JP2005174683A5 - - Google Patents

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JP2005174683A5
JP2005174683A5 JP2003411706A JP2003411706A JP2005174683A5 JP 2005174683 A5 JP2005174683 A5 JP 2005174683A5 JP 2003411706 A JP2003411706 A JP 2003411706A JP 2003411706 A JP2003411706 A JP 2003411706A JP 2005174683 A5 JP2005174683 A5 JP 2005174683A5
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glass paste
glass
film
paste
display panel
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JP2003411706A
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JP4337535B2 (en
JP2005174683A (en
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すなわち本発明は、軟化点が４００〜４８０℃の範囲内にある非結晶性ガラス粉末（Ａ）と軟化点が５００〜６００℃の範囲内にある非結晶性ガラス粉末（Ｂ）とを含み、該非結晶性ガラス粉末（Ａ）と非結晶性ガラス粉末（Ｂ）の重量比が０．５／９９．５〜１０／９０の範囲内であることを特徴とするガラスペーストである。 That is, the present invention includes an amorphous glass powder (A) having a softening point in the range of 400 to 480 ° C and an amorphous glass powder (B) having a softening point in the range of 500 to 600 ° C. A glass paste characterized in that the weight ratio of the amorphous glass powder (A) to the amorphous glass powder (B) is in the range of 0.5 / 99.5 to 10/90 .

本発明のガラスペーストを用いることにより、形状保持と透明性の両方を兼ね備えたガラス層を得ることができる。 By using the glass paste of the present invention, a glass layer having both shape retention and transparency can be obtained.

実施例１〜５、参考例１、比較例１〜２
まず前面板を作製した。
旭硝子社製ガラス基板ＰＤ２００上に、ＩＴＯを用いて、ピッチ３７５μｍ、線幅１５０μｍのスキャン電極を形成した。また、その基板上に感光性銀ペースト（東レ社製）を塗布した後に、フォトマスクを介したマスク露光、０．３％炭酸ナトリウム水溶液を用いた現像、５８０℃１５分間の焼成工程を経て、線幅５０μｍ、厚み３μｍのバス電極を形成した。 Examples 1 to 5, Reference Example 1 , Comparative Examples 1 and 2
First, a front plate was produced.
A scan electrode having a pitch of 375 μm and a line width of 150 μm was formed on a glass substrate PD200 manufactured by Asahi Glass Co., Ltd. using ITO. In addition, after applying a photosensitive silver paste (manufactured by Toray Industries, Inc.) on the substrate, through a mask exposure through a photomask, development using a 0.3% aqueous sodium carbonate solution, and a baking process at 580 ° C. for 15 minutes, A bus electrode having a line width of 50 μm and a thickness of 3 μm was formed.

Figure 2005174683
実施例１〜５では、得られた格子状のパターンが形成された誘電体層は、透過率が８０％以上であり、パターン形状は矩形〜台形であった。この格子状のパターンが形成された誘電体層をもつ前面板を用いてＰＤＰを作製した。パネル点灯時の異常放電等はなく、表示状態は良好であった。
Figure 2005174683
 In actual施例1-5, the resulting lattice-shaped pattern is formed dielectric layer, the transmittance is 80% or more, the pattern shape was rectangular-trapezoid. A PDP was manufactured using a front plate having a dielectric layer on which a lattice-like pattern was formed. There was no abnormal discharge when the panel was lit, and the display state was good.

Claims (6)

軟化点が４００〜４８０℃の範囲内にある非結晶性ガラス粉末（Ａ）と軟化点が５００〜６００℃の範囲内にある非結晶性ガラス粉末（Ｂ）とを含み、該非結晶性ガラス粉末（Ａ）と非結晶性ガラス粉末（Ｂ）の重量比が０．５／９９．５〜１０／９０の範囲内であることを特徴とするガラスペースト。An amorphous glass powder (A) having a softening point in the range of 400 to 480 ° C. and an amorphous glass powder (B) having a softening point in the range of 500 to 600 ° C. A glass paste, wherein the weight ratio of (A) to the amorphous glass powder (B) is in the range of 0.5 / 99.5 to 10/90. 焼成後膜厚４０μｍにおけるガラスペースト膜の全光線透過率が８０％以上であることを特徴とする請求項１に記載のガラスペースト。 The glass paste according to claim 1, wherein the total light transmittance of the glass paste film at a film thickness of 40 μm after firing is 80% or more. ガラスペーストが感光性有機成分を含むことを特徴する請求項１または２に記載のガラスペースト。 The glass paste according to claim 1 or 2 , wherein the glass paste contains a photosensitive organic component. 請求項３に記載のガラスペーストの層が支持フィルム上に形成された感光性フィルム。 A photosensitive film in which the glass paste layer according to claim 3 is formed on a support film. ペーストを基板上に塗布して乾燥する工程を含むディスプレイパネル用部材の製造方法であって、ペーストに請求項１〜３のいずれかに記載のガラスペーストを用いることを特徴とするディスプレイパネル用部材の製造方法。 A display panel member comprising a step of applying a paste on a substrate and drying the display panel member, wherein the glass paste according to any one of claims 1 to 3 is used for the paste. Manufacturing method. 支持フィルム上に形成されたガラスペーストの層を基板上に転写する工程を含むディスプレイパネル用部材の製造方法であって、転写フィルムとして請求項４に記載の感光性フィルムを用いることを特徴とするディスプレイパネル用部材の製造方法。 A method for producing a display panel member comprising a step of transferring a glass paste layer formed on a support film onto a substrate, wherein the photosensitive film according to claim 4 is used as the transfer film. A method for producing a display panel member.
JP2003411706A 2003-12-10 2003-12-10 Patterned glass layer forming glass paste, patterned glass layer forming photosensitive film, and method for producing display panel member using the same Expired - Fee Related JP4337535B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003411706A JP4337535B2 (en) 2003-12-10 2003-12-10 Patterned glass layer forming glass paste, patterned glass layer forming photosensitive film, and method for producing display panel member using the same

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Application Number Priority Date Filing Date Title
JP2003411706A JP4337535B2 (en) 2003-12-10 2003-12-10 Patterned glass layer forming glass paste, patterned glass layer forming photosensitive film, and method for producing display panel member using the same

Publications (3)

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JP2005174683A JP2005174683A (en) 2005-06-30
JP2005174683A5 true JP2005174683A5 (en) 2007-02-01
JP4337535B2 JP4337535B2 (en) 2009-09-30

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4870959B2 (en) * 2005-09-26 2012-02-08 太陽ホールディングス株式会社 Method for producing photosensitive paste and plasma display panel
JP5061613B2 (en) 2006-12-28 2012-10-31 セントラル硝子株式会社 Glass ceramic materials for plasma displays
KR100889774B1 (en) * 2007-03-06 2009-03-24 삼성에스디아이 주식회사 A photosensitive paste composition, a barrier rib prepared using the composition and a plasma display panel comprising the barrier rib
KR20110016986A (en) * 2008-06-26 2011-02-18 이 아이 듀폰 디 네모아 앤드 캄파니 Glass compositions used in conductors for photovoltaic cells

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