JP2005114881A - 投影光学系、露光装置、および露光方法 - Google Patents

投影光学系、露光装置、および露光方法 Download PDF

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Publication number
JP2005114881A
JP2005114881A JP2003346573A JP2003346573A JP2005114881A JP 2005114881 A JP2005114881 A JP 2005114881A JP 2003346573 A JP2003346573 A JP 2003346573A JP 2003346573 A JP2003346573 A JP 2003346573A JP 2005114881 A JP2005114881 A JP 2005114881A
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Prior art keywords
lens group
optical system
lens
projection optical
refractive power
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JP2003346573A
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Japanese (ja)
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JP2005114881A5 (enExample
Inventor
Yohei Fujishima
洋平 藤島
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Nikon Corp
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Nikon Corp
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Publication of JP2005114881A5 publication Critical patent/JP2005114881A5/ja
Withdrawn legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003346573A 2003-10-06 2003-10-06 投影光学系、露光装置、および露光方法 Withdrawn JP2005114881A (ja)

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JP2003346573A JP2005114881A (ja) 2003-10-06 2003-10-06 投影光学系、露光装置、および露光方法

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JP2003346573A JP2005114881A (ja) 2003-10-06 2003-10-06 投影光学系、露光装置、および露光方法

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JP2005114881A true JP2005114881A (ja) 2005-04-28
JP2005114881A5 JP2005114881A5 (enExample) 2008-02-28

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007513372A (ja) * 2003-12-02 2007-05-24 カール・ツァイス・エスエムティー・アーゲー 投影光学系
US7256948B2 (en) 2004-03-30 2007-08-14 Nikon Corporation Anti-reflection coating, and optical element and optical system with anti-reflection coating
US7336421B2 (en) 2004-03-30 2008-02-26 Nikon Corporation Optical system with anti-reflection coating
JP2010096866A (ja) * 2008-10-14 2010-04-30 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes
CN113835209A (zh) * 2021-11-19 2021-12-24 中导光电设备股份有限公司 一种大视场duv物镜

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007513372A (ja) * 2003-12-02 2007-05-24 カール・ツァイス・エスエムティー・アーゲー 投影光学系
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes
US7256948B2 (en) 2004-03-30 2007-08-14 Nikon Corporation Anti-reflection coating, and optical element and optical system with anti-reflection coating
US7336421B2 (en) 2004-03-30 2008-02-26 Nikon Corporation Optical system with anti-reflection coating
US9726979B2 (en) 2004-05-17 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9019596B2 (en) 2004-05-17 2015-04-28 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US8432532B2 (en) 2008-10-14 2013-04-30 Canon Kabushiki Kaisha Projection optical system with rarefaction compensation
JP2010096866A (ja) * 2008-10-14 2010-04-30 Canon Inc 投影光学系、露光装置及びデバイスの製造方法
CN113835209A (zh) * 2021-11-19 2021-12-24 中导光电设备股份有限公司 一种大视场duv物镜
CN113835209B (zh) * 2021-11-19 2024-04-26 中导光电设备股份有限公司 一种大视场duv物镜

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