JP2005166961A - 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス - Google Patents

不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス Download PDF

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Publication number
JP2005166961A
JP2005166961A JP2003403918A JP2003403918A JP2005166961A JP 2005166961 A JP2005166961 A JP 2005166961A JP 2003403918 A JP2003403918 A JP 2003403918A JP 2003403918 A JP2003403918 A JP 2003403918A JP 2005166961 A JP2005166961 A JP 2005166961A
Authority
JP
Japan
Prior art keywords
chamber
exhaust
flow rate
inert gas
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003403918A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005166961A5 (enExample
Inventor
Yasuteru Tominaga
泰輝 冨永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003403918A priority Critical patent/JP2005166961A/ja
Priority to US11/001,115 priority patent/US7130015B2/en
Publication of JP2005166961A publication Critical patent/JP2005166961A/ja
Publication of JP2005166961A5 publication Critical patent/JP2005166961A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003403918A 2003-12-03 2003-12-03 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス Pending JP2005166961A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003403918A JP2005166961A (ja) 2003-12-03 2003-12-03 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス
US11/001,115 US7130015B2 (en) 2003-12-03 2004-12-02 Inert-gas purge method, exposure apparatus, device fabrication method and devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003403918A JP2005166961A (ja) 2003-12-03 2003-12-03 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス

Publications (2)

Publication Number Publication Date
JP2005166961A true JP2005166961A (ja) 2005-06-23
JP2005166961A5 JP2005166961A5 (enExample) 2007-01-25

Family

ID=34631665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003403918A Pending JP2005166961A (ja) 2003-12-03 2003-12-03 不活性ガスパージ方法、露光装置、デバイス製造方法、及びデバイス

Country Status (2)

Country Link
US (1) US7130015B2 (enExample)
JP (1) JP2005166961A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101034261B (zh) * 2006-03-09 2010-08-11 中芯国际集成电路制造(上海)有限公司 防止由阻挡处理对光学元件的污染的方法和设备
EP2959504B1 (en) * 2013-02-25 2018-07-04 Kla-Tencor Corporation Method and system for gas flow mitigation of molecular contamination of optics

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3084332B2 (ja) 1993-01-19 2000-09-04 キヤノン株式会社 露光装置
JP3531914B2 (ja) * 2000-04-14 2004-05-31 キヤノン株式会社 光学装置、露光装置及びデバイス製造方法
JP2002158170A (ja) * 2000-09-08 2002-05-31 Nikon Corp 露光装置及びデバイス製造方法
JP2004186179A (ja) * 2002-11-29 2004-07-02 Canon Inc 露光装置
JP2005142382A (ja) * 2003-11-07 2005-06-02 Canon Inc 露光装置

Also Published As

Publication number Publication date
US7130015B2 (en) 2006-10-31
US20050122493A1 (en) 2005-06-09

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