JP2005159328A5 - - Google Patents

Download PDF

Info

Publication number
JP2005159328A5
JP2005159328A5 JP2004311240A JP2004311240A JP2005159328A5 JP 2005159328 A5 JP2005159328 A5 JP 2005159328A5 JP 2004311240 A JP2004311240 A JP 2004311240A JP 2004311240 A JP2004311240 A JP 2004311240A JP 2005159328 A5 JP2005159328 A5 JP 2005159328A5
Authority
JP
Japan
Prior art keywords
electrode
liquid
semiconductor film
plasma treatment
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004311240A
Other languages
English (en)
Japanese (ja)
Other versions
JP4393968B2 (ja
JP2005159328A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004311240A priority Critical patent/JP4393968B2/ja
Priority claimed from JP2004311240A external-priority patent/JP4393968B2/ja
Publication of JP2005159328A publication Critical patent/JP2005159328A/ja
Publication of JP2005159328A5 publication Critical patent/JP2005159328A5/ja
Application granted granted Critical
Publication of JP4393968B2 publication Critical patent/JP4393968B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004311240A 2003-10-28 2004-10-26 配線の作製方法及び半導体装置の作製方法 Expired - Fee Related JP4393968B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004311240A JP4393968B2 (ja) 2003-10-28 2004-10-26 配線の作製方法及び半導体装置の作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003368030 2003-10-28
JP2004311240A JP4393968B2 (ja) 2003-10-28 2004-10-26 配線の作製方法及び半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2005159328A JP2005159328A (ja) 2005-06-16
JP2005159328A5 true JP2005159328A5 (enrdf_load_stackoverflow) 2006-05-11
JP4393968B2 JP4393968B2 (ja) 2010-01-06

Family

ID=34741095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004311240A Expired - Fee Related JP4393968B2 (ja) 2003-10-28 2004-10-26 配線の作製方法及び半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4393968B2 (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4618087B2 (ja) * 2004-10-15 2011-01-26 セイコーエプソン株式会社 仕切部材の形成方法、カラーフィルター用仕切部材の形成方法
JP2007043113A (ja) * 2005-06-30 2007-02-15 Semiconductor Energy Lab Co Ltd 半導体装置、半導体装置の作製方法
JP4761199B2 (ja) * 2005-09-29 2011-08-31 セイコーエプソン株式会社 半導体素子用電極の製造方法、トランジスタの製造方法、およびｐｉｎダイオードの製造方法
KR20070053060A (ko) * 2005-11-19 2007-05-23 삼성전자주식회사 표시장치와 이의 제조방법
TWI338189B (en) * 2006-01-13 2011-03-01 Hon Hai Prec Ind Co Ltd Substrate structure and method of manufacturing thin film pattern layer using the same
JP4542527B2 (ja) * 2006-06-30 2010-09-15 株式会社フューチャービジョン 白色の色度差を低減した表示装置とその製造方法
JP2008130866A (ja) * 2006-11-22 2008-06-05 Seiko Epson Corp 表面改質方法およびパターン形成方法
JPWO2009096525A1 (ja) * 2008-02-01 2011-05-26 日本電気株式会社 薄膜トランジスタ
JP5560629B2 (ja) * 2009-09-04 2014-07-30 コニカミノルタ株式会社 薄膜トランジスタの製造方法
WO2019186805A1 (ja) 2018-03-28 2019-10-03 堺ディスプレイプロダクト株式会社 有機ｅｌ表示装置及びその製造方法
US11950488B2 (en) 2018-04-20 2024-04-02 Sakai Display Products Corporation Organic electroluminescent device and method for producing same

Similar Documents

Publication Publication Date Title
JP2007096055A5 (enrdf_load_stackoverflow)
JP2005079560A5 (enrdf_load_stackoverflow)
TW200715562A (en) Thin film transistor substrate and fabrication thereof
JP2007512680A5 (enrdf_load_stackoverflow)
JP2005159328A5 (enrdf_load_stackoverflow)
TW200746487A (en) Transistor element, display device and these manufacturing methods
TW200644305A (en) Polymeric gate dielectrics for organic thin film transistors
JP2005093396A5 (enrdf_load_stackoverflow)
JP2009135140A5 (enrdf_load_stackoverflow)
JP2015072770A5 (enrdf_load_stackoverflow)
JP2006100808A5 (enrdf_load_stackoverflow)
JP2003142692A5 (enrdf_load_stackoverflow)
WO2008117395A1 (ja) 有機半導体素子及びその製造方法
JP2006303476A5 (enrdf_load_stackoverflow)
JP2009278072A5 (enrdf_load_stackoverflow)
JP2009521131A5 (enrdf_load_stackoverflow)
JP2005506704A5 (enrdf_load_stackoverflow)
JP2005159327A5 (enrdf_load_stackoverflow)
JP2005159143A5 (enrdf_load_stackoverflow)
JP2005013985A5 (enrdf_load_stackoverflow)
JP2006054425A5 (enrdf_load_stackoverflow)
JP2005536056A5 (enrdf_load_stackoverflow)
JP2005311325A5 (enrdf_load_stackoverflow)
JP2006108169A5 (enrdf_load_stackoverflow)
JP2005244197A5 (enrdf_load_stackoverflow)