JP2005126758A5 - - Google Patents
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- Publication number
- JP2005126758A5 JP2005126758A5 JP2003362628A JP2003362628A JP2005126758A5 JP 2005126758 A5 JP2005126758 A5 JP 2005126758A5 JP 2003362628 A JP2003362628 A JP 2003362628A JP 2003362628 A JP2003362628 A JP 2003362628A JP 2005126758 A5 JP2005126758 A5 JP 2005126758A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- transparent conductive
- conductive film
- power density
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000000758 substrate Substances 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 2
- 239000010408 film Substances 0.000 claims 14
- 238000000034 method Methods 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- 229910052711 selenium Inorganic materials 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003362628A JP4229803B2 (ja) | 2003-10-23 | 2003-10-23 | 透明導電膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003362628A JP4229803B2 (ja) | 2003-10-23 | 2003-10-23 | 透明導電膜の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005126758A JP2005126758A (ja) | 2005-05-19 |
| JP2005126758A5 true JP2005126758A5 (https=) | 2006-11-02 |
| JP4229803B2 JP4229803B2 (ja) | 2009-02-25 |
Family
ID=34642194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003362628A Expired - Fee Related JP4229803B2 (ja) | 2003-10-23 | 2003-10-23 | 透明導電膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4229803B2 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008156708A (ja) * | 2006-12-25 | 2008-07-10 | Idemitsu Kosan Co Ltd | 透明導電膜の製造方法 |
| JP5530618B2 (ja) * | 2008-10-20 | 2014-06-25 | 出光興産株式会社 | 光起電力素子、および、その製造方法 |
| JP5465859B2 (ja) * | 2008-10-20 | 2014-04-09 | 出光興産株式会社 | 光起電力素子、および、その製造方法 |
| JP5465860B2 (ja) * | 2008-10-20 | 2014-04-09 | 出光興産株式会社 | 光起電力素子、および、その製造方法 |
| KR20110091683A (ko) * | 2008-10-20 | 2011-08-12 | 이데미쓰 고산 가부시키가이샤 | 광기전력 소자 및 그 제조 방법 |
| CN102394210B (zh) * | 2011-11-24 | 2013-12-11 | 深圳市创益科技发展有限公司 | 用于制备薄膜太阳能电池透明导电膜的设备及方法 |
| TWI643969B (zh) * | 2013-12-27 | 2018-12-11 | Semiconductor Energy Laboratory Co., Ltd. | 氧化物半導體的製造方法 |
-
2003
- 2003-10-23 JP JP2003362628A patent/JP4229803B2/ja not_active Expired - Fee Related
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