JP2004535486A - 紫外線および真空紫外線用途において有用なポリマー−液体組成物 - Google Patents
紫外線および真空紫外線用途において有用なポリマー−液体組成物 Download PDFInfo
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- JP2004535486A JP2004535486A JP2002589549A JP2002589549A JP2004535486A JP 2004535486 A JP2004535486 A JP 2004535486A JP 2002589549 A JP2002589549 A JP 2002589549A JP 2002589549 A JP2002589549 A JP 2002589549A JP 2004535486 A JP2004535486 A JP 2004535486A
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Classifications
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- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C08J3/00—Processes of treating or compounding macromolecular substances
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- C08J3/091—Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques in organic liquids characterised by the chemical constitution of the organic liquid
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J129/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Adhesives based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Adhesives based on derivatives of such polymers
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
- C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
- C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/02—Halogenated hydrocarbons
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/28—Non-macromolecular organic substances
- C08L2666/32—Halogen-containing compounds
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29071101P | 2001-05-14 | 2001-05-14 | |
| PCT/US2002/018397 WO2002092670A2 (en) | 2001-05-14 | 2002-05-14 | Fluoropolymer compositions comprising a fluor-containing liquid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004535486A true JP2004535486A (ja) | 2004-11-25 |
| JP2004535486A5 JP2004535486A5 (enExample) | 2006-01-05 |
Family
ID=23117214
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002589549A Pending JP2004535486A (ja) | 2001-05-14 | 2002-05-14 | 紫外線および真空紫外線用途において有用なポリマー−液体組成物 |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1401923A2 (enExample) |
| JP (1) | JP2004535486A (enExample) |
| KR (1) | KR20030095405A (enExample) |
| AU (1) | AU2002342745A1 (enExample) |
| WO (1) | WO2002092670A2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040096654A (ko) * | 2002-03-06 | 2004-11-16 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 진공 자외선에서 고투명도를 갖는 불소 함유 화합물 |
| TW200408665A (en) * | 2002-08-21 | 2004-06-01 | Asahi Glass Co Ltd | Ultraviolet-permeable fluoropolymers and pellicles made by using the same |
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| JPH05107746A (ja) * | 1991-10-15 | 1993-04-30 | Shin Etsu Chem Co Ltd | リソグラフイー用ペリクル |
| JPH06505034A (ja) * | 1990-12-07 | 1994-06-09 | ヴァスキュテック リミテッド | ポリマー表面のフッ素化 |
| JPH06317895A (ja) * | 1993-05-07 | 1994-11-15 | Shin Etsu Chem Co Ltd | ペリクルの製造方法 |
| JPH07118596A (ja) * | 1993-10-25 | 1995-05-09 | Daikin Ind Ltd | 撥水撥油剤組成物およびその製法 |
| JPH11501685A (ja) * | 1995-02-06 | 1999-02-09 | イー・アイ・デユポン・ドウ・ヌムール・アンド・カンパニー | テトラフルオロエチレン−ヘキサフルオロプロピレンの非晶質コポリマー類 |
| JPH11167030A (ja) * | 1997-10-02 | 1999-06-22 | Asahi Glass Co Ltd | 屈折率分布型光学樹脂材料 |
| US6156389A (en) * | 1997-02-03 | 2000-12-05 | Cytonix Corporation | Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4928026B1 (enExample) * | 1965-01-12 | 1974-07-23 | ||
| IT1222804B (it) * | 1987-10-02 | 1990-09-12 | Ausimont Spa | Additivi coadiuvanti al distacco degli stampi di gomme vulcanizzabili mediante perossidi |
| JP2752393B2 (ja) * | 1988-11-10 | 1998-05-18 | 旭硝子株式会社 | コーティング用含フッ素重合体組成物 |
| JP2718140B2 (ja) * | 1989-02-03 | 1998-02-25 | 旭硝子株式会社 | フッ素系希釈剤 |
| WO1991014724A2 (en) * | 1990-03-23 | 1991-10-03 | E.I. Du Pont De Nemours And Company | Polymer foams containing gas barrier resins |
| JP3229895B2 (ja) * | 1992-02-18 | 2001-11-19 | グンゼ株式会社 | 離型性が優れたチューブ状フィルム |
| JPH05320615A (ja) * | 1992-05-18 | 1993-12-03 | Sumitomo 3M Ltd | 物品の水切り乾燥兼表面保護用材料、および、その材料を使用した物品の水切り乾燥兼表面保護方法 |
| EP0584703A1 (en) * | 1992-08-28 | 1994-03-02 | E.I. Du Pont De Nemours And Company | Protective coatings of perfluorinated polymer solutions |
| US5356986A (en) * | 1992-08-28 | 1994-10-18 | E. I. Du Pont De Nemours And Company | Plasticized fluoropolymers |
| US5760139A (en) * | 1994-04-18 | 1998-06-02 | Yasuhiro Koike | Graded-refractive-index optical plastic material and method for its production |
| US5478905A (en) * | 1995-02-06 | 1995-12-26 | E. I. Du Pont De Nemours And Company | Amorphous tetrafluoroethylene/hexafluoropropylene copolymers |
| US5532310A (en) * | 1995-04-28 | 1996-07-02 | Minnesota Mining And Manufacturing Company | Surfactants to create fluoropolymer dispersions in fluorinated liquids |
| WO1997001599A1 (en) * | 1995-06-28 | 1997-01-16 | E.I. Du Pont De Nemours And Company | Fluoropolymer nanocomposites |
| GB9608952D0 (en) * | 1995-09-22 | 1996-07-03 | Bnfl Fluorchem Ltd | Coating compositions |
| EP0889092A4 (en) * | 1996-03-22 | 1999-06-23 | Nippon Zeon Co | LIQUID CONTAINING LUBRICANT POLYMER AND TECHNIQUE FOR FORMING LUBRICANT POLYMER FILM |
| DE19640972A1 (de) * | 1996-10-04 | 1998-04-16 | Bayer Ag | Flüssig-Fluorkautschuk, ein Verfahren zu seiner Herstellung und seine Verwendung |
| US5853894A (en) * | 1997-02-03 | 1998-12-29 | Cytonix Corporation | Laboratory vessel having hydrophobic coating and process for manufacturing same |
| IT1293515B1 (it) * | 1997-07-31 | 1999-03-01 | Ausimont Spa | Dispersioni di fluoropolimeri |
| CN1112594C (zh) * | 1997-10-02 | 2003-06-25 | 旭硝子株式会社 | 折射率分布型光学树脂材料 |
| JP4106723B2 (ja) * | 1998-01-27 | 2008-06-25 | 旭硝子株式会社 | 反射防止フィルタ用コーティング組成物 |
| US6248823B1 (en) * | 1998-07-02 | 2001-06-19 | E. I. Du Pont De Nemours And Company | Solvents for amorphous fluoropolymers |
| CN1240731C (zh) * | 2000-11-30 | 2006-02-08 | 3M创新有限公司 | 制备聚四氟乙烯的无爆乳液聚合方法 |
-
2002
- 2002-05-14 KR KR10-2003-7014719A patent/KR20030095405A/ko not_active Withdrawn
- 2002-05-14 AU AU2002342745A patent/AU2002342745A1/en not_active Abandoned
- 2002-05-14 JP JP2002589549A patent/JP2004535486A/ja active Pending
- 2002-05-14 WO PCT/US2002/018397 patent/WO2002092670A2/en not_active Ceased
- 2002-05-14 EP EP02744277A patent/EP1401923A2/en not_active Withdrawn
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06505034A (ja) * | 1990-12-07 | 1994-06-09 | ヴァスキュテック リミテッド | ポリマー表面のフッ素化 |
| JPH05107746A (ja) * | 1991-10-15 | 1993-04-30 | Shin Etsu Chem Co Ltd | リソグラフイー用ペリクル |
| JPH06317895A (ja) * | 1993-05-07 | 1994-11-15 | Shin Etsu Chem Co Ltd | ペリクルの製造方法 |
| JPH07118596A (ja) * | 1993-10-25 | 1995-05-09 | Daikin Ind Ltd | 撥水撥油剤組成物およびその製法 |
| JPH11501685A (ja) * | 1995-02-06 | 1999-02-09 | イー・アイ・デユポン・ドウ・ヌムール・アンド・カンパニー | テトラフルオロエチレン−ヘキサフルオロプロピレンの非晶質コポリマー類 |
| US6156389A (en) * | 1997-02-03 | 2000-12-05 | Cytonix Corporation | Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same |
| JPH11167030A (ja) * | 1997-10-02 | 1999-06-22 | Asahi Glass Co Ltd | 屈折率分布型光学樹脂材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002092670A3 (en) | 2003-11-13 |
| KR20030095405A (ko) | 2003-12-18 |
| WO2002092670A2 (en) | 2002-11-21 |
| EP1401923A2 (en) | 2004-03-31 |
| AU2002342745A1 (en) | 2002-11-25 |
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