JP2005191361A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005191361A5 JP2005191361A5 JP2003432401A JP2003432401A JP2005191361A5 JP 2005191361 A5 JP2005191361 A5 JP 2005191361A5 JP 2003432401 A JP2003432401 A JP 2003432401A JP 2003432401 A JP2003432401 A JP 2003432401A JP 2005191361 A5 JP2005191361 A5 JP 2005191361A5
- Authority
- JP
- Japan
- Prior art keywords
- metal
- electro
- optical device
- forming
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910052751 metal Inorganic materials 0.000 claims 31
- 239000002184 metal Substances 0.000 claims 31
- 239000010955 niobium Substances 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 9
- 239000000956 alloy Substances 0.000 claims 7
- 229910045601 alloy Inorganic materials 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 7
- 229910052721 tungsten Inorganic materials 0.000 claims 7
- 239000010937 tungsten Substances 0.000 claims 7
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 6
- 229910052750 molybdenum Inorganic materials 0.000 claims 6
- 239000011733 molybdenum Substances 0.000 claims 6
- 229910052758 niobium Inorganic materials 0.000 claims 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims 5
- 229910052715 tantalum Inorganic materials 0.000 claims 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 5
- 239000000463 material Substances 0.000 claims 4
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 229910017604 nitric acid Inorganic materials 0.000 claims 3
- 239000000654 additive Substances 0.000 claims 2
- 230000000996 additive effect Effects 0.000 claims 2
- 239000004973 liquid crystal related substance Substances 0.000 claims 2
- 150000002739 metals Chemical class 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 235000011007 phosphoric acid Nutrition 0.000 claims 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 238000000137 annealing Methods 0.000 claims 1
- 239000010407 anodic oxide Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000001259 photo etching Methods 0.000 claims 1
- XGZGDYQRJKMWNM-UHFFFAOYSA-N tantalum tungsten Chemical compound [Ta][W][Ta] XGZGDYQRJKMWNM-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003432401A JP2005191361A (ja) | 2003-12-26 | 2003-12-26 | 非線形抵抗素子、電気光学装置、電気光学装置の製造方法、及び電子機器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003432401A JP2005191361A (ja) | 2003-12-26 | 2003-12-26 | 非線形抵抗素子、電気光学装置、電気光学装置の製造方法、及び電子機器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005191361A JP2005191361A (ja) | 2005-07-14 |
| JP2005191361A5 true JP2005191361A5 (https=) | 2006-06-15 |
Family
ID=34790114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003432401A Withdrawn JP2005191361A (ja) | 2003-12-26 | 2003-12-26 | 非線形抵抗素子、電気光学装置、電気光学装置の製造方法、及び電子機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005191361A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8449818B2 (en) | 2010-06-30 | 2013-05-28 | H. C. Starck, Inc. | Molybdenum containing targets |
| US8449817B2 (en) * | 2010-06-30 | 2013-05-28 | H.C. Stark, Inc. | Molybdenum-containing targets comprising three metal elements |
| US9334565B2 (en) | 2012-05-09 | 2016-05-10 | H.C. Starck Inc. | Multi-block sputtering target with interface portions and associated methods and articles |
-
2003
- 2003-12-26 JP JP2003432401A patent/JP2005191361A/ja not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW480611B (en) | Etching agent, production of substrate for electronic equipment using the same and electronic equipment | |
| CN105887091B (zh) | 用于银薄层的蚀刻剂组合物，使用其形成金属图案的方法和使用其制作阵列基板的方法 | |
| JP4282927B2 (ja) | エッチング溶液及びエッチング溶液でパターン形成された銅配線を有する電子機器用アレー基板 | |
| CN108265296B (zh) | 蚀刻液组合物、配线、显示装置用阵列基板及其制造方法 | |
| CN105951101A (zh) | 含银薄膜的蚀刻液组合物和使用了其的显示装置用阵列基板的制造方法 | |
| KR20080110259A (ko) | 은 식각액 조성물 | |
| CN102747367A (zh) | 非卤化蚀刻剂和使用该非卤化蚀刻剂制造显示基底的方法 | |
| JP2014104600A (ja) | 積層構造体、積層構造体の製造方法および電子機器 | |
| CN108220963A (zh) | 多层膜用蚀刻液组合物、蚀刻方法及阵列基板的制造方法 | |
| US5340491A (en) | Etchant for production of electrode plate structure for liquid crystal display device | |
| TW588177B (en) | Liquid crystal display and the wiring structure thereof | |
| JP4730662B2 (ja) | 薄膜配線層 | |
| TWI632670B (zh) | 用於銅基金屬膜的蝕刻劑組合物及製造液晶顯示器用陣列基板的方法 | |
| JP2005191361A5 (https=) | ||
| JP5022364B2 (ja) | 配線用積層膜及び配線回路 | |
| JP5394051B2 (ja) | エッチング液、及びエッチング方法 | |
| JP4655281B2 (ja) | 薄膜配線層 | |
| CN108385109B (zh) | 蚀刻液组合物及利用其的显示装置用阵列基板的制造方法 | |
| JP4583564B2 (ja) | 配線、電極及び接点 | |
| JP2010258347A (ja) | 表示装置およびこれに用いるＣｕ合金膜 | |
| JP2007189120A (ja) | Ｔｆｔ基板及びその製造方法 | |
| TWI608077B (zh) | 用於形成銀或銀合金的佈線和反射層的蝕刻劑組合物 | |
| JPH06236893A (ja) | Ｔｆｔ液晶表示装置の製造方法 | |
| JP2000349294A (ja) | 薄膜トランジスタの製造方法 | |
| TW486512B (en) | Method of manufacturing a substrate for electronic device by using etchant and electronic device having the substrate |