the present invention relates to a catadioptric system, and more particularly, to a catadioptric system of an exposure apparatus such as a stepper used for manufacturing a semiconductor. More specifically, the present invention relates to a catadioptric reduction optical system of a scanning reduction exposure apparatus of about 1/4 that has a resolution of a submicron unit in an ultraviolet wavelength region.
  • the wavelength of the light source of the exposure apparatus must be shortened and the NA (numerical aperture of the optical system) must be increased.
  • the optical glass that can withstand practical use is limited due to light absorption.
  • the projection optical system of the exposure apparatus is constituted only by the refraction optical system, chromatic aberration correction becomes impossible at all. Therefore, it is very difficult to construct a projection lens by constructing an optical system using only a refraction system as the projection optical system to achieve the required resolution.
  • Japanese Unexamined Patent Publication No. Hei 5-25170 Japanese Unexamined Patent Publication No. 63-163319, Japanese Unexamined Patent Publication No. 4-234722, and US Pat. No. 4,779,966 may be mentioned.
  • the one using only one concave mirror is the optical system disclosed in JP-A-4-234722 and USP-4,779,966.
  • these optical systems only a negative lens is used in a reciprocating optical system composed of a concave mirror, and a positive power system is not used.
  • the light beam spreads and enters the concave mirror, so that the diameter of the concave mirror tends to increase.
  • the reciprocating optical system disclosed in Japanese Patent Application Laid-Open No. 4-234722 is a completely symmetrical type, and the generation of aberrations in the optical system there is minimized, and the subsequent refractive optical system is responsible for aberration correction.
  • the working distance (WD) on the first surface (reticle or mask) side is reduced.
  • a concave mirror is used in a second imaging optical system behind the intermediate image. Therefore, in order to ensure the required brightness of the optical system, the light beam spreads and enters the concave mirror, making it difficult to reduce the size of the concave mirror.
  • the ratio ⁇ value of the N A of the illumination optical system and the N A of the projection optical system is made variable.
  • an aperture stop can be installed in the illumination optical system, but if the above-described catadioptric optical system is used in the projection optical system, an effective aperture installation portion cannot be taken anywhere in the projection optical system. It will be.
  • a catadioptric optical system capable of adopting an effective diaphragm installation portion, having a sufficient peaking distance, and being capable of forming a large-sized concave mirror with the smallest possible size. It is intended to provide a system. Disclosure of the invention
  • a first imaging optical system G1 composed of a refractive lens, at least one concave lens and two reflecting mirrors are provided. And a third imaging optical system G3 comprising a refracting lens.
  • the first imaging optical system G1 has a first intermediate image IM of the first surface R.
  • the second imaging optical system G2 forms a second intermediate image IM2 by re-imaging the first intermediate image IM1, and the third imaging optical G3 system.
  • a catadioptric system that re-images the second intermediate image IM2 onto the second surface W.
  • the present invention also provides a projection exposure apparatus and a projection exposure method using the catadioptric optical system.
  • a light source an illumination optical system for uniformly irradiating a light beam from the light source onto the first surface R, and a catadioptric optical system for projecting the first surface R to the second surface W
  • a projection exposure apparatus characterized by including:
  • the illumination light is emitted from the light source, and the illumination optical system uniformly illuminates the illumination light on the first surface R.
  • a projection exposure method wherein the first surface R is projected onto the second surface W using the above-described catadioptric system, and the second surface W is exposed.
  • FIG. 1 is a principle diagram of a catadioptric optical system according to the present invention.
  • FIG. 2 is an optical path diagram of the catadioptric optical system of the first embodiment.
  • FIG. 3 is a coma aberration diagram of the first example.
  • FIG. 4 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the first example.
  • FIG. 5 is an optical path diagram of the catadioptric optical system of the second embodiment.
  • FIG. 6 is a coma aberration diagram of the second example.
  • FIG. 7 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the second example.
  • FIG. 8 is an optical path diagram of the catadioptric optical system of the third embodiment.
  • FIG. 9 is a coma aberration diagram of the third example.
  • FIG. 10 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the third example.
  • FIG. 11 is an optical path diagram of the catadioptric optical system of the fourth embodiment.
  • FIG. 12 is a coma aberration diagram of the fourth example.
  • FIG. 13 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the fourth example.
  • FIG. 14 is an optical path diagram of the catadioptric optical system of the fifth embodiment.
  • FIG. 15 is a coma aberration diagram of the fifth example.
  • FIG. 16 is a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the fifth example.
  • FIG. 17 is an optical path diagram of the catadioptric optical system of the sixth embodiment.
  • FIG. 18 is a coma aberration diagram of the sixth example.
  • FIG. 19 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the sixth example.
  • FIG. 20 is an optical path diagram of the catadioptric optical system of the seventh embodiment.
  • FIG. 21 is a coma aberration diagram of the seventh example. '
  • FIG. 22 shows a spherical aberration diagram, an astigmatism diagram, and a distortion diagram of the seventh example.
  • FIG. 23 is an optical path diagram of the catadioptric optical system of the eighth embodiment.
  • FIG. 24 is a coma aberration diagram of the eighth example.
  • FIG. 25 is a diagram of spherical aberration, astigmatism, and distortion of the eighth embodiment.
  • FIG. 26 is a diagram of a projection exposure apparatus according to the present invention.
  • FIG. 27 is a view showing the procedure of the projection exposure method according to the present invention. BEST MODE FOR CARRYING OUT THE INVENTION
  • the optical axes of these imaging optical systems can be configured to be a single straight line.
  • color correction which is a characteristic of the catadioptric system, is performed, so that color correction using a single glass type is possible.
  • the refractive optical system portion (the first imaging optical system and the third imaging optical system) includes a positive power
  • the Petzval sum which tends to be a positive value, is also reduced by the negative peak of the concave mirror portion. It can be completely canceled out by the Koval value.
  • the first intermediate image IM1 is converted into a first concave mirror K1 (a concave mirror that is arranged near the first imaging optical system G1 of the two concave mirrors) with an aperture.
  • the second intermediate image is formed near the center opening of the second concave mirror K 2 (a concave mirror disposed near the third imaging optical system G 3 of the two concave mirrors), and the second intermediate image is formed. It is necessary to guide the light ray path backward through the center opening of.
  • the entrance pupil has a central shielding part, but the size of the intermediate image is smaller than the size of the concave mirror, and the image formation position of the intermediate image is far away from the position of the concave mirror. Therefore, the size of the central shielding portion relative to the size of the entrance pupil, that is, the so-called central shielding ratio is small, and does not significantly affect the imaging performance.
  • the numerical aperture on the second surface side is NA0 and the effective diameter of at least one concave lens of the second imaging optical system is ⁇ , it is preferable that the following condition is satisfied.
  • This condition is for reducing the size of the refractive lens and the reflecting mirror used in the catadioptric optical system. If this condition is not met, it becomes difficult to reduce the size of the refractive lens and the reflecting mirror.
  • the catadioptric system be composed of 21 or more refractive lenses. Even better results can be obtained if it consists of more than a few refracting lenses.
  • the catadioptric optical system is preferably composed of 20 or less refractive lenses when the performance of the antireflection coating is difficult to improve or when there is a problem with the transmittance of the glass material. 'Even better results can be obtained if it consists of no more than 18 refractive lenses.
  • the two reflecting mirrors are arranged so as to face each other with the concave reflecting surfaces facing each other. It is preferably a concave mirror.
  • the first imaging optical system G1 includes at least two or more positive lenses
  • the third imaging optical system G3 includes at least two or more positive lenses.
  • at least one or more aperture stops are arranged in the first imaging optical system G1 or the third imaging optical system G3.
  • at least one or more central shielding plates be disposed in the first imaging optical system G1 or the third imaging optical system G3.
  • the catadioptric system preferably includes at least five or more aspheric surfaces. By using an aspherical surface, it is possible to achieve higher performance of the projection optical system and a reduction in the number of lenses. Further, it is preferable that all the refractive lenses of the catadioptric system are made of the same glass material, particularly fluorite. As the glass material, besides fluorite, quartz glass to which fluorine is added or crystals of a fluorine compound can be considered.
  • the one arranged closer to the first surface side R is referred to as the first 113
  • the surface mirror Kl, the one located closer to the second surface W side is the second concave mirror K2
  • the distance from the position of the first intermediate image I Ml to the position of the first concave mirror 1 is d1
  • the distance from the position of the second intermediate image IM2 to the position of the second concave mirror K2 is d2
  • the diameter of the exposure area on the second surface W is, the following conditions are preferably satisfied.
  • the condition relating to d1 defines an appropriate refractive power distribution of the first imaging optical system G1 and the second imaging optical system G2, and the condition relating to d2 corresponds to the second imaging optical system G1.
  • G2 and third imaging optical system G3 define an appropriate refractive power distribution. If these conditions are deviated, the refractive power of one of the imaging optical systems becomes tight, and it becomes difficult to satisfactorily correct aberrations, and at the same time, it becomes difficult to reduce the size of the concave mirror.
  • the catadioptric optical system is preferably a telecentric optical system on the first surface R side or the second surface W side.
  • the catadioptric optical system basically includes, as shown in FIG. 1, a first imaging optical system Gl and a second imaging optical system G2 in order from the first surface to the second surface W side. And a third imaging optical system G3.
  • the first imaging optical system G1 forms a first intermediate image I Ml of the first surface R near the second imaging optical system G2.
  • the second imaging optical system G2 forms a second intermediate image IM2, which is a re-imaged image of the first intermediate image IM1, in the vicinity of the third imaging optical system G3.
  • the optical system G3 forms the second intermediate image IM2 on the second surface W.
  • FIG. 1 also shows scanning directions on the first surface R and the second surface W when the catadioptric optical system according to the present invention is applied to a scanning projection exposure apparatus.
  • the running directions on the first surface R and the second surface W are opposite to each other.
  • the illumination area and the exposure area have a rectangular shape centered on the optical axis. Note that an aperture stop ST0 is disposed in the third imaging optical system G3.
  • an aspherical surface is used. Is as follows ( y: Height from optical axis
  • Fluorite has a refractive index of 1.5600 at a wavelength of 157 nm.
  • the catadioptric optical system includes, in order from the first surface R to the second surface W side, a first imaging optical system Gl, a second imaging optical system G2, and a second imaging optical system G2. It consists of three imaging optics G3.
  • the first imaging optical system G1 is provided with three positive meniscus lenses, three negative meniscus lenses, two positive lenses, and three positive meniscus lenses in order from the first surface R side.
  • the two imaging optics G 2 is trained by one concave mirror, two negative meniscus lenses and one concave mirror.
  • the third imaging optical system G 3 includes one positive meniscus lens, one negative lens, two positive meniscus lenses, one negative lens, four positive meniscus lenses, and one negative meniscus lens. The course is taught by a lens and one positive meniscus lens.
  • the catadioptric optical system of this example has a reduction ratio of 1/4, a numerical aperture (NA) of the second surface W side of 0.75, and a maximum object height of the first surface R side of 37.44 mm.
  • the maximum image height on the second side W side is 9.36 ram, and the exposure size on the second side W is a 17.5 x 6.6 mm rectangular aperture. You. By performing scanning and exposure, the overall exposure area is 17.2 X 25 mm.
  • the WD is 50.912830 on the first surface R side and 13.234625 on the second surface W side.
  • the diameter of the concave mirror used is 260.2 mm or less, the effective diameter of the two largest lenses of the lenses used is 246.9 ram or less, and the effective diameter of most other lenses is 183. It is 5 watts or less, which is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.
  • the shielding ratio of the shielding part of the concave mirror to the light beam is 19.5% in NA ratio, and has little effect on the imaging performance, and sufficient high performance can be obtained.
  • the refractive lens part is made of fluorite, and chromatic aberration correction with a half-value width of 1 pm at a wavelength of 157 nm of an ultraviolet F2 excimer laser is performed.
  • the projection optical system according to the second embodiment includes, in order from the first surface R to the second surface W side, a first imaging optical system Gl, a second imaging optical system G2, and a third imaging optical system G2. It consists of an imaging optical system G3.
  • the first imaging optical system G 1 includes, in order from the first surface R side, three positive meniscus lenses, three negative meniscus lenses, two positive lenses, one negative meniscus lens, and two positive meniscus lenses.
  • the second imaging optical system G2 is provided by one concave mirror, two negative meniscus lenses, and one concave mirror.
  • Third imaging light G3 has one positive meniscus lens, one negative lens, two positive meniscus lenses, one negative lens, four positive meniscus lenses, one negative lens, and one positive meniscus It is taught by lens.
  • the catadioptric optical system according to the present embodiment has a reduction ratio of 1/4, a numerical aperture (NA) force S 0.75 on the second surface W side, and a maximum object height 37.44 on the first surface R side. mm, the maximum image height on the second surface W side is 9.36 images, and the exposure size on the second surface W is a 17.5 x 6.6 cubic rectangular aperture.
  • NA numerical aperture
  • the WD is 50.000 000 on the first surface R side and 12.333503 on the second surface W side.
  • the diameter of the concave mirror used is less than 251.2 cm, the effective diameter of the two largest lenses among the lenses used is less than 238.4 mm, and the effective diameter of most other lenses is 187 mm This is much smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.
  • the shielding ratio of the shielding part of the concave mirror to the light beam is 19.5% in NA ratio, and has little effect on the imaging performance, and sufficient high performance can be obtained.
  • the refractive lens part is made of fluorite, and has a chromatic aberration correction with a half-value width of 1.0 pm at a wavelength of 157 nm of an ultraviolet excimer laser.
  • the catadioptric optical system As shown in FIG. In order to the side, it is composed of a first imaging optical system Gl, a second imaging optical system G2, and a third imaging optical system G3.
  • the first imaging optical system G 1 includes, in order from the first surface R side, one negative meniscus lens, one positive lens, '' three positive meniscus lenses, one negative lens, and two positive meniscus. It consists of a lens, two positive lenses, and two positive meniscus lenses, and the second imaging optical system G 2 is configured by one concave mirror, two negative meniscus lenses, and one concave mirror. .
  • the third imaging optical system G3 includes one positive lens, one negative lens, one positive meniscus lens, one positive lens, one positive meniscus lens, one negative meniscus lens, The course is taught by four positive meniscus lenses, one positive lens, one negative meniscus lens and one positive meniscus lens.
  • the catadioptric optical system of this embodiment has a reduction magnification power S 1/4 times, a numerical aperture NA on the second surface W side of 0.75, and a maximum object height on the first surface R side of 52.8 sq.
  • the maximum image height on the second side W side is 13.2, and the exposure size on the second side W is a rectangular aperture of 25 x 8.8 mm.
  • the WD is 72.733469.5 on the first surface R side and 17.227255 on the second surface W side.
  • the diameter of the concave mirror used is 260 mm or less, the effective diameter of the two largest lenses of the lenses used is 259 mm or less, and the effective diameter of most other lenses is 188 mm or less. However, it is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system used in the normal specification.
  • the shielding ratio of the shielding part of the concave mirror to the light flux is 20% in NA ratio, and has little effect on the imaging performance, and it is possible to obtain sufficiently high performance.
  • the refractive lens part is made of fluorite and has a chromatic aberration correction with a half-width of 2 pm at a wavelength of 157 nm of ultraviolet F2 excimer laser.
  • the catadioptric optical system according to the fourth embodiment includes, as shown in FIG. 11, a first imaging optical system G1, a second imaging optical system G2, and a second surface W in order from the first surface R to the second surface W. It comprises a third imaging optical system G3.
  • the first imaging optical system G1 includes three positive meniscus lenses, one negative meniscus lens, one negative lens, one positive meniscus lens, and two positive lenses in order from the first surface R side. , One positive meniscus lens, one positive lens, and one positive meniscus lens, and the second imaging optical system G2 has two concave mirrors arranged to face each other symmetrically. And two negative meniscus lenses.
  • the third imaging optical system G3 includes one positive meniscus lens, one concave lens, two positive meniscus lenses, one negative meniscus lens, four positive meniscus lenses, one negative lens, It consists of one positive meniscus lens.
  • the catadioptric optical system of this embodiment has a reduction magnification of 1/4, a numerical aperture on the second surface W side of 0.75, a maximum object height on the first surface R side of 52.8 thighs, and a second surface.
  • the maximum image height on the W side is 13.2 mm
  • the exposure size on the second surface W is a rectangular aperture of 25.0 X 8.8 ram. With this, scanning and exposure are performed, and the entire exposure area is set to 25.0 X 33 rows.
  • WD is 78.864226 on the first surface R side and 12.628525 on the second surface W side.
  • the diameter of the concave mirror used is less than 265 cm, the effective diameter of the two largest lenses of the lenses used is less than 260 mm, and the effective diameter of most other lenses is less than 183 cm.
  • the effective lens of the refractive system spherical optical system used in this specification It is much smaller than the diameter.
  • the shielding ratio of the shielding part of the concave mirror to the light beam is 20% in NA ratio, and the effect on the imaging performance is small, and sufficiently high performance can be obtained.
  • the refractive lens part is made of fluorite, and has a chromatic aberration correction with a half-value width of 2.0 pm at a wavelength of 157 nm of an ultraviolet excimer laser.
  • the catadioptric optical system according to the fifth embodiment includes, as shown in FIG. 14, a first imaging optical system G1, a second imaging optical system G2, and a second surface W in order from the first surface R. It comprises a third imaging optical system G3.
  • the first imaging optical system G 1 includes, in order from the first surface R side, one positive meniscus lens, one positive lens, one negative meniscus lens, one negative lens, and two positive meniscus lenses
  • the second imaging optical system G2 is provided by one concave mirror, two negative meniscus lenses, and one concave mirror.
  • the second imaging optical system G2 is provided by two positive lenses and one concave meniscus lens.
  • the third imaging optical system G3 has two positive lenses, one negative meniscus lens, one positive meniscus lens, one positive lens, one positive lens, one positive meniscus lens, One negative meniscus lens, two positive lenses, one negative meniscus lens, one positive meniscus lens, and one negative meniscus lens.
  • the catadioptric optical system of this example has a reduction ratio of 1/4, a numerical aperture NA on the second surface W side of 0.75, a maximum object height on the first surface R side of 52.8 mm, The maximum image height on the W side of the second surface is 13.2 thighs, and the exposure size on the second surface W is a rectangular aperture of 25 x 8.8 thighs. The exposure area is 25 X 8.8 ram, and the WD is 110.490999 on the first surface R side and 13.000594 on the second surface W side.
  • the diameter of the concave mirror used is 313 mm or less, the effective diameter of the two largest lenses of the lenses used is 308 or less, and the effective diameter of most other lenses is 195 awake or less. However, it is considerably smaller than the effective diameter of the lens used in the refractive spherical optical system used in the ordinary spec.
  • the shielding ratio of the shielding portion of the concave mirror to the light beam is 23% in NA ratio, and has little effect on the imaging performance, and it is possible to obtain sufficiently high performance.
  • the refractive lens part is made of fluorite and has a chromatic aberration correction with a half-width of 2 pm at a wavelength of 157 nm of an ultraviolet excimer laser.
  • the catadioptric optical system according to the sixth embodiment includes, in order from the first surface R to the second surface W side, a first imaging optical system Gl, a second imaging optical system G2, It comprises a third imaging optical system G3.
  • the first imaging optical system G 1 includes, in order from the first surface R side, one positive lens, one positive meniscus lens, two negative meniscus lenses, two positive lenses, and one positive meniscus lens
  • the second imaging optical system G2 is provided by one concave mirror, two negative meniscus lenses, and one concave mirror.
  • the third imaging optical system G3 is controlled by one positive lens, two positive meniscus lenses, two positive lenses, one positive meniscus lens, one positive lens, and two positive meniscus lenses. Done It is.
  • the catadioptric optical system of this example has a reduction ratio of 1/4, an image-side numerical aperture NA of 0.75, a maximum object height of 51.2 ⁇ , and a maximum image height of 12.8 ⁇ .
  • the exposure size on the wafer is a 25 x 5.5 mm rectangular aperture. Thus, scanning and exposure are performed, and the overall exposure area is 25 X 33 mm.
  • the WD is 224.250603 on the first surface R side and 18.245931 on the second surface W side.
  • the diameter of the tetrahedron used is 272 ram or less, the effective diameter of the two largest lenses of the lenses used is 269.2 mm or less, and the effective diameter of most other lenses is 191.6. mm or less, which is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this spec.
  • the shielding ratio of the shielding part of the concave mirror to the light beam is 20% in NA ratio, and the effect on the imaging performance is small, and sufficiently high performance can be obtained.
  • the refractive lens part is made of fluorite and has a chromatic aberration correction with a half-width of 2 pm at a wavelength of 157 nm of ultraviolet F2 excimer laser.
  • the catadioptric optical system according to the seventh embodiment includes a first imaging optical system Gl, a second imaging optical system G2, It comprises a third imaging optical system G3.
  • the first imaging optical system G 1 includes three positive meniscus lenses, one negative meniscus lens, one negative lens, one positive meniscus lens, and two positive lenses in order from the first surface R side. , One positive meniscus lens, one positive lens, one positive lens
  • the second imaging optical system G2 is composed of two concave mirrors and two negative meniscus lenses which are arranged symmetrically facing each other.
  • the third imaging optical system G3 includes one positive meniscus lens, one negative lens, two positive meniscus lenses, one negative meniscus lens, four positive meniscus lenses, and one negative meniscus lens. The lens consists of one positive lens.
  • the catadioptric optical system of this embodiment has a reduction ratio of 1/4, an image-side numerical aperture NA of 0.75, a maximum object height of 41.6, and a maximum image height of 10.4.
  • the exposure size of the second side WJ is a 20.0 X 5.5 ram rectangular aperture. Thus, scanning and exposure are performed, and the entire exposed area is set to 20.0 X 33 awake.
  • WD is 166.292101 on the first surface R side and 15.484990 on the second surface W side.
  • the diameter of the concave mirror used is 264.3 mm or less, the effective diameter of the two largest lenses of the used lenses is 259.8 or less, and the effective diameter of most other lenses is 182. It is 5 mm or less, which is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.
  • the shielding ratio of the shielding part of the concave mirror to the light beam is 20% in NA ratio, and the effect on the imaging performance is small, and sufficiently high performance can be obtained.
  • the refractive lens part is made of fluorite, and has a chromatic aberration correction with a half-width of 2.0 pm at a wavelength of 157 nm of an ultraviolet excimer laser.
  • the catadioptric optical system according to the eighth embodiment includes, as shown in FIG. 23, a first imaging optical system G1, a second imaging optical system G2, and It comprises a third imaging optical system G3.
  • the first imaging optical system G 1 includes, in order from the first surface R side, one negative meniscus lens, one positive lens, three positive meniscus lenses, one negative meniscus lens, and two positive meniscus lenses.
  • the second imaging optical system G2 includes a lens, two positive lenses, and two positive meniscus lenses.
  • the second imaging optical system G2 includes one concave mirror, two negative meniscus lenses, and one concave mirror.
  • the third imaging optical system G3 has one positive lens, one negative meniscus lens, one positive meniscus lens, one positive lens, one positive meniscus lens, and one negative lens. It consists of a meniscus lens, four positive meniscus lenses, one positive lens, one negative meniscus lens, and one positive meniscus lens.
  • the catadioptric optical system of this example has a reduction ratio of 1/4, an image-side numerical aperture of 0.75, a maximum object height of 52.8 mm, and a maximum image height of 13.2 mm.
  • the exposure size on the two sides W is a 25 x 8.8 rectangular aperture. Thus, scanning and exposure are performed, and the overall exposure area is 25 X 33 mm.
  • WD is 181.103882 on the first surface R side and 18.788119 on the second surface W side.
  • the diameter of the concave mirror used is 260.0 mm or less, the effective diameter of the two largest lenses of the lenses used is 258.1 mm or less, and the effective diameter of most other lenses is 174 thighs. This is considerably smaller than the effective diameter of the lens used for the refractive spherical optical system normally used in this specification.
  • the shielding ratio of the shielding part of the concave mirror to the light beam is 24.0% in NA ratio, and has little effect on the imaging performance, and it is possible to obtain sufficiently high performance.
  • the refractive lens part is made of fluorite and has a chromatic aberration correction with a half-width of 2 pm at a wavelength of 157 nm of an ultraviolet excimer laser.
  • 000000 ⁇ 1 ⁇ ⁇ ' ⁇ L6f9 ⁇ 63 ⁇ is • 9S 8S98I ⁇ 06 OS ⁇ ⁇ 8 ⁇ S0608' 1L ⁇ 2-3 ⁇ 968 ⁇ ⁇ : ⁇ ⁇ — 36S1 ⁇ 26I ⁇ 0 0 2I-36 8S62 ⁇ : 9 80-399 ⁇ 6 ⁇ V
  • a reticle as a projection original plate on which a predetermined circuit pattern is formed is arranged, and on the second surface W of the projection optical system PL, a photoresist as a substrate is applied. Wafer is placed.
  • the reticle is held on a reticle stage R S, the wafer is held on a wafer stage W S, and an illumination optical device I S for uniformly illuminating the reticle is arranged above the reticle.
  • the illumination optical device includes a light source that emits exposure light, and an illumination optical system that uniformly irradiates a light beam from the light source onto a reticle.
  • the light source is an F2 excimer laser light source, and emits exposure light having a wavelength of 157 nm.
  • the illumination optics system consists of a fly-eye lens for uniforming the illuminance distribution, an illumination system aperture stop, a variable field stop (reticle blind), and a condenser lens system.
  • the projection optical system PL is substantially telecentric on the reticle side and the wafer side as described above.
  • the exposure light supplied from the illumination optical device IS illuminates the reticle, and an image of the light source of the illumination optical device IS is formed at the position of the aperture stop STO of the projection optical system PL, so-called Koehler illumination is performed. Then, the circuit pattern of the reticle illuminated with Koehler illumination is reduced at a predetermined magnification via the projection optical system PL and projected onto the wafer.
  • step 1 a metal film is deposited on one lot of wafers.
  • step 2 A photoresist is applied on the metal film.
  • step 3 the pattern on the reticle is sequentially scanned and exposed on each exposure area on the wafer via the projection optical system PL using the above-mentioned projection exposure apparatus.
  • step 4 the photoresist on the wafer is developed.
  • step 5 a circuit pattern corresponding to the resist pattern on the reticle is formed in each exposure region on the wafer by etching the wafer on which the resist pattern is formed.
  • a device such as a semiconductor element is manufactured by forming a circuit pattern of a further upper layer.
  • the entire optical system is optically controlled.
  • the search can be performed with the axis as the center, and the inclination and displacement of each internal lens can be detected.
  • it is possible to obtain an effective diaphragm installation part, obtain a sufficient working distance, and obtain an optical system with a dramatically small concave mirror, and finally use the smallest aspherical element.
  • it consists of a single optical axis that is easy to adjust, and the reticle scanning direction can be taken in a direction perpendicular to gravity.

Abstract

L'invention porte sur un système optique réfléchissant/réfringent dont une partie constitue un bouchon efficace, et présentant une distance de travail assez longue et un miroir concave (usuellement grand) aussi petit que possible. Ledit système comporte: en allant d'un premier plan R à un deuxième plan W: un premier système optique de formation d'image (G1) comportant une lentille réfringente, un deuxième système optique de formation d'image (G2) comportant au moins une lentille concave et deux miroirs réfléchissants, et un troisième système optique de formation d'image (G3) comportant une lentille réfringente. Le premier système optique (G1) forme une première image intermédiaire (IM1) du premier plan R; le deuxième système optique (G2) forme une deuxième image intermédiaire (IM2) par reformation de la première image intermédiaire (IM1 ); et le troisième système optique (G3) reforme la deuxième image intermédiaire (IM2) sur le deuxième plan W.
PCT/JP2001/000912 2000-02-09 2001-02-09 Systeme optique reflechissant/refringent WO2001059502A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2001232257A AU2001232257A1 (en) 2000-02-09 2001-02-09 Reflection/refraction optical system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000-31285 2000-02-09
JP2000031285A JP2005233979A (ja) 2000-02-09 2000-02-09 反射屈折光学系

Publications (1)

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WO2001059502A1 true WO2001059502A1 (fr) 2001-08-16

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Country Status (3)

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JP (1) JP2005233979A (fr)
AU (1) AU2001232257A1 (fr)
WO (1) WO2001059502A1 (fr)

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