AU2001232257A1 - Reflection/refraction optical system - Google Patents

Reflection/refraction optical system

Info

Publication number
AU2001232257A1
AU2001232257A1 AU2001232257A AU3225701A AU2001232257A1 AU 2001232257 A1 AU2001232257 A1 AU 2001232257A1 AU 2001232257 A AU2001232257 A AU 2001232257A AU 3225701 A AU3225701 A AU 3225701A AU 2001232257 A1 AU2001232257 A1 AU 2001232257A1
Authority
AU
Australia
Prior art keywords
reflection
optical system
refraction optical
refraction
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001232257A
Other languages
English (en)
Inventor
Satoru Kumagai
Kiyoshi Mitarai
Tomowaki Takahashi
Hiroyuki Tsukamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2001232257A1 publication Critical patent/AU2001232257A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
AU2001232257A 2000-02-09 2001-02-09 Reflection/refraction optical system Abandoned AU2001232257A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-31285 2000-02-09
JP2000031285A JP2005233979A (ja) 2000-02-09 2000-02-09 反射屈折光学系
PCT/JP2001/000912 WO2001059502A1 (fr) 2000-02-09 2001-02-09 Systeme optique reflechissant/refringent

Publications (1)

Publication Number Publication Date
AU2001232257A1 true AU2001232257A1 (en) 2001-08-20

Family

ID=18556059

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001232257A Abandoned AU2001232257A1 (en) 2000-02-09 2001-02-09 Reflection/refraction optical system

Country Status (3)

Country Link
JP (1) JP2005233979A (fr)
AU (1) AU2001232257A1 (fr)
WO (1) WO2001059502A1 (fr)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6600608B1 (en) 1999-11-05 2003-07-29 Carl-Zeiss-Stiftung Catadioptric objective comprising two intermediate images
KR101484435B1 (ko) 2003-04-09 2015-01-19 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP4706171B2 (ja) * 2003-10-24 2011-06-22 株式会社ニコン 反射屈折投影光学系、露光装置及び露光方法
EP2722703A3 (fr) 2003-05-06 2014-07-23 Nikon Corporation Système de projection optique, système et procédé d'exposition
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
TWI282487B (en) * 2003-05-23 2007-06-11 Canon Kk Projection optical system, exposure apparatus, and device manufacturing method
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
WO2006005547A1 (fr) * 2004-07-14 2006-01-19 Carl Zeiss Smt Ag Objectif de projection catadioptrique
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
TWI505329B (zh) 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
CN100483174C (zh) 2004-05-17 2009-04-29 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜
JP5600128B2 (ja) * 2004-07-14 2014-10-01 カール・ツァイス・エスエムティー・ゲーエムベーハー カタディオプトリック投影対物系
KR101171131B1 (ko) 2004-07-14 2012-08-07 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2660853B1 (fr) 2005-05-12 2017-07-05 Nikon Corporation Système de projection optique, système d'exposition et procédé d'exposition
KR20080091182A (ko) * 2006-01-30 2008-10-09 가부시키가이샤 니콘 반사 굴절 결상 광학계, 노광 장치 및 디바이스의 제조방법
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
DE102008001216A1 (de) * 2007-04-18 2008-10-23 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
EP2179330A1 (fr) 2007-10-16 2010-04-28 Nikon Corporation Système optique d'éclairage, appareil d'exposition et procédé de fabrication de dispositif
KR101546987B1 (ko) 2007-10-16 2015-08-24 가부시키가이샤 니콘 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
WO2009145048A1 (fr) 2008-05-28 2009-12-03 株式会社ニコン Dispositif et procédé d'inspection pour modulateur spatial de lumière, système optique d'éclairage, procédé de réglage de ce système optique d'éclairage, dispositif d'exposition et procédé de fabrication de dispositif
JP2011049571A (ja) * 2010-09-24 2011-03-10 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法
JP2012073632A (ja) * 2011-11-18 2012-04-12 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3635684B2 (ja) * 1994-08-23 2005-04-06 株式会社ニコン 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
JP3352325B2 (ja) * 1996-05-21 2002-12-03 キヤノン株式会社 走査露光装置及びそれを用いたデバイスの製造方法

Also Published As

Publication number Publication date
JP2005233979A (ja) 2005-09-02
WO2001059502A1 (fr) 2001-08-16

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