JP2005191361A5 - - Google Patents

Download PDF

Info

Publication number
JP2005191361A5
JP2005191361A5 JP2003432401A JP2003432401A JP2005191361A5 JP 2005191361 A5 JP2005191361 A5 JP 2005191361A5 JP 2003432401 A JP2003432401 A JP 2003432401A JP 2003432401 A JP2003432401 A JP 2003432401A JP 2005191361 A5 JP2005191361 A5 JP 2005191361A5
Authority
JP
Japan
Prior art keywords
metal
electro
optical device
forming
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003432401A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005191361A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2003432401A priority Critical patent/JP2005191361A/ja
Priority claimed from JP2003432401A external-priority patent/JP2005191361A/ja
Publication of JP2005191361A publication Critical patent/JP2005191361A/ja
Publication of JP2005191361A5 publication Critical patent/JP2005191361A5/ja
Withdrawn legal-status Critical Current

Links

JP2003432401A 2003-12-26 2003-12-26 非線形抵抗素子、電気光学装置、電気光学装置の製造方法、及び電子機器 Withdrawn JP2005191361A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003432401A JP2005191361A (ja) 2003-12-26 2003-12-26 非線形抵抗素子、電気光学装置、電気光学装置の製造方法、及び電子機器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003432401A JP2005191361A (ja) 2003-12-26 2003-12-26 非線形抵抗素子、電気光学装置、電気光学装置の製造方法、及び電子機器

Publications (2)

Publication Number Publication Date
JP2005191361A JP2005191361A (ja) 2005-07-14
JP2005191361A5 true JP2005191361A5 (https=) 2006-06-15

Family

ID=34790114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003432401A Withdrawn JP2005191361A (ja) 2003-12-26 2003-12-26 非線形抵抗素子、電気光学装置、電気光学装置の製造方法、及び電子機器

Country Status (1)

Country Link
JP (1) JP2005191361A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8449817B2 (en) 2010-06-30 2013-05-28 H.C. Stark, Inc. Molybdenum-containing targets comprising three metal elements
US8449818B2 (en) 2010-06-30 2013-05-28 H. C. Starck, Inc. Molybdenum containing targets
US9334565B2 (en) 2012-05-09 2016-05-10 H.C. Starck Inc. Multi-block sputtering target with interface portions and associated methods and articles

Similar Documents

Publication Publication Date Title
TW480611B (en) Etching agent, production of substrate for electronic equipment using the same and electronic equipment
CN108265296B (zh) 蚀刻液组合物、配线、显示装置用阵列基板及其制造方法
CN105951101A (zh) 含银薄膜的蚀刻液组合物和使用了其的显示装置用阵列基板的制造方法
KR20080110259A (ko) 은 식각액 조성물
CN102747367A (zh) 非卤化蚀刻剂和使用该非卤化蚀刻剂制造显示基底的方法
TW588177B (en) Liquid crystal display and the wiring structure thereof
JP4730662B2 (ja) 薄膜配線層
TWI632670B (zh) 用於銅基金屬膜的蝕刻劑組合物及製造液晶顯示器用陣列基板的方法
CN109750292B (zh) 银蚀刻液组合物、利用它的蚀刻方法及金属图案形成方法
JP2005191361A5 (https=)
CN103820784A (zh) 刻蚀剂组合物、金属图案的形成方法和阵列基板的制法
JP5022364B2 (ja) 配線用積層膜及び配線回路
JP5394051B2 (ja) エッチング液、及びエッチング方法
CN110359049B (zh) 含银薄膜蚀刻液组合物、利用其制造的显示装置用阵列基板及其制造方法
JP4655281B2 (ja) 薄膜配線層
CN108385109B (zh) 蚀刻液组合物及利用其的显示装置用阵列基板的制造方法
JP4583564B2 (ja) 配線、電極及び接点
KR100472175B1 (ko) 몰리브덴또는몰리브덴합금을이용한반도체장치의제조방법
JP2010258347A (ja) 表示装置およびこれに用いるCu合金膜
JP2007189120A (ja) Tft基板及びその製造方法
TWI608077B (zh) 用於形成銀或銀合金的佈線和反射層的蝕刻劑組合物
CN110284140A (zh) 含银薄膜的蚀刻液组合物及利用其的显示装置用阵列基板的制造方法
JPH06236893A (ja) Tft液晶表示装置の製造方法
JP2000349294A (ja) 薄膜トランジスタの製造方法
CN102753652A (zh) 蚀刻液组成物