JP2005161142A - Apparatus for producing sterilizing water continuously - Google Patents

Apparatus for producing sterilizing water continuously Download PDF

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JP2005161142A
JP2005161142A JP2003401047A JP2003401047A JP2005161142A JP 2005161142 A JP2005161142 A JP 2005161142A JP 2003401047 A JP2003401047 A JP 2003401047A JP 2003401047 A JP2003401047 A JP 2003401047A JP 2005161142 A JP2005161142 A JP 2005161142A
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aqueous solution
sodium hypochlorite
water
mixing
acid aqueous
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Mitsuharu Yamashita
光治 山下
Masayuki Shigemoto
雅之 重本
Ishizue Masuda
礎 増田
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HSP KK
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Priority to PCT/JP2004/015102 priority patent/WO2005054138A1/en
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/76Treatment of water, waste water, or sewage by oxidation with halogens or compounds of halogens
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/32Nature of the water, waste water, sewage or sludge to be treated from the food or foodstuff industry, e.g. brewery waste waters
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/42Nature of the water, waste water, sewage or sludge to be treated from bathing facilities, e.g. swimming pools
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/06Controlling or monitoring parameters in water treatment pH
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/40Liquid flow rate
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C02F5/083Mineral agents

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  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To continuously produce slightly-acidic sodium hypochlorite-diluted water (sterilizing water) having desired sterilizing power over a long period of time without maintaining a sterilizing water producing apparatus. <P>SOLUTION: Sterilizing water is produced by arranging a mixing/reacting part for producing sterilizing water on the downstream side of a diluting/mixing part for producing a dilute acid aqueous solution, injecting a sodium hypochlorite aqueous solution (an undiluted liquid) into the dilute acid aqueous solution while making the dilute acid aqueous solution flow in the mixing/reacting part and mixing the sodium hypochlorite aqueous solution with the dilute acid aqueous solution. This apparatus can be provided with an air bubble removing unit for removing air bubbles suspended in the sodium hypochlorite aqueous solution or an agitation tank accumulator for homogenizing the sterilizing water produced in the mixing/reacting part. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

この発明は、塩酸、酢酸等の酸水溶液を加えることによってpH値が弱酸性域に保たれた次亜塩素酸ナトリウム水溶液の希釈水からなる殺菌水の連続生成装置に関するものである。   The present invention relates to a continuous production apparatus for sterilizing water composed of diluted water of a sodium hypochlorite aqueous solution whose pH value is kept in a weakly acidic range by adding an aqueous acid solution such as hydrochloric acid or acetic acid.

医療施設や食品業では、次亜塩素酸ナトリウム水溶液(原液)を水道水などで一定濃度に希釈して形成した次亜塩素酸ナトリウム希釈水が殺菌水として広く使用されている。そして、この次亜塩素酸ナトリウム希釈水はpHを弱酸性域に保つことでその殺菌力が大幅に増強されることが知られている。   In medical facilities and the food industry, sodium hypochlorite diluted water formed by diluting a sodium hypochlorite aqueous solution (stock solution) to a certain concentration with tap water or the like is widely used as sterilizing water. And it is known that the disinfection power of this sodium hypochlorite-diluted water is greatly enhanced by maintaining the pH in a weakly acidic region.

このようなpHを弱酸性域に保った次亜塩素酸ナトリウム希釈水は、一般に、塩酸と水を混合して希塩酸を生成し、次亜塩素酸ナトリウム水溶液(原液)と水を混合して希釈次亜塩素酸ナトリウム水溶液を生成し、これら希塩酸と希釈次亜塩素酸ナトリウム水溶液を混合する方法で得られている。   Diluted water of sodium hypochlorite that maintains such a pH in a weakly acidic region is generally diluted with hydrochloric acid and water to form dilute hydrochloric acid, and mixed with sodium hypochlorite aqueous solution (stock solution) and water. It is obtained by producing a sodium hypochlorite aqueous solution and mixing these dilute hydrochloric acid and diluted sodium hypochlorite aqueous solution.

そして、このような次亜塩素酸ナトリウム希釈水を生成するための殺菌水生成装置は特許文献や非特許文献に数多く提案されている。
特開2002−241209号公報 特開2001−321778号公報 特開平11−188083号公報 丹保憲仁・小笠原紘一著「浄水の技術」(技報堂出版)
And many sterilization water production | generation apparatuses for producing | generating such sodium hypochlorite dilution water are proposed by the patent document and the nonpatent literature.
JP 2002-241209 A JP 2001-321778 A JP-A-11-188083 Norihito Tanbo and Junichi Ogasawara "Water Purification Technology" (Gihodo Publishing)

この発明が解決しようとする問題点は、水道水や井戸水へ次亜塩素酸ナトリウム水溶液(原液)を注入する注入部で次亜塩素酸ナトリウム水溶液(原液)中に含まれるアルカリ成分によって水道水や井戸水に含まれるカルシウム成分やマグネシウム成分が析出し、これが注入部の逆流防止弁に固着して該逆流防止弁の動きを悪くしたり、注入部の注入口を狭くして所望量の次亜塩素酸ナトリウム水溶液(原液)が注入されなくなり、生成された殺菌水の殺菌力が低下してしまう点である。   The problem to be solved by the present invention is that the tap water or the well water is injected with the sodium hypochlorite aqueous solution (stock solution) by the alkaline component contained in the sodium hypochlorite aqueous solution (stock solution). Calcium and magnesium components contained in the well water are deposited, which adheres to the backflow prevention valve of the injection section and makes the movement of the backflow prevention valve worse, or narrows the injection port of the injection section to obtain a desired amount of hypochlorous acid. The sodium acid aqueous solution (stock solution) is not injected, and the sterilizing power of the generated sterilizing water is reduced.

本発明は、予め希釈混合して生成した希酸水溶液中に次亜塩素酸ナトリウム水溶液(原液)を加える装置を備えていることを最も主要な特徴とする。   The main feature of the present invention is that it includes a device for adding a sodium hypochlorite aqueous solution (stock solution) to a dilute acid aqueous solution produced by dilution and mixing in advance.

本発明に係る殺菌水の連続生成装置は、源水中に含まれるカルシウム等のスケール成分が次亜塩素酸ナトリウム水溶液(原液)を注入する注入口付近へ析出・固着しなくなるので、所望量の次亜塩素酸ナトリウム水溶液(原液)が常に注入でき、生成される殺菌水中の塩素濃度が常に所望の値になり、従って、所望の殺菌能力を有する殺菌水が確実に得られるという利点がある。   In the continuous production apparatus for sterilizing water according to the present invention, the scale component such as calcium contained in the source water does not precipitate and adhere to the vicinity of the injection port for injecting the sodium hypochlorite aqueous solution (stock solution). An aqueous solution of sodium chlorite (stock solution) can always be injected, and the chlorine concentration in the produced sterilized water always becomes a desired value, so that there is an advantage that sterilized water having the desired sterilizing ability can be surely obtained.

また、本発明に係る殺菌水の連続生成装置は、前記供給量修正部を備えている場合、次亜塩素酸ナトリウム水溶液(原液)が劣化している場合であっても対応でき、生成される殺菌水中の塩素濃度が所望の値になり、従って、所望の殺菌能力を有する殺菌水が確実に得られるという利点がある。   Moreover, the continuous production | generation apparatus of the sterilization water which concerns on this invention can respond even if it is a case where the sodium hypochlorite aqueous solution (raw solution) has deteriorated, when the said supply amount correction | amendment part is provided, and is produced | generated. There is an advantage that the chlorine concentration in the sterilized water becomes a desired value, and thus sterilized water having the desired sterilizing ability can be surely obtained.

また、本発明に係る殺菌水の連続生成装置は、前記気泡除去装置を備えている場合、次亜塩素酸ナトリウム水溶液供給手段のポンプの空転が防止され、所望量の次亜塩素酸ナトリウム水溶液(原液)が常に注入でき、生成される殺菌水中の塩素濃度が常に所望の値になり、従って、所望の殺菌能力を有する殺菌水が確実に得られるという利点がある。   Moreover, when the continuous production | generation apparatus of the sterilization water which concerns on this invention is equipped with the said bubble removal apparatus, the idling of the pump of the sodium hypochlorite aqueous solution supply means is prevented, and desired amount of sodium hypochlorite aqueous solution ( The chlorine concentration in the produced sterilized water always becomes a desired value, and therefore, there is an advantage that sterilized water having the desired sterilizing ability can be surely obtained.

また、本発明に係る殺菌水の連続生成装置は、前記混合反応部で生成された殺菌水を滞留させる攪拌タンクアキュムレータを備えている場合、水源から供給される水の圧力等が変化して殺菌水の塩素濃度やpHが多少変わっても、殺菌水の塩素濃度やpHが攪拌タンクアキュムレータで均質化させられるので、塩素濃度及びpHの安定した殺菌水を供給することができるという利点がある。   Further, when the sterilizing water continuous generation apparatus according to the present invention includes a stirring tank accumulator that retains the sterilizing water generated in the mixing reaction section, the pressure of water supplied from the water source changes and the sterilization Even if the chlorine concentration or pH of the water changes somewhat, the chlorine concentration or pH of the sterilizing water is homogenized by the stirring tank accumulator, so that there is an advantage that sterilizing water having a stable chlorine concentration and pH can be supplied.

また、本発明に係る殺菌水の連続生成装置は、前記混合希釈部と前記混合反応部を共通の混合容器とした場合、装置を小型化することができるという利点がある。   Moreover, the continuous production | generation apparatus of the sterilizing water which concerns on this invention has the advantage that an apparatus can be reduced in size, when the said mixing dilution part and the said mixing reaction part are made into a common mixing container.

所望の殺菌能力を有する殺菌水を装置のメンテナンスなしに長期にわたって連続的に得るという目的を、簡単な装置構成で実現した。   The objective of continuously obtaining sterilized water having a desired sterilizing ability over a long period without maintenance of the apparatus was realized with a simple apparatus configuration.

図1は、本発明装置の一実施例の説明図、図2は本発明装置の一実施例の希釈カラムの説明図、図3は本発明装置の一実施例の気泡除去装置の説明図、図4は本発明装置の一実施例の混合カラムの説明図、図5は図4の拡散部の裏面図である。   1 is an explanatory view of an embodiment of the apparatus of the present invention, FIG. 2 is an explanatory view of a dilution column of an embodiment of the apparatus of the present invention, FIG. 3 is an explanatory view of a bubble removing apparatus of an embodiment of the apparatus of the present invention, FIG. 4 is an explanatory view of a mixing column of an embodiment of the apparatus of the present invention, and FIG. 5 is a rear view of the diffusion portion of FIG.

図1において、10は水源であり、水源10から源水配管12を介して酸希釈カラム14に水(源水)が供給されるようになっている。水源10としては公共の水道や井戸が使用されるが、水源10が井戸の場合は汲み上げられた水が飲料水として適合している必要がある。   In FIG. 1, reference numeral 10 denotes a water source, and water (source water) is supplied from the water source 10 to the acid dilution column 14 via the source water pipe 12. A public water supply or well is used as the water source 10, but when the water source 10 is a well, the pumped water needs to be adapted as drinking water.

源水配管12には、水源10に近い方から、シスターン16、減圧弁18、フィルタ20、電磁弁22、流量センサ24、液性検知センサ26がこの順に設けられ、酸希釈カラム14の直前には逆流防止弁28及びチャッキ30が設けられている。   The source water pipe 12 is provided with a cistern 16, a pressure reducing valve 18, a filter 20, a solenoid valve 22, a flow rate sensor 24, and a liquidity detection sensor 26 in this order from the side closer to the water source 10. Is provided with a check valve 28 and a check 30.

ここで、シスターン16は水源10から供給される水の量や圧力の不足を補償するために設置されるものである。減圧弁18は水源10から供給される水の圧力を下げ、フィルタ20や電磁弁22を保護し、また、後述するポンプ38,58の吐出量を安定化させるために設置されている。   Here, the cistern 16 is installed in order to compensate for the shortage of the amount of water supplied from the water source 10 and the pressure. The pressure reducing valve 18 is installed to lower the pressure of the water supplied from the water source 10, protect the filter 20 and the electromagnetic valve 22, and stabilize the discharge amount of pumps 38 and 58 described later.

また、フィルタ20は源水配管12や後述する各種配管44,66,72を保護したり、水源から供給される水のpHを安定化させたり、水の中のゴミを除去するために設置されている。電磁弁22は本装置の異常の際に水源からの水の供給を停止させるために設置されている。   The filter 20 is installed to protect the source water pipe 12 and various pipes 44, 66, and 72 described later, stabilize the pH of water supplied from the water source, and remove dust in the water. ing. The electromagnetic valve 22 is installed in order to stop the supply of water from the water source in the event of an abnormality in the apparatus.

また、流量センサ24は源水配管12中を流れる水の流量を計り、得られた流量データを後述する制御装置80に送るために設置されている。液性検知センサ26は源水配管12中を流れる水の電解質を検出し、得られたデータを後述する制御装置80に送るために設置されている。   The flow rate sensor 24 is installed to measure the flow rate of water flowing through the source water pipe 12 and send the obtained flow rate data to the control device 80 described later. The liquid property detection sensor 26 is installed to detect the electrolyte of water flowing in the source water pipe 12 and send the obtained data to the control device 80 described later.

32は酸水溶液(例:塩酸、酢酸)を貯蔵している酸水溶液貯蔵タンクであり、酸水溶液貯蔵タンク32から酸水溶液供給配管34を介して源水配管12のチャッキ30に酸水溶液(酸が塩酸の場合、その濃度は8.5〜9.0%w/v)が注入・供給されるようになっている。酸水溶液供給配管34には、酸水溶液貯蔵タンク32に近い方から、チューブセンサ36、酸水溶液供給ポンプ38がこの順に設けられている。   An acid aqueous solution storage tank 32 stores an acid aqueous solution (eg, hydrochloric acid, acetic acid). The acid aqueous solution (acid is added) from the acid aqueous solution storage tank 32 to the check 30 of the source water pipe 12 through the acid aqueous solution supply pipe 34. In the case of hydrochloric acid, the concentration is 8.5 to 9.0% w / v). A tube sensor 36 and an acid aqueous solution supply pump 38 are provided in this order from the side close to the acid aqueous solution storage tank 32 in the acid aqueous solution supply pipe 34.

ここで、チューブセンサ36は塩酸等の液切れおよび気泡検知のために設けられている。また、酸水溶液供給ポンプ38は定量ポンプからなり、塩酸等の酸水溶液を一定の流量で送るようになっている。そして、酸水溶液供給配管34および酸水溶液供給ポンプ38が本発明における酸水溶液供給手段になる。   Here, the tube sensor 36 is provided for detecting liquid breakage such as hydrochloric acid and detecting bubbles. The acid aqueous solution supply pump 38 is a metering pump, and sends an acid aqueous solution such as hydrochloric acid at a constant flow rate. The acid aqueous solution supply pipe 34 and the acid aqueous solution supply pump 38 serve as the acid aqueous solution supply means in the present invention.

酸希釈カラム14は、水源10から供給された水に酸水溶液貯蔵タンク32から供給された酸水溶液を拡散させる拡散部40と、拡散部40を囲む容器部42とからなる。拡散部40は、図2に示すように、先端部が閉塞され、基部が開放され、周囲に複数の貫通穴を有するパイプ状の部材からなる。酸水溶液供給配管34の下流側の端部は拡散部40の基部に接続されている。   The acid dilution column 14 includes a diffusion unit 40 that diffuses the aqueous acid solution supplied from the aqueous acid solution storage tank 32 into the water supplied from the water source 10, and a container unit 42 that surrounds the diffusion unit 40. As shown in FIG. 2, the diffusing portion 40 is composed of a pipe-shaped member having a distal end portion closed, a base portion opened, and a plurality of through holes in the periphery. The downstream end of the acid aqueous solution supply pipe 34 is connected to the base of the diffusion section 40.

酸希釈カラム14の下流側には希酸水溶液配管44を介して混合カラム46が接続されている。希酸水溶液配管44には混合カラム46の直前に逆流防止弁48が設けられている。そして、酸希釈カラム14が本発明における希釈混合部になる。   A mixing column 46 is connected to the downstream side of the acid dilution column 14 via a dilute acid aqueous solution pipe 44. The dilute acid aqueous solution pipe 44 is provided with a backflow prevention valve 48 immediately before the mixing column 46. And the acid dilution column 14 becomes a dilution mixing part in this invention.

50は次亜塩素酸ナトリウム水溶液(原液)を貯蔵している次亜塩素酸ナトリウム水溶液貯蔵タンクである。次亜塩素酸ナトリウム水溶液貯蔵タンク50から次亜塩素酸ナトリウム水溶液供給配管52を介して混合カラム46に次亜塩素酸ナトリウム水溶液(原液)が供給されるようになっている。次亜塩素酸ナトリウム水溶液(原液)は有効塩素濃度5%又は12%以上の液を弱酸性水の使用量に応じて使い分けるのがよい。   50 is a sodium hypochlorite aqueous solution storage tank for storing a sodium hypochlorite aqueous solution (stock solution). A sodium hypochlorite aqueous solution (stock solution) is supplied from the sodium hypochlorite aqueous solution storage tank 50 to the mixing column 46 via the sodium hypochlorite aqueous solution supply pipe 52. As for the sodium hypochlorite aqueous solution (stock solution), it is preferable to use a solution having an effective chlorine concentration of 5% or 12% or more according to the amount of weakly acidic water used.

次亜塩素酸ナトリウム水溶液供給配管52には、次亜塩素酸ナトリウム水溶液貯蔵タンク50に近い方から、気泡除去装置54、チューブセンサ56、次亜塩素酸ナトリウム水溶液供給ポンプ58、逆流防止弁60がこの順に設けられている。   The sodium hypochlorite aqueous solution supply pipe 52 includes a bubble removing device 54, a tube sensor 56, a sodium hypochlorite aqueous solution supply pump 58, and a backflow prevention valve 60 from the side close to the sodium hypochlorite aqueous solution storage tank 50. They are provided in this order.

ここで、気泡除去装置54は、図3に示すように、脱気容器62と、脱気容器62に接続された戻し配管64と、戻し配管64に接して設けられた戻しポンプ66とからなる。脱気容器62は略垂直に設けられた主管の側部に枝管を備えた三方管からなり、戻し配管64は脱気容器62の上端部62aに接続され、戻し配管64の先端部は次亜塩素酸ナトリウム水溶液貯蔵タンク50に接続されている。   Here, as shown in FIG. 3, the bubble removing device 54 includes a deaeration container 62, a return pipe 64 connected to the deaeration container 62, and a return pump 66 provided in contact with the return pipe 64. . The deaeration container 62 is a three-way pipe provided with a branch pipe on the side of the main pipe provided substantially vertically. The return pipe 64 is connected to the upper end part 62a of the deaeration container 62. It is connected to a sodium chlorite aqueous solution storage tank 50.

脱気容器62の下端部62bは次亜塩素酸ナトリウム水溶液供給配管52を介して次亜塩素酸ナトリウム水溶液貯蔵タンク50に接続され、脱気容器62の側端部62cは次亜塩素酸ナトリウム水溶液供給配管52を介して次亜塩素酸ナトリウム水溶液供給ポンプ58に接続されている。   The lower end 62b of the deaeration vessel 62 is connected to the sodium hypochlorite aqueous solution storage tank 50 via the sodium hypochlorite aqueous solution supply pipe 52, and the side end 62c of the deaeration vessel 62 is connected to the sodium hypochlorite aqueous solution. A sodium hypochlorite aqueous solution supply pump 58 is connected via a supply pipe 52.

また、チューブセンサ56は次亜塩素酸ナトリウム水溶液(原液)の液切れや気泡を検知するためのものである。次亜塩素酸ナトリウム水溶液供給ポンプ58は定量ポンプからなり、次亜塩素酸ナトリウム水溶液貯蔵タンク50内の次亜塩素酸ナトリウム水溶液(原液)を混合カラム46に一定量ずつ供給するようになっている。そして、次亜塩素酸ナトリウム水溶液供給配管52および次亜塩素酸ナトリウム水溶液供給ポンプ58が本発明における次亜塩素酸ナトリウム水溶液供給手段になる。   Moreover, the tube sensor 56 is for detecting the liquid shortage and air bubbles of the sodium hypochlorite aqueous solution (stock solution). The sodium hypochlorite aqueous solution supply pump 58 is a metering pump, and supplies the sodium hypochlorite aqueous solution (stock solution) in the sodium hypochlorite aqueous solution storage tank 50 to the mixing column 46 by a certain amount. . The sodium hypochlorite aqueous solution supply pipe 52 and the sodium hypochlorite aqueous solution supply pump 58 serve as the sodium hypochlorite aqueous solution supply means in the present invention.

混合カラム46は、図4及び図5に示すように、次亜塩素酸ナトリウム水溶液(原液)を希酸水溶液中に拡散させる拡散部68と、拡散部68を囲む容器部70とからなり、拡散部68は次亜塩素酸ナトリウム水溶液供給配管52の下流側の端部に接続されている。そして、混合カラム46が本発明における混合反応部になる。   As shown in FIGS. 4 and 5, the mixing column 46 includes a diffusion portion 68 for diffusing a sodium hypochlorite aqueous solution (stock solution) into the dilute acid aqueous solution, and a container portion 70 surrounding the diffusion portion 68. The part 68 is connected to the downstream end of the sodium hypochlorite aqueous solution supply pipe 52. And the mixing column 46 becomes a mixing reaction part in this invention.

混合カラム46の下流側には第一殺菌水配管72を介して攪拌タンクアキュムレータ74が設けられ、第一殺菌水配管72の途中には液性検知センサ76が設けられている。攪拌タンクアキュムレータ74の下流側には第二殺菌水配管78が接続され、混合カラム46で生成された次亜塩素酸ナトリウム希釈水(殺菌水)は攪拌タンクアキュムレータ74および第二殺菌水配管78を介して外部に供給される。   A stirring tank accumulator 74 is provided on the downstream side of the mixing column 46 via a first sterilizing water pipe 72, and a liquid property detection sensor 76 is provided in the middle of the first sterilizing water pipe 72. A second sterilizing water pipe 78 is connected to the downstream side of the stirring tank accumulator 74, and the sodium hypochlorite diluted water (sterilizing water) generated in the mixing column 46 passes through the stirring tank accumulator 74 and the second sterilizing water pipe 78. Via the outside.

ここで、液性検知センサ76は混合カラム46で生成された殺菌水の電解質成分および水素イオン量を分離検出し、得られたデータを後述する制御装置80に送るようになっている。攪拌タンクアキュムレータ74は液性を均質化し、本装置内を流れる水の急停止による濃度変化と水撃を防ぐために設けられている。   Here, the liquid property detection sensor 76 separates and detects the electrolyte component and the amount of hydrogen ions of the sterilizing water generated in the mixing column 46, and sends the obtained data to the control device 80 described later. The agitation tank accumulator 74 is provided to homogenize the liquidity and prevent concentration change and water hammer due to a sudden stop of the water flowing in the apparatus.

80は制御装置であり、制御装置80は、図6に示すように、酸水溶液供給ポンプ38を制御する酸水溶液供給ポンプ制御部82と、次亜塩素酸ナトリウム水溶液供給ポンプ58を制御する次亜塩素酸ナトリウム水溶液供給ポンプ制御部84と、電磁弁制御部86とを備えている。   As shown in FIG. 6, the control device 80 includes an acid aqueous solution supply pump controller 82 that controls the acid aqueous solution supply pump 38 and a hypochlorite solution that controls the sodium hypochlorite aqueous solution supply pump 58. A sodium chlorate aqueous solution supply pump control unit 84 and a solenoid valve control unit 86 are provided.

酸水溶液供給ポンプ制御部82は、流量センサ24で得られた流量データと、あらかじめ定めた水量及び酸水溶液供給量との関係から必要な酸水溶液の供給量を算出し、この値が得られるように酸水溶液供給ポンプ38を制御し、必要な量の酸水溶液を酸希釈カラム14に供給させている。   The acid aqueous solution supply pump control unit 82 calculates the supply amount of the required acid aqueous solution from the relationship between the flow rate data obtained by the flow sensor 24 and the predetermined amount of water and the acid aqueous solution supply amount, so that this value can be obtained. The acid aqueous solution supply pump 38 is controlled to supply a necessary amount of the acid aqueous solution to the acid dilution column 14.

次亜塩素酸ナトリウム水溶液供給ポンプ制御部84は、流量センサ24で得られた水の流量データと、あらかじめ定めた水量及び次亜塩素酸ナトリウム水溶液(原液)供給量との関係から必要な次亜塩素酸ナトリウム水溶液(原液)の供給量を算出し、この値が得られるように次亜塩素酸ナトリウム水溶液供給ポンプ58を制御し、必要な量の次亜塩素酸ナトリウム水溶液(原液)を混合カラム46に供給させている。   The sodium hypochlorite aqueous solution supply pump control unit 84 determines the necessary hypochlorite from the relationship between the flow rate data of the water obtained by the flow sensor 24 and the predetermined amount of water and the amount of sodium hypochlorite aqueous solution (stock solution) supplied. Calculate the amount of sodium chlorate aqueous solution (stock solution) supplied, control the sodium hypochlorite aqueous solution supply pump 58 to obtain this value, and mix the required amount of sodium hypochlorite aqueous solution (stock solution) 46 is supplied.

次に、この殺菌水の連続生成装置の働きについて説明する。   Next, the function of this continuous sterilizing water generator will be described.

制御装置80のスイッチをONにすると、電磁弁22が開状態となり、水源10から水が源水配管12を通って酸希釈カラム14に供給される。このとき、流量センサ24が源水配管12を通る水の流量を計測し、流量データを制御装置80に送る。   When the switch of the control device 80 is turned on, the electromagnetic valve 22 is opened, and water is supplied from the water source 10 through the source water pipe 12 to the acid dilution column 14. At this time, the flow rate sensor 24 measures the flow rate of water passing through the source water pipe 12 and sends the flow rate data to the control device 80.

制御装置80の酸水溶液供給ポンプ制御部82では水の流量データ及び予め入力されている酸水溶液の濃度から酸希釈カラム14へ送る必要な酸水溶液の流量を求め、酸水溶液供給ポンプ38を制御して、この流量の酸水溶液を酸希釈カラム14へ送らせる。   The acid aqueous solution supply pump controller 82 of the control device 80 obtains the flow rate of the acid aqueous solution required to be sent to the acid dilution column 14 from the flow rate data of the water and the concentration of the acid aqueous solution inputted in advance, and controls the acid aqueous solution supply pump 38. Then, the acid aqueous solution at this flow rate is sent to the acid dilution column 14.

酸水溶液供給ポンプ38によって送られた酸水溶液は酸希釈カラム14に送られ、酸希釈カラム14の拡散部40によって水の中に拡散し、希酸水溶液が生成される。生成された希酸水溶液は希酸水溶液配管44を通って混合カラム46に送られる。   The acid aqueous solution sent by the acid aqueous solution supply pump 38 is sent to the acid dilution column 14 and is diffused into water by the diffusion unit 40 of the acid dilution column 14 to generate a dilute acid aqueous solution. The produced dilute acid aqueous solution is sent to the mixing column 46 through the dilute acid aqueous solution pipe 44.

また、制御装置80の次亜塩素酸ナトリウム水溶液供給ポンプ制御部84では水の流量データ及び予め入力されている次亜塩素酸ナトリウム水溶液(原液)の濃度から混合カラム46へ送る必要な次亜塩素酸ナトリウム水溶液(原液)の流量を求め、次亜塩素酸ナトリウム水溶液供給ポンプ58を制御して、この流量の次亜塩素酸ナトリウム水溶液(原液)を混合カラム46へ送らせる。   Further, the sodium hypochlorite aqueous solution supply pump control unit 84 of the control device 80 requires hypochlorous acid to be sent to the mixing column 46 from the flow rate data of water and the concentration of the sodium hypochlorite aqueous solution (stock solution) inputted in advance. The flow rate of the aqueous sodium chlorite solution (stock solution) is obtained, and the sodium hypochlorite aqueous solution supply pump 58 is controlled to send the aqueous sodium hypochlorite solution (stock solution) at this flow rate to the mixing column 46.

ここで、次亜塩素酸ナトリウム水溶液貯蔵タンク50から次亜塩素酸ナトリウム水溶液供給配管52に入った次亜塩素酸ナトリウム水溶液(原液)は次亜塩素酸ナトリウム水溶液供給ポンプ58に入る前に気泡除去装置54を通過し、次亜塩素酸ナトリウム水溶液(原液)中に浮遊していた気泡が除去される。このため、気泡が次亜塩素酸ナトリウム水溶液供給ポンプ58内に溜まることによって次亜塩素酸ナトリウム水溶液供給ポンプ58が空転し、混合カラム46への次亜塩素酸ナトリウム水溶液(原液)の供給が停止される事態が防止される。   Here, the sodium hypochlorite aqueous solution (raw solution) that has entered the sodium hypochlorite aqueous solution supply pipe 52 from the sodium hypochlorite aqueous solution storage tank 50 is removed before it enters the sodium hypochlorite aqueous solution supply pump 58. Air bubbles that have passed through the device 54 and have been suspended in the aqueous sodium hypochlorite solution (stock solution) are removed. For this reason, when bubbles are accumulated in the sodium hypochlorite aqueous solution supply pump 58, the sodium hypochlorite aqueous solution supply pump 58 is idled, and the supply of the sodium hypochlorite aqueous solution (stock solution) to the mixing column 46 is stopped. Is prevented.

次亜塩素酸ナトリウム水溶液供給ポンプ58によって送られた次亜塩素酸ナトリウム水溶液(原液)は混合カラム46に送られ、混合カラム46の拡散部68によって希酸水溶液の中に拡散し、ここで弱酸性の次亜塩素酸ナトリウム希釈水、すなわち殺菌水が生成される。   The sodium hypochlorite aqueous solution (stock solution) sent by the sodium hypochlorite aqueous solution supply pump 58 is sent to the mixing column 46 and diffused into the dilute acid aqueous solution by the diffusion section 68 of the mixing column 46, where it is weakened. Acidic sodium hypochlorite dilution water, i.e. sterilizing water, is produced.

このようにして、アルカリ性の次亜塩素酸ナトリウム水溶液(原液)は混合カラム46で希酸水溶液中に注入、拡散させられるので、本装置内を流れる水はアルカリ性になる機会がなく、本装置内を流れる水からカルシウム、マグネシウム等のスケール成分が析出し、これらが流路のいずれかの部位に析出・固着するような事態は生じない。   In this manner, since the alkaline sodium hypochlorite aqueous solution (stock solution) is injected and diffused into the dilute acid aqueous solution by the mixing column 46, the water flowing in the apparatus does not have an opportunity to become alkaline, and the inside of the apparatus There is no situation where scale components such as calcium and magnesium are precipitated from the water flowing through and are deposited and fixed to any part of the flow path.

このため、流路のいずれかの部位へのスケール成分の固着により生ずる塩素イオン濃度の低下等、種々の不具合がなくなり、従って、このような不具合を直すメンテナンス等が長期にわたって不要になる。   For this reason, various troubles such as a decrease in the chlorine ion concentration caused by the adhesion of the scale component to any part of the flow path are eliminated, and therefore maintenance for correcting such troubles becomes unnecessary for a long time.

尚、本発明の殺菌水の連続生成装置は、上記した実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内において種々変更を加え得ることは勿論である。   In addition, the continuous production | generation apparatus of the sterilization water of this invention is not limited to above-described embodiment, Of course, a various change can be added in the range which does not deviate from the summary of this invention.

例えば、プールや浴槽の水を殺菌する場合に応用し、プールや浴槽の水を抜き出し、この抜き出した水に塩酸等の酸を加えて酸性にし、この酸性にした水の中に次亜塩素酸ナトリウム水溶液(原液)を注入し、スケールの析出により次亜塩素酸ナトリウム水溶液の注入口が狭まったり、閉塞したりする事態をなくすようにしてもよい。   For example, it can be applied to sterilize pool and bathtub water, drain water from pools and bathtubs, add acid such as hydrochloric acid to the extracted water, and then make hypochlorous acid into the acidified water. A sodium aqueous solution (stock solution) may be injected to eliminate the situation where the injection port of the sodium hypochlorite aqueous solution is narrowed or clogged due to the precipitation of scale.

本発明は、医療や食品加工に従事する者の手を殺菌するための殺菌水を生成・供給するだけでなく、空気中に浮遊している細菌やウイルスを殺菌する殺菌性の霧を生成させる殺菌水を生成・供給することにも利用できる。   The present invention not only generates and supplies sterilized water for sterilizing the hands of persons engaged in medical and food processing, but also generates a bactericidal mist that sterilizes bacteria and viruses floating in the air. It can also be used to produce and supply sterilized water.

本発明装置の一実施例の説明図である。It is explanatory drawing of one Example of this invention apparatus. 本発明装置の一実施例の希釈カラムの説明図である。It is explanatory drawing of the dilution column of one Example of this invention apparatus. 本発明装置の一実施例の気泡除去装置の説明図である。It is explanatory drawing of the bubble removal apparatus of one Example of this invention apparatus. 本発明装置の一実施例の混合カラムの説明図である。It is explanatory drawing of the mixing column of one Example of this invention apparatus. 図4の拡散部の裏面図である。It is a reverse view of the spreading | diffusion part of FIG. 制御装置の説明図である。It is explanatory drawing of a control apparatus.

符号の説明Explanation of symbols

10 水源
12 源水配管
14 酸希釈カラム
16 シスターン
18 減圧弁
20 フィルタ
22 電磁弁
24 流量センサ
26 液性検知センサ
28 逆流防止弁
30 チャッキ
32 酸水溶液貯蔵タンク
34 酸水溶液供給配管
36 チューブセンサ
38 酸水溶液供給ポンプ
40 拡散部
42 容器部
44 希酸水溶液配管
46 混合カラム
48 逆流防止弁
50 次亜塩素酸ナトリウム水溶液貯蔵タンク
52 次亜塩素酸ナトリウム水溶液供給配管
54 気泡除去装置
56 チューブセンサ
58 次亜塩素酸ナトリウム水溶液供給ポンプ
60 逆流防止弁
62 脱気容器
62a 上端部
62b 下端部
62c 側端部
64 戻し配管
66 戻しポンプ
68 拡散部
70 容器部
72 第一殺菌水配管
74 攪拌タンクアキュムレータ
76 液性検知センサ
78 第二殺菌水配管
80 制御装置
82 酸水溶液供給ポンプ制御部
84 次亜塩素酸ナトリウム水溶液供給ポンプ制御部
86 電磁弁制御部
DESCRIPTION OF SYMBOLS 10 Water source 12 Source water piping 14 Acid dilution column 16 Systurn 18 Pressure reducing valve 20 Filter 22 Solenoid valve 24 Flow rate sensor 26 Liquidity detection sensor 28 Backflow prevention valve 30 Check 32 Acid aqueous solution storage tank 34 Acid aqueous solution supply piping 36 Tube sensor 38 Acid aqueous solution Supply pump 40 Diffusion section 42 Container section 44 Dilute acid aqueous solution pipe 46 Mixing column 48 Backflow prevention valve 50 Sodium hypochlorite aqueous solution storage tank 52 Sodium hypochlorite aqueous solution supply pipe 54 Bubble removing device 56 Tube sensor 58 Hypochlorous acid Sodium aqueous solution supply pump 60 Backflow prevention valve 62 Deaeration container 62a Upper end part 62b Lower end part 62c Side end part 64 Return pipe 66 Return pump 68 Diffusion part 70 Container part 72 First sterilization water pipe 74 Stirring tank accumulator 76 Liquidity detection sensor 78 Second sterilization water piping 80 control equipment 82 acid solution supply pump control unit 84 Sodium hypochlorite solution supply pump control unit 86 solenoid valve control unit

Claims (7)

酸水溶液を貯蔵している酸水溶液貯蔵タンクと、該酸水溶液貯蔵タンクの酸水溶液を供給する酸水溶液供給手段と、該酸水溶液供給手段によって供給された酸水溶液と水供給源から流量センサを介して供給された水を混合する希釈混合部と、次亜塩素酸ナトリウム水溶液を貯蔵している次亜塩素酸ナトリウム水溶液貯蔵タンクと、該次亜塩素酸ナトリウム水溶液貯蔵タンクの次亜塩素酸ナトリウム水溶液を供給する次亜塩素酸ナトリウム水溶液供給手段と、該希釈混合部で得られた希釈酸水溶液に該次亜塩素酸ナトリウム水溶液供給手段によって供給された次亜塩素酸ナトリウム水溶液を加えて希釈酸水溶液と次亜塩素酸ナトリウム水溶液を混合させる混合反応部と、該混合反応部で生成された殺菌水のpH値を測定するpHセンサと、該pHセンサによって測定されたpH値及び該流量センサによって得られた流量に基づいて該酸水溶液供給手段及び該次亜塩素酸ナトリウム水溶液供給手段を制御する制御装置とを備えたことを特徴とする殺菌水の連続生成装置。   An acid aqueous solution storage tank for storing an acid aqueous solution, an acid aqueous solution supply means for supplying an acid aqueous solution of the acid aqueous solution storage tank, an acid aqueous solution supplied by the acid aqueous solution supply means, and a water supply source from a water supply source A diluting and mixing section for mixing the water supplied in this manner, a sodium hypochlorite aqueous solution storage tank storing a sodium hypochlorite aqueous solution, and a sodium hypochlorite aqueous solution in the sodium hypochlorite aqueous solution storage tank Sodium hypochlorite aqueous solution supply means for supplying the diluted sodium hydroxide aqueous solution supplied by the sodium hypochlorite aqueous solution supply means to the diluted acid aqueous solution obtained in the dilution mixing unit A mixing reaction part for mixing the aqueous sodium hypochlorite solution, a pH sensor for measuring the pH value of the sterilized water produced in the mixing reaction part, and the p A sterilizing water comprising: a control device for controlling the acid aqueous solution supply means and the sodium hypochlorite aqueous solution supply means based on a pH value measured by the sensor and a flow rate obtained by the flow sensor. Continuous generation device. 前記制御装置が、前記流量センサによって得られた水の流量と前記酸水溶液貯蔵タンク内の酸水溶液の濃度から前記希釈混合部に供給する酸水溶液の必要量を算出し、この算出結果に基づいて前記酸水溶液供給手段を制御して該酸水溶液供給手段に必要量の酸水溶液を該希釈混合部に供給させる酸水溶液供給量制御部を備えていることを特徴とする請求項1に記載の殺菌水の連続生成装置。   The control device calculates a necessary amount of the acid aqueous solution to be supplied to the dilution mixing unit from the flow rate of water obtained by the flow sensor and the concentration of the acid aqueous solution in the acid aqueous solution storage tank, and based on the calculation result 2. The sterilization according to claim 1, further comprising an acid aqueous solution supply amount control unit that controls the acid aqueous solution supply unit to supply the acid aqueous solution supply unit with a necessary amount of acid aqueous solution to the dilution mixing unit. A continuous water generator. 前記制御装置が、前記流量センサによって得られた水の流量と前記次亜塩素酸ナトリウム水溶液貯蔵タンク内の次亜塩素酸ナトリウム水溶液の濃度から前記混合反応部に供給する次亜塩素酸ナトリウム水溶液の必要量を算出し、この算出結果に基づいて前記次亜塩素酸ナトリウム水溶液供給手段を制御して該次亜塩素酸ナトリウム水溶液供給手段に必要量の次亜塩素酸ナトリウム水溶液を該混合反応部に供給させる次亜塩素酸ナトリウム水溶液供給量制御部を備えていることを特徴とする請求項1又は2に記載の殺菌水の連続生成装置。   The controller controls the flow rate of water obtained by the flow sensor and the concentration of the sodium hypochlorite aqueous solution in the sodium hypochlorite aqueous solution storage tank. The required amount is calculated, and based on the calculation result, the sodium hypochlorite aqueous solution supply means is controlled, and the sodium hypochlorite aqueous solution supply means supplies the sodium hypochlorite aqueous solution supply means to the mixing reaction section. The continuous production | generation apparatus of the sterilizing water of Claim 1 or 2 provided with the sodium hypochlorite aqueous solution supply amount control part to supply. 前記制御装置が、前記pHセンサで得られたpH値から、次亜塩素酸ナトリウム水溶液の増加量を求め、求められた増加量に基づいて前記次亜塩素酸ナトリウム水溶液供給手段による次亜塩素酸ナトリウム水溶液の供給量を増加させ、その後、生成された殺菌水のpH値から、希釈酸水溶液の増加量を求め、求められた増加量に基づいて前記酸水溶液供給手段による酸水溶液の供給量を増加させる供給量修正部を備えていることを特徴とする請求項1〜3のいずれかに記載の殺菌水の連続生成装置。   The control device obtains an increase amount of the sodium hypochlorite aqueous solution from the pH value obtained by the pH sensor, and hypochlorous acid by the sodium hypochlorite aqueous solution supply means based on the obtained increase amount. The supply amount of the aqueous sodium solution is increased, and then the increase amount of the diluted acid aqueous solution is obtained from the pH value of the generated sterilizing water, and the supply amount of the aqueous acid solution by the acid aqueous solution supply means is determined based on the obtained increase amount. The continuous production | generation apparatus of the sterilization water in any one of Claims 1-3 provided with the supply amount correction | amendment part to increase. 前記次亜塩素酸ナトリウム水溶液供給手段が、前記次亜塩素酸ナトリウム水溶液貯蔵タンクの次亜塩素酸ナトリウム水溶液を前記混合反応部に送る次亜塩素酸ナトリウム水溶液供給ポンプと、該次亜塩素酸ナトリウム水溶液供給ポンプの上流側に設けられた気泡除去装置とを備えていることを特徴とする請求項1〜4のいずれかに記載の殺菌水の連続生成装置。   The sodium hypochlorite aqueous solution supply means includes a sodium hypochlorite aqueous solution supply pump for sending the sodium hypochlorite aqueous solution in the sodium hypochlorite aqueous solution storage tank to the mixing reaction section, and the sodium hypochlorite The continuous production | generation apparatus of the sterilization water in any one of Claims 1-4 provided with the bubble removal apparatus provided in the upstream of the aqueous solution supply pump. 前記混合反応部で生成された殺菌水を滞留させる攪拌タンクアキュムレータを備えていることを特徴とする請求項1〜5のいずれかに記載の殺菌水の連続生成装置。   The continuous production apparatus for sterilized water according to any one of claims 1 to 5, further comprising a stirring tank accumulator for retaining the sterilized water produced in the mixing reaction section. 前記混合希釈部と前記混合反応部が共通の混合容器からなり、該混合容器の上流側が混合希釈部、該混合容器の下流側が混合反応部になっていることを特徴とする請求項1〜6のいずれかに記載の殺菌水の連続生成装置。   The mixed dilution section and the mixing reaction section are composed of a common mixing container, and the upstream side of the mixing container is a mixing dilution section, and the downstream side of the mixing container is a mixing reaction section. The continuous production | generation apparatus of sterilization water in any one of.
JP2003401047A 2003-12-01 2003-12-01 Apparatus for producing sterilizing water continuously Pending JP2005161142A (en)

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JP2006305428A (en) * 2005-04-27 2006-11-09 Toshizumi Ikeda Method and apparatus for making sterilized water
JP2008012392A (en) * 2006-07-03 2008-01-24 Asari Denki:Kk Method and apparatus for manufacturing sterilized water
JP2011508661A (en) * 2007-12-19 2011-03-17 カッファロ キミカ エス.アール.エル. イン リクイダシオン Apparatus and method for sterilizing water
JP2013126632A (en) * 2011-12-19 2013-06-27 Suido Kiko Kaisha Ltd Method for generating and injecting diluted aqueous solution of sodium hypochlorite
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JP2006305428A (en) * 2005-04-27 2006-11-09 Toshizumi Ikeda Method and apparatus for making sterilized water
JP4688557B2 (en) * 2005-04-27 2011-05-25 年純 池田 Method and apparatus for producing sterilizing water
JP2008012392A (en) * 2006-07-03 2008-01-24 Asari Denki:Kk Method and apparatus for manufacturing sterilized water
JP4685721B2 (en) * 2006-07-03 2011-05-18 株式会社浅利電機 Disinfecting water manufacturing method and manufacturing apparatus
JP2011508661A (en) * 2007-12-19 2011-03-17 カッファロ キミカ エス.アール.エル. イン リクイダシオン Apparatus and method for sterilizing water
JP2013126632A (en) * 2011-12-19 2013-06-27 Suido Kiko Kaisha Ltd Method for generating and injecting diluted aqueous solution of sodium hypochlorite
JP2019030834A (en) * 2017-08-07 2019-02-28 国立大学法人三重大学 Apparatus for producing cleaning sterilizing liquid and method for producing cleaning sterilizing liquid
EP3815532A1 (en) 2019-10-29 2021-05-05 Wen Chung Shiao Hypochlorous acid disinfectant and its production method
US11793200B2 (en) 2019-10-29 2023-10-24 Wen Chung Shiao Hypochlorous acid disinfectant and its production method
KR20220162415A (en) * 2021-06-01 2022-12-08 한일호 Sodium Hypochlorite Injection Apparatus
KR102510635B1 (en) 2021-06-01 2023-03-15 한일호 Sodium Hypochlorite Injection Apparatus

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