JP2019030834A - Apparatus for producing cleaning sterilizing liquid and method for producing cleaning sterilizing liquid - Google Patents

Abstract

To provide an apparatus for producing cleaning sterilizing liquid which can enhance a cleaning effect and a sterilizing effect of sterilizing water and cleaning water using hypochlorous acid as an active factor, by lowering a concentration of dissolved gas.SOLUTION: An apparatus 1 for producing cleaning sterilizing liquid includes: a first pipe 7 in which a degassing device 2 for degassing raw water 40a and feeding it as degassed water 40b is connected to an upstream side; a second pipe 16 connected to a mixing section 3 on a downstream side of the first pipe 7; and an exhaust device 9 for removing air in the second pipe 16. The second pipe 16 is configured to add first liquid 40c containing sodium hypochlorite to the degassed water 40b to obtain cleaning sterilizing liquid 40f.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an apparatus for producing a cleaning sterilizing liquid mainly composed of sodium hypochlorite and a method for producing the cleaning sterilizing liquid.

  Sodium hypochlorite is the most widely used drug as a food additive disinfectant. A commercially available aqueous sodium hypochlorite solution contains a high concentration of hypochlorous acid having a free effective chlorine concentration of 5 to 12%, and exhibits a strong oxidizing action. The main components of sodium hypochlorite are hypochlorous acid (HOCl) and sodium hydroxide (NaOH), which is a strong alkaline aqueous solution having a pH value of about 13. For this reason, when a commercially available sodium hypochlorite aqueous solution comes into contact with human skin or mucous membrane, irritant contact dermatitis is caused. Therefore, when using sodium hypochlorite, commercially available sodium hypochlorite was diluted with water to make a low-concentration aqueous solution and used as a weak alkaline aqueous solution having a pH value of about 7.5 to 10.

By the way, hypochlorous acid is a weak acid, and its dissociation state changes depending on the pH value of the aqueous solution. The cleaning effect and sterilizing effect of hypochlorous acid depend on the pH value of this aqueous solution. For example, paying attention to the bactericidal effect, if the pH value of the sodium hypochlorite aqueous solution is about 7.5 to 10 as before, the abundance ratio of hypochlorite ions (OCl ⁻ ) having a weak bactericidal power increases. On the other hand, if the pH value of the sodium hypochlorite aqueous solution is 5.0 to 6.5, the proportion of non-dissociable hypochlorous acid molecules (HOCl) having strong bactericidal power increases. That is, by adjusting the pH value of the sodium hypochlorite aqueous solution to 5.0 to 6.5, the bactericidal effect is much higher than the conventional weak alkaline sodium hypochlorite aqueous solution while having the same effective chlorine concentration. Can be obtained.

Focusing on the cleaning effect, a sodium hypochlorite aqueous solution containing a high concentration of hypochlorite ions (OCl ⁻ ) has a strong detergency against organic soil adhering to the solid surface. That is, a sodium hypochlorite aqueous solution containing a high concentration of hypochlorite ions (OCl ⁻ ) is prepared even if the pH value of the sodium hypochlorite aqueous solution is about 7.5 to 10 as before. Can improve the cleaning power. In this regard, even if the pH value of the high concentration sodium hypochlorite aqueous solution is adjusted to 5.0 to 6.5 to increase the concentration of non-dissociable hypochlorous acid molecules (HOCl), the detergency is exhibited. do not do.

As a means for adjusting the pH value of the sodium hypochlorite aqueous solution to 5.0 to 6.5, for example, there is a method of mixing an acidic solution. However, a simple mixing method is dangerous because toxic chlorine gas (Cl ₂ ) is generated and released into the atmosphere.

  Conventionally, "a disinfectant manufacturing apparatus that dilutes at least one of sodium hypochlorite and pH adjusting acid and then mixes them by mechanical mixing means such as a stir bar (Japanese Patent Laid-Open No. 10-182325)", "Sterilized water production apparatus comprising sodium hypochlorite diluting part, hydrochloric acid diluting part and mixing reaction part having outer shell and inner shell having a plurality of holes in the wall (Japanese Patent Laid-Open No. 2002-241209)" "As a means for mixing sodium hypochlorite aqueous solution and hydrochloric acid aqueous solution, sterilized water production comprising a static mixer having a plurality of mixing blades along the longitudinal direction of the tube to make the water flow in the tube turbulent Apparatus (Japanese Patent Laid-Open No. 2003-326277) ”,“ Ion polarization current is generated by magnetic flux in a pipe for mixing sodium hypochlorite and a pH adjusting liquid and in an aqueous solution in the pipe. A liquid mixing apparatus (Japanese Patent Laid-Open No. 2006-192419) for producing a sterilizing water and a washing water by applying an acidic solution and an alkaline solution as a pH adjusting liquid in a liquid mixing equipped with a magnetic processing device for promoting the combination is proposed. Has been.

  In addition, “a sterilizing water production device that connects a sodium hypochlorite supply path upstream of the main flow path and a dilute hydrochloric acid supply path downstream of the main flow path to mix dilute hydrochloric acid while diluting sodium hypochlorite (Japanese Patent Laid-Open No. 2010-046603) has been proposed.

  Furthermore, “Weakly acidic sterilized water to which carbonated water generated by dissolving carbon dioxide (carbon dioxide) in water is added for the purpose of avoiding generation of chlorine gas when mixing acidic solution with sodium hypochlorite aqueous solution. A manufacturing apparatus (Japanese Patent Application Laid-Open No. 2004-305472) has been proposed.

Japanese Patent Laid-Open No. 10-182325 JP 2002-241209 A JP 2003-326277 A JP 2006-192419 A JP 2010-046603 A JP 2004-305472 A

  However, in the sterilizing water production apparatus described in Patent Literatures 1 to 4, the sodium hypochlorite and the pH-adjusting acidic solution or alkaline solution have a mechanical mixing means such as a stir bar or a plurality of holes in the wall. Air is used under vigorous stirring conditions using an inner shell tube, a mixing blade that turbulently flows the water in the pipe, and a magnetic processing device that generates ion polarization current by magnetic flux in the aqueous solution in the pipe to promote mixing. The fine bubbles are generated in the mixed solution, and the dissolved gas concentration of the produced sterilizing water is higher than that of the raw water.

  Moreover, as described in Patent Document 5, when alkaline washing water is generated, carbon dioxide in the air is absorbed, resulting in an increase in dissolved carbon dioxide gas. And in the weak acidic disinfection water manufacturing apparatus of patent document 6, in order to mix carbonated water with which high concentration carbon dioxide dissolved into sodium hypochlorite aqueous solution, the dissolved gas concentration of the generated disinfection water and washing water is The dissolved gas concentration is much higher than the raw water.

  When a food material is sterilized using a hypochlorous acid aqueous solution containing such a dissolved gas, a phenomenon occurs in which an infinite number of fine dissolved gas molecules adsorbed on the surface of the food material are adsorbed. As a result, the adsorbed gas molecular layer hinders contact between the hypochlorous acid (HOCl), which is a sterilization factor, and the food, and causes a decrease in sterilization efficiency. In addition, in the case of vegetables with fine uneven surfaces and fine pores, the air present in the gaps prevents the penetration of water, so the contact time must be extended to obtain a certain sterilizing effect. Absent.

  In addition, when cleaning an object to be cleaned having a fine flow path such as a water line tube for dental treatment, when the dissolved gas in the cleaning liquid is adsorbed on the flow path wall surface and bubbles are formed, the cleaning liquid is fed. Becomes extremely difficult and is one of the causes of poor cleaning.

  The present invention has been made in view of the above circumstances, and has produced a cleaning sterilizing liquid production apparatus that has improved the cleaning effect and sterilizing effect of sterilizing water and cleaning water using hypochlorous acid as an active factor by reducing the dissolved gas concentration, and It aims at providing the manufacturing method of a washing | cleaning disinfection liquid.

  As an embodiment, the above-described problem is solved by a solution as disclosed below.

  The apparatus for producing a cleaning sterilizing liquid of the present invention is connected to a first pipe connected to the upstream side of a degassing device for degassing raw water and feeding it as degassed water, and a mixing section on the downstream side of the first pipe. And / or an exhaust device that removes air in the second tube and an exhaust device that removes air in the mixing section. The second tube contains sodium hypochlorite. The first liquid is configured to be added to the degassed water.

  According to the present invention, even when a large amount of dissolved gas is dissolved in the raw water, a deaeration device for the raw water can be provided to obtain deaerated water. The exhaust device is configured to be connected to the mixing unit, so that an unnecessary gas (air) is added by the exhaust device while adding the first liquid (chemical solution) containing sodium hypochlorite to the deaerated water. ) Can be removed to prepare a cleaning and sterilizing solution having a low dissolved gas concentration. Alternatively, by adding the exhaust device to the second pipe, it is added to the degassed water with unnecessary gas (air) removed from the first liquid (chemical liquid) containing sodium hypochlorite. By doing this, a cleaning sterilizing solution having a low dissolved gas concentration can be prepared.

  The present invention further includes a third pipe connected to the mixing unit, wherein the third pipe adds a second liquid for pH adjustment to the degassed water or a second liquid for pH adjustment. It is preferable that it is the structure added to the liquid mixture of the said deaeration water and said 1st liquid. Here, the exhaust device may be connected to the second pipe, the exhaust device may be connected to the third pipe, and the exhaust device may be connected to the mixing unit. According to this configuration, it is possible to prepare a cleaning sterilizing liquid having a low dissolved gas concentration and a pH adjusted.

  For example, the exhaust device includes a gas-liquid separation chamber and an orifice, and discharges unnecessary gas (air) from the exhaust pipe above the mixing unit through the orifice. According to this configuration, the unnecessary gas (air) can be discharged from either or both of the first liquid and the second liquid, although the control unit is not required.

  For example, the exhaust device includes a water level sensor and a valve in an exhaust pipe above the mixing unit, and when the water level sensor detects air accumulation, the valve is opened to discharge air. Here, the exhaust device includes a controller that controls opening and closing of the valve. The valve is an electromagnetic valve or an air driven valve. According to this structure, the said mixing part can be pressure-reduced and an unnecessary gas (air) can be discharged | emitted.

  The deaeration device preferably includes a hollow fiber membrane module through which the raw water passes. According to this configuration, installation in a piping line is easy, pressure loss can be kept low, and dissolved oxygen concentration can be degassed at a ppb level.

  The method for producing a cleaning sterilizing liquid according to the present invention uses a cleaning sterilizing liquid manufacturing apparatus including a first pipe connected to an upstream side of a degassing device, and degassed raw water by the degassing device. And the first liquid containing sodium hypochlorite is added to the degassed water in the mixing section on the downstream side of the first pipe.

  According to the present invention, even when a large amount of dissolved gas is dissolved in the raw water, a deaeration device for the raw water is provided to remove the unnecessary gas (air), and the deaerated water is removed. By adding the first liquid (chemical solution) containing sodium hypochlorite to the liquid, the concentration of dissolved gas is lowered to enhance the cleaning effect and the sterilizing effect of sterilizing water and cleaning water containing hypochlorous acid as an active factor be able to.

  In the mixing unit, the second liquid for pH adjustment is added to the degassed water or the mixed solution of the degassed water and the first liquid in the mixing unit, and the pH value is adjusted to 5.0 to 6.5. It is preferable to adjust or to adjust the pH value to 7.5 to 13.2. According to this, it is possible to prepare a cleaning sterilizing liquid whose pH is adjusted while lowering the dissolved gas concentration.

And the dissolved oxygen concentration of the said deaerated water can be made into 100 ppb or less by the said deaeration apparatus. Moreover, the dissolved oxygen concentration of the cleaning sterilizing liquid can be maintained at 100 [ppb] or less by reducing the pressure of the mixing unit to 10 ⁴ Pa or less by the exhaust device.

  For example, a sodium chloride aqueous solution in which sodium chloride is dissolved in drinking water is electrolyzed to obtain the first liquid. According to this, a washing | cleaning disinfection liquid can be used for a foodstuff.

  According to the present invention, even when a large amount of dissolved gas is dissolved in the raw water, a deaeration device for the raw water is disposed to form deaerated water, and sodium hypochlorite is added to the deaerated water. A cleaning sterilizing solution having a low dissolved gas concentration can be prepared by removing unnecessary gas (air) with an exhaust device that targets the mixing unit while mixing the chemical solution. Or it is set as the deaeration 1st liquid which removed the unnecessary gas (air) from the said 1st liquid (chemical | medical solution) containing sodium hypochlorite by the exhaust apparatus which makes the said 1st liquid object, and the said deaeration 1st liquid is By adding to the deaerated water from the deaerator, a cleaning sterilizing solution having a low dissolved gas concentration can be prepared. And the washing | cleaning disinfection liquid obtained by this invention shows the bactericidal effect and washing | cleaning effect which were superior to the past with respect to various objects in a medical treatment, food processing, the agricultural and fisheries field, etc.

FIG. 1 is a schematic configuration diagram showing an example of a cleaning sterilizing liquid manufacturing apparatus according to the first embodiment of the present invention. FIG. 2 is a schematic configuration diagram illustrating another example of the cleaning sterilizing liquid manufacturing apparatus according to the embodiment. FIG. 3 is a schematic configuration diagram illustrating another example of the cleaning sterilizing liquid manufacturing apparatus according to the embodiment. FIG. 4 is a schematic configuration diagram showing an example of a deaeration device of the cleaning sterilizing liquid manufacturing apparatus according to the embodiment. FIG. 5 is a schematic configuration diagram showing an example of a cleaning sterilizing liquid manufacturing apparatus according to the second embodiment of the present invention. FIG. 6 is a schematic configuration diagram illustrating another example of the cleaning sterilizing liquid manufacturing apparatus according to the embodiment. FIG. 7 is a schematic configuration diagram illustrating another example of the cleaning sterilizing liquid manufacturing apparatus according to the embodiment. FIG. 8 is a process flow diagram showing an example of a procedure for producing a cleaning sterilizing liquid according to the present invention. FIG. 9 is a process flow diagram showing another example of the procedure for producing the cleaning sterilizing liquid according to the present invention. FIG. 10 is a comparative table showing the sterilizing effect of various kinds of vegetables of the cleaning sterilizing liquid according to the present invention and the conventional product in comparison. FIG. 11 is a comparison table showing the sterilizing effect of various kinds of vegetables of the cleaning sterilizing liquid according to the present invention and the conventional product. FIG. 12 is a comparison table showing a comparison of the bactericidal effect on various seaweeds of the cleaning sterilizing liquid according to the present invention and the conventional product.

(First embodiment)
Hereinafter, a first embodiment of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic configuration diagram illustrating an example of a cleaning sterilizing liquid manufacturing apparatus 1 (1A) of the present embodiment. Note that components having the same function are denoted by the same reference symbols throughout the drawings for describing the embodiments, and the repetitive description thereof may be omitted.

  As shown in FIG. 1, the cleaning sterilizing liquid manufacturing apparatus 1 </ b> A of the present embodiment includes a first pipe 7 that feeds raw water 40 a and travels from the upstream side to the downstream side. The raw water 40a is distilled water, ion exchange water or tap water. The raw water 40a is fed by a liquid feed pump or is fed using gravity (not shown).

  Connected to the upstream side of the first pipe 7 is a degassing device 2 for degassing the raw water 40a and feeding it as degassed water 40b. An exhaust pipe 18 is connected to the deaeration device 2 and is discharged from the deaeration device 2 as an unnecessary gas 99 by a vacuum pump 8 connected to the exhaust pipe 18. The unnecessary gas 99 is mainly air.

  FIG. 4 is a schematic configuration diagram illustrating an example of the deaeration device 2. The deaeration device 2 includes a hollow fiber membrane module 21 and a dissolved oxygen meter 22. The raw water 40a is supplied to the liquid supply port 21a of the hollow fiber membrane module 21, and the dissolved gas in the raw water 40a is removed by passing through the inside of the hollow fiber membrane module 21. The removed dissolved gas passes through the exhaust pipe 18 connected to the vacuum port 21 d of the hollow fiber membrane module 21 and is discharged as an unnecessary gas 99 by the vacuum pump 8. The deaerated water 40b from which the dissolved gas has been removed is fed from the first pipe 7 through the dissolved oxygen meter 22 connected to the drain port 21b of the hollow fiber membrane module 21. The dissolved oxygen meter 22 may be omitted. The exhaust pipe 18 and the vacuum pump 8 connected to the exhaust pipe 18 may be omitted.

  According to this embodiment, since it can be set as the small deaeration apparatus 2, the installation installation to a piping line becomes easy. And the pressure loss can be kept low by the deaeration device 2, and the dissolved oxygen concentration can be deaerated to the ppb level.

  A mixing unit 3 (an area surrounded by a dotted line) is provided on the downstream side of the first pipe 7. A check valve 81 is connected to the mixing unit 3, and the second pipe 16 is connected to the check valve 81. The second pipe 16 delivers the first liquid 40c containing sodium hypochlorite. The check valve 81 allows the first liquid 40 c to pass through the mixing unit 3, but does not allow the liquid from the mixing unit 3 to pass through the second pipe 16.

  A liquid feed pump 73 is connected to the upper side of the second pipe 16, and the exhaust device 9 is connected to the lower side of the second pipe 16. The exhaust device 9 includes a gas-liquid separation chamber 91 having a buffer function for temporarily storing the first liquid 40c, and an orifice 92 that allows gas to pass but restricts passage of the liquid. The exhaust pipe 19 is connected to the orifice 92. In the gas-liquid separation chamber 91, the flow rate of the first liquid 40c is reduced and temporarily accumulated, and then added to the deaerated water 40b through the check valve 81 and in the mixing unit 3. According to this configuration, the unnecessary gas 99 can be discharged while having a simple configuration that does not require the control means. The unnecessary gas 99 is mainly air. Note that the vacuum pump 8 may be connected to the exhaust pipe 19 to discharge the unnecessary gas 99.

  In the mixing unit 3, the first liquid 40 c containing sodium hypochlorite is added to the degassed water 40 b to become a cleaning sterilizing liquid 40 f and is sent toward the downstream of the first pipe 7.

  According to the present embodiment, even when a large amount of dissolved gas is dissolved in the raw water 40a, the degassing device 2 for the raw water 40a is disposed, and the first liquid (chemical solution) containing sodium hypochlorite is disposed. ) By degassing first liquid obtained by removing unnecessary gas (air) 99 from the first liquid (chemical liquid) 40c by the exhaust device 9 for 40c, and adding the degassed first liquid to the degassed water 40b A cleaning sterilizing solution having a low dissolved gas concentration can be prepared.

  FIG. 2 is a schematic configuration diagram illustrating another example of the cleaning sterilizing liquid manufacturing apparatus 1A according to the present embodiment. A mixing unit 3 (an area surrounded by a dotted line) is provided on the downstream side of the first pipe 7. A check valve 81 is connected to one side of the mixing unit 3, and a check valve 82 is connected to the other side of the mixing unit 3. The second pipe 16 is connected to the check valve 81, and the third pipe 17 is connected to the check valve 82. In the mixing unit 3, the second pipe 16 and the third pipe 17 are connected in parallel. The 3rd pipe | tube 17 sends the 2nd liquid 40d for pH adjustment. The check valve 82 passes the second liquid 40 d through the mixing unit 3, but does not pass the liquid from the mixing unit 3 through the third pipe 17.

  According to the present embodiment, even when a large amount of dissolved gas is dissolved in the raw water 40a, the degassing device 2 for the raw water 40a is provided as the degassed water 40b, and sodium hypochlorite is used. The first liquid (chemical liquid) 40c including the first liquid (chemical liquid) 40c is removed from the first liquid (chemical liquid) 40c by the exhaust device 9 as a degassing first liquid, and the pH adjusting second liquid 40d is used as the first liquid (chemical liquid) 40c. A degassed second liquid is obtained by removing unnecessary gas (air) from the second liquid (chemical liquid) 40d by the target exhaust device 9, and the degassed first liquid and the degassed second liquid are added to the degassed water 40b. By doing so, it is possible to prepare the cleaning sterilizing liquid 40f having a low dissolved gas concentration and adjusted in pH.

  The second liquid 40d for adjusting pH contains an inorganic acid or an organic acid. The second liquid 40d enhances the cleaning effect and the sterilizing effect of the first liquid 40c. Here, “inorganic acid” refers to, for example, hydrochloric acid, sulfuric acid, phosphoric acid and the like, and “organic acid” refers to acetic acid, lactic acid, citric acid and the like. Here, the second liquid 40d is not limited to an acidic solution, and may be an alkaline solution. As the second liquid 40d, for example, a substance designated as a food additive can be used.

  FIG. 3 is a schematic configuration diagram illustrating another example of the cleaning sterilizing liquid manufacturing apparatus 1A according to the present embodiment. A mixing unit 3 (an area surrounded by a dotted line) is provided on the downstream side of the first pipe 7. A check valve 81 is connected to the upstream side in the mixing unit 3, and a check valve 82 is connected to the downstream side in the mixing unit 3. In the mixing unit 3, the second pipe 16 and the third pipe 17 are connected in series.

  According to the present embodiment, even when a large amount of dissolved gas is dissolved in the raw water 40a, the degassing device 2 for the raw water 40a is provided as the degassed water 40b, and sodium hypochlorite is used. A first degassing first liquid obtained by removing unnecessary gas (air) 99 from the first liquid (chemical liquid) 40c by the exhaust device 9 for the first liquid (chemical liquid) 40c to be contained, and a second liquid 40d for pH adjustment. The degassed second liquid is obtained by removing unnecessary gas (air) 99 from the second liquid (chemical liquid) 40d by the exhaust device 9 intended for the above, and the degassed first liquid is added to the degassed water 40b. By further adding the degassed second liquid, it is possible to prepare the cleaning and sterilizing liquid 40f having a low dissolved gas concentration and adjusted in pH. In the example of FIG. 3, the second pipe 16 is on the upstream side and the third pipe 17 is on the downstream side. However, the present invention is not limited to this example, and the third pipe 17 is on the upstream side and the second pipe 16 is on the upstream side. It may be downstream.

(Second Embodiment)
FIG. 5: is a schematic block diagram which shows the example of the manufacturing apparatus 1 (1B) of the washing | cleaning disinfection liquid which concerns on the 2nd Embodiment of this invention. The second embodiment will be described with a focus on differences from the first embodiment. In the second embodiment, the mixing unit 3 has a buffer function for temporarily storing the deaerated water 40b. A second pipe 16 is connected to the upper side of the mixing unit 3. An exhaust pipe 19 is connected to the upper side of the mixing unit 3. When the flow rate of the first liquid 40c is decelerated and temporarily accumulated in the mixing unit 3, the first liquid 40c is added from the second pipe 16 to become the cleaning sterilizing liquid 40f and is sent downstream of the first pipe 7. The Since the flow rate of the first liquid 40c is reduced in the mixing unit 3, the pressure in the mixing unit 3 is reduced.

  In the exhaust device 9, a water level sensor 32 is attached to the exhaust pipe 19 above the mixing unit 3. A valve 33 is attached to the exhaust pipe 19 at a position higher than the water level sensor 32. The exhaust device 9 includes a controller 34 that receives the detection signal from the water level sensor 32 and controls the opening and closing of the valve 33. When the water level sensor 32 detects air accumulation, the valve 33 is opened to discharge air. When the water level sensor 32 detects liquid, the valve 33 is closed. Accordingly, the mixing unit 3 is decompressed to discharge unnecessary gas (air) 99, and when the water level rises to the position of the water level sensor 32, the valve 33 is closed to prevent liquid leakage. In addition, it is good also as a structure which connects the vacuum pump 8 to the exhaust pipe 19, and discharges | emits unnecessary gas (air) 99. FIG.

  According to the present embodiment, even when a large amount of dissolved gas is dissolved in the raw water 40a, the degassing device 2 for the raw water 40a is provided as the degassed water 40b, and sodium hypochlorite is used. By removing the unnecessary gas (air) 99 by the exhaust device 9 that targets the mixing unit 3 while mixing the first liquid (chemical solution) 40c that is included, the cleaning and sterilizing liquid 40f having a low dissolved gas concentration can be prepared. .

  FIG. 6 is a schematic configuration diagram illustrating another example of the cleaning sterilizing liquid manufacturing apparatus 1B according to the present embodiment. A mixing unit 3 is provided on the downstream side of the first pipe 7. A second pipe 16 and a third pipe 17 are connected to the upper side of the mixing unit 3. In the mixing unit 3, the second pipe 16 and the third pipe 17 are connected in parallel.

  According to the present embodiment, even when a large amount of dissolved gas is dissolved in the raw water 40a, the degassing device 2 for the raw water 40a is provided as the degassed water 40b, and sodium hypochlorite is used. By removing the unnecessary gas (air) 99 by the exhaust device 9 intended for the mixing unit 3 while mixing the first liquid (chemical liquid) 40c and the second liquid 40d for pH adjustment, the dissolved gas concentration is low. A pH-adjusted cleaning and sterilizing solution 40f can be prepared.

  FIG. 7 is a schematic configuration diagram showing another example of the cleaning sterilizing liquid manufacturing apparatus 1B of the present embodiment. A mixing unit 3 to which the second pipe 16 is connected is provided on the downstream side of the first pipe 7. The mixing unit 3 to which the third pipe 17 is connected is provided on the downstream side of the mixing unit 3. The first pipe 7 is provided with two mixing sections 3, and the second pipe 16 and the third pipe 17 are connected to each mixing section 3 and connected in series.

  According to the present embodiment, even when a large amount of dissolved gas is dissolved in the raw water 40a, the degassing device 2 for the raw water 40a is provided as the degassed water 40b, and sodium hypochlorite is used. The unnecessary gas (air) 99 is removed by the exhaust device 9 intended for the mixing unit 3 while mixing the first liquid (chemical solution) 40c included, and then the mixing unit 3 while mixing the second liquid 40d for pH adjustment. By removing the unnecessary gas (air) 99 by the exhaust device 9 intended for the above, it is possible to prepare the cleaning sterilizing liquid 40f having a low dissolved gas concentration and adjusted in pH. In the example of FIG. 7, the second pipe 16 is on the upstream side and the third pipe 17 is on the downstream side. However, the present invention is not limited to this example, and the third pipe 17 is on the upstream side and the second pipe 16 is on the upstream side. It may be downstream.

(Production method of the present invention)
FIG. 8 is a process flow diagram showing an example of a procedure for producing a cleaning sterilizing liquid according to the present invention. The example of FIG. 8 includes a step S1 in which the raw water 40a is degassed water 40b, and a step S2 in which the chemical liquid (first liquid, second liquid) is mixed with the degassed water 40b. For example, the cleaning sterilizing liquid manufacturing apparatus 1 illustrated in FIGS. 1 to 7 can be applied to the manufacturing method of the present invention.

  The raw water 40a is deaerated by the deaeration device 2 to become deaerated water 40b (reference S1). The deaeration level of the raw water 40a is preferably 100 [ppb] or less, more preferably 10 [ppb] or less, using the dissolved oxygen concentration as an index. When the dissolved oxygen concentration is 100 [ppb] or less, the adsorption of fine dissolved gas molecules to the surface of the object to be treated is significantly reduced. Furthermore, when the dissolved oxygen concentration is 10 [ppb] or less, the penetration of water into fine irregularities and pores on the surface of the object to be treated is promoted.

  And the deaeration water 40b branches, for example, a flow path, the 1st liquid containing sodium hypochlorite is added to the deaeration water 40b of one side, and it becomes a 1st dilution liquid. Further, a second liquid containing an inorganic acid or an organic acid is added to the deaerated water 40b on the other side and diluted to become a second diluted liquid.

And the said 1st dilution liquid and the said 2nd dilution liquid are mixed in the mixing part 3 (code | symbol S2), and become the washing | cleaning disinfection liquid 40f. At this time, the exhaust device 9 removes unnecessary gas (air) present in the space in the mixing unit 3 (reference S2). Here, the exhaust capacity of the exhaust device 9 is preferably 10 ⁴ [Pa] or less, more preferably 10 ³ [Pa] or less, using the pressure as an index. When the pressure in the flow path is 10 ⁴ [Pa] or less, a pressure environment in which the dissolved oxygen concentration of the cleaning sterilizing solution 40f is easily maintained at 100 [ppb] or less is obtained. Furthermore, when the pressure in the flow path is 10 ³ [Pa] or less, the pressure environment in which the dissolved oxygen concentration of the cleaning sterilizing solution 40f is easily maintained at 10 [ppb] or less is obtained. In this way, it is possible to prepare the cleaning sterilizing liquid 40f having a low dissolved gas concentration.

  FIG. 9 is a process flow diagram showing another example of the procedure for producing the cleaning sterilizing liquid according to the present invention. The example of FIG. 9 includes step S1 in which the raw water 40a is degassed water 40b, and step S3 in which the chemical solution (first liquid and second liquid) is diluted water and the diluted water is mixed with the degassed water 40b. . For example, the cleaning sterilizing liquid manufacturing apparatus 1 illustrated in FIGS. 1 to 7 can be applied to the manufacturing method of the present invention.

  The raw water 40a is deaerated by the deaeration device 2 to become deaerated water 40b (reference S1). The raw water 40a has, for example, a branched flow path, and a first liquid containing sodium hypochlorite is added to the raw water 40a on one side and diluted to become a first diluted liquid. Moreover, the 2nd liquid containing an inorganic acid or an organic acid is added and diluted to the raw | natural water 40a of the other side, and it becomes a 2nd dilution liquid.

  Then, the first diluent and the second diluent are mixed. And the mixed dilution liquid of the 1st liquid and the 2nd liquid and deaerated water 40b which were mixed are mixed in the mixing part 3 (code | symbol S3), and it becomes the washing | cleaning disinfection liquid 40f. In this way, it is possible to prepare the cleaning sterilizing liquid 40f having a low dissolved gas concentration.

  Here, when the first dilution liquid and the second dilution liquid are further diluted with deaerated water 40b, if it is expected that the generation of gas is small, the exhaust device 9 can be omitted. It is.

Example 1
The cleaning sterilizing liquid 40f was manufactured by using the cleaning sterilizing liquid manufacturing apparatus 1 of the first embodiment described above, and the cut vegetables and cut seaweed were cleaned and sterilized to evaluate the cleaning and sterilizing effect of the product of the present invention.

(A) Experimental apparatus The cleaning sterilizing liquid manufacturing apparatus 1 used in the experiment is configured by connecting a commercially available apparatus by piping. The deaeration device 2 is a combination of a hollow fiber membrane module 21 and a dissolved oxygen meter 22. As the hollow fiber membrane module 21, PF-001-MK manufactured by DIC Corporation was used. The raw water 40a is ion exchange water. The deaerated water 40b obtained by the deaerator 2 has a dissolved oxygen concentration of 4 [ppb] and a supply capacity of 144 [ml / min. ].

(B1) Cleaning and disinfecting solution In the experiment, a reagent of sodium hypochlorite was used. The effective chlorine of the reagent is 50,000 [ppm]. As an example, sodium hypochlorite was deaerated by the deaeration device 2 and diluted with deaerated ion-exchanged water having a dissolved oxygen concentration of 4 [ppb], and the concentration was 100 [ppm]. A sodium hypochlorite aqueous solution was obtained. The pH of the aqueous solution is 6.0. As a comparative example, sodium hypochlorite was diluted with ion-exchanged water having a deoxygenation treatment of untreated and a dissolved oxygen concentration of 4 [ppm] to obtain a sodium hypochlorite aqueous solution having a concentration of 100 [ppm]. It was. The pH of the aqueous solution is 6.0.

(C1) Cut vegetables The sterilization treatment of vegetables was performed by immersing (standing) the cut vegetables 30 [g] for 10 minutes in 500 [ml] of sodium hypochlorite aqueous solutions having different dissolved oxygen concentrations. After soaking, the cut vegetables are transferred to a physiological saline containing Na ₂ S ₂ O ₃ with a concentration of 0.3 [%], and the microorganisms are washed out. The number of viable bacteria per 1 g of each vegetable is determined on an agar plate. It was measured by the surface smear method. The unit of viable count is CFU / g. FIG. 6 and FIG. 7 are comparative tables showing the sterilizing effect of various kinds of vegetables of the cleaning sterilizing liquid according to the present invention and the conventional product in comparison. In the notation in the figure, untreated refers to ion-exchanged water that has not been degassed. The conventional product (without degassing) is a sodium hypochlorite aqueous solution diluted to 100 [ppm] with ion-exchanged water that has not been degassed. The product of the present invention (with degassing) is a degassed sodium hypochlorite aqueous solution diluted to a concentration of 100 ppm with degassed ion exchange water.

  As shown in FIGS. 10 and 11, the product of the present invention has a relative decrease in the logarithmic decrease in the number of general viable bacteria by 0.1 to 1.0 compared to the conventional product. In the case of bean sprouts, the product of the present invention tends to be less turbid. And in the case of bean sprouts, lettuce, trevis, cabbage, mizuna, radish, onion, the product of the present invention tends to sink in the liquid. That is, in the present invention, by reducing the dissolved gas concentration in the liquid, the dissolved gas does not adsorb relatively to the hydrophobic surface of the vegetable, and tends to sink in the liquid relatively. It was confirmed that the bactericidal effect by hypochlorous acid (HOCl) was enhanced.

(C2) Cut seaweed The seaweed sterilization treatment is the same as for vegetables. FIG. 12 is a comparison table showing the sterilizing effect of the cleaning sterilizing liquid according to the present invention and conventional products on various seaweeds.

  As shown in FIG. 12, the product of the present invention has a relative decrease in the logarithmic decrease value of the number of viable bacteria of 0.2 to 0.6 as compared with the conventional product. Moreover, in the case of hijiki, the product of the present invention tends to sink in the liquid. That is, in the product of the present invention, the dissolved gas concentration in the liquid is reduced, so that the dissolved gas is relatively not adsorbed on the hydrophobic surface of the seaweed, and the water absorption of the seaweed is further increased. It was confirmed that the bactericidal effect by hypochlorous acid (HOCl) was relatively enhanced.

  From the results shown in FIGS. 10 to 12, it was confirmed that the dissolved gas of the sodium hypochlorite aqueous solution was adsorbed on the surface of vegetables and seaweed and hindered contact with hypochlorous acid (HOCl). . According to the present invention, by using a degassed sodium hypochlorite aqueous solution obtained by diluting sodium hypochlorite using degassed raw water, the surface of vegetables and seaweed, hypochlorous acid (HOCl) and By increasing the contact surface, a high cleaning and sterilizing effect can be obtained.

(Example 2)
The cleaning sterilizing liquid 40f was manufactured using the cleaning sterilizing liquid manufacturing apparatus 1 of the embodiment described above, and the fine pipes were cleaned and sterilized to evaluate the cleaning sterilizing effect of the product of the present invention. The cleaning sterilizing liquid manufacturing apparatus 1 used in the experiment is configured by connecting a commercially available apparatus by piping. The deaeration device 2 is the same as that in the first embodiment.

(B2) Cleaning sterilizing solution In the experiment, a reagent of sodium hypochlorite was used. The effective chlorine of the reagent is 50,000 [ppm]. As an example, sodium hypochlorite was deaerated by the deaerator 2 and diluted with deaerated distilled water having a dissolved oxygen concentration of 4 [ppb], and deaerated at a concentration of 200 [ppm]. A sodium hypochlorite aqueous solution was obtained. The pH of the aqueous solution is 10.0. As a comparative example, sodium hypochlorite was diluted with distilled water having an untreated degassing treatment and a dissolved oxygen concentration of 4 ppm to obtain a sodium hypochlorite aqueous solution having a concentration of 200 [ppm]. The pH of the aqueous solution is 10.0.

(C3) Fine piping Bovine serum albumin, which is a protein, is adsorbed on the inner surface of a stainless steel fine piping (inner diameter 1 mmφ × length 100 mm) and dried at a temperature of 40 ° C. for 24 hours. Produced. The washing experiment of the fine pipe was performed by immersing (standing) the stainless steel fine pipe adsorbed with bovine serum albumin in 100 [ml] of sodium hypochlorite aqueous solution having a different dissolved oxygen concentration for 2 [hour]. After washing, bovine serum albumin removed by washing was measured, and the removal rate was calculated.

  The product of the present invention (with degassing) is a degassed sodium hypochlorite aqueous solution diluted to 200 [ppm] with degassed distilled water, and the removal rate of bovine serum albumin is 92 [% ]Met. On the other hand, the conventional product (without degassing) is a sodium hypochlorite aqueous solution diluted to a concentration of 200 [ppm] with distilled water that has not been degassed, and the removal rate of bovine serum albumin is 68 [ %]Met.

  The product of the present invention significantly improved the protein removal rate compared to the conventional product. According to the present invention, it has been confirmed that the cleaning effect by hypochlorous acid (HOCl) is relatively increased.

  The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the present invention. For example, in the above-described embodiment, the configuration including the exhaust device 9 that removes the unnecessary gas (air) 99 in the second pipe 16 and the exhaust device 9 that removes the unnecessary gas (air) 99 in the mixing unit 3 are provided. However, the present invention is not limited to this example, and the exhaust device that removes unnecessary gas (air) 99 in the second pipe 16 and the unnecessary gas (air) 99 in the mixing unit 3 are removed. It is also possible to have a configuration provided with each exhaust device.

  In Example 1 described above, the pH value of the degassed sodium hypochlorite aqueous solution was 6.0, but is not limited to this example, and the pH value of the degassed sodium hypochlorite aqueous solution is 5.0-6. .5 may be adjusted. For example, in Example 2 described above, the pH value of the degassed sodium hypochlorite aqueous solution was set to 10.0. However, the pH value of the degassed sodium hypochlorite aqueous solution is 7 It may be adjusted to .5 to 13.2.

DESCRIPTION OF SYMBOLS 1, 1A, 1B Manufacturing apparatus 2 of washing | cleaning disinfection liquid 3 Deaeration apparatus 3 Mixing part 7 1st pipe 16 2nd pipe 17 3rd pipe 8 Vacuum pump 9 Exhaust apparatus 18, 19 Exhaust pipe 21 Hollow fiber membrane module 22 Dissolved oxygen meter 40a Raw water 40b Deaerated water 40c First liquid 40d Second liquid 40f Cleaning sterilization liquid 81, 82 Check valve 99 Unnecessary gas (air)

Claims (10)

A first pipe connected to the upstream side of a degassing device for degassing raw water and feeding it as degassed water;
A second pipe connected to the mixing section on the downstream side of the first pipe;
Either or both of an exhaust device for removing air in the second pipe and an exhaust device for removing air in the mixing section,
The apparatus for producing a cleaning sterilizing liquid, wherein the second pipe is configured to add a first liquid containing sodium hypochlorite to the degassed water. A third pipe connected to the mixing unit;
The third pipe is configured to add a second liquid for pH adjustment to the degassed water, or add a second liquid for pH adjustment to a mixture of the degassed water and the first liquid. The apparatus for producing a cleaning sterilizing liquid according to claim 1. 3. The cleaning and sterilizing liquid manufacturing method according to claim 1, wherein the exhaust device includes a gas-liquid separation chamber and an orifice, and is configured to discharge air from an exhaust pipe above the mixing unit through the orifice. apparatus. 2. The exhaust device according to claim 1, wherein a water level sensor and a valve are provided in an exhaust pipe above the mixing unit, and the valve is opened to discharge air when the water level sensor detects an accumulation of air. 2. An apparatus for producing the cleaning sterilizing liquid according to 2. The said deaeration apparatus is provided with the hollow fiber membrane module which lets the said raw | natural water pass, The manufacturing apparatus of the washing | cleaning disinfection liquid as described in any one of Claims 1-4 characterized by the above-mentioned. Using a cleaning and sterilizing liquid manufacturing apparatus provided with a first pipe connected to the upstream side of the degassing device, the degassing device degass the raw water and sends it as degassed water,
A method for producing a cleaning sterilizing liquid, comprising: adding a first liquid containing sodium hypochlorite to the degassed water in a mixing section downstream of the first pipe. In the mixing unit, a second liquid for pH adjustment is added to the degassed water or a mixture of the degassed water and the first liquid,
The method for producing a cleaning sterilizing solution according to claim 6, wherein the pH value is adjusted to 5.0 to 6.5, or the pH value is adjusted to 7.5 to 13.2. The cleaning sterilizing liquid manufacturing apparatus includes an exhaust device for removing air in the mixing unit,
The method for producing a cleaning sterilizing liquid according to claim 6 or 7, wherein the pressure of the mixing section is reduced to 10 ⁴ Pa or less by the exhaust device. The deaeration device includes a hollow fiber membrane module through which the raw water passes.
The method for producing a cleaning sterilizing solution according to any one of claims 6 to 8, wherein a dissolved oxygen concentration of the deaerated water is set to 100 ppb or less by the deaerator. The method for producing a cleaning and sterilizing solution according to any one of claims 6 to 9, wherein an aqueous sodium chloride solution in which sodium chloride is dissolved in drinking water is electrolyzed to form the first solution.