JP2005200293A5 - - Google Patents
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- Publication number
- JP2005200293A5 JP2005200293A5 JP2004341551A JP2004341551A JP2005200293A5 JP 2005200293 A5 JP2005200293 A5 JP 2005200293A5 JP 2004341551 A JP2004341551 A JP 2004341551A JP 2004341551 A JP2004341551 A JP 2004341551A JP 2005200293 A5 JP2005200293 A5 JP 2005200293A5
- Authority
- JP
- Japan
- Prior art keywords
- synthetic silica
- molecules
- ppm
- laser
- ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 109
- 230000003287 optical effect Effects 0.000 claims description 69
- 239000000463 material Substances 0.000 claims description 56
- 239000000377 silicon dioxide Substances 0.000 claims description 30
- 230000008859 change Effects 0.000 claims description 25
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 24
- 229910052782 aluminium Inorganic materials 0.000 claims description 23
- 239000005350 fused silica glass Substances 0.000 description 29
- 238000007596 consolidation process Methods 0.000 description 15
- 239000011521 glass Substances 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 12
- 239000000203 mixture Substances 0.000 description 12
- 150000004678 hydrides Chemical class 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical group CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000015556 catabolic process Effects 0.000 description 3
- 238000005056 compaction Methods 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000004071 soot Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000004335 scaling law Methods 0.000 description 2
- 239000002210 silicon-based material Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000005391 art glass Substances 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000010606 normalization Methods 0.000 description 1
- -1 polymethylsiloxanes Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US52541903P | 2003-11-26 | 2003-11-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005200293A JP2005200293A (ja) | 2005-07-28 |
| JP2005200293A5 true JP2005200293A5 (enExample) | 2007-11-22 |
Family
ID=34825870
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004341551A Abandoned JP2005200293A (ja) | 2003-11-26 | 2004-11-26 | 光学的に誘起された屈折率変化に対する耐性の高い合成シリカガラス光学材料 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7265070B2 (enExample) |
| JP (1) | JP2005200293A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7964522B2 (en) * | 2006-08-31 | 2011-06-21 | Corning Incorporated | F-doped silica glass and process of making same |
| DE102013215292A1 (de) | 2013-08-02 | 2015-02-05 | Carl Zeiss Smt Gmbh | Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv |
| DE102014212710A1 (de) | 2014-07-01 | 2016-01-07 | Carl Zeiss Smt Gmbh | Optischer Manipulator, Projektionsobjektiv und Projektionsbelichtungsanlage |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5086352A (en) * | 1989-06-09 | 1992-02-04 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks or synthetic silica glass and method for their production |
| EP0964832B1 (de) * | 1997-03-07 | 2001-05-23 | Schott ML GMBH | Vorform aus synthetischem kieselglas und vorrichtung zu ihrer herstellung |
| TW440548B (en) * | 1997-05-14 | 2001-06-16 | Nippon Kogaku Kk | Synthetic silica glass optical member and method of manufacturing the same |
| JP2980094B2 (ja) * | 1997-05-16 | 1999-11-22 | 住友電気工業株式会社 | 石英ガラス物品及びその製造方法 |
| US6333283B1 (en) * | 1997-05-16 | 2001-12-25 | Sumitomo Electric Industries, Ltd. | Silica glass article and manufacturing process therefor |
| KR100554091B1 (ko) * | 1997-12-08 | 2006-05-16 | 가부시키가이샤 니콘 | 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재 |
| US8402786B2 (en) * | 1998-01-30 | 2013-03-26 | Asahi Glass Company, Limited | Synthetic silica glass optical component and process for its production |
| JP2000143278A (ja) * | 1998-11-10 | 2000-05-23 | Nikon Corp | 耐久性の向上された投影露光装置及び結像光学系の製造方法 |
| US6630418B2 (en) * | 2001-12-21 | 2003-10-07 | Corning Incorporated | Fused silica containing aluminum |
| US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
-
2004
- 2004-11-24 US US10/996,507 patent/US7265070B2/en not_active Expired - Fee Related
- 2004-11-26 JP JP2004341551A patent/JP2005200293A/ja not_active Abandoned
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