JP2005037896A - 投影光学系、露光装置及びデバイスの製造方法 - Google Patents

投影光学系、露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP2005037896A
JP2005037896A JP2004139679A JP2004139679A JP2005037896A JP 2005037896 A JP2005037896 A JP 2005037896A JP 2004139679 A JP2004139679 A JP 2004139679A JP 2004139679 A JP2004139679 A JP 2004139679A JP 2005037896 A JP2005037896 A JP 2005037896A
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JP
Japan
Prior art keywords
optical system
imaging optical
lens
deflecting
reflecting member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004139679A
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English (en)
Japanese (ja)
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JP2005037896A5 (ru
Inventor
Takashi Kato
隆志 加藤
Chiaki Terasawa
千明 寺沢
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004139679A priority Critical patent/JP2005037896A/ja
Priority to US10/851,869 priority patent/US6995833B2/en
Priority to TW093114474A priority patent/TWI282487B/zh
Priority to CNB2004100453671A priority patent/CN1307456C/zh
Priority to EP04012075A priority patent/EP1480065A3/en
Priority to KR1020040036790A priority patent/KR100678484B1/ko
Publication of JP2005037896A publication Critical patent/JP2005037896A/ja
Priority to US11/267,858 priority patent/US7053986B2/en
Publication of JP2005037896A5 publication Critical patent/JP2005037896A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004139679A 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法 Pending JP2005037896A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004139679A JP2005037896A (ja) 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法
US10/851,869 US6995833B2 (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
TW093114474A TWI282487B (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
CNB2004100453671A CN1307456C (zh) 2003-05-23 2004-05-21 投影光学系统、曝光装置及器件的制造方法
EP04012075A EP1480065A3 (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
KR1020040036790A KR100678484B1 (ko) 2003-05-23 2004-05-24 투영광학계, 노광장치 및 디바이스의 제조방법
US11/267,858 US7053986B2 (en) 2003-05-23 2005-11-03 Projection optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003146442 2003-05-23
JP2003189594 2003-07-01
JP2004139679A JP2005037896A (ja) 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2005037896A true JP2005037896A (ja) 2005-02-10
JP2005037896A5 JP2005037896A5 (ru) 2007-04-12

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ID=34222133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004139679A Pending JP2005037896A (ja) 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP2005037896A (ru)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006137349A1 (en) * 2005-06-23 2006-12-28 Canon Kabushiki Kaisha Catadioptric projection optical system, and exposure apparatus having the same
US7580115B2 (en) 2006-03-07 2009-08-25 Canon Kabushiki Kaisha Exposure apparatus and method, and device manufacturing method
JP2010500769A (ja) * 2006-08-14 2010-01-07 カール・ツァイス・エスエムティー・アーゲー 瞳ミラーを有する反射屈折投影対物器械、投影露光装置及び方法
US8390784B2 (en) 2006-08-14 2013-03-05 Carl Zeiss Smt Gmbh Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method
US11317798B2 (en) 2016-09-06 2022-05-03 Nikon Corporation Catadioptric unit-magnification afocal pupil relay and optical imaging system employing the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006137349A1 (en) * 2005-06-23 2006-12-28 Canon Kabushiki Kaisha Catadioptric projection optical system, and exposure apparatus having the same
US7580115B2 (en) 2006-03-07 2009-08-25 Canon Kabushiki Kaisha Exposure apparatus and method, and device manufacturing method
JP2010500769A (ja) * 2006-08-14 2010-01-07 カール・ツァイス・エスエムティー・アーゲー 瞳ミラーを有する反射屈折投影対物器械、投影露光装置及び方法
JP2011013681A (ja) * 2006-08-14 2011-01-20 Carl Zeiss Smt Gmbh 瞳ミラーを有する反射屈折投影対物器械、投影露光装置及び方法
US8390784B2 (en) 2006-08-14 2013-03-05 Carl Zeiss Smt Gmbh Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method
JP2015109463A (ja) * 2006-08-14 2015-06-11 カール・ツァイス・エスエムティー・ゲーエムベーハー 瞳ミラーを有する反射屈折投影対物器械、投影露光装置及び方法
JP2016157137A (ja) * 2006-08-14 2016-09-01 カール・ツァイス・エスエムティー・ゲーエムベーハー 瞳ミラーを有する反射屈折投影対物器械、投影露光装置及び方法
US11317798B2 (en) 2016-09-06 2022-05-03 Nikon Corporation Catadioptric unit-magnification afocal pupil relay and optical imaging system employing the same

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