JP2005200293A5 - - Google Patents

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Publication number
JP2005200293A5
JP2005200293A5 JP2004341551A JP2004341551A JP2005200293A5 JP 2005200293 A5 JP2005200293 A5 JP 2005200293A5 JP 2004341551 A JP2004341551 A JP 2004341551A JP 2004341551 A JP2004341551 A JP 2004341551A JP 2005200293 A5 JP2005200293 A5 JP 2005200293A5
Authority
JP
Japan
Prior art keywords
synthetic silica
molecules
ppm
laser
ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2004341551A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005200293A (ja
Filing date
Publication date
Application filed filed Critical
Publication of JP2005200293A publication Critical patent/JP2005200293A/ja
Publication of JP2005200293A5 publication Critical patent/JP2005200293A5/ja
Abandoned legal-status Critical Current

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JP2004341551A 2003-11-26 2004-11-26 光学的に誘起された屈折率変化に対する耐性の高い合成シリカガラス光学材料 Abandoned JP2005200293A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US52541903P 2003-11-26 2003-11-26

Publications (2)

Publication Number Publication Date
JP2005200293A JP2005200293A (ja) 2005-07-28
JP2005200293A5 true JP2005200293A5 (https=) 2007-11-22

Family

ID=34825870

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004341551A Abandoned JP2005200293A (ja) 2003-11-26 2004-11-26 光学的に誘起された屈折率変化に対する耐性の高い合成シリカガラス光学材料

Country Status (2)

Country Link
US (1) US7265070B2 (https=)
JP (1) JP2005200293A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
DE102013215292A1 (de) 2013-08-02 2015-02-05 Carl Zeiss Smt Gmbh Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv
DE102014212710A1 (de) 2014-07-01 2016-01-07 Carl Zeiss Smt Gmbh Optischer Manipulator, Projektionsobjektiv und Projektionsbelichtungsanlage

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0401845B2 (en) * 1989-06-09 2001-04-11 Heraeus Quarzglas GmbH & Co. KG Optical members and blanks of synthetic silica glass and method for their production
DE59800763D1 (de) * 1997-03-07 2001-06-28 Schott Ml Gmbh Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung
TW440548B (en) * 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
US6333283B1 (en) * 1997-05-16 2001-12-25 Sumitomo Electric Industries, Ltd. Silica glass article and manufacturing process therefor
JP2980094B2 (ja) * 1997-05-16 1999-11-22 住友電気工業株式会社 石英ガラス物品及びその製造方法
KR100554091B1 (ko) * 1997-12-08 2006-05-16 가부시키가이샤 니콘 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재
US8402786B2 (en) * 1998-01-30 2013-03-26 Asahi Glass Company, Limited Synthetic silica glass optical component and process for its production
JP2000143278A (ja) * 1998-11-10 2000-05-23 Nikon Corp 耐久性の向上された投影露光装置及び結像光学系の製造方法
US6630418B2 (en) * 2001-12-21 2003-10-07 Corning Incorporated Fused silica containing aluminum
US7534733B2 (en) * 2004-02-23 2009-05-19 Corning Incorporated Synthetic silica glass optical material having high resistance to laser induced damage

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