JP2005183938A5 - - Google Patents

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Publication number
JP2005183938A5
JP2005183938A5 JP2004327534A JP2004327534A JP2005183938A5 JP 2005183938 A5 JP2005183938 A5 JP 2005183938A5 JP 2004327534 A JP2004327534 A JP 2004327534A JP 2004327534 A JP2004327534 A JP 2004327534A JP 2005183938 A5 JP2005183938 A5 JP 2005183938A5
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JP
Japan
Prior art keywords
illuminator
polarization
illumination
ils
polarization states
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JP2004327534A
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English (en)
Japanese (ja)
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JP4491332B2 (ja
JP2005183938A (ja
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Publication of JP2005183938A publication Critical patent/JP2005183938A/ja
Publication of JP2005183938A5 publication Critical patent/JP2005183938A5/ja
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Publication of JP4491332B2 publication Critical patent/JP4491332B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004327534A 2003-12-19 2004-11-11 最適化した偏光照明 Expired - Fee Related JP4491332B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US53066203P 2003-12-19 2003-12-19

Publications (3)

Publication Number Publication Date
JP2005183938A JP2005183938A (ja) 2005-07-07
JP2005183938A5 true JP2005183938A5 (cg-RX-API-DMAC10.html) 2007-08-02
JP4491332B2 JP4491332B2 (ja) 2010-06-30

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ID=34520284

Family Applications (1)

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JP2004327534A Expired - Fee Related JP4491332B2 (ja) 2003-12-19 2004-11-11 最適化した偏光照明

Country Status (7)

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US (3) US7292315B2 (cg-RX-API-DMAC10.html)
EP (1) EP1544679B1 (cg-RX-API-DMAC10.html)
JP (1) JP4491332B2 (cg-RX-API-DMAC10.html)
KR (1) KR100919856B1 (cg-RX-API-DMAC10.html)
CN (1) CN100524028C (cg-RX-API-DMAC10.html)
SG (1) SG135042A1 (cg-RX-API-DMAC10.html)
TW (1) TWI373278B (cg-RX-API-DMAC10.html)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7292315B2 (en) * 2003-12-19 2007-11-06 Asml Masktools B.V. Optimized polarization illumination
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
ATE539383T1 (de) 2004-01-16 2012-01-15 Zeiss Carl Smt Gmbh Projektionssystem mit einem polarisationsmodulierenden optischen element mit variabler dicke
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US7324280B2 (en) 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
CN103605262B (zh) * 2004-06-09 2016-06-29 株式会社尼康 曝光装置及其维护方法、以及元件制造方法
JP4528580B2 (ja) * 2004-08-24 2010-08-18 株式会社東芝 照明光源の設計方法、マスクパターン設計方法、フォトマスクの製造方法、半導体装置の製造方法、及びプログラム
US7548302B2 (en) * 2005-03-29 2009-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317506B2 (en) * 2005-03-29 2008-01-08 Asml Netherlands B.V. Variable illumination source
EP1896899A2 (en) * 2005-06-24 2008-03-12 Koninklijke Philips Electronics N.V. Methods and devices for characterizing polarization of illumination system
US7804646B2 (en) * 2006-01-31 2010-09-28 Asml Masktools B.V. Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings
US7548315B2 (en) * 2006-07-27 2009-06-16 Asml Netherlands B.V. System and method to compensate for critical dimension non-uniformity in a lithography system
US7705998B2 (en) * 2007-09-12 2010-04-27 Infineon Technologies Ag Method for evaluating an optical imaging process
JP2009071125A (ja) * 2007-09-14 2009-04-02 Canon Inc 露光条件を決定する方法及びプログラム
US7673278B2 (en) * 2007-11-29 2010-03-02 Tokyo Electron Limited Enhanced process yield using a hot-spot library
TW200938957A (en) * 2008-03-05 2009-09-16 Nanya Technology Corp Feedback system and feedback method for controlling power ratio of light source
JP2009251521A (ja) * 2008-04-10 2009-10-29 Jedat Inc ガラスデータ設計システム、方法およびプログラム
JP5607327B2 (ja) * 2009-08-27 2014-10-15 キヤノン株式会社 決定方法、露光方法、デバイスの製造方法及びプログラム
NL2005738A (en) * 2009-12-15 2011-06-16 Asml Holding Nv Improved polarization designs for lithographic apparatus.
NL2007306A (en) * 2010-09-23 2012-03-26 Asml Netherlands Bv Source polarization optimization.
NL2007303A (en) 2010-09-23 2012-03-26 Asml Netherlands Bv Process tuning with polarization.
JP2012099596A (ja) * 2010-11-01 2012-05-24 Panasonic Corp 照明形状の最適化方法、マスク形状の最適化方法及びパターン形成方法
JP2012169483A (ja) * 2011-02-15 2012-09-06 Toshiba Corp 露光条件決定プログラム
CN106028585B (zh) * 2016-05-23 2018-03-09 电子科技大学 一种基于牛顿极值搜索算法的双闭环照明节能控制方法
CN106028584B (zh) * 2016-05-23 2018-03-09 电子科技大学 一种基于梯度极值搜索算法的双闭环照明节能控制方法
CN106341938B (zh) * 2016-11-07 2018-08-07 电子科技大学 基于变幅值牛顿极值搜索算法的照明节能控制方法
EP3336608A1 (en) * 2016-12-16 2018-06-20 ASML Netherlands B.V. Method and apparatus for image analysis
DE102017115262B9 (de) * 2017-07-07 2021-05-27 Carl Zeiss Smt Gmbh Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
WO2026145911A1 (en) * 2024-12-30 2026-07-09 Asml Netherlands B.V. Method for imaging-metric-mapping aware source-mask optimization

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US4985579A (en) 1989-10-16 1991-01-15 Dow Corning Corporation Removal of hydrogen-containing silanes from organosilane mixtures
US6404482B1 (en) * 1992-10-01 2002-06-11 Nikon Corporation Projection exposure method and apparatus
JP3339593B2 (ja) 1993-04-22 2002-10-28 株式会社ニコン 投影露光装置、及び該装置を用いた素子製造方法
KR0173168B1 (ko) * 1994-02-24 1999-03-20 가네꼬 히사시 웨이퍼상의 레지스트막을 노광하기 위한 노광계와 그에 사용되는 조명계 및 방법
DE19535392A1 (de) * 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
EP0824722B1 (en) 1996-03-06 2001-07-25 Asm Lithography B.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
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US6140660A (en) 1999-03-23 2000-10-31 Massachusetts Institute Of Technology Optical synthetic aperture array
US6491396B2 (en) * 2000-02-15 2002-12-10 Seiko Epson Corporation Projector modulating a plurality of partial luminous fluxes according to imaging information by means of an electro-optical device
US6563566B2 (en) 2001-01-29 2003-05-13 International Business Machines Corporation System and method for printing semiconductor patterns using an optimized illumination and reticle
US7396558B2 (en) 2001-01-31 2008-07-08 Toray Industries, Inc. Integrated mask and method and apparatus for manufacturing organic EL device using the same
TWI285295B (en) 2001-02-23 2007-08-11 Asml Netherlands Bv Illumination optimization in lithography
US6519760B2 (en) * 2001-02-28 2003-02-11 Asml Masktools, B.V. Method and apparatus for minimizing optical proximity effects
MXPA04003486A (es) * 2001-10-19 2004-07-30 3M Innovative Properties Co Sistema de conversion de polarizacion de iluminacion.
US7293249B2 (en) * 2002-01-31 2007-11-06 Juan Andres Torres Robles Contrast based resolution enhancement for photolithographic processing
US6888615B2 (en) 2002-04-23 2005-05-03 Asml Holding N.V. System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
JP2004111579A (ja) * 2002-09-17 2004-04-08 Canon Inc 露光方法及び装置
TWI247339B (en) 2003-02-21 2006-01-11 Asml Holding Nv Lithographic printing with polarized light
DE602004032449D1 (de) * 2003-09-17 2011-06-09 Photonic Lattice Inc Polarisations-Analysegerät und entsprechende Methode
TWI569308B (zh) * 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
KR20050043713A (ko) 2003-11-05 2005-05-11 에이에스엠엘 마스크툴즈 비.브이. 고유 분해 기반 ｏｐｃ 모델
US7292315B2 (en) * 2003-12-19 2007-11-06 Asml Masktools B.V. Optimized polarization illumination

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